JPS5837620A - Production of substrate for liquid crystal cell - Google Patents

Production of substrate for liquid crystal cell

Info

Publication number
JPS5837620A
JPS5837620A JP56135096A JP13509681A JPS5837620A JP S5837620 A JPS5837620 A JP S5837620A JP 56135096 A JP56135096 A JP 56135096A JP 13509681 A JP13509681 A JP 13509681A JP S5837620 A JPS5837620 A JP S5837620A
Authority
JP
Japan
Prior art keywords
films
substrate
liquid crystal
polyamic acid
insulating substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56135096A
Other languages
Japanese (ja)
Inventor
Jun Nakanowatari
旬 中野渡
Yoshimi Kamijo
芳省 上條
Yoshizo Tashiro
田代 美三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP56135096A priority Critical patent/JPS5837620A/en
Publication of JPS5837620A publication Critical patent/JPS5837620A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Abstract

PURPOSE:To obtain oriented films having high adhesive strength to substrates by immersing insulation substrates into a soln. of polyamic acid, heating the same while taking up to form the films of the polyamic acid and heat treating the films to form polyamide films after removing the unnecessary parts of the films. CONSTITUTION:An insulation substrates 1 is immersed in mixed solns. of polyamic acid and N-methylpyrrolidone and while the substrate is taken up gradually, the substrate is dried by IF heating 6 or the like, whereby films 7 of polyamic acid are formed on the substrate 1. The substrate 1 is beforehand formed with insulation films 13 of Al2O3 by forming transparent electrodes on a substrate 12 then coating an org. aluminum compd. on the electrodes 12 and heat treating the same. Said substrate formed with the films of the polyamic acid is removed of connecting terminal parts and sealing parts by using etching resist and is then heated to form polyimide films 13. The surfaces of the films 13 are oriented to form oriented films 14, then a pair of the substrates are sealed 3L to complete a liquid crystal cell. Thus the liquid crystal display element which is free from stripping or the like of the oriented films and has excellent heat resistance, etc. is obtained.

Description

【発明の詳細な説明】 本発明は、液晶セル基板庖にポリイミド被膜を配向処理
膜として表面に有する液晶セル基板の製造方法に関する
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a liquid crystal cell substrate having a polyimide coating on the surface thereof as an alignment treatment film.

液晶表示装置の耐熱特性改善のため、液晶の配向処理膜
としてポリイミド被膜を用いる場合がある。ポリイミド
被膜の絶縁基板上への形成は、スピンナーによる塗布方
法が一般的であったが、基板の大きさに制限があり、又
ポリイミド被膜の膜厚が不均一になる欠点があった。さ
らにポリイミド被111Aとシール材との接着力が極め
て低く、得られる液晶表示装置の耐熱特性も低下してし
まう欠点があった。
In order to improve the heat resistance characteristics of a liquid crystal display device, a polyimide film is sometimes used as an alignment treatment film for liquid crystals. A coating method using a spinner has generally been used to form a polyimide film on an insulating substrate, but this method has the disadvantage that the size of the substrate is limited and the thickness of the polyimide film becomes non-uniform. Furthermore, the adhesive force between the polyimide covering 111A and the sealing material is extremely low, and the resulting liquid crystal display device has a disadvantage in that its heat resistance properties are also deteriorated.

本発明の目的は、叙上の従来の欠点を解消し、均一な膜
厚のポリイミド被膜を安易に形成でき、耐熱特性、機械
的強度の優れた液晶表示装置を提供することである。以
下図面をもとに、本発明を説明する。
An object of the present invention is to eliminate the above-mentioned conventional drawbacks, to provide a liquid crystal display device that can easily form a polyimide film with a uniform thickness, and has excellent heat resistance and mechanical strength. The present invention will be explained below based on the drawings.

1゛−−3−−− 第1図は、一般的な液晶表示装置の断側面図であり、(
1)は、液晶セル基板で、表面にInO,等の透明電極
等を有するガラスノ1に板等の絶縁基板からなっている
。液晶表示装置に、少なくとも一方が透明な互に対向し
た2枚の液晶セル基板(1)、(1)の間隙に、ネマチ
ック液晶等の液晶物質(2)を、エポキシ樹脂等のシー
ル材(3)で封入した構造になっている。第2図G)、
(ロ)は、それぞれ従来の液晶セル基板及び液晶表示装
置の構造を示す図である。第2図(イ)、(ロ)をもと
に、従来の液晶表示装置の製造方法を説明する。
1゛---3--- Figure 1 is a cross-sectional side view of a general liquid crystal display device.
1) is a liquid crystal cell substrate, which is made of an insulating substrate such as a glass plate having transparent electrodes such as InO on its surface. In a liquid crystal display device, a liquid crystal material (2) such as nematic liquid crystal is applied to a gap between two mutually facing liquid crystal cell substrates (1), at least one of which is transparent, and a sealing material (3) such as an epoxy resin. ) is enclosed in a structure. Figure 2G),
(B) is a diagram showing the structures of a conventional liquid crystal cell substrate and a conventional liquid crystal display device, respectively. A conventional method for manufacturing a liquid crystal display device will be explained based on FIGS. 2(a) and 2(b).

従来の液晶表示装置の製造にあたっては、まず、第2図
(イ)に示すように、ガラス基板などの絶縁基板1.i
η上に、印刷法、蒸着法などによりIn(J、等の金属
酸化物からなる透明電極(1つを所定形状に形成する。
In manufacturing a conventional liquid crystal display device, first, as shown in FIG. 2(a), an insulating substrate 1. i
A transparent electrode (one transparent electrode made of a metal oxide such as In(J) is formed in a predetermined shape on η by a printing method, a vapor deposition method, etc.

該透明電極(13を被って、浸漬法、蒸オーr法、印刷
法などによりアルミニウムアセチルアセトナート等の有
機アルミニウム化合物を塗布し、350℃で30分間熱
処理し、ポリイミド被膜とガラス基板との密着度を上げ
るためAl t Osの4ft縁被膜時特開昭58− 
37620(2ノ を形成する。さらに、該絶縁被膜θ→上に、スピンナー
によりポリアミック酸被膜を塗布し、350℃、30分
熱処理を行いポリイミド被膜の配向処理膜(141を形
成する。該配向処理膜Q41を一定方向にラビングして
、液晶セル基板(1)を作製する。このようにして作製
した2枚の液晶セル基板上の周辺に、11に品注入]]
を除き、所定形状に、エポキシ樹脂などのシール旧を塗
布乾燥した後、2枚の液晶セル基板を密灰配置し、加圧
加熱し、シール材を硬化させてf(k晶セルを作製する
。次に、液晶物質を液晶注入[1より注入封止して、第
2図(ロ)に示すような液晶表示装置を完成する。斜上
のような液晶表示装置1″?の製イ1f方法では、配向
処理膜0ゆが、シール材(3)と絶縁被膜03との間に
介在しており、ポリイミドからなる配向処r411膜u
111が、エポキシ樹脂等から々るシール材(3)と絶
縁被膜0→との密着性を悪くしていた。このだめ、液晶
表示装置は、強度的に弱く、少しの応力、iji+撃力
が働いた場合、2枚の絶縁基板がはがれ、機械強度的に
弱く、耐湿性、耐熱性の悪いものとなっていた。又、ス
ピンナー一−5−− により塗布したポリアミック酸被膜は、乾燥しす111
く、熱処理工程までの絶縁基板の取り扱い方や、熱処理
条件によっては、均一な膜厚のポリイミド被膜が得られ
ない欠点があった。
An organic aluminum compound such as aluminum acetylacetonate is applied over the transparent electrode (13) by a dipping method, an evaporation method, a printing method, etc., and heat treatment is performed at 350° C. for 30 minutes to ensure close contact between the polyimide film and the glass substrate. In order to increase the degree of
37620 (2 No. is formed.Furthermore, a polyamic acid film is applied on the insulating film θ→ by a spinner, and heat treatment is performed at 350° C. for 30 minutes to form an orientation treatment film (141) of the polyimide film.The orientation treatment The film Q41 is rubbed in a certain direction to produce a liquid crystal cell substrate (1).A product is injected into the periphery of the two liquid crystal cell substrates produced in this way.
After applying and drying a sealant such as epoxy resin to a predetermined shape, two liquid crystal cell substrates are placed in dense ash, heated under pressure, and the sealant is cured to create a f(k crystal cell). Next, the liquid crystal material is injected and sealed from liquid crystal injection [1] to complete the liquid crystal display device as shown in FIG. 2 (b). In this method, an oriented film 0 layer is interposed between the sealing material (3) and the insulating film 03, and an oriented film U made of polyimide is formed.
111 deteriorated the adhesion between the sealing material (3) made of epoxy resin or the like and the insulation coating 0→. Unfortunately, liquid crystal display devices are weak in strength, and if a small amount of stress or impact is applied, the two insulating substrates will peel off, resulting in weak mechanical strength and poor moisture resistance and heat resistance. Ta. Moreover, the polyamic acid coating coated with spinner 1-5-- was dried with 111
Moreover, depending on how the insulating substrate is handled up to the heat treatment step and the heat treatment conditions, a polyimide film with a uniform thickness cannot be obtained.

従来の欠点を解消した本発明の特徴は、絶縁基板をポリ
アミック酸溶液中に浸漬しfCf&絶縁基板を加熱しな
がら引き上げることにより均一な;膜厚のポリアミック
酸被膜を絶縁基板上に形成したことであり、又不必要な
ポリアミック酸被膜を除去し、シール材と絶縁基板との
密着性を良くシ、機械的強度のある液晶表示装置を扉供
したことである。
The feature of the present invention that overcomes the conventional drawbacks is that a polyamic acid coating with a uniform thickness is formed on the insulating substrate by immersing the insulating substrate in a polyamic acid solution and pulling it up while heating the fCf & insulating substrate. Moreover, an unnecessary polyamic acid film is removed, the adhesiveness between the sealing material and the insulating substrate is improved, and a liquid crystal display device with mechanical strength is provided.

次に、本発明液晶セル基板の製造方法を説明する。絶縁
基板上にA720.の絶縁被膜を形成させる昔では、従
来と同様である。次に、捷ずポリアミック酸溶液を作製
する。即ち、ポリアミック酸例えば、日立化成社製PI
Q100Fに、N−メチルピロリドン1005’を加え
よく混合する。次にアセトン7002とN−メチルピロ
リドン1001との混合溶液を、攪拌しながら少祉づつ
加え混合し、前艷□更− 記P I Qを10倍に11i′8釈した溶液を作り、
2〜3目放lid後1吏用する。作製したポリアミック
酸と、アセトンど、IN−メチルピロリドンとの混合浴
液に、ガラスなどの絶縁基板を浸漬し、ゆっくりと引き
上げながら、絶縁基板の両側面より赤外線ヒーター等に
」:す、絶縁水板表面温度が120℃〜150℃になる
ように加熱する。第3図は、この様子を示しだもので、
容器(4)に満たした前記混合溶7+M(5)中に、絶
縁基板(1)を浸漬し、赤外線ヒーター(6)中を通過
させながら、ゆっくりと矢印方向に引き上げ、絶縁基板
(])上にポリアミック11pの破膜(7)を形成する
。なお、(8)は、絶縁基板ホルダーで、該ホルダーは
、赤外線ヒーター(6)の熱により絶縁基板(1)に与
えられた応力が緩和されるようスポンジ寺の弾性材(9
)を絶縁基板(1)との間に設ける必要がある。斜上の
ようにして作製したポリアミック酸の被膜(7)は、か
なり固く膜厚の均一な被膜となり、後工程の熱処理によ
り得られるポリイミドの被j漢も均一なものとなる。
Next, a method for manufacturing the liquid crystal cell substrate of the present invention will be explained. A720. on an insulating substrate. In the past, the process of forming an insulating film was the same as in the past. Next, a polyamic acid solution is prepared without stirring. That is, polyamic acid, for example, PI manufactured by Hitachi Chemical Co., Ltd.
Add N-methylpyrrolidone 1005' to Q100F and mix well. Next, a mixed solution of acetone 7002 and N-methylpyrrolidone 1001 was added and mixed little by little while stirring to make a solution in which PIQ was diluted 10 times with 11i'8.
After 2-3 lids, use 1 tbsp. An insulating substrate such as glass is immersed in a mixed bath solution of the prepared polyamic acid, acetone, etc., and IN-methylpyrrolidone, and while being slowly pulled up, an infrared heater, etc. is applied from both sides of the insulating substrate. The plate is heated to a surface temperature of 120°C to 150°C. Figure 3 shows this situation.
The insulating substrate (1) is immersed in the mixed solution 7+M (5) filled in the container (4), and slowly pulled up in the direction of the arrow while passing through the infrared heater (6), and placed on the insulating substrate (]). A ruptured membrane (7) of polyamic 11p is formed. In addition, (8) is an insulating substrate holder, and this holder is made of a sponge-like elastic material (9) to relieve stress applied to the insulating substrate (1) by the heat of the infrared heater (6).
) must be provided between the insulating substrate (1) and the insulating substrate (1). The polyamic acid coating (7) produced in the diagonal manner becomes a fairly hard coating with a uniform thickness, and the polyimide coating obtained by heat treatment in the post-process also becomes uniform.

次に、エツチングレジスト例えば、プロトコー■+−−
−7− ト社534o−cをスクリーン印刷法により、外部との
接続端子部とシール部とを除いた絶縁ノ、(仮」二の前
記ポリアミック酸の被膜上に塗布した陵、乾燥する。
Next, etching resist, for example, protocol
-7- Co., Ltd. 534O-C was coated on the polyamic acid coating (temporary) 2 by a screen printing method, excluding the external connection terminal portion and the seal portion, and then dried.

次に、3俤水酸化ナトリウム溶液にて、外部との接続端
子部とシール部とのポリアミック酸液ハαをエツチング
除去した後、絶縁基板を水洗後トリクロルエタン中にて
超音波洗浄を行って、エツチングレジストを除去する。
Next, after removing the polyamic acid solution from the external connection terminals and the sealing area by etching with a 3-ton sodium hydroxide solution, the insulating substrate was washed with water and then ultrasonically cleaned in trichloroethane. , remove the etching resist.

エツチングレジストを除去した絶縁基板を、350℃に
−C30分間熱処3]11して、ポリアミック酸に架橋
反応を起こさせポリイミド被膜を形成する。該ポリイミ
ド被膜上を、脱脂綿にて一定方向に摩擦して配向処理を
行い、配向処理膜となし、液晶セル基板を完成する。
The insulating substrate from which the etching resist has been removed is heat-treated at 350 DEG C. for 30 minutes (3)11 to cause a crosslinking reaction in the polyamic acid to form a polyimide film. The polyimide coating is rubbed in a certain direction with absorbent cotton to perform an alignment treatment, thereby forming an alignment treatment film and completing a liquid crystal cell substrate.

完成した1枚の液晶セル基板」−のポリイミド被膜が形
成されていないシール部上に、エボキ7傾1脂等のシー
ル材を、スクリーン印刷法により塗布し、もう一枚の液
晶セル基板を一定間隔を1lAjって対向させ、加圧加
熱してシール材を硬化さぜ、液晶セルを作製する。液晶
セル内に、液晶物l!i (例特開昭53− 3762
0(8) えば、P型ネマチック液晶チッソ社製3046)を封入
して液晶表示装置を作製した。
A sealing material such as EBOKI 7-Tan-1 resin is applied by screen printing onto the sealed portion of the completed liquid crystal cell substrate on which the polyimide film is not formed, and the other liquid crystal cell substrate is fixed to the surface. They are placed facing each other with an interval of 1 lAj and heated under pressure to harden the sealing material to produce a liquid crystal cell. There is a liquid crystal substance inside the liquid crystal cell! i (Example: Japanese Patent Publication No. 53-3762
For example, a P-type nematic liquid crystal (3046 manufactured by Chisso Corporation) was sealed to produce a liquid crystal display device.

第4図は、qrtられた液晶表示装置の断側面図で、シ
ール材(3)とA、720.からなる絶縁被膜(1:3
とは、直[と嬢オ′「シており、従って、絶縁基板aの
とシール材(3)との接着強IWも良好で、2枚の絶縁
基板がはがれることもなく、本発明液晶表示装置は、耐
湿性、l1111熱性に1・Vれたものであった。なお
、(2)は、液晶物′1ノ↓、(1磨」、透明電極、(
[Φは、ポリイミド被膜からなる配向処理膜である。
FIG. 4 is a cross-sectional side view of the liquid crystal display device that has been qrted, showing sealing material (3), A, 720. An insulating film consisting of (1:3
Therefore, the adhesive strength IW between the insulating substrate a and the sealing material (3) is good, and the two insulating substrates do not peel off. The device was moisture resistant and heat resistant by 1 V. Note that (2) is a liquid crystal material '1 no ↓, (1 polish), a transparent electrode, (
[Φ is an alignment film made of a polyimide film.

作製した本発明i1M品表示装置nに対して、100℃
、700 時間の耐熱放置試験及び120℃、 2at
mのプレッシャークツカー試験を施こしだが、液晶の配
向・1/1は、作製初)IJIと変らず良好で、配向乱
れや、ディスクリイ・−ジョンは発生しなかった。
100°C for the i1M product display device n of the present invention manufactured.
, 700 hours heat resistance test and 120℃, 2at
The liquid crystal orientation (1/1) was as good as IJI (the first time it was produced), and no alignment disorder or discrimination occurred.

斜上の説明のとうり、本発明は、機械的強度があり、耐
?!+ii 4’l二、耐熱性に優れた液晶表示装置を
提供できる大きな利点がある。
As explained above, the present invention has mechanical strength and durability. ! +ii 4'l 2. There is a great advantage that a liquid crystal display device with excellent heat resistance can be provided.

4、 図面o簡単’f、 1j8A ’J]第1図は、
一般的な液晶表示装置の要部断側面j’−−−9、−− 図、11等2図(イ)、(ロ)は従来例で、(イ)に1
〆(1品セル基板の断側面図、(ロ)rよ、液晶表示装
置の断側面図である。そして、第3図、第4図1、本発
明実1t(lJ例で、第3図は、液晶セル基板の製造法
を11iU明するための図で、第4図は、液晶表示装置
の断側面図である。
4. Drawing o simple 'f, 1j8A 'J] Figure 1 is
Figures 2 (a) and 2 (b), such as Figure 11, are conventional examples, and (a) shows 1.
(B) R is a cross-sectional side view of a liquid crystal display device. FIG. 4 is a diagram for explaining the manufacturing method of the liquid crystal cell substrate, and FIG. 4 is a cross-sectional side view of the liquid crystal display device.

(1)  液晶セル基板 (2)液晶物質 (3)  シール材 01)絶縁基板 0シ 透明′電極 q3  絶縁被膜 (141配向処理膜 第1図     2 第2図 (イ) (口つ +1 12  13  14 (/// It   13   IA   12    2第3図 第4図(1) Liquid crystal cell board (2) Liquid crystal material (3) Seal material 01) Insulating substrate 0shi Transparent electrode q3 Insulating coating (141 alignment treatment film Figure 1     2 Figure 2 (stomach) (mouth +1 12 13 14 (/// It 13 IA 12 2 Figure 3 Figure 4

Claims (2)

【特許請求の範囲】[Claims] (1)  ポリアミック酸と、アセトンと、N−メチル
ピロリドンとの混合溶液に、絶縁基板を浸漬する工程と
、絶縁基板を加熱しながら前記混合溶液中より引き上げ
、絶縁基板上にポリアミック酸の被膜を形成する工程と
、絶縁基板に熱処理を施こして絶縁基板上にポリイミド
の被膜を形成する工程とからなることを特徴とする液晶
セル基板の製造方法。
(1) A step of immersing an insulating substrate in a mixed solution of polyamic acid, acetone, and N-methylpyrrolidone, and lifting the insulating substrate from the mixed solution while heating it to form a polyamic acid coating on the insulating substrate. 1. A method for manufacturing a liquid crystal cell substrate, comprising the steps of forming a polyimide film on the insulating substrate by heat-treating the insulating substrate.
(2)  ポリアミック酸と、アセトンと、N−メチル
ピロリドンとの混合溶液に、絶縁基板を浸漬する工程と
、絶縁基板を加熱しながら前記混合溶液中より引き上げ
、絶縁基板上全面にポリアミック酸の被膜を形成する工
程と、絶縁基板上に形成されたポリアミック酸の被膜の
不要部を除去する工程と、さらに絶縁基板に熱処理を施
こして絶縁基板上に所定形状のポリイミドの被膜p、 
 2 を形成する工程とからなることを特徴とする液晶セル基
板の製造方法。
(2) A step of immersing the insulating substrate in a mixed solution of polyamic acid, acetone, and N-methylpyrrolidone, and lifting the insulating substrate from the mixed solution while heating it to coat the entire surface of the insulating substrate with polyamic acid. a step of removing unnecessary portions of the polyamic acid coating formed on the insulating substrate, and further heat-treating the insulating substrate to form a polyimide coating p in a predetermined shape on the insulating substrate.
2. A method for manufacturing a liquid crystal cell substrate, comprising the steps of: 2.
JP56135096A 1981-08-28 1981-08-28 Production of substrate for liquid crystal cell Pending JPS5837620A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56135096A JPS5837620A (en) 1981-08-28 1981-08-28 Production of substrate for liquid crystal cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56135096A JPS5837620A (en) 1981-08-28 1981-08-28 Production of substrate for liquid crystal cell

Publications (1)

Publication Number Publication Date
JPS5837620A true JPS5837620A (en) 1983-03-04

Family

ID=15143734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56135096A Pending JPS5837620A (en) 1981-08-28 1981-08-28 Production of substrate for liquid crystal cell

Country Status (1)

Country Link
JP (1) JPS5837620A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301575A (en) * 2005-04-20 2006-11-02 Lg Philips Lcd Co Ltd Liquid crystal display device and method for fabricating same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006301575A (en) * 2005-04-20 2006-11-02 Lg Philips Lcd Co Ltd Liquid crystal display device and method for fabricating same
JP4496159B2 (en) * 2005-04-20 2010-07-07 エルジー ディスプレイ カンパニー リミテッド Liquid crystal display device and manufacturing method thereof
US7880855B2 (en) 2005-04-20 2011-02-01 Lg Display Co., Ltd. LCD device and method having a ball spacer in an alignment film groove having a groove width greater than the spacer diameter and curing a seal pattern and the spacer at the same time after bonding the substrates
US7907242B2 (en) 2005-04-20 2011-03-15 Lg. Display Co., Ltd. Liquid crystal display device and method for fabricating same having spacer in alignment groove in which the groove width is greater than the spacer diameter

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