JPS5843098B2 - Low-temperature gas injection device for local cooling - Google Patents

Low-temperature gas injection device for local cooling

Info

Publication number
JPS5843098B2
JPS5843098B2 JP9322480A JP9322480A JPS5843098B2 JP S5843098 B2 JPS5843098 B2 JP S5843098B2 JP 9322480 A JP9322480 A JP 9322480A JP 9322480 A JP9322480 A JP 9322480A JP S5843098 B2 JPS5843098 B2 JP S5843098B2
Authority
JP
Japan
Prior art keywords
ejector
liquid nitrogen
gas
gas injection
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9322480A
Other languages
Japanese (ja)
Other versions
JPS5720265A (en
Inventor
昌平 石川
克己 大和
武良 浜田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teisan KK
Original Assignee
Teisan KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teisan KK filed Critical Teisan KK
Priority to JP9322480A priority Critical patent/JPS5843098B2/en
Publication of JPS5720265A publication Critical patent/JPS5720265A/en
Publication of JPS5843098B2 publication Critical patent/JPS5843098B2/en
Expired legal-status Critical Current

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  • Thermotherapy And Cooling Therapy Devices (AREA)

Description

【発明の詳細な説明】 本発明はリウマチ等の患部を急激に冷却して疼痛緩和と
治療とに或いは冷却麻酔等に使用する局部冷却用低温ガ
ス噴射装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a low-temperature gas injection device for local cooling, which is used for rapid cooling of affected areas such as rheumatoid arthritis for pain relief and treatment, cooling anesthesia, and the like.

従来この種の治療としては一196℃の液体窒素を利用
し、気化加温して一50℃以下の温度のガスになったも
のを患部に直接噴射して、患部を凍傷を起こさない程度
に維持しつつ冷却する方法があるが、この場合には、換
気の少ない病、医院の治療室で連続して窒素ガスを室内
に放出すると室内の窒素濃度が増加し、酸素欠乏の状態
となるため、人体に悪影響を与える欠点がある。
Conventionally, this type of treatment uses liquid nitrogen at a temperature of -196°C, which is vaporized and heated to become a gas at a temperature of 150°C or less, which is injected directly onto the affected area to prevent frostbite. There is a method of cooling while maintaining the temperature, but in this case, if nitrogen gas is continuously released into the room in a treatment room of a clinic or a hospital with little ventilation, the nitrogen concentration in the room will increase, resulting in a state of oxygen deficiency. , there are drawbacks that have a negative impact on the human body.

更は、従来はドライアイスや凍結手術プローブ等の利用
が考えられているが、この場合は倒れも皮膚に接触させ
ないと冷却効果が得られず、直接接触させると凍傷を起
こす危険性が多大である。
Furthermore, conventional methods have been considered to use dry ice or cryosurgical probes, but in this case, the cooling effect cannot be obtained unless they come into contact with the skin, and direct contact poses a great risk of frostbite. be.

又従来のガスを噴射して行う装置では所望の温度のガス
を得るのが極めて困難であり、このため例えば特開昭5
5−40336号公報に示す装置においては正圧の加わ
った液体窒素タンクから送出する液体窒素をそれぞれバ
ルブを介して2つの通路に分割し一方の通路の液体窒素
をガス化した後他方の通路の液体窒素と混合せしめるよ
うにしているが一定温度にするため正圧の加わった液体
窒素とガスをそれぞれバルブによって制御して一定比率
で混合する操作は極めて面倒で且つ困難であり5又酸素
欠乏の問題は全く解決されていない。
Furthermore, it is extremely difficult to obtain gas at a desired temperature using conventional gas injection devices, and for this reason, for example,
In the device shown in Publication No. 5-40336, liquid nitrogen sent from a liquid nitrogen tank to which positive pressure is applied is divided into two passages via valves, and after gasifying the liquid nitrogen in one passage, the liquid nitrogen is transferred to the other passage. However, in order to maintain a constant temperature, liquid nitrogen and gas under positive pressure are controlled by valves and mixed at a constant ratio, which is extremely troublesome and difficult. The problem is not resolved at all.

このような酸素欠乏の問題を解決するため酸素と液体窒
素を混合したものを噴出するようにしたものもあるが依
然として一定温度のガスを得るのが困難である。
In order to solve this problem of oxygen deficiency, some devices emit a mixture of oxygen and liquid nitrogen, but it is still difficult to obtain a gas at a constant temperature.

本発明装置はこのような問題を解決するようにしたもの
であって、低温ガス噴射ノズルと、エゼクタ−と、この
エセクターの入口に接続した圧力調節機構を有する酸素
ガス供給ラインと、前記エセクターの吸入口に接続した
ほぼ大気圧の液体窒素導入ラインと、前記エゼクタ−の
出口と前記ノズル間に介挿した加温機構とを含むことを
特徴とする。
The device of the present invention is designed to solve such problems, and includes a low-temperature gas injection nozzle, an ejector, an oxygen gas supply line having a pressure regulation mechanism connected to the inlet of the ejector, and an oxygen gas supply line connected to the inlet of the ejector. It is characterized by including a liquid nitrogen introduction line at approximately atmospheric pressure connected to the suction port, and a heating mechanism interposed between the outlet of the ejector and the nozzle.

以下図面によって本発明の詳細な説明する。The present invention will be explained in detail below with reference to the drawings.

図中1は液体窒素のタンク、2はタンク1に対する液体
窒素供給ライン、3はタンク1の上部に設けた開口、4
はタンク1内に設けた液体窒素の液面センサー、5は酸
素ガス供給ライン、6はガスを患部に吹き付けるための
低温ガス噴射ノズルを示す。
In the figure, 1 is a liquid nitrogen tank, 2 is a liquid nitrogen supply line to tank 1, 3 is an opening provided at the top of tank 1, and 4
1 is a liquid nitrogen level sensor provided in a tank 1, 5 is an oxygen gas supply line, and 6 is a low-temperature gas injection nozzle for spraying gas onto the affected area.

本発明においてはエゼクタ−7を設けその人ロアaに圧
力調節機構としての例えばメングラン式圧力調整器を有
する酸素ガス供給ライン5を接続し、その吸引ロアbに
タンク1内の液体窒素をほぼ大気圧で導入するライン8
を接続し、その出ロアcをサーモスタットを有する加温
機構9を介して低温ガス噴射ノズル6に連結せしめ、圧
力調整器によって所定の一定圧力に調節された常温の酸
素ガスをエゼクタ−7内に送り込みエゼクタ−7の吸引
ロアbに作用する負圧、即ちエゼクタ−作用によってタ
ンク1内の液体窒素を導入ライン8を介してエゼクタ−
7内に液滴状に取り込み、このエゼクタ−7内の気液混
合物を、次いで加温機構9によって加温し所定の温度の
ガス体とした後ノズル6か与噴出せしめるようにする。
In the present invention, an ejector 7 is provided, and an oxygen gas supply line 5 having, for example, a Menglan pressure regulator as a pressure regulating mechanism is connected to the ejector 7, and the liquid nitrogen in the tank 1 is supplied to the suction lower b of the ejector 7. Line 8 introduced by atmospheric pressure
The output lower c is connected to the low temperature gas injection nozzle 6 via the heating mechanism 9 having a thermostat, and the room temperature oxygen gas adjusted to a predetermined constant pressure by the pressure regulator is injected into the ejector 7. The liquid nitrogen in the tank 1 is transferred to the ejector via the introduction line 8 by the negative pressure acting on the suction lower b of the feed ejector 7, that is, by the ejector action.
The gas-liquid mixture in the ejector 7 is then heated by the heating mechanism 9 to form a gas at a predetermined temperature, and then ejected from the nozzle 6.

実施例では加温機構9は加温すべきガスの流れるフィン
付き管に温風を吹き付けるようにしている。
In the embodiment, the heating mechanism 9 blows hot air onto a finned tube through which gas to be heated flows.

この加温機構9は温度センサー10の信号によって作動
する温度制御機構11によって制御されるので、ガス温
度を一定に保つことができる。
Since this heating mechanism 9 is controlled by a temperature control mechanism 11 that is activated by a signal from a temperature sensor 10, the gas temperature can be kept constant.

尚本発明装置におけるタンク1内は開口3を介して常時
大気に開放し、タンク1内の液体窒素の液面上の圧力は
ほぼ大気圧となるようにする。
In the apparatus of the present invention, the inside of the tank 1 is always open to the atmosphere through the opening 3, so that the pressure above the liquid nitrogen level in the tank 1 is approximately atmospheric pressure.

又この液体窒素の液面は常時センサー4により感知し、
このセンサー4の出力を入力とする調節機構12と前記
液体窒素供給ライン2に介挿した流量制御機構13とに
より液体窒素供給ラインから供給される液体窒素の量を
制御しタンク1内の液面レベルが常に一定であるように
する。
In addition, the liquid level of this liquid nitrogen is constantly detected by a sensor 4,
The amount of liquid nitrogen supplied from the liquid nitrogen supply line is controlled by an adjustment mechanism 12 which receives the output of this sensor 4 as input, and a flow rate control mechanism 13 inserted into the liquid nitrogen supply line 2, and the liquid level in the tank 1 is controlled. Ensure that the level remains constant.

本発明装置においては上記のように酸素ガスと液体窒素
の混合気体を用いるため酸素欠乏の問題はなく、又液体
窒素はほぼ大気圧で取り込まれ、ノズル6の開口、エゼ
クタ−7の入口、吸引口、出口の面積比はそれぞれ一定
であるから酸素ガスの圧力、流量、液体窒素導入ライン
8の長さ、タンク1内の液体窒素液面高さによって任意
にその混合量を制御できるためその混合比を空気と類似
ならしめることができ、このようにほぼ一定の混合比と
なった混合物を更にエゼクタ−外に設けた加温機構9に
より調節するようにしたので混合ガスを理想的な混合比
で且つ精度良くその温度を調節することができる。
In the device of the present invention, as mentioned above, a mixed gas of oxygen gas and liquid nitrogen is used, so there is no problem of oxygen deficiency, and the liquid nitrogen is taken in at almost atmospheric pressure, Since the area ratio of the inlet and outlet is constant, the mixing amount can be controlled arbitrarily depending on the pressure and flow rate of the oxygen gas, the length of the liquid nitrogen introduction line 8, and the height of the liquid nitrogen liquid level in the tank 1. The ratio can be made similar to that of air, and the mixture having a nearly constant mixing ratio is further adjusted by the heating mechanism 9 installed outside the ejector, so that the mixed gas can be adjusted to the ideal mixing ratio. The temperature can be adjusted with high precision.

又本発明装置においては酸素ガスがエゼクタ−7に供給
されなければ液体窒素も導入ライン8を上昇しないため
低温ガス噴射ノズル6から窒素ガスのみが放出されて酸
欠を起こすような事故を完全に防止できる大きな利益が
ある。
In addition, in the device of the present invention, unless oxygen gas is supplied to the ejector 7, liquid nitrogen will not rise up the introduction line 8, so accidents such as only nitrogen gas being released from the low temperature gas injection nozzle 6 and causing oxygen deficiency can be completely avoided. There are great benefits to preventing it.

尚本発明装置において用いる酸素ガスは露点−60℃程
度の乾燥ガスであるがエゼクタ−7の入ロアa附近では
エゼクタ−7の吸引ロアbを介して吸引され噴霧化した
液体窒素と接近するので酸素ガスは露点以下となり、酸
素ガス中の微量の水分がエゼクタ−7の人ロアa部分で
これに氷結するおそれがある。
The oxygen gas used in the device of the present invention is a dry gas with a dew point of about -60°C, but in the vicinity of the inlet lower a of the ejector 7, it comes into contact with the atomized liquid nitrogen sucked through the suction lower b of the ejector 7. The oxygen gas will be below the dew point, and there is a risk that a trace amount of moisture in the oxygen gas will freeze on the lower part a of the ejector 7.

従って本発明の他の実施例においてはエゼクタ−7の入
ロアaの外側部分で酸素ガス供給ライン5に加温機構1
4を設けこの部分を加熱せしめ、入ロアaが酸素ガスの
露点以下にならないようにする。
Therefore, in another embodiment of the present invention, the heating mechanism 1 is connected to the oxygen gas supply line 5 at the outer part of the entrance lower a of the ejector 7.
4 is provided to heat this part so that the inlet lower a does not fall below the dew point of oxygen gas.

図示の実施例では温風を吹き付けることによって金属製
の酸素供給管5を加温し、その熱伝導によってエゼクタ
−7の入ロアaの温度を高めている。
In the illustrated embodiment, the metal oxygen supply pipe 5 is heated by blowing hot air, and the temperature of the inlet lower a of the ejector 7 is raised by the heat conduction.

このようにすれば前記氷結の問題を一掃することができ
る。
In this way, the problem of icing can be eliminated.

本発明の更に他の実施例においてはノズル6の近傍に酸
素濃度センサー15を設け、このセンサー15の出力を
濃度警報機構16に加え、例えばノズル6から噴射され
るガス中の酸素濃度が18%〜25%の範囲から外れる
ようになった場合警報を発するようにし、場合によって
は酸素ガス供Pフィン5に介挿した電磁弁を制御して酸
素ガスの供給を止めるようにする。
In still another embodiment of the present invention, an oxygen concentration sensor 15 is provided near the nozzle 6, and the output of this sensor 15 is added to the concentration alarm mechanism 16, so that, for example, the oxygen concentration in the gas injected from the nozzle 6 is 18%. If the temperature falls outside the range of ~25%, an alarm is issued, and depending on the situation, a solenoid valve inserted in the oxygen gas supply P fin 5 is controlled to stop the supply of oxygen gas.

このようにすれば酸素欠乏或いは酸素過剰による危険を
未然に防止することができる。
In this way, dangers due to oxygen deficiency or oxygen excess can be prevented.

【図面の簡単な説明】[Brief explanation of drawings]

図は本発明装置の説明図である。 1・・・・・・液体窒素タンク、2・・・・・・液体窒
素供給ライン、3・・・・・・タンク上部開口、4・・
・・・・液面センサ、5・・・・・・酸素ガス供給ライ
ン、6・・・・・・低温ガス噴射ノズル、7・−・−・
エゼクタ−7a・・・・・・エゼクタ−の入口、7b・
・・・・・エゼクタ−の吸引口、8・・・・−・導入ラ
イン、9・・・・・・加温機構、10・・・・・・温度
センサー、11・・・・・・温度制御機構、12・−・
・・・調節機構、13・・・・・・流量制御機構、14
・−・・・・加温機構。 15・・・・・・酸素濃度センサー 16、、、、−0
濃度警報機構。
The figure is an explanatory diagram of the device of the present invention. 1... Liquid nitrogen tank, 2... Liquid nitrogen supply line, 3... Tank top opening, 4...
...Liquid level sensor, 5...Oxygen gas supply line, 6...Low temperature gas injection nozzle, 7...
Ejector 7a... Ejector entrance, 7b.
...Ejector suction port, 8...Introduction line, 9...Heating mechanism, 10...Temperature sensor, 11...Temperature Control mechanism, 12...
...Adjustment mechanism, 13...Flow rate control mechanism, 14
・-・・・Heating mechanism. 15...Oxygen concentration sensor 16,...-0
Concentration alarm mechanism.

Claims (1)

【特許請求の範囲】[Claims] 1 低温ガス噴射ノズルと、エゼクタ−と、このエゼク
タ−の入口に接続した圧力調節機構を有する酸素ガス供
給ラインと、前記エゼクタ−の吸引口に接続したほぼ大
気圧の液体窒素導入ラインと、前記エゼクタ−の出口と
前記ノズル間に介挿した加温機構とを含むことを特徴と
する局部冷却用低温ガス噴射装置。
1 a low temperature gas injection nozzle, an ejector, an oxygen gas supply line with a pressure adjustment mechanism connected to the inlet of the ejector, a liquid nitrogen introduction line at approximately atmospheric pressure connected to the suction port of the ejector, and the A low-temperature gas injection device for local cooling, comprising a heating mechanism interposed between an ejector outlet and the nozzle.
JP9322480A 1980-07-10 1980-07-10 Low-temperature gas injection device for local cooling Expired JPS5843098B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9322480A JPS5843098B2 (en) 1980-07-10 1980-07-10 Low-temperature gas injection device for local cooling

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9322480A JPS5843098B2 (en) 1980-07-10 1980-07-10 Low-temperature gas injection device for local cooling

Publications (2)

Publication Number Publication Date
JPS5720265A JPS5720265A (en) 1982-02-02
JPS5843098B2 true JPS5843098B2 (en) 1983-09-24

Family

ID=14076574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9322480A Expired JPS5843098B2 (en) 1980-07-10 1980-07-10 Low-temperature gas injection device for local cooling

Country Status (1)

Country Link
JP (1) JPS5843098B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189800A (en) * 1984-10-08 1986-05-07 Matsushita Electric Ind Co Ltd Piezoelectric type electroacoustic transducer

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101905830B1 (en) * 2016-11-15 2018-10-08 울산과학기술원 Cryoanesthesia device, method for controlling cryoanesthesia device and temperature controller of coolant in cryoanesthesia device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189800A (en) * 1984-10-08 1986-05-07 Matsushita Electric Ind Co Ltd Piezoelectric type electroacoustic transducer

Also Published As

Publication number Publication date
JPS5720265A (en) 1982-02-02

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