JPS5846521Y2 - Shutter devices such as electron microscopes - Google Patents

Shutter devices such as electron microscopes

Info

Publication number
JPS5846521Y2
JPS5846521Y2 JP5809879U JP5809879U JPS5846521Y2 JP S5846521 Y2 JPS5846521 Y2 JP S5846521Y2 JP 5809879 U JP5809879 U JP 5809879U JP 5809879 U JP5809879 U JP 5809879U JP S5846521 Y2 JPS5846521 Y2 JP S5846521Y2
Authority
JP
Japan
Prior art keywords
conductive foil
shutter member
electron beam
conductor
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5809879U
Other languages
Japanese (ja)
Other versions
JPS55158155U (en
Inventor
秀雄 小林
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP5809879U priority Critical patent/JPS5846521Y2/en
Publication of JPS55158155U publication Critical patent/JPS55158155U/ja
Application granted granted Critical
Publication of JPS5846521Y2 publication Critical patent/JPS5846521Y2/en
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 本考案はレンズ磁場を利用したシャッター装置の改良に
関するものである。
[Detailed Description of the Invention] The present invention relates to an improvement of a shutter device that utilizes a lens magnetic field.

斯かるレンズ磁場を利用したシャッター装置の従来例を
第1図に示す。
A conventional example of a shutter device using such a lens magnetic field is shown in FIG.

図中1は基板であり、該基板1が第2図に示すようにレ
ンズのポールピース2aと2bとの間に挿入され、レン
ズヨーク等に固定される。
In the figure, reference numeral 1 denotes a substrate, and as shown in FIG. 2, the substrate 1 is inserted between lens pole pieces 2a and 2b and fixed to a lens yoke or the like.

該基板上には電子線通過用穴3が設けられ、その軸心は
レンズ軸(光軸)と一致せられている。
An electron beam passage hole 3 is provided on the substrate, and its axis is aligned with the lens axis (optical axis).

又該基板1上には2個の端子板4 a 、4 bがこの
基板と電気絶縁されて固定されており、スイッチ5を介
して直流電源6の両端子に夫々接続されている。
Two terminal plates 4 a and 4 b are fixed on the substrate 1 and electrically insulated from the substrate 1, and are connected to both terminals of a DC power source 6 via a switch 5, respectively.

7は板状又は帯状の導電箔で、該導電箔はコの字状に折
り曲げると共に、その両端面7a及び7bにU字状の折
曲部8a及び8bを形成せしめて弾性をもつように構成
されており、又両端面7 a 、7 bは前記端子板4
a 、4 bに夫々固定されている。
Reference numeral 7 denotes a plate-shaped or band-shaped conductive foil, which is bent into a U-shape and has U-shaped bent portions 8a and 8b formed on both end surfaces 7a and 7b to have elasticity. and both end surfaces 7a and 7b are connected to the terminal plate 4.
a and 4 b, respectively.

該導電箔7の前記基板1の電子線通過穴3に対応する場
所に耐熱性金属製のシャッタ一部材9が取り付けである
A shutter member 9 made of heat-resistant metal is attached to the conductive foil 7 at a location corresponding to the electron beam passage hole 3 of the substrate 1.

10はストッパーである。10 is a stopper.

しかして今、レンズ磁場の方向が電子線Eの進行方向と
同じであるならば、スイッチ5を閉じると電源6から一
定の直流電流が導電箔7に流れ、フレミングの左手の法
則に従い導電箔7のシャッタ一部材9を取り付けている
面7Cには同図中右方向の力が作用し、該導電箔は移動
する。
However, now, if the direction of the lens magnetic field is the same as the traveling direction of the electron beam E, when the switch 5 is closed, a constant DC current flows from the power supply 6 to the conductive foil 7, and according to Fleming's left hand rule, the conductive foil 7 A force in the right direction in the figure acts on the surface 7C to which the shutter member 9 is attached, and the conductive foil moves.

従って該導電箔7の移動によりシャッタ一部材9が電子
線通過穴3を塞ぐため、電子線Eはカットされる。
Therefore, since the shutter member 9 closes the electron beam passage hole 3 due to the movement of the conductive foil 7, the electron beam E is cut.

しかしてシャッタ一部材9のストロークを大きくするた
めに前述したように導電箔7の途中にU字状の折曲部8
a、8bを設けた構造では、導電箔7に電流を供給した
場合シャッタ一部材9に振動が生じて、電子線を完全に
遮断できなくなることが生ずる。
In order to increase the stroke of the shutter member 9, a U-shaped bent portion 8 is formed in the middle of the conductive foil 7 as described above.
In the structure in which the conductive foils 7a and 8b are provided, when a current is supplied to the conductive foil 7, the shutter member 9 vibrates, making it impossible to completely block the electron beam.

つまり導電箔7への通電により面7Cの右方向への移動
にともなって折曲部8 a 、8 bの底部a部分が同
方向にたわむため、この新曲部8 a 、8 b部分に
抗力が生じる。
In other words, when the conductive foil 7 is energized, the surface 7C moves to the right, and the bottom a portions of the bent portions 8 a and 8 b bend in the same direction, so that a drag is exerted on the new bent portions 8 a and 8 b. arise.

該抗力は導電箔7の面7Cの移動量に応じて次第に大き
くなり、ついには面7Cにおける力よりも大きくなって
この面7Cを逆方向(左方向)に移動させる。
The drag force gradually increases in accordance with the amount of movement of the surface 7C of the conductive foil 7, and finally becomes larger than the force on the surface 7C, causing the surface 7C to move in the opposite direction (to the left).

この面7Cの左方向の移動により抗力は減小し、再び面
7Cは右方向に移動する。
This movement of the surface 7C to the left reduces the drag, and the surface 7C moves to the right again.

以下この現象が繰り返されるため、面7Cの固定された
シャッタ一部材9が振動し、電子線を完全に遮断できな
い状態が生ずる。
Since this phenomenon is repeated thereafter, the shutter member 9 to which the surface 7C is fixed vibrates, resulting in a state in which the electron beam cannot be completely blocked.

本考案は斯かる不都合を解決することを目的とするもの
で、以下第3図に示す一実施例に基づき説明する。
The present invention is aimed at solving such inconveniences, and will be explained below based on an embodiment shown in FIG.

尚第1図及び第2図と同一番号は同一構成要素を示す。Note that the same numbers as in FIGS. 1 and 2 indicate the same components.

即ち本考案では基板1上に取り付けられる導電箔11を
その両端面11 aと11 bが間隔を保って互いに重
なり合うような四角形に折り曲げて大きな弾性(たわみ
)を得るようになすと共にこの導電箔11の両端面11
a、llbと対向する面11 Cにシャッタ一部材9を
固定したものである。
That is, in the present invention, the conductive foil 11 attached to the substrate 1 is bent into a rectangular shape such that both end surfaces 11a and 11b overlap each other with a distance between them to obtain large elasticity (bending). Both end faces 11 of
A shutter member 9 is fixed to the surface 11C facing a and llb.

又前記両端面11 aと11 bの夫々の先端は端子板
4a、4bに夫々固定される。
Further, the respective tips of the end surfaces 11a and 11b are fixed to the terminal plates 4a and 4b, respectively.

斯様な構成となせば、従来のように導電箔の途中にU字
状の折曲部を形成する構造のものに比べてシャッタ一部
材9の振動を発生させることなくシャッタ一部材のスト
ロークを長することができる。
With such a configuration, the stroke of the shutter member 9 can be controlled without causing vibration of the shutter member 9 compared to a conventional structure in which a U-shaped bent portion is formed in the middle of the conductive foil. It can be long.

即ち本考案においても導電箔11を通過してシャッター
板9を第3図中右方向に移動させた場合導電箔11の端
面11 a、11 bも同方向にたわむため、該部分に
抗力が生ずる。
That is, in the present invention, when the shutter plate 9 is moved to the right in FIG. 3 through the conductive foil 11, the end surfaces 11a and 11b of the conductive foil 11 are also bent in the same direction, so that a drag force is generated in these parts. .

このとき導電箔の端面11 a (11b)ノ長さは第
1図で示す折曲部8a(8b)の面8al(8bl)の
長さに比べて非常に長い(2倍以上)ため、前述した抗
力は本考案の方が従来に比べてはるかに小さくなる。
At this time, the length of the end surface 11a (11b) of the conductive foil is very long (more than twice) than the length of the surface 8al (8bl) of the bent portion 8a (8b) shown in FIG. The drag force of the present invention is much smaller than that of the conventional method.

従って本考案における導電箔の端面11a、llb部分
に発生する抗力も第1図の構造に比べて減小するため、
導電箔11に通電させた際シャッタ一部材9が振動する
ことがなくなり、電子線を確実にカットすることができ
、実用上天なる効果を有する。
Therefore, the drag force generated at the end surfaces 11a and llb of the conductive foil in the present invention is also reduced compared to the structure shown in FIG.
When the conductive foil 11 is energized, the shutter member 9 does not vibrate, and the electron beam can be reliably cut, which has a great practical effect.

一方シャッタ一部材9の導電箔11への取り付けにあた
っては、第4図aで示すようにシャッタ一部材9に3個
の突出部12 a 、12 b 、12 Cを形成し、
コノ各突出部12 a 、12 b 、12 Cを第4
図b テ示すように導電箔11の面11 Cに折り曲げ
て取り付ければ、導電箔11 Cとシャッタ一部材9と
の間の接触面積を少なくすることができる。
On the other hand, when attaching the shutter member 9 to the conductive foil 11, three protrusions 12 a , 12 b , and 12 C are formed on the shutter member 9 as shown in FIG.
Each of the protrusions 12 a , 12 b , 12 C is connected to the fourth
If the conductive foil 11 is bent and attached to the surface 11C as shown in FIG. b, the contact area between the conductive foil 11C and the shutter member 9 can be reduced.

その為電子線照射によりシャッタ一部材9の温度が上昇
しても導電箔が温度上昇することを防止できる。
Therefore, even if the temperature of the shutter member 9 increases due to electron beam irradiation, the temperature of the conductive foil can be prevented from increasing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び゛第2図は従来例を示す図、第3図は本考案
の一実施例を示す斜視図、第4図a及びbは本考案で使
用されるシャッタ一部材の斜視図である。 図中 1:基板、2a、2b:レンズのポールピース、
3:電子線通過穴、4a及び4b:端子板、5:スイッ
チ、6:直流電源、7及び11:導電箔、9:シャッタ
一部材。
Figures 1 and 2 are views showing a conventional example, Figure 3 is a perspective view showing an embodiment of the present invention, and Figures 4a and b are perspective views of shutter members used in the present invention. be. In the figure 1: Substrate, 2a, 2b: Lens pole pieces,
3: electron beam passage hole, 4a and 4b: terminal plate, 5: switch, 6: DC power supply, 7 and 11: conductive foil, 9: shutter member.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 磁場内に箔状の導電体の両端を固定して配置し、該導電
体に通電することにより生ずる力を利用して該導電体を
移動せしめて電子線をカットするようになした装置にお
いて、前記導電体の両端近傍を互いに間隔を保って重な
り合うように配置せしめると共に該両端近傍の重なり合
う部分と対向する導電体の部分に電子線をカットするシ
ャッタ一部材を取り付けてなる電子顕微鏡等のシャッタ
ー装置。
A device in which both ends of a foil-like conductor are fixedly placed in a magnetic field, and the conductor is moved using force generated by energizing the conductor to cut an electron beam, A shutter device for an electron microscope or the like, which comprises arranging the conductors near both ends so as to overlap each other while maintaining a distance from each other, and attaching a shutter member for cutting an electron beam to a portion of the conductor opposite to the overlapping portion near the both ends. .
JP5809879U 1979-04-28 1979-04-28 Shutter devices such as electron microscopes Expired JPS5846521Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5809879U JPS5846521Y2 (en) 1979-04-28 1979-04-28 Shutter devices such as electron microscopes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5809879U JPS5846521Y2 (en) 1979-04-28 1979-04-28 Shutter devices such as electron microscopes

Publications (2)

Publication Number Publication Date
JPS55158155U JPS55158155U (en) 1980-11-13
JPS5846521Y2 true JPS5846521Y2 (en) 1983-10-22

Family

ID=29292159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5809879U Expired JPS5846521Y2 (en) 1979-04-28 1979-04-28 Shutter devices such as electron microscopes

Country Status (1)

Country Link
JP (1) JPS5846521Y2 (en)

Also Published As

Publication number Publication date
JPS55158155U (en) 1980-11-13

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