JPS5846439U

JPS5846439U - Sample stage of electron beam lithography system

Info

Publication number: JPS5846439U
Application number: JP14040481U
Authority: JP
Inventors: 南川　佳久
Original assignee: 株式会社日立製作所
Priority date: 1981-09-24
Filing date: 1981-09-24
Publication date: 1983-03-29

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Brief explanation of the drawing]

第１図（ま従来の電子線描−装置の構成を示す平面図、
第２図は本考案を説明する電子線描画装置の平面図、第
３図は第２図の正面を示す断面図、第４図は信号線の断
面図、第５図は第３図の固定部詳細図、第６図は本考案
の他の実施例を示す信号線の構成図である。　　　　　
　′ １・・・試料、２・・・試料室、３・・・Ｙテーブル、
７・・・Ｘテーブル、１３〜１５・・・信号線、２３・
・・燐青銅板゛、２４・・・保護板、２６．２７．３１
．３３．・３４．３７・・・コネクター。第２聞第３図　・７第６図 −ＩＧ４１）３ワ　３８　３１FIG. 1 (a plan view showing the configuration of a conventional electron beam lithography device,
Fig. 2 is a plan view of an electron beam lithography system explaining the present invention, Fig. 3 is a sectional view showing the front of Fig. 2, Fig. 4 is a sectional view of the signal line, and Fig. 5 is a fixing of Fig. 3. FIG. 6 is a detailed diagram of a signal line showing another embodiment of the present invention.
'1...sample, 2...sample chamber, 3...Y table,
7...X table, 13-15...signal line, 23.
... Phosphor bronze plate, 24... Protective plate, 26.27.31
．． 33.・34.37...Connector. 2nd period Figure 3 7 Figure 6-IG41) 3W 38 31

Claims

[Claims for Utility Model Registration] 1. A sample for drawing with an electron beam, a movable stage for holding and moving the sample, and a state on the movable stage that can be transferred to another part via a fixed end, or to another part. In a sample stage consisting of a transmission member for acting on a movable table from a section through a fixed end, and a container for keeping each section in a vacuum, the transmission member is fixed at two places, the movable end and the fixed end. A sample stage for an electron beam lithography apparatus, characterized in that the member is configured to have no contact portion in the direction of gravity. 2. A sample stage for an electron beam lithography apparatus as set forth in claim 1 of the utility model registration claim, characterized in that the transmission member is configured to have a vertically elongated cross section. 3. A sample stand for an electron beam lithography system as set forth in claim 1 of the utility model registration claim, characterized in that a low-wear material is provided in the portion where the side portion of the transmission member comes into contact. 4 In paragraph 1 of the claims for utility model registration,
A sample stand for an electron beam lithography system, characterized in that the continuous member has a large section modulus in the direction of gravity and is integrated with a flexible member in the horizontal direction to connect a moving end and a fixed end. 5. In claim 1 of the utility model registration claim, the transmission member is provided between the relative linear movable tables, and both ends of the transmission member are fixed to each of the relative movable tables. A sample stage for an electron beam lithography apparatus, characterized in that it is configured to connect a moving end and a fixed end using a composite configuration. 6. A sample stage for an electron beam lithography apparatus according to claims 1 and 5 i+ of the utility model registration, characterized in that both fixed ends of the transmission member are of a connector type and configured to be separable.