JPS5845777B2 - Method and apparatus for forming a fluorescent surface for color picture tubes - Google Patents

Method and apparatus for forming a fluorescent surface for color picture tubes

Info

Publication number
JPS5845777B2
JPS5845777B2 JP11552278A JP11552278A JPS5845777B2 JP S5845777 B2 JPS5845777 B2 JP S5845777B2 JP 11552278 A JP11552278 A JP 11552278A JP 11552278 A JP11552278 A JP 11552278A JP S5845777 B2 JPS5845777 B2 JP S5845777B2
Authority
JP
Japan
Prior art keywords
light
film
face panel
space
absorbing film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11552278A
Other languages
Japanese (ja)
Other versions
JPS5541677A (en
Inventor
悟 文字
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP11552278A priority Critical patent/JPS5845777B2/en
Publication of JPS5541677A publication Critical patent/JPS5541677A/en
Publication of JPS5845777B2 publication Critical patent/JPS5845777B2/en
Expired legal-status Critical Current

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  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Description

【発明の詳細な説明】 本発明はカラー受像管用螢光面、とくにブラックマトリ
ックス形螢光面の形成方法および同螢光面の形成装置に
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a phosphor surface for a color picture tube, and more particularly to a method for forming a black matrix type phosphor surface and an apparatus for forming the phosphor surface.

一般に、ブラックマトリックス形螢光面は死重たはスト
ライブからなる多数の空間を備えるように選択的に形成
された光吸収性膜と、前記空間内に充填された3種のド
ツト状昔たはストライブ状の螢光体膜とからなり、以下
にのべる手順により形成される。
In general, a black matrix type phosphor surface consists of a light-absorbing film selectively formed to have a large number of spaces consisting of dead weights or stripes, and three types of dot-shaped films filled in the spaces. consists of a striped phosphor film, and is formed by the procedure described below.

すなわち、1ず、ポリビニールアルコールと重クロム酸
塩とからなる感光性樹脂液をフェースパネルの内面に一
様に塗布してここに感光性樹脂膜を形成する。
That is, first, a photosensitive resin liquid made of polyvinyl alcohol and dichromate is uniformly applied to the inner surface of the face panel to form a photosensitive resin film thereon.

ついで、前記フェースパネル内にシャドウマスクを装着
し、3電子ビームの偏向中心となるべき位置に設置した
露光用光源を点灯させる。
Next, a shadow mask is mounted inside the face panel, and an exposure light source installed at a position that is to be the center of deflection of the three electron beams is turned on.

前記光源を3つの偏向中心位置で点灯させることによっ
て前記感光性樹脂膜を選択露光し、露光点の膜部分を硬
化させる。
By turning on the light source at three deflection center positions, the photosensitive resin film is selectively exposed, and the film portions at the exposed points are cured.

つぎに、水による現像処理を施すと、硬化した樹脂膜部
分のみがフェースパネルの内面に残留するから、ついで
、前記樹脂膜上にグラファイト膜を一様に塗布形成する
Next, when a water development treatment is performed, only the hardened resin film portion remains on the inner surface of the face panel, so a graphite film is then uniformly applied and formed on the resin film.

そして、過酸化水素を与えて前記グラファイト膜の下層
の前記樹脂膜を膨潤させ、再び水による現像処理を施す
と、前記樹脂膜とその直上に位置していたグラファイト
膜部分とがとり除かれ、ブラックマトリックス、つ筐り
、多数の空間を備えた光吸収性膜が得られる。
Then, when hydrogen peroxide is applied to swell the resin film below the graphite film, and development treatment with water is performed again, the resin film and the graphite film portion located directly above it are removed. A light-absorbing film with a black matrix, a housing, and a large number of spaces is obtained.

つぎに、この光吸収性膜の空間内に、赤、前転よび緑の
各発光をなす3種の螢光体膜を付設する。
Next, three types of phosphor films emitting red, forward, and green light are attached within the space of this light-absorbing film.

第1図には光吸収性膜が太い破線で示されてむり、この
膜の空間1内に螢光体膜が付設される。
In FIG. 1, a light-absorbing film is indicated by a thick dashed line, and a phosphor film is applied within the space 1 of this film.

螢光体膜付設工程では、渣ず、フェースパネル2の内面
に感光性螢光体膜3が前記光吸収性膜を覆うように一様
に塗布形成される。
In the phosphor film application step, the photosensitive phosphor film 3 is uniformly coated on the inner surface of the face panel 2 so as to cover the light-absorbing film.

そして、シャドウマスフ4が所定位置に装着され、露光
用光源5から放射されて補正レンズ6およびシャドウマ
スク4を通じた光が感光性螢光体膜3に与えられる。
Then, the shadow mask 4 is mounted at a predetermined position, and light emitted from the exposure light source 5 passes through the correction lens 6 and the shadow mask 4 and is applied to the photosensitive phosphor film 3.

そして、この選択露光処理後に施した現像処理により、
1種のドツト状渣たはストライブ状の螢光体膜ができ上
るので、残る2種の螢光体膜を前述と同様の要領で付設
する。
Then, through the development process performed after this selective exposure process,
Since one kind of dot-like residue or stripe-like phosphor film is completed, the remaining two kinds of phosphor films are applied in the same manner as described above.

選択露光処理時の感光性螢光体膜3上に釦ける照度分布
は第2図に曲線7で示すようなものとなる。
The illuminance distribution on the photosensitive phosphor film 3 during the selective exposure process is as shown by the curve 7 in FIG.

照度と露光量との間には相反則が成立するので、照度分
布で露光量分布を論じることができる。
Since a reciprocity law holds between illuminance and exposure, the exposure distribution can be discussed in terms of illuminance distribution.

第2図中の光量レベルIaは、これを基準にして現像処
理を施すと光吸収性膜の空間Gに対して、空間Gと同一
幅の螢光体膜部分が得られることを意味している。
The light intensity level Ia in FIG. 2 means that if the development process is performed based on this level, a phosphor film portion with the same width as the space G will be obtained for the space G of the light-absorbing film. There is.

捷た、光量レベル■。は、これを基準にして現像処理を
施すと空間Gに対して、隣の空間R1たはBに接する幅
の螢光体膜部分が得られることを意味し、光量レベルI
bは2つの光量レベルIa、Ioの中間を示す。
The light intensity level has changed. means that if the development process is performed based on this, a phosphor film portion with a width that touches the adjacent space R1 or B will be obtained for the space G, and the light amount level I
b indicates the middle between the two light intensity levels Ia and Io.

したがって、良好な螢光体膜を得るには、zAのレベル
範囲内に納することか必要となる。
Therefore, in order to obtain a good phosphor film, it is necessary to keep the zA level within the range.

一方、螢光面の輝度を高めるためには、光吸収性膜の空
間をできるだけ大きくとり、螢光体膜の有効発光面積を
大きくする必要がある。
On the other hand, in order to increase the brightness of the phosphor surface, it is necessary to increase the space of the light-absorbing film as much as possible to increase the effective light-emitting area of the phosphor film.

螢光体膜は通常、光吸収性膜の一部分と重なり合うため
、光吸収性膜部分の幅をMl からM2へと減少させる
と、部分aにおける螢光体膜が隣りの空間R4たばB内
へはみ出すことがある。
Since the phosphor film usually overlaps a part of the light-absorbing film, when the width of the light-absorbing film part is reduced from Ml to M2, the phosphor film in part a overlaps with the adjacent space R4 and B. It may stick out.

また、部分すにおける螢光体膜に欠けを生じることがあ
る。
Furthermore, the phosphor film in some parts may be chipped.

したがって、前記幅をM2 とする場合は、レベル範囲
zAをレベル範囲zBに圧縮する必要があり、この場合
、製造面での精度が非常にきびしくなる。
Therefore, when the width is set to M2, it is necessary to compress the level range zA to the level range zB, and in this case, manufacturing accuracy becomes very strict.

この欠点を解消させるための方策として、外部から光を
補充し、第2図に曲線8で示すような照度分布に改める
ことが考えられる。
As a measure to eliminate this drawback, it is conceivable to supplement the light from the outside and change the illuminance distribution to the one shown by curve 8 in FIG. 2.

第3図に示す構成では、従来と同様の露光用光源5のほ
かに、フェースパネル2の外面側に補助光源5′を設置
している。
In the configuration shown in FIG. 3, in addition to the conventional exposure light source 5, an auxiliary light source 5' is installed on the outer surface of the face panel 2.

また、第4図に示す他の例では、フェースパネル2の外
面側に、パネル外面に沿った反射面を有する無指向性反
射板9を設置しており、この場合、感光性螢光体膜3に
吸収されることなくフェースパネル2を透過した露光用
光線が、反射板9の反射面で螢光体膜3側へ反射して補
充光線となる。
In another example shown in FIG. 4, an omnidirectional reflector 9 having a reflective surface along the outer surface of the panel is installed on the outer surface of the face panel 2, and in this case, a photosensitive phosphor film is provided. The exposure light beam that has passed through the face panel 2 without being absorbed by the reflector plate 9 is reflected toward the phosphor film 3 side by the reflective surface of the reflector plate 9 and becomes a supplementary light beam.

しかし、第3図に示した補助光源法では、補助光源5′
からの光がフェースパネル2を一様に照射するので、光
吸収性膜の所定の空間内の螢光体膜部分のみならず、隣
りの空間内の螢光体膜部分をも露光してし渣う結果とな
り、かぶりによる混色不良を生じる。
However, in the auxiliary light source method shown in FIG.
Since the light uniformly illuminates the face panel 2, not only the portion of the phosphor film in a predetermined space of the light-absorbing film but also the portion of the phosphor film in an adjacent space is exposed. This results in smearing and poor color mixing due to fogging.

寸た、第4図に示した反射露光法では、フェースパネル
2の中央領域C1以外で好1しくない結果を招く。
However, the reflection exposure method shown in FIG. 4 causes unfavorable results in areas other than the central area C1 of the face panel 2.

すなわち、中央領域C1では、空間G内を透過しかつ反
射板9の反射面で反射した光線が元の空間G側へ反射す
るものの、周辺領域C2,C3では、空間G内を透過し
た光線11が反射板9の反射面で反射光r1 となって
外方へそれるので、やはり混色不良を生じる。
That is, in the central region C1, the light rays that have passed through the space G and have been reflected by the reflective surface of the reflector plate 9 are reflected back to the original space G, but in the peripheral regions C2 and C3, the light rays 11 that have passed through the space G becomes reflected light r1 on the reflective surface of the reflector plate 9 and is deflected outward, resulting in poor color mixing.

本発明は前述の諸点に留意してなされたものであり、つ
ぎに本発明を図面に示した実施例とともに説明する。
The present invention has been made with the above-mentioned points in mind, and will now be described with reference to embodiments shown in the drawings.

第5図に示す反射板10は第6図に示すように高屈折率
ガラスピーズからなる球状のレンズ体12と、その後方
にあってレンズ体12の焦点位置に設けられた同心球面
状の反射面11とからなる反射鏡対を素体とし、この素
体をフェースパネル2の外面に沿って多数個配列した構
成となっている。
The reflecting plate 10 shown in FIG. 5 includes a spherical lens body 12 made of high refractive index glass beads as shown in FIG. The face panel 2 has a structure in which a pair of reflecting mirrors consisting of a surface 11 is used as an element body, and a large number of these element bodies are arranged along the outer surface of the face panel 2.

前記反射鏡対は第7図に示すように入射光線11をレン
ズ体12によって屈折させる。
The reflector pair refracts the incident light beam 11 by a lens body 12 as shown in FIG.

そして、レンズ体12を出た光線は焦点位置Fにある反
射面11によって、入射光線11 の入射角と同一角度
で反射し、レンズ体12にもどって屈折する。
The light beam exiting the lens body 12 is reflected by the reflecting surface 11 located at the focal position F at the same angle as the incident angle of the incident light beam 11, returns to the lens body 12, and is refracted.

このため、反射光線r1は入射光線11 と平行な軌
道をとむってフェースパネル側へ進み、補充光線となる
Therefore, the reflected light ray r1 takes a trajectory parallel to the incident light ray 11 and proceeds toward the face panel, becoming a supplementary light ray.

第8図ないし第11図は光吸収性膜の空間G。FIGS. 8 to 11 show the space G of the light-absorbing film.

R,Bの幅むよび空間相互間の光吸収性膜部分13の幅
を一定とし、反射鏡対の大きさを変えたときの入射光線
11.12,13と反射光線rllr2 + r3
との関係を示すもので、レンズ体12の直径をP、
光吸収性膜の空間の配列ピッチをH1光吸収性膜の空間
の最大幅をDとしている。
Incident light rays 11, 12, 13 and reflected light rays rllr2 + r3 when the widths of R and B and the width of the light-absorbing film portion 13 between the spaces are constant and the size of the reflecting mirror pair is changed.
This shows the relationship between the diameter of the lens body 12 and P,
The arrangement pitch of the spaces in the light-absorbing film is H1, and the maximum width of the spaces in the light-absorbing film is D.

第8図ばP>H−Dとした場合で、空間Gへの入射光線
11が反射鏡対の反対面11で反射光線r1 となり
、隣りの空間Rに入射するので好1しくない。
In FIG. 8, when P>HD, the incident light ray 11 into the space G becomes a reflected light ray r1 at the opposite surface 11 of the pair of reflecting mirrors, which is not preferable because it enters the adjacent space R.

第9図はP=H−Dとした場合で、第10図はP<H−
Dとした場合である。
Figure 9 shows the case where P=H-D, and Figure 10 shows the case where P<H-
This is the case of D.

これらの場合は反射鏡対が光吸収性膜部分13よりも犬
とならないので、空間Gへの入射光線11.12,13
・・・・・・が反射鏡対の反射面11で反射しても、反
射光線r1 + r2 + r3・・・・・・
となって元の空間Gへ入射するため、混色不良を生じな
い。
In these cases, since the reflecting mirror pair is smaller than the light-absorbing film portion 13, the incident light rays 11, 12, 13 into the space G are
Even if .
Since the light enters the original space G, no defective color mixture occurs.

第11図はPHとした場合で、反射鏡対のフェースパネ
ル外面への設置を光吸収性膜部分の配列ピッチに合わせ
て行なうことの不便さはあっても良好な螢光面が得られ
る。
FIG. 11 shows the case of PH, and although it is inconvenient to install the reflecting mirror pair on the outer surface of the face panel in accordance with the arrangement pitch of the light-absorbing film portion, a good fluorescent surface can be obtained.

したがって、光吸収性膜のある空間Gを透過した光線が
反射鏡対で反射した後、元の空間G以外の空間に入射し
ないためにはレンズ体12の直径Pを、光吸収性膜の空
間相互間に介在する光吸収性膜部分の幅(H−D )以
下とするか、あるいは前記空間の配列ピッチHに等しい
値にする必要があり、この条件を満たした反射鏡対を多
数個配列した反射鏡をフェースパネルの外面上に設置し
、露光用光源から放射されかつシャドウマスクを通じた
光線を感光性螢光体膜に与えると、感光性螢光体膜に吸
収されずにフェースパネルを透過した光線は前記反射鏡
対によって反射し、この反射光により前記感光性螢光体
膜の硬化が促進されるのであって、かぶりや欠落のない
ドツト状またはストライブ状の螢光体膜を効率よく形成
することが可能となる。
Therefore, in order to prevent the light beam transmitted through the space G where the light-absorbing film is located from entering a space other than the original space G after being reflected by the pair of reflecting mirrors, the diameter P of the lens body 12 must be adjusted to the space G where the light-absorbing film is located. It is necessary to set the width to be less than or equal to the width (H-D) of the light-absorbing film portions interposed between each other, or to a value equal to the arrangement pitch H of the space, and it is necessary to arrange a large number of reflecting mirror pairs that meet this condition. When a reflective mirror is installed on the outer surface of the face panel and the light rays emitted from the exposure light source and passed through the shadow mask are applied to the photosensitive phosphor film, the light rays from the face panel are not absorbed by the photosensitive phosphor film. The transmitted light beam is reflected by the pair of reflecting mirrors, and this reflected light accelerates the curing of the photosensitive phosphor film, forming a dot-shaped or striped phosphor film without fogging or chipping. This enables efficient formation.

なお、光吸処性膜の空間が矩形捷たはストライプの場合
、レンズ体を球状とせずに円柱状となすことができ、こ
のレンズ体の焦点位置に波状の反射面を設置すればよい
Note that when the space of the light-absorbing film is rectangular or striped, the lens body can be made cylindrical instead of spherical, and a wavy reflective surface may be provided at the focal point of this lens body.

そして、かかる反射板はフェースパネルの外面上に、レ
ンズ体の長さ方向がシャドウマスクのスロットの長さ方
向に平行となるように設置される。
The reflector is installed on the outer surface of the face panel so that the length direction of the lens body is parallel to the length direction of the slot of the shadow mask.

また、反射鏡対は反射板全域に配列されていなくてもよ
く、螢光面形成に訃いて、特に問題となる螢光面周辺領
域またはその他の領域にのみ配列することができる。
In addition, the reflecting mirror pairs do not have to be arranged over the entire area of the reflecting plate, but can be arranged only in the peripheral area of the fluorescent surface or other areas which are particularly problematic due to the formation of the fluorescent surface.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の螢光面形成方法を説明するための構成図
、第2図は感光性螢光体膜上の照度分布を示す図、第3
図むよび第4図は従来の螢光面形成方法を説明するため
の構成図むよび説明図、第5図は本発明の一実施例を説
明するための構成図、第6図は本発明にむいて適用され
る反射鏡対の一例を示す拡大図、第7図は前記反射鏡対
の作用を説明するための図、第8図ないし第11図は反
射鏡対の大きさと反射作用とを説明するための図である
。 1・・・・・・光吸収性膜の空間、2・・・・・・フェ
ースパネル、3・・・・・・感光性螢光体膜、4・・・
・・・シャドウマスク、5・・・・・・露光用光源、1
0・・・・・・反射板、11・・・・・・反射面、12
・・・・・・レンズ体、13・・・・・・光吸収性膜部
分。
Figure 1 is a block diagram for explaining the conventional method of forming a fluorescent surface, Figure 2 is a diagram showing the illuminance distribution on a photosensitive phosphor film, and Figure 3 is a diagram showing the illuminance distribution on a photosensitive phosphor film.
Figures 4 and 4 are block diagrams and explanatory diagrams for explaining a conventional method for forming a fluorescent surface, Figure 5 is a block diagram for explaining an embodiment of the present invention, and Figure 6 is a block diagram for explaining an embodiment of the present invention. FIG. 7 is a diagram for explaining the action of the reflecting mirror pair, and FIGS. 8 to 11 show the size and reflection action of the reflecting mirror pair. FIG. 1... Space of light-absorbing film, 2... Face panel, 3... Photosensitive phosphor film, 4...
... Shadow mask, 5 ... Exposure light source, 1
0... Reflection plate, 11... Reflection surface, 12
... Lens body, 13 ... Light absorbing film part.

Claims (1)

【特許請求の範囲】 1 フェースパネルの内面に光吸収性膜を選択的に形成
したのち前記光吸収性膜を覆って感光性螢光体膜を一様
に塗布形成し、シャドウマスクを通じて与えた光により
前記感光性螢光体膜を選択露光するにさいし、前記感光
性螢光体膜、前記光吸収性膜の空間および前記フェース
パネルを透過した光を、前記フェースパネルの外面上に
設置したレンズ体むよび前記レンズ体の焦点位置に設置
した波状の反射面で屈折および反射させ、この反射光を
前記空間内の感光性螢光体膜部分に導くことを特徴とす
るカラー受像管用螢光面の形成方法。 2 選択的に形成された光吸収性膜およびこの膜を覆っ
て一様に塗布形成された感光性螢光体膜を内面に有する
フェースパネルと、前記フェースパネルの内面に近接し
て設置されたシャドウマスクと、前記シャドウマスクの
内面に向き合って設置された露光用光源と、前記光源か
ら放射されて前記シャドウマスク、前記感光性螢光体膜
、前記光吸収性膜の空間および前記フェースパネルを通
じた光を屈折させるために前記フェースパネルの外面上
に配置されたレンズ体と、前記レンズ体の焦点位置に設
置されて前記屈折された光を前記空間側へ反射させるた
めの波状の反射面とを備えてなることを特徴とするカラ
ー受像管用螢光面の形成装置。
[Claims] 1. After selectively forming a light-absorbing film on the inner surface of the face panel, a photosensitive phosphor film is uniformly applied to cover the light-absorbing film, and is applied through a shadow mask. When selectively exposing the photosensitive phosphor film to light, the light transmitted through the photosensitive phosphor film, the space of the light-absorbing film, and the face panel is placed on the outer surface of the face panel. A fluorescent light for a color picture tube, characterized in that the reflected light is refracted and reflected by a lens body and a wavy reflective surface installed at a focal point of the lens body, and the reflected light is guided to a photosensitive fluorescent film portion in the space. How to form surfaces. 2. A face panel having on its inner surface a selectively formed light-absorbing film and a photosensitive phosphor film coated uniformly over the film, and a face panel installed close to the inner surface of the face panel. a shadow mask, an exposure light source installed facing the inner surface of the shadow mask; and radiation emitted from the light source through the space of the shadow mask, the photosensitive phosphor film, the light-absorbing film, and the face panel. a lens body disposed on the outer surface of the face panel to refract the refracted light; and a wavy reflecting surface disposed at a focal position of the lens body to reflect the refracted light toward the space. A device for forming a fluorescent surface for a color picture tube, comprising:
JP11552278A 1978-09-19 1978-09-19 Method and apparatus for forming a fluorescent surface for color picture tubes Expired JPS5845777B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11552278A JPS5845777B2 (en) 1978-09-19 1978-09-19 Method and apparatus for forming a fluorescent surface for color picture tubes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11552278A JPS5845777B2 (en) 1978-09-19 1978-09-19 Method and apparatus for forming a fluorescent surface for color picture tubes

Publications (2)

Publication Number Publication Date
JPS5541677A JPS5541677A (en) 1980-03-24
JPS5845777B2 true JPS5845777B2 (en) 1983-10-12

Family

ID=14664601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11552278A Expired JPS5845777B2 (en) 1978-09-19 1978-09-19 Method and apparatus for forming a fluorescent surface for color picture tubes

Country Status (1)

Country Link
JP (1) JPS5845777B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0256582A1 (en) * 1986-08-18 1988-02-24 North American Philips Consumer Electronics Corp. Method of producing a phosphor screen for a colour cathode ray tube
SG98010A1 (en) * 2000-12-22 2003-08-20 Sony Electronics Singapore Pte A method of exposing photo-resist on an optical substrate

Also Published As

Publication number Publication date
JPS5541677A (en) 1980-03-24

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