JPS5837657B2 - Broadband electron beam deflection device - Google Patents

Broadband electron beam deflection device

Info

Publication number
JPS5837657B2
JPS5837657B2 JP55107616A JP10761680A JPS5837657B2 JP S5837657 B2 JPS5837657 B2 JP S5837657B2 JP 55107616 A JP55107616 A JP 55107616A JP 10761680 A JP10761680 A JP 10761680A JP S5837657 B2 JPS5837657 B2 JP S5837657B2
Authority
JP
Japan
Prior art keywords
deflection
electron beam
spiral
deflection device
broadband
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55107616A
Other languages
Japanese (ja)
Other versions
JPS56123650A (en
Inventor
ボジダー・ヨンコー
リチヤード・エリオツト・ピアザ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tektronix Inc
Original Assignee
Tektronix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tektronix Inc filed Critical Tektronix Inc
Publication of JPS56123650A publication Critical patent/JPS56123650A/en
Publication of JPS5837657B2 publication Critical patent/JPS5837657B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70Arrangements for deflecting ray or beam
    • H01J29/708Arrangements for deflecting ray or beam in which the transit time of the electrons has to be taken into account
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof

Landscapes

  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Microwave Tubes (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)

Description

【発明の詳細な説明】 本発明は電子ビーム偏向装置、特に螺旋状偏向構体を使
用する広帯域電子ビーム偏向装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam deflection device, and more particularly to a broadband electron beam deflection device using a helical deflection structure.

従来オシロスコープ用陰極線管に使用する遅波構造の広
帯域電子ビーム偏向装置は特公昭44−16697号、
米国特許第3,6 9 4,6 8 9号明細書等に開
示されている。
A broadband electron beam deflection device with a slow wave structure conventionally used in cathode ray tubes for oscilloscopes is disclosed in Japanese Patent Publication No. 16697/1983.
It is disclosed in US Pat. No. 3,694,689 and the like.

これらはいずれも導電性螺旋偏向構体を複数の導電性ピ
ンを用いて電子ビーム偏向面から最も離れた点でガラス
又はセラミック棒に固定するのを普通とする。
All of these typically involve fixing a conductive helical deflection structure to a glass or ceramic rod using a plurality of conductive pins at a point farthest from the electron beam deflection surface.

その為に、安定な動作特性を得るには充分な強度を有す
る材料を用いて極めて高精度に螺旋状偏向構体を加工製
作及び取付けなければならず、また導電性ピンによる偏
向歪が生じるという欠点がある。
Therefore, in order to obtain stable operating characteristics, the spiral deflection structure must be fabricated and installed with extremely high precision using a material with sufficient strength, and the disadvantage is that deflection distortion occurs due to the conductive pins. There is.

本発明は斯る従来技術の欠点を解消する為になされたも
のであって、導電性ピンを使用することなく複数個の誘
電体支持部材を用い、しかも螺旋状偏向構体の偏向部の
裏面を直接支持することにより、寸法精度が高く、且つ
加工性の優れた材料を用いても振動・衝撃等に対して極
めて動作が安定している広帯域電子ビーム偏向装置を提
供することを目的とする。
The present invention has been made in order to eliminate the drawbacks of the prior art, and uses a plurality of dielectric support members without using conductive pins, and moreover, the back surface of the deflection part of the spiral deflection structure is It is an object of the present invention to provide a broadband electron beam deflection device which has high dimensional accuracy and whose operation is extremely stable against vibrations, shocks, etc. even when using materials with excellent workability by directly supporting the device.

本発明による広帯域電子ビーム偏向装置は、電子ビーム
通路に沿って略平行に配設した2個の偏向構体を含む電
子ビーム偏向装置において、偏向構体の少なくとも1個
は導電性板状部材を断面略矩形の螺旋状に巻回して電子
ビーム通路に沿って互いに平行な複数の電子ビーム偏向
部を有し、螺旋状偏向構体の偏向部裏面を電子ビーム通
路に略直角に配設した複数個の誘電体支持部材に直接固
着して螺旋状偏向構体を支持するようにしたものである
A broadband electron beam deflection device according to the present invention includes two deflection structures disposed substantially in parallel along an electron beam path, in which at least one of the deflection structures includes a conductive plate-like member with a cross section of approximately A plurality of dielectrics are wound in a rectangular spiral and have a plurality of electron beam deflection sections parallel to each other along the electron beam path, and the back surface of the deflection section of the spiral deflection structure is arranged approximately at right angles to the electron beam path. The spiral deflection structure is directly fixed to the body support member to support the helical deflection structure.

以下に第1図及び第2図を参照して、本発明の一実施例
を説明しよう。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

第1図は本発明による偏向装置の一実施例の側面図を示
し、第2図は第1図中の破線で囲まれた部分の拡大斜視
図である。
FIG. 1 shows a side view of an embodiment of a deflection device according to the present invention, and FIG. 2 is an enlarged perspective view of the portion surrounded by a broken line in FIG.

22.23は電子ビーム26の通路に沿って互いに略平
行に配された偏向構体で、夫々導電性板状部材を断面略
矩形の螺旋状に巻回して遅延線となし、夫々に電子ビー
ム26の通路に沿って互いに平行で所定間隔を保って対
向する複数の平坦な電子ビーム偏向部22a ,22b
を形成することによって平衡な偏向装置を構成する。
22 and 23 are deflection structures disposed substantially parallel to each other along the path of the electron beam 26, each of which is formed by winding a conductive plate-like member in a spiral shape with a substantially rectangular cross section to form a delay line. A plurality of flat electron beam deflectors 22a and 22b are parallel to each other and face each other at a predetermined interval along the path.
A balanced deflection device is constructed by forming .

これら複数の電子ビーム偏向部22a ,22b間の空
隙に、所望の感度及び走査の偏向電界が形或され、この
電界によってその空隙を走行する電子ビームが偏向され
る。
A deflection electric field with desired sensitivity and scanning is formed in the gap between the plurality of electron beam deflectors 22a and 22b, and the electron beam traveling through the gap is deflected by this electric field.

又、偏向構体22,230インピーダンスは、これを駆
動する偏向増幅器と整合するように設定される。
Also, the impedance of the deflection structures 22, 230 is set to match the deflection amplifier driving them.

19は、電子ビーム26の通路に略垂直に配設した複数
個の柱状の誘電体支持部材で、その各一端が夫々ガラス
ロツド20 ,21に埋込まれると共に、その各他端が
夫々1巻毎の各偏向部22a,22bの電子ビーム26
の通路と反対側の裏面において電子ビームに最も近い点
21で直接固着され(真鍮鑞、エポキシ樹脂等の接着剤
を用いて、あるいは電気鍍金法等により)ることによっ
て、各偏向構体22,23が支持される。
Reference numeral 19 denotes a plurality of columnar dielectric support members disposed approximately perpendicular to the path of the electron beam 26, one end of each of which is embedded in the glass rods 20 and 21, and the other end of each dielectric support member arranged perpendicularly to the path of the electron beam 26. The electron beam 26 of each deflection section 22a, 22b
Each deflection structure 22, 23 is directly fixed (using an adhesive such as brass solder, epoxy resin, or by electroplating) at a point 21 closest to the electron beam on the back surface opposite to the passage. is supported.

そして、各偏向構体22,23は、一対の偏向体端部支
持体24.25間に配設される。
Each deflection structure 22, 23 is arranged between a pair of deflection body end supports 24, 25.

かかる端部支持体24.25は、ガラスロツド20,2
1に既知の方法で接着乃至固着され、又、電子ビームが
通過するに適当な開口を有している。
Such end supports 24,25 are connected to glass rods 20,2.
1 by a known method, and has a suitable opening for the electron beam to pass through.

尚、偏向構体22,23のうちの一方は、他方の螺旋状
偏向構体の偏向部と平行に対向する平坦な導電性接地板
にて構成しても良い。
Incidentally, one of the deflection structures 22 and 23 may be constituted by a flat conductive ground plate facing parallel to the deflection portion of the other spiral deflection structure.

又、ガラスロンド20.21は、偏向構体22,23の
螺旋状のトンネル内に位置するように配しても良いが、
外部に配した方が組立か容易である。
Further, the glass ronds 20, 21 may be arranged so as to be located within the spiral tunnels of the deflection structures 22, 23.
It is easier to assemble if it is placed outside.

更に、誘電体支持部材19は、所定個置きの偏向部22
a ,22bに固着しても良い。
Further, the dielectric support member 19 has deflection portions 22 arranged at predetermined intervals.
It may be fixed to a and 22b.

上述せる本発明によれば、次のような利点がある。According to the present invention described above, there are the following advantages.

一対の偏向構体のうちの少なくとも一方の螺旋状偏向構
体の電子ビーム偏向部の電子ビームの通路の反対側の裏
面を、誘電体支持部材に直接固着して支持するので、不
要の信号輻射が無く、偏向電界を乱すことなくして、螺
旋状偏向構体の機械的に強固な支持が可能となる。
Since the back surface of the electron beam deflection section of at least one of the pair of deflection structures, on the opposite side of the electron beam path, is directly fixed to and supported by the dielectric support member, unnecessary signal radiation is eliminated. , it is possible to mechanically firmly support the helical deflection structure without disturbing the deflection electric field.

従って、寸法精度が高く、且つ加工性の優れた材料を用
いても振動・衝撃等に対して極めて動作が安定し、超高
周波信号まで歪なく確実に偏向することのできる広帯域
電子ビーム偏向装置を得ることができる。
Therefore, we have created a broadband electron beam deflection device that has high dimensional accuracy and is extremely stable in operation against vibrations and shocks even when using materials with excellent workability, and is capable of reliably deflecting even ultra-high frequency signals without distortion. Obtainable.

又、誘電体支持部材の誘電率は低いので、偏向構体0イ
ンピーダンスの著しい局部的な変化、偏向構体に沿う前
方への結合の増加及び多くの輻射を生じる虞は殆んどな
い。
Also, because the dielectric support member has a low dielectric constant, there is little risk of significant local changes in the deflection structure zero impedance, increased forward coupling along the deflection structure, and significant radiation.

かくして、本発明による偏向装置を高性能のCRTに適
用して頗る好適である。
Thus, the deflection device according to the present invention is particularly suitable for application to high performance CRTs.

以上、本発明の好適な実施例を述べたにすぎず、本発明
の要旨を逸脱することなく、変形,変更をなし得ること
は、当業者には明らかであろう。
The preferred embodiments of the present invention have been described above, and it will be obvious to those skilled in the art that modifications and changes can be made without departing from the gist of the present invention.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による広帯域電子ビーム偏向装置の一実
施例の側面図、第2図は第1図の破線で囲んだ部分の拡
大斜視図である。 19は誘電体支持部材、20.21はガラスロンド、2
2 .23は偏向構体、22a ,23aは電子ビーム
偏向部、26は電子ビームである。
FIG. 1 is a side view of an embodiment of a broadband electron beam deflection device according to the present invention, and FIG. 2 is an enlarged perspective view of a portion surrounded by a broken line in FIG. 19 is a dielectric support member, 20.21 is a glass rond, 2
2. 23 is a deflection structure, 22a and 23a are electron beam deflection sections, and 26 is an electron beam.

Claims (1)

【特許請求の範囲】[Claims] 1 電子ビーム通路に沿って略平行に配設した2個の偏
向構体を含む電子ビーム偏向装置において、上記偏向構
体の少なくとも1個は導電性板状部材を断面略矩形の螺
旋状に巻回して上記電子ビーム通路に沿って互いに平行
な複数の電子ビーム偏向部を有し、上記螺旋状偏向構体
の上記偏向部裏面を上記電子ビーム通路に略直角に配設
した複数個の誘電体支持部材に直接固着して上記螺旋状
偏向構体を支持することを特徴とする広帯域電子ビーム
偏向装置。
1. In an electron beam deflection device including two deflection structures disposed substantially parallel to each other along an electron beam path, at least one of the deflection structures includes a conductive plate member wound spirally with a substantially rectangular cross section. The spiral deflection structure has a plurality of electron beam deflection sections parallel to each other along the electron beam path, and the back surface of the deflection section of the spiral deflection structure is connected to a plurality of dielectric support members disposed substantially perpendicular to the electron beam path. A broadband electron beam deflection device, characterized in that the spiral deflection structure is directly fixed to support the above-mentioned spiral deflection structure.
JP55107616A 1973-07-19 1980-08-05 Broadband electron beam deflection device Expired JPS5837657B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00380627A US3849695A (en) 1973-07-19 1973-07-19 Distributed deflection structure employing dielectric support

Publications (2)

Publication Number Publication Date
JPS56123650A JPS56123650A (en) 1981-09-28
JPS5837657B2 true JPS5837657B2 (en) 1983-08-17

Family

ID=23501896

Family Applications (2)

Application Number Title Priority Date Filing Date
JP7971574A Expired JPS5627984B2 (en) 1973-07-19 1974-07-11
JP55107616A Expired JPS5837657B2 (en) 1973-07-19 1980-08-05 Broadband electron beam deflection device

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP7971574A Expired JPS5627984B2 (en) 1973-07-19 1974-07-11

Country Status (7)

Country Link
US (1) US3849695A (en)
JP (2) JPS5627984B2 (en)
CA (1) CA998729A (en)
DE (1) DE2432592C2 (en)
FR (1) FR2238243B1 (en)
GB (1) GB1466985A (en)
NL (1) NL168650C (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4005408A (en) * 1975-10-08 1977-01-25 The United States Of America As Represented By The Secretary Of The Army Multiple electron beam analog to digital converter
US4076994A (en) * 1976-04-09 1978-02-28 Rca Corporation Flat display device with beam guide
US4093891A (en) * 1976-12-10 1978-06-06 Tektronix, Inc. Traveling wave deflector for electron beams
US4207492A (en) * 1977-05-31 1980-06-10 Tektronix, Inc. Slow-wave high frequency deflection structure
US4507586A (en) * 1982-10-27 1985-03-26 Tektronix, Inc. Traveling wave push-pull electron beam deflector with pitch compensation
KR890005026B1 (en) * 1987-04-13 1989-12-06 석윤기 Manufacturing method of the gas-flow valve nozzle of a lighter
US5172029A (en) * 1991-01-22 1992-12-15 The United States Of America As Represented By The United States Department Of Energy Shielded helix traveling wave cathode ray tube deflection structure
US5376864A (en) * 1992-10-29 1994-12-27 The United States Of America As Represented By The Department Of Energy Shielded serpentine traveling wave tube deflection structure

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE845220C (en) * 1951-02-09 1952-07-31 Hellmuth Mohr Helical waveguide held in points
FR1465559A (en) * 1965-11-30 1967-01-13 Electronique & Physique Improvements to delay lines
US3504222A (en) * 1966-10-07 1970-03-31 Hitachi Ltd Slow-wave circuit including meander line and shielding therefor
US3610999A (en) * 1970-02-05 1971-10-05 Varian Associates Slow wave circuit and method of fabricating same
FR2079815A5 (en) * 1970-02-13 1971-11-12 Thomson Csf
US3654509A (en) * 1970-12-14 1972-04-04 Varian Associates Dielectrically supported helix derived slow wave circuit
US3694689A (en) * 1971-02-24 1972-09-26 Tektronix Inc Electron beam deflection apparatus
US3670196A (en) * 1971-02-24 1972-06-13 Raytheon Co Helix delay line for traveling wave devices
US3705327A (en) * 1971-06-02 1972-12-05 Allan W Scott Microwave generator with interleaved focusing and interaction structures
US3736534A (en) * 1971-10-13 1973-05-29 Litton Systems Inc Planar-shielded meander slow-wave structure

Also Published As

Publication number Publication date
JPS56123650A (en) 1981-09-28
CA998729A (en) 1976-10-19
JPS5040067A (en) 1975-04-12
DE2432592A1 (en) 1975-02-06
NL7408669A (en) 1975-01-21
FR2238243B1 (en) 1979-02-09
NL168650B (en) 1981-11-16
US3849695A (en) 1974-11-19
GB1466985A (en) 1977-03-16
NL168650C (en) 1982-04-16
DE2432592C2 (en) 1982-04-08
JPS5627984B2 (en) 1981-06-29
FR2238243A1 (en) 1975-02-14

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