JPS5837954Y2 - Kagaku Kenmasouchi - Google Patents

Kagaku Kenmasouchi

Info

Publication number
JPS5837954Y2
JPS5837954Y2 JP13364674U JP13364674U JPS5837954Y2 JP S5837954 Y2 JPS5837954 Y2 JP S5837954Y2 JP 13364674 U JP13364674 U JP 13364674U JP 13364674 U JP13364674 U JP 13364674U JP S5837954 Y2 JPS5837954 Y2 JP S5837954Y2
Authority
JP
Japan
Prior art keywords
chemical polishing
polishing liquid
liquid
storage tank
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13364674U
Other languages
Japanese (ja)
Other versions
JPS5159421U (en
Inventor
潔 井上
Original Assignee
株式会社井上ジャパックス研究所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社井上ジャパックス研究所 filed Critical 株式会社井上ジャパックス研究所
Priority to JP13364674U priority Critical patent/JPS5837954Y2/en
Publication of JPS5159421U publication Critical patent/JPS5159421U/ja
Application granted granted Critical
Publication of JPS5837954Y2 publication Critical patent/JPS5837954Y2/en
Expired legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Description

【考案の詳細な説明】 本考案は金型その他の被加工物表面の仕上げ加工等に使
用する化学研摩装置に係る。
[Detailed Description of the Invention] The present invention relates to a chemical polishing device used for finishing the surface of molds and other workpieces.

例えば放電加工は今日では広く使用されており特に金型
等の成形加工に有効である。
For example, electrical discharge machining is widely used today and is particularly effective for forming molds and the like.

しかしながら放電加工は加工速度と加工面粗さとが反比
例の関係にあり、特に加工面粗さを数μRmax程度以
下とする数mg/min程度の加工速度しか得られず、
またlμRmax前後の加工面に仕上げたとしても鏡面
を必要とする場合や放電加工の熱変化層を除去する必要
がある場合には手作業を含む種々の研摩方法による仕上
げ後処理加工を何れにしても必要とするから今日では加
工速度がそれ程遅くない例えば15〜30μRmax程
度の加工面粗さに放電加工して後放電加工以外の手段で
の仕上げ加工をすることが通例である。
However, in electrical discharge machining, the machining speed and machined surface roughness are inversely proportional, and in particular, machining speeds of only several mg/min can be obtained to keep the machined surface roughness below several μRmax.
Furthermore, even if the machined surface is finished around lμRmax, if a mirror surface is required or if it is necessary to remove the heat change layer from electrical discharge machining, it is necessary to perform post-finishing processing using various polishing methods, including manual polishing. Therefore, it is customary today to perform electrical discharge machining to obtain a machined surface roughness of, for example, 15 to 30 .mu.Rmax, which is not so slow, and then perform finishing machining by means other than post-discharge machining.

しかして放電加工面には通常の機械的研削手段等では除
去が困難な研削、研摩効率の悪い熱変化層があるだけで
なく、機械的な仕上げ加工の困難な形状のものが少なく
なく、このため従来手作業に多くを頼っていたが、化学
研摩や電解研摩または電解加工等仕上げ加工手段も利用
されるようになってきている。
However, electrical discharge machined surfaces not only have a heat change layer that is difficult to remove with normal mechanical grinding means and have poor polishing efficiency, but also have many shapes that are difficult to mechanically finish. For this reason, much of the work has traditionally been done by hand, but finishing methods such as chemical polishing, electrolytic polishing, and electrolytic machining are now being used.

化学研摩は被加工物の材質に合った液を使用すると数μ
Rmaxまたはそれ以下の滑らかな鏡面が単位面積当す
g /min前後のオーダの速度で行なわれることが知
られている。
Chemical polishing can be done by using a liquid that matches the material of the workpiece.
It is known that smooth mirror surfaces of Rmax or less can be achieved at speeds on the order of around g/min per unit area.

また化学研摩液には寿命があること即ち液中に被加工物
金属の容解量またはその割合が増すと加工速度が低下し
、従って成る割合に達すると液の更新が必要なことも知
られている。
It is also known that chemical polishing fluids have a limited lifespan, that is, as the amount of workpiece metal dissolved in the fluid or its proportion increases, the machining speed decreases, and therefore, the fluid needs to be replaced when this percentage is reached. ing.

またこのことは被加工物に対する化学研摩量の制御また
は調整は化学研摩の時間によって通常行なわれるから新
しい液と既に成る程度加工に使用した液とでは加工時間
の調整を必要とするものの古い液を何時までも使用する
ことは加工能率の点からでも得策でない。
This also means that the amount of chemical polishing applied to the workpiece is normally controlled or adjusted by the chemical polishing time, so while it is necessary to adjust the machining time between a new liquid and a liquid that has already been used for processing, it is necessary to adjust the processing time when using an old liquid. It is not a good idea to use it for any length of time from the viewpoint of processing efficiency.

このため従来は何時間加工をしたとかどれだけの面積の
部分を何時間加工した等の記録をつけておき、使用時間
の合計や使用時間と処理面積の積との合計がある値に達
すると化学研摩液を更新するようにしている。
For this reason, in the past, records were kept of how many hours were processed, how much area was processed, etc., and when the total usage time or the product of the usage time and the processing area reached a certain value, I am trying to update the chemical polishing fluid.

しかして金型としては例えば黄銅金型や特殊の合金材か
ら戊る金型もあるが、その多くは鉄を主成分とする鉄材
である。
Although there are, for example, brass molds and molds made of special alloy materials, most of these molds are made of iron, the main component of which is iron.

尤も本考案は格別鉄材の化学研摩に限定されるものでは
ないが、以下本考案を鉄材の金型研摩の場合について説
明する。
Of course, the present invention is not limited to chemical polishing of iron materials, but the present invention will be described below with respect to mold polishing of iron materials.

例えば化学研摩液として過酸化水素100g、/l、酸
性弗化アンモニウム50g/lを使用し、放電加工によ
り加工面粗さ約15μRmaxに加工された355C鉄
材から成る被加工物として化学研摩による表面仕上加工
を行なった時化学研摩液中のFeの溶解量に対する化学
研摩の加工速度と仕上面粗さの関係は第1図の如くなる
For example, using 100 g/l of hydrogen peroxide and 50 g/l of acidic ammonium fluoride as chemical polishing liquid, the workpiece is made of 355C iron material processed by electric discharge machining to a machined surface roughness of approximately 15 μRmax, and the surface is finished by chemical polishing. The relationship between the amount of Fe dissolved in the chemical polishing solution, the processing speed of chemical polishing, and the finished surface roughness during processing is as shown in FIG.

即ち加工速度は化学研摩液が新しく Feの溶解量が増
すに従って遅くなるが、加工面粗さは液が新しすぎても
逆に古すぎても粗くなり、Feの溶解量が1%前後の時
が最も良い。
In other words, the machining speed slows down as the chemical polishing fluid is new and the amount of dissolved Fe increases, but the roughness of the machined surface becomes rougher when the fluid is too new or too old. Time is the best.

しかして化学研摩は加工速度が早いに越したことはない
が、表面仕上加工を目的とするものであるから加工面粗
さが成る値に達すれば即ちFeの溶解量が成る値に達す
れば、新しい液と交換するとか新しい液を補充してFe
の溶解量の割合を低下させることが目標達成のために必
要となる。
However, chemical polishing is better if the processing speed is faster, but since the purpose is surface finishing, if the processed surface roughness reaches a certain value, that is, if the amount of dissolved Fe reaches a certain value, then Replace with new fluid or refill with new fluid.
In order to achieve this goal, it is necessary to reduce the proportion of dissolved amount of

従って本考案はこのような点を考慮して提案された金型
等の化学研摩に適した装置を提案することにある。
Therefore, the present invention takes these points into consideration and proposes an apparatus suitable for chemical polishing of molds, etc.

図面は本考案を説明するための実施例説明図で1は被加
工物、2は化学研摩液を被加工物1に噴射するノズル、
3はノズルホルダ、4及び5は前記ホルダ3に直角方向
に交叉して係合するホルダ3のX軸及びy軸方向の送り
ネジ、6及び7は送りネジ4及び5によりノズル位置を
制御する倣いシーケンスコントローラ、またはNC制御
等の制御装置、8は化学研摩液の貯槽、9はノズル2へ
化学研摩液を供給するポンプ、10は液の供給管に設け
られた供給液中に於けるFeの溶解量を検出するための
溶解度原子吸光計、電解電位計、ポウラログラフ、また
は透過光検出方式の光度計等から戒る検出装置、11は
検出装置10による検出値または検出値が所定レベル以
上に達したことを表示する表示装置、12は貯槽8中の
化学研摩液を攪拌する攪拌装置、13は新しい化学研摩
液の貯槽、14は供給制御バルブ、15はドレーン制御
バルブである。
The drawing is an explanatory diagram of an embodiment for explaining the present invention, and 1 shows a workpiece, 2 a nozzle for spraying chemical polishing liquid onto the workpiece 1,
3 is a nozzle holder; 4 and 5 are feed screws in the X- and Y-axis directions of the holder 3 that engage with the holder 3 in a perpendicular direction; and 6 and 7 are feed screws 4 and 5 to control the nozzle position. A control device such as a copying sequence controller or NC control, 8 is a storage tank for chemical polishing liquid, 9 is a pump that supplies the chemical polishing liquid to nozzle 2, and 10 is Fe in the supply liquid provided in the liquid supply pipe. A detection device such as a solubility atomic absorption spectrometer, electrolytic electrometer, polarograph, or transmitted light detection type photometer for detecting the dissolved amount of 12 is a stirring device for stirring the chemical polishing liquid in the storage tank 8, 13 is a storage tank for new chemical polishing liquid, 14 is a supply control valve, and 15 is a drain control valve.

即ち前記検出装置10の出力により単に表示するだけで
なく、ポンプ9の停止制御、バルブ14.15の開閉制
御を必要に応じて自動的に行なうものとする。
That is, the output of the detection device 10 is not only used to simply display the information, but also to automatically control the stoppage of the pump 9 and the opening and closing of the valves 14 and 15 as necessary.

貯槽8内の化学研摩液は循環して使用され、検出装置1
0が第1図の例えばFeの溶解量20%に達したのを検
出すると、表示装置11により表示せしめ、かつ好まし
くはポンプ9を自動的に停止せしめる。
The chemical polishing liquid in the storage tank 8 is circulated and used.
When it is detected that 0 has reached 20% of the amount of dissolved Fe in FIG.

次いでドレンバルブ15を開いて一部または全部の液を
排出した後バルブ14を開いて新しい化学研摩液を補充
する。
Next, drain valve 15 is opened to drain some or all of the liquid, and then valve 14 is opened to replenish new chemical polishing liquid.

バルブ15より排出された液は再生処理されるか廃棄の
ための処理をする。
The liquid discharged from the valve 15 is recycled or disposed of.

このようにして被加工物1の仕上研摩を行なうと何個か
の加工を行なううちに検出装置10によってFeの溶解
量が許容限度l・二速したことが検出され、液の交換ま
たは補充が行なわれて加工に使用される化学研摩液は加
工速度及び仕上面粗さが成る所定の範囲内にあるように
保たれることになり化学研摩の時間や加工面積、取代そ
の他の記録を取らなくても良く、加工ミスがなくなり、
化学研摩を効率良く行なうことができる。
When finishing polishing the workpiece 1 in this manner, the detection device 10 detects that the amount of dissolved Fe has exceeded the allowable limit of 1.2 speeds after several pieces have been processed, and it is necessary to replace or replenish the liquid. The chemical polishing liquid used during processing is kept within a predetermined range of processing speed and finished surface roughness, so there is no need to keep records of chemical polishing time, processing area, machining allowance, etc. This eliminates machining errors.
Chemical polishing can be performed efficiently.

なお本考案は鉄材の化学研摩以外の場合にも適用できる
ものであり、またその実施装置としても検出装置は貯槽
中の化学研摩液に対して設ける等各種の変更が可能なも
のである。
The present invention can be applied to cases other than chemical polishing of iron materials, and various modifications can be made to the implementation apparatus, such as installing a detection device for the chemical polishing liquid in a storage tank.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は化学研摩液の加工特性線図、第2図は実施例装
置の概略構成図である。 2はノズル、8は貯槽、9はポンプ、10は検出装置、
11は表示装置。
FIG. 1 is a processing characteristic diagram of a chemical polishing liquid, and FIG. 2 is a schematic configuration diagram of an example apparatus. 2 is a nozzle, 8 is a storage tank, 9 is a pump, 10 is a detection device,
11 is a display device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 化学研摩液の貯槽と、化学研摩液の汲み上げ供給ポンプ
と、被加工物の加工領域に化学研摩液を前記ポンプから
管路を介して供給するノズルと、供給された化学研摩液
を前記貯槽に管路を介して回収する装置を設けた装置に
於て前記化学研摩液の供給管路または貯槽に化学研摩液
中に含まれる被加工物金属の溶解量を検出する装置を設
けるとともに検出値を表示せしめる表示装置を備えせし
めて成る化学研摩装置。
a chemical polishing liquid storage tank; a pump for pumping up and supplying the chemical polishing liquid; a nozzle for supplying the chemical polishing liquid from the pump to the processing area of the workpiece through a pipe line; and a nozzle for supplying the chemical polishing liquid to the storage tank. In an apparatus equipped with a recovery device via a pipe, a device for detecting the dissolved amount of workpiece metal contained in the chemical polishing liquid is provided in the supply pipe or storage tank for the chemical polishing liquid, and the detected value is also detected. A chemical polishing device equipped with a display device for displaying information.
JP13364674U 1974-11-06 1974-11-06 Kagaku Kenmasouchi Expired JPS5837954Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13364674U JPS5837954Y2 (en) 1974-11-06 1974-11-06 Kagaku Kenmasouchi

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13364674U JPS5837954Y2 (en) 1974-11-06 1974-11-06 Kagaku Kenmasouchi

Publications (2)

Publication Number Publication Date
JPS5159421U JPS5159421U (en) 1976-05-11
JPS5837954Y2 true JPS5837954Y2 (en) 1983-08-27

Family

ID=28399057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13364674U Expired JPS5837954Y2 (en) 1974-11-06 1974-11-06 Kagaku Kenmasouchi

Country Status (1)

Country Link
JP (1) JPS5837954Y2 (en)

Also Published As

Publication number Publication date
JPS5159421U (en) 1976-05-11

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