JPS5837062A - Heat-resistant powder composition - Google Patents

Heat-resistant powder composition

Info

Publication number
JPS5837062A
JPS5837062A JP56134555A JP13455581A JPS5837062A JP S5837062 A JPS5837062 A JP S5837062A JP 56134555 A JP56134555 A JP 56134555A JP 13455581 A JP13455581 A JP 13455581A JP S5837062 A JPS5837062 A JP S5837062A
Authority
JP
Japan
Prior art keywords
powder
resin
weight
melting point
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56134555A
Other languages
Japanese (ja)
Inventor
Takeshi Yokota
健 横田
Ryukichi Usuki
臼杵 隆吉
Yukio Endo
幸雄 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP56134555A priority Critical patent/JPS5837062A/en
Publication of JPS5837062A publication Critical patent/JPS5837062A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

PURPOSE:To provide a heat-resistant powder compsn. which forms a coating film with an excellent surface smoothness and is suitable for powder coating of the surface of metal substrates, prepared by dispersing and blending a silicone resin, a polyester resin, a low-melting glass and a high-melting inorganic substance homogeneously. CONSTITUTION:The compsn. is prepared by dispersing and blending homogeneously 5-50wt% silicone resin, 5-50wt% polyester resin, 20-80wt% low-melting glass (e.g., borosilicate glass or lead glass) and 0.2-15wt% high-melting inorganic substance (e.g., alumina or titanium dioxide) by powder blend process, kneading-crushing method, etc. The silicone and polyester resins serve as binders and fluidizing agents which flow within a baking temperature range of the powder coating and form a smooth coated surface, while the low-melting glass and high-melting inorganic substance form strong ceramic film.

Description

【発明の詳細な説明】 この発明は金属基材表面に粉体塗装し、各種電気桟器等
の保りIm装或は絶縁塗装として有用な粉体組成物特に
耐熱性に優れ九粉体組成物に関するものである1通常の
塗装用粉体は合成樹脂の単一もしくは複合粉体であるた
めにそ0*WIO分解温度以下で使用する機器にしか使
用できず、電気機器等例えば通常の使用温度では樹脂が
分解することなく優れた塗膜を維持するとともに、過負
荷電流−による異常な温度上昇をした場合に、樹脂が分
解してもなお絶縁等保si!!A膜を残存する塗料とし
て樹脂粉末に無機物粉末を配合したものが考えられ、代
weなもOとしてはエポキシ樹脂粉末に無機物な末を配
合した複合粉体が知られてiる。
DETAILED DESCRIPTION OF THE INVENTION This invention provides a powder composition useful as a maintenance coating or insulation coating for various electric crosspieces, etc. by powder coating the surface of a metal base material, and a powder composition particularly excellent in heat resistance. 1. Ordinary coating powders are single or composite powders of synthetic resins, so they can only be used in equipment that is used at temperatures below the decomposition temperature of At high temperatures, the resin maintains an excellent coating without decomposing, and even when the temperature rises abnormally due to overload current, even if the resin decomposes, the insulation remains intact! ! A paint that retains the A film may be a mixture of resin powder and an inorganic powder, and a known alternative is a composite powder that is a mixture of an epoxy resin powder and an inorganic powder.

この複合な体はエポキシ*mが分解すれば無機物粉車受
で皮膜構成tすることが出来ず、単なるエポキシ樹脂の
4体塗膜の性状を若干改善したに留まるものであった。
If the epoxy*m decomposes, this composite body cannot form a film with an inorganic powder wheel, and the properties of the epoxy resin four-body coating film were only slightly improved.

又、エポキシ樹脂粉末に代えてシリコ/樹脂粉末を用−
これ・と無機物粉末を夜番させ九複合粉体もあるが、こ
れとてシリコンIIMがエポキシ樹脂よりも高温に耐え
ると云う丈O%Oで反面、機械的強度や基材に対する密
着性は寧ろエポキシ樹脂よ)劣る外、シリコ/樹脂が分
解温度以上でFi塗膜が崩壊することはエポキシ樹脂と
本質的な相違は見出らな−。
Also, silicon/resin powder can be used instead of epoxy resin powder.
There is also a composite powder made by combining this and other inorganic powders, but while silicone IIM is said to withstand higher temperatures than epoxy resin, its mechanical strength and adhesion to the substrate are poor. Besides being inferior to epoxy resins, there is no essential difference between silico/resin and epoxy resins in that the Fi coating collapses above the decomposition temperature.

本発明者等はこの点を追求した結果シリコン樹脂、エポ
キシ樹脂、低融点ガラス粉末及び高融点無機物微粉末か
らなる複合粉体を開発し、この複合粉体による塗膜は樹
脂の分解俵もセラミック皮膜が構成され、依然として保
護用もしくは絶縁用皮膜の機能を果すことを見出した。
As a result of pursuing this point, the present inventors developed a composite powder consisting of silicone resin, epoxy resin, low-melting point glass powder, and high-melting point inorganic fine powder. It has been found that the coating can be constructed and still perform the function of a protective or insulating coating.

上記の四つの組成からなる複合粉体はそれ自体優れた性
能の皮at得る仁とは前述の通)であるが塗膜に平滑性
が乏しい難点があった。
Although the composite powder consisting of the above four compositions has excellent performance in itself (as described above), it has the disadvantage that the coating film is poor in smoothness.

本発明はこの点を検討の結果、シリコン樹脂、ポリエス
テル樹脂、低融点ガラス粉末及び高融点無機物微粉末の
四つの成分からなる複合粉体が常時使用温度で優れた絶
縁性や保譲作用を有し、樹脂の分解温度以上の高温でセ
ラミック化した皮膜に変化するとともに、塗膜の平滑性
が極めて優れて−ることを見出した。
As a result of studies on this point, the present invention has developed a composite powder consisting of four components: silicone resin, polyester resin, low-melting point glass powder, and high-melting point inorganic fine powder, which has excellent insulation and preservation properties at normal operating temperatures. However, it was discovered that the coating changes to a ceramic film at a high temperature above the decomposition temperature of the resin, and that the smoothness of the coating film is extremely excellent.

特に本発明の好ましい配合は、シリコン樹脂5〜50重
量−、ポリエステル樹脂5〜50重量覧低鵬点ガラス粉
末20〜80重量%及び高融点無機物0.2〜15重量
−からなる複合粉体組成物である。
In particular, a preferred formulation of the present invention is a composite powder composition consisting of 5-50% by weight of silicone resin, 5-50% by weight of polyester resin, 20-80% by weight of low-temperature glass powder, and 0.2-15% by weight of high-melting point inorganic material. It is a thing.

次に本発明を構成する複合粉体の組成につりて説明すれ
ば、シリコ/樹脂及びポリエステル樹脂は通常の粉体塗
料の焼付温度領域で流動し平滑な塗装面管得るため流動
剤としての働きと、低融点ガ2へ微粉末及び無機質微粉
末に対する・迄ダとしての働11t−持ってお〕、特に
シリコン樹脂は塗膜に耐熱性を附与して温度上昇時には
塗膜の脆化を防止し、かつIIIJ[が熱分解温度以上
の高温に曝されたときに鉱、その熱分解によシ生成する
引03が低融点ガラスと反応して高融点のセラミック物
質とな〕、耐熱性に優れた絶縁皮jI管形成する。
Next, to explain the composition of the composite powder that constitutes the present invention, the silico/resin and polyester resin flow in the baking temperature range of normal powder coatings and function as flow agents to obtain a smooth painted surface. In addition, low-melting point gases have the ability to act as a hardener on fine powders and inorganic fine powders.In particular, silicone resins provide heat resistance to the coating film and prevent it from becoming brittle when the temperature rises. and heat resistance. Forms an excellent insulating skin for tubes.

本配合に於てシリコ/樹脂が5重量−よシ少ない場合に
は温度上昇に際しI!IJ[の脆化を防止する効果が不
充分とな)、逆に50重量−よシ多けれり。
In this formulation, if the silico/resin is less than 5% by weight, I! IJ [the effect of preventing embrittlement is insufficient], on the contrary, it is 50% heavier.

ば、高温によ〕生成したセラミック絶縁皮膜にクラック
が発生し、皮膜の密着性が低下するおそれがあゐ。′ このシリコ/樹脂にはメチル系シリコン樹脂、メチルフ
ェニル系シリコ/樹脂の単独又は混合物、そO外、アル
キッド樹脂変性どリコン樹脂、エポキシ変性シリコン樹
脂、フェノール樹脂変性シリコン樹脂、メラミン樹脂変
性シリコ/樹脂等及びそれと変性しないシリコン樹脂と
の共重合物或はシリコ/樹脂とメチルメタクリレート、
アクリロニトリル等の重合性モノマーとO共重合物も使
用することができ、その場合シリコン樹脂成分O含量は
少くも3〇−以上あることが望ましi。
For example, there is a risk that cracks may occur in the ceramic insulation film formed due to high temperatures, and the adhesion of the film may deteriorate. ' This silico/resin includes methyl silicone resin, methylphenyl silico/resin alone or in mixture, as well as alkyd resin-modified dolicon resin, epoxy-modified silicone resin, phenol resin-modified silicone resin, and melamine resin-modified silico/resin. Copolymers of resins and unmodified silicone resins, or silicone/resin and methyl methacrylate,
A copolymer of a polymerizable monomer such as acrylonitrile and O may also be used, and in that case, it is desirable that the O content of the silicone resin component is at least 30- or more.

更にはS轟とT盛、B 、 At、P 、 Ge、As
、8b等O元素t−1種以上と酸素とを骨格に持つもの
、或は別とTi 、B 、 AJ!、P 、 Ge 、
As 、8b等の元素を111以上と酸素と炭素と會骨
格に持つ構造のものなど使用可能である。
Furthermore, S Todoroki and T Mori, B, At, P, Ge, As
, 8b, etc., which have t-1 or more O elements and oxygen in their skeletons, or Ti, B, AJ! ,P,Ge,
It is possible to use a structure having 111 or more elements such as As and 8b, oxygen, and carbon in the skeleton.

ポリエステル樹脂は異常高温等で樹脂の分解温度で分解
し消失するが、5重量−よシ少ない場合は最初の111
属の平滑性及び密着性が不充分であ気50重量St越え
た場合に紘異常高温によシポリエステル機脂が分解した
場合に皮膜中の熱分解合が多くなシ過ぎて急激な脆化を
来たし、基材から皮膜が剥離するおそれがある。
Polyester resin decomposes and disappears at the decomposition temperature of the resin at abnormally high temperatures, etc., but if it is less than 5 weight, the initial 111
If the smoothness and adhesion of the polyester resin is insufficient and the temperature exceeds 50 weight St, the polyester resin will decompose due to abnormally high temperatures, and the film will undergo too much thermal decomposition, resulting in rapid embrittlement. This may cause the film to peel off from the base material.

低融点ガラス微粉末(ガラスフリット)は、エポキシ樹
脂およびシリコパン系樹脂が分解する400℃程度の温
度で軟化流動して基材との密着性を保持し、かつ前述の
シリコン樹脂の分解生成物(8轟0□)と反応して高融
点セラミック皮膜を形成するものである。この低融点ガ
ラスとしては、融点が300〜600℃穆度のホウケイ
酸ガラスi九は含鉛ガラス、リン酸系ガラ4用いらnる
。tた高温における金属基材との密着性をさらに向上さ
せる九め、低融点ガラスにOo、N1N15Pe 、 
TI 、 Zr 、Os 、Mo  等の金属の酸化物
や化合物。
Low-melting glass fine powder (glass frit) softens and flows at a temperature of about 400°C, at which epoxy resins and silicopane resins decompose, and maintains adhesion to the base material, and also contains the aforementioned silicone resin decomposition products ( 8) to form a high melting point ceramic film. Examples of the low melting point glass include borosilicate glass having a melting point of 300 to 600° C., lead-containing glass, and phosphoric acid glass. Ninth, Oo, N1N15Pe, N1N15Pe,
Metal oxides and compounds such as TI, Zr, Os, Mo, etc.

あるいはホウ酸塩、さらにはこnらの元素1含む複合酸
化物やその他の化合物等’k1種オたは2種以上添加混
合したもの管用いることが望ましい。
Alternatively, it is desirable to use a mixture of one or more of these elements, such as a borate, a composite oxide containing one of these elements, and other compounds.

なお、ζこで用すられる低一点ガラス微粉末としては2
種以上のガラスを併せて用いることができる。低融点ガ
ラスは異常温度上昇により、樹脂が分解したrQK強固
なセラミック皮膜を生成する上で重要な役割を果すので
20〜80重量−が好筐しく、20重量%より少ない場
合に/l117M膜の耐熱性が悪く80重量%を越える
と皮膜の平滑性、接着性等が悪くなる。
In addition, the low point glass fine powder used here is 2.
More than one type of glass can be used in combination. Since low melting point glass plays an important role in producing a strong ceramic film of rQK in which the resin decomposes due to abnormal temperature rise, 20 to 80% by weight is preferable, and if it is less than 20% by weight, the Heat resistance is poor, and if it exceeds 80% by weight, the smoothness, adhesion, etc. of the film will deteriorate.

高融点無機質微粉末は、樹脂成分が分解するに至る昇g
A過程に於て塗膜の収縮による亀裂発生で基材からの剥
離現象を来たすのを防止し1強固なセラミック皮膜を形
成するために必要な本ので0.2〜1511量優が好ま
しい範囲である。その添加量が15重量−より多過ぎれ
ばセラミック″**の強度が低下し、0.2重量%より
少ない場合にけ昇温時に大きな亀裂を発生し易い。
High melting point inorganic fine powder has a high g
In process A, it is necessary to prevent peeling from the base material due to cracking due to shrinkage of the coating film and to form a strong ceramic film, so the preferred range is 0.2 to 1511. be. If the amount added is more than 15% by weight, the strength of the ceramic''** decreases, and if it is less than 0.2% by weight, large cracks are likely to occur when the temperature is increased.

又、この高融点無機質微粉末はポリエステル樹脂、シリ
コン樹脂、低融点ガラス微粉末の間に介在しt相互の反
応を抑制し、m換の平滑性を良くする作用も果慶す。
In addition, this high melting point inorganic fine powder is interposed between the polyester resin, silicone resin, and low melting point glass fine powder, and has the effect of suppressing the mutual reaction between t and improving the smoothness of m conversion.

高融点無機質微粉末としては、少くも低融点ガラス微粉
末より高い融点のもので1通常6000以上好ましくは
soo℃以上の融点のものが用いられる。具体的にはア
ル7ナ(k’s Os )+シリカ(840m)、ベリ
リア(BeQ )、ジルコニア(ZrOl)、マグネシ
ア(MgO)、駿化チfi ン(TlOs ) 、ff
化鉄(FeO、F匂Os  )、チタン酸ノ々リクA 
(BMTI−01ン、チタン駿カルシウム(0aTiO
s) s チタン駿鉛(PbTlOs )、ジルニア 
:/ (Zr8104 )、ジにコア識バリウム(Ba
Zr0m )、xf7fi イ) (Mg8+o、入タ
ルク、FL−、モンモリロナイト、ベントナイト、カオ
リン、マイカ、ゼロンナイトライト(BN入窒化ケイ素
、その他to*’)zツク系耐熟着色IR科等が使用さ
れ石、なお、これらの無機微粉末は、ビニル基、エポキ
シ基、アルキルアtノ基、アルコキシ基、ア竜トキシ基
、ハシゲン原子などt−有するシラン系処理剤中シリル
パーオキサイドなどの変性シラン或いはアルキルチタネ
ートなどの有機チタン系物質更にはりン酸エステル%亜
リン酸エステル等の有機す/化合物などの処理剤によっ
てシリコン系*mと親和性もしくは反応性の状態になる
よう表面処理してお−ても良い、即ちこのような表面処
理は粉体塗装時の加熱によって流動性が良好となシ塗膜
を平滑化し易く、かつ無機物粉末とシリコン系樹脂との
密着性が良好とな)、強靭な塗膜が得られるものである
As the high melting point inorganic fine powder, one having a melting point at least higher than that of the low melting point glass fine powder, usually 6,000° C. or more, preferably soo C. or more, is used. Specifically, Al7Na (k'sOs) + silica (840m), beryllia (BeQ), zirconia (ZrOl), magnesia (MgO), tin fluoride (TlOs), ff
Ferric acid (FeO, FoOs), Nororiku titanate A
(BMTI-01, Titanium Shun Calcium (0aTiO
s) s Titanium lead (PbTlOs), Zirnia
:/ (Zr8104), Jini Core Knowledge Barium (Ba
(Zr0m), xf7fi a) (Mg8+O, talc containing, FL-, montmorillonite, bentonite, kaolin, mica, xeronitrite (BN silicon nitride, others to *') Ztsuku-based aging-resistant coloring IR family etc. are used. In addition, these inorganic fine powders are treated with modified silanes such as silyl peroxide or alkyl titanates in silane-based processing agents having t-containing vinyl groups, epoxy groups, alkyl atom groups, alkoxy groups, aroxy groups, halide atoms, etc. Even if the surface is treated with organic titanium-based substances such as phosphate esters, organic titanium compounds such as phosphoric acid esters, and organic titanium compounds such as phosphoric acid esters, etc., to make it compatible with or reactive with silicon-based materials. In other words, this type of surface treatment makes it easy to smooth the coating film by heating it during powder coating, and it also improves the adhesion between the inorganic powder and the silicone resin), and it creates a strong coating. A film is obtained.

又、無機物微粉末はあらかじめその粒子表面にポリエス
テル樹脂、シリコン樹脂或はこれらの樹脂と相容性の良
V=@脂を被覆した複合粉体としても良く、この場合に
も塗膜の平滑性が改善され、基材への密着性も改善され
る。
In addition, the inorganic fine powder may be a composite powder in which the particle surface is coated with polyester resin, silicone resin, or a V = @ fat that is compatible with these resins, and in this case, the smoothness of the coating film is also improved. is improved, and adhesion to the substrate is also improved.

本発明ではシリコン樹脂とと^にポリエステル樹脂を採
用しているので、基材への密着性はエポキシ樹脂に比べ
て若干低下すると社言え、実用的にはかな)の密着性も
よく、シリコン樹脂との反応性が少ないfF、、めに塗
膜の流動性に優れ、平滑なmat形成し易i。
In the present invention, since polyester resin is used for the silicone resin, it can be said that the adhesion to the base material is slightly lower than that of epoxy resin, but in practical terms, the adhesion to the silicone resin is good, and the adhesion to the base material is good. fF, which has little reactivity with other materials, has excellent fluidity of the coating film and is easy to form a smooth mat.

耐熱性粉体O製造方法は、粉体ブレンド法、混練後粉砕
法、転勤流動法、スプレードライ法など各種の方法によ
ることができ、各粉体の粒度はシリコン樹脂及びポリエ
ステル樹脂【粉体として配合する場合にはそれぞれ80
メツシユ以下が望ましい。i九混練侵粉砕法、転勤流動
法、スプレードライ法等ては最終粒子を80メツシユ以
下とすることが適宜しい。
Heat-resistant powder O can be produced by various methods such as powder blending method, kneading and pulverization method, transfer flow method, and spray drying method. 80 each if combined
Desirably less than 100 kg. (9) When using the kneading and pulverizing method, the transfer flow method, the spray drying method, etc., it is appropriate that the final particles be 80 meshes or less.

塗装方法は静電塗装もしくはスプレー塗装等によシ12
0〜250℃@1.に加熱すれば良く、塗膜は1層!友
は多数層に形成しても良い、又塗装Kaつては140℃
程度で基材KIIIA着させfe後。
The painting method is electrostatic painting or spray painting.12
0~250℃@1. All you have to do is heat it to 1 layer, and there is only one layer of paint! The layer may be formed in multiple layers, and the coating temperature is 140℃.
After attaching the base material KIIIA at a certain level.

200℃〜250を程度で後加熱しても良い。Post-heating may be performed at about 200°C to 250°C.

m膜表面の平滑性を一層要求する場合には1本発明によ
る耐熱性粉体を基材の上に塗着し内層の塗膜を形成した
上に%更にニーキシ樹脂、ポリエステル樹脂、シリコン
樹脂、ポリイミド樹脂、ポリアミド樹脂或はフェノール
樹脂の如き樹脂粉体の111又Fi2種以上の混合物の
外層m膜で保護する二重塗膜構造とすることができる。
When further smoothness of the film surface is required, the heat-resistant powder according to the present invention is coated on the base material to form an inner layer coating, and then Nixy resin, polyester resin, silicone resin, It can have a double coating structure protected by an outer layer of a mixture of two or more types of 111 or Fi of resin powder such as polyimide resin, polyamide resin, or phenol resin.

なお外装塗膜は本来内層塗膜の上で塗膜の平滑性を高め
るものであるが、温度上昇時に内層の耐熱性塗膜の分解
ガスが脱気し難くなるおそれがあシ、このようなことが
起れば塗膜にふくれなどの原因で剥離金生じるおそれが
あるが、外装置1E膜に分解性の良嶋樹脂を用いたシ、
或は分解性の悪い*mであっても、高融点無機物を多く
添加してやれば、分解ガスの脱気が容易となシ、温度上
昇時に前述のような内層の耐熱性塗膜の剥離現象を防ぐ
ことができる。
Note that the exterior paint film is originally intended to improve the smoothness of the paint film on the inner layer paint film, but when the temperature rises, decomposition gas from the inner heat-resistant paint film may become difficult to degas, so If this happens, there is a risk of flaking due to blistering of the paint film, but if the outer device 1E film uses degradable Yoshishima resin,
Even if *m has poor decomposability, adding a large amount of high-melting point inorganic substances will make it easier to degas the decomposed gas and prevent the above-mentioned peeling phenomenon of the heat-resistant coating film on the inner layer when the temperature rises. It can be prevented.

なお上記O如く二重塗膜による場合は内層の耐熱性m膜
の厚さは20〜700趣が良く、更に好ましい範囲は1
00〜4004mでこのIIL属厚が薄過ぎれば高温時
の電気絶縁性が低下し、逆に厚過ぎれば分解ガスが脱は
離(なル、ふくれや剥離を生じ機械的特性や電気的特性
を損なう。
In addition, in the case of double coating as in O above, the thickness of the inner layer heat-resistant m film is preferably 20 to 700 mm, and a more preferable range is 1
00 to 4004 m, if the thickness of the IIL metal is too thin, the electrical insulation properties at high temperatures will deteriorate; if it is too thick, decomposed gases may desorb, cause blistering or peeling, and deteriorate the mechanical and electrical properties. spoil.

次に本発明OX施例につiて述べる。Next, an example of OX of the present invention will be described.

実施例1 メチルフェニル系シリコン樹脂(東芝シリコ/社@ Y
B2168 )の粒径100メツシユ以下の粉末33重
量−と、ポリエステル樹脂(東洋紡績社製GV−100
)42)粒径100メツシ≧以下の粉末16重量囁と、
粒1180メツシュ以下、融点450℃の低融点ガラス
粉末(鉛系)48重量−と、平均粒径1μmo4ンガラ
3重量−とをl−ルミルで均一に混合して粉体組成物を
得た。その粉体組成物1200℃に予熱した鋼板上にス
プレー塗装して融着させ、厚さ30011ahOg膜を
形成した。
Example 1 Methylphenyl silicone resin (Toshiba Silico Co., Ltd. @ Y
B2168) powder with a particle size of 100 mesh or less, and polyester resin (GV-100 manufactured by Toyobo Co., Ltd.)
) 42) Powder with a particle size of 100 mm or less and a weight of 16 mm,
A powder composition was obtained by uniformly mixing 48 weight of low-melting point glass powder (lead-based) with grains of 1180 mesh or less and a melting point of 450°C and 3 weight of ngara with an average particle diameter of 1 μm in a l-luminium. The powder composition was spray-painted onto a steel plate preheated to 1200°C and fused to form a 30011ahOg film with a thickness of 30011ahOg.

実施例2 メチルフェニル系シリ;ン1tJDi ()II芝” 
+) :xン製YR3168)の粒径30メツシユ以下
の粉末23重量−と、ポリエステル樹脂(東洋紡績社製
GV−100)の粒113Gメツシュ以下の粉末11重
量−と1粒径80メツシュ以下、融点450℃の低融点
ガラス粉末CII系)63重量−と1平均粒径lμSO
ベンガラ3重量−とtv襲電電キサで均一に混合してか
ら、60℃の加熱ロールで混練した後、粉砕機で80メ
ツシユ以下に粉砕して粉体組成物を得た。その粉体組成
物t200℃に予熱した鋼板上にスプレー塗着して融着
させ、厚さ300#の塗膜を形成した。
Example 2 Methylphenyl silicone 1tJDi () II Shiba”
+): 23 weight of powder of YR3168 manufactured by Xun Co., Ltd. with particle size of 30 mesh or less, 11 weight of powder of polyester resin (GV-100 manufactured by Toyobo Co., Ltd.) of particle size of 113 G mesh or less, and 1 particle size of 80 mesh or less, Low melting point glass powder CII system with a melting point of 450°C) 63 weight and 1 average particle size lμSO
After uniformly mixing Red Red Garla 3 weight with a TV electric shock absorber, kneading with a heated roll at 60° C., and pulverizing to 80 mesh or less with a pulverizer to obtain a powder composition. The powder composition was spray-coated and fused onto a steel plate preheated to 200°C to form a coating film with a thickness of 300#.

実施例3 メチ〜7玄系シリ・ン樹脂(東芝シリ=・社gyast
ssンO粒11100メツシュ以下の粉末20重量−と
、ポリエステル樹脂(東洋紡績社jlQV−100)の
粒径10Gメツシユ以下の粉末10重量−と、粒径80
メツシユ以下、融点450℃の低融点ガラス粉末(鉛系
)67重量−と、平均粒価1μmのベンガラ3重量−と
t−セールミルで均一に混合して粉体組成物を得た。そ
O粉体組成−を200℃に予熱した鋼板上にスプレー塗
装して融着させ、厚さ300μmのmgを形成して耐熱
性の内層とし、更にこの上に100メツシユ以下のエポ
キシ樹脂粉体(大日本塗料社製V−PET ”1340
H)を用−て内層塗膜を有する基材t′200℃に予熱
し、これにスプレー法で塗装し融着して外層の塗膜を厚
さ150μmに形成し九。
Example 3 Methi-7 brown silicone resin (Toshiba Siri-・Gyast
20 weight of powder of ssn O grains of 11,100 mesh or less, 10 weight of powder of polyester resin (Toyobo JlQV-100) with particle size of 10 G mesh or less, and particle size of 80
A powder composition was obtained by uniformly mixing 67 weights of low-melting point glass powder (lead-based) with a melting point of 450° C. below mesh and 3 weights of red iron oxide having an average particle size of 1 μm in a T-sail mill. The O powder composition is spray-painted onto a steel plate preheated to 200°C and fused to form a heat-resistant inner layer with a thickness of 300 μm, and on top of this is an epoxy resin powder of 100 mesh or less. (V-PET ”1340 manufactured by Dainippon Toyo Co., Ltd.
A base material t' having an inner layer coating film was preheated to 200° C. using H), and was coated by a spray method and fused to form an outer layer coating film with a thickness of 150 μm.9.

実施例4 メチル系シリコン’IHMC東芝シリコン社gYiL−
3370)の粒径20メツシユ以下の粉末36重量%、
ポリエステル*mc東洋紡績社製GV−100)の粒径
20メツシュ以下0@末17重量9!、低融点ガラス(
lli点400℃)(リン酸系)の粒径80メツシユ以
下の粉末44重量%及びベンガラ粒径l細3重量%から
なる粉体をv盟ミキサーで均一に混合し友後、60℃に
温度制御した熱ロールで7分間混練し、ついでこの混和
物’tノーンマーミルで80メツシユ以下に粉砕し、耐
熱性の粉体組成物を得九。この粉体組成物’1230℃
に予熱した鋼板にスプレー塗装して融着させ厚さ300
#2)塗膜を形成した。
Example 4 Methyl silicon 'IHMC Toshiba Silicon Co., Ltd.gYiL-
3370) powder with a particle size of 20 mesh or less, 36% by weight,
Polyester *mc GV-100 manufactured by Toyobo Co., Ltd.) Particle size 20 mesh or less 0 @ End 17 Weight 9! , low melting point glass (
A powder consisting of 44% by weight of a powder with a particle size of 80 mesh or less and 3% by weight of a red iron oxide particle with a particle size of 1/2 (phosphoric acid) (phosphoric acid) was mixed uniformly in a V-type mixer, and then heated to 60°C. The mixture was kneaded for 7 minutes using controlled heated rolls, and then ground to 80 mesh or less in a non-marine mill to obtain a heat-resistant powder composition. This powder composition'1230℃
Spray paint and fuse to a preheated steel plate to a thickness of 300mm.
#2) A coating film was formed.

実施例5 実施例4による塗膜を形成後、更にその上に100メツ
シユ以下のエポキシ樹脂(大日本塗料社gV−PITφ
1340H)を用−て1前記′I11属會被覆し九基材
t230℃で予熱した後、スプレー法で塗装して融着さ
せ厚さ150μmOk膜を形成した。
Example 5 After forming the coating film according to Example 4, an epoxy resin of 100 mesh or less (Dainippon Toyo Co., Ltd. gV-PITφ
After preheating the substrate at 230 DEG C. using 1340H), a 150 .mu.m thick Ok film was formed by spraying and fusing.

上記実施例と対比するため下記の比較例試料全作った。In order to compare with the above-mentioned example, all the following comparative samples were prepared.

比較例1 エポキシ樹脂粉体(大日本塗料社製V−PFfTφ13
40H)を鋼板上に静電塗装し、200℃で30分間加
熱して厚さ250μmの塗膜を形成した・比較例2 メチルフェニル;4Vす、コン樹脂(東芝クリコン社f
fJYR3168)の粒径100メツシユ以下の粉末4
5重量−と、粒径100メツシユ以下融点450℃の低
融点ガラス粉末(鉛系)52重n*と平均粒径1μmの
べ/ガラ3重量−とをゼールミルで均一に混合して粉体
組成物も得た。その粉体組成物′t″200℃に予熱し
た鋼板上にスプレー塗装して融着させ、厚さ250μm
の塗膜全形成した。
Comparative Example 1 Epoxy resin powder (V-PFfTφ13 manufactured by Dainippon Toyo Co., Ltd.
40H) was electrostatically coated on a steel plate and heated at 200°C for 30 minutes to form a coating film with a thickness of 250 μm. Comparative Example 2 Methylphenyl; 4V Sucon resin (Toshiba Crycon Co., Ltd.
fJYR3168) powder with a particle size of 100 mesh or less 4
A powder composition was obtained by uniformly mixing 5 weight of low melting point glass powder (lead-based) with a particle size of 100 mesh or less and a melting point of 450°C (lead-based) 52 weight n* and 3 weight of glass/glass with an average particle size of 1 μm in a Zeel mill. I also got things. The powder composition 't'' was spray-painted onto a steel plate preheated to 200°C and fused to a thickness of 250 μm.
The entire coating was formed.

上記の実施例及び比較例に示した塗膜の性能會比較試験
した結果を示せば次O通少である。
The results of performance comparison tests of the coating films shown in the above Examples and Comparative Examples are as follows.

(注) O良  △普通 x不良 上記の表から判るように本発明の組成物による塗膜はい
づれも耐熱特性に優れ電気絶縁性も良く、平滑性も良い
ことが判る。
(Note) 0 Good △ Average

特許出願人  藤倉電線株式会社 代理人 弁理士  竹  内   守 手続補正書(自発) 昭和57年5月27日 特許庁長官島田春樹殿 l事件の表示 昭和56年特許願第134555号 λ発明の名称 耐熱性粉体組成物 3.111i1Eをする名 事件との関係  特許出願人 住 所 東京都江東区木場−丁目5番1号名 称 (5
1g)藤倉電線株式金社 ff表者河村勝夫 4、代理人〒101 居 所 東京都千代田区内神田二丁目15番13号南部
ビル ) (75リ  紙) 1、 明細書第1員菖19〜20行「各機電気残器等の
−」とある記載を、「各種電気機器等の・−・」とil
J圧する。
Patent Applicant Fujikura Electric Cable Co., Ltd. Agent Patent Attorney Mamoru Takeuchi Procedural Amendment (Voluntary) May 27, 1980 Haruki Shimada, Commissioner of the Japan Patent Office Display of the Case 1982 Patent Application No. 134555 λ Name of Invention Heat Resistant Relation to the famous case involving powder composition 3.111i1E Patent applicant address 5-1 Kiba-chome, Koto-ku, Tokyo Name (5
1g) Fujikura Electric Wire Co., Ltd. Kinsha ff Representative: Katsuo Kawamura 4, Agent: 101 Address: Nanbu Building, 2-15-13 Uchikanda, Chiyoda-ku, Tokyo) (75 papers) 1. Specification No. 1 member Iris 19~ In line 20, the description "for each machine's remaining electrical equipment, etc." has been changed to "for various electrical equipment, etc."
Press J.

2−  BAJl]I第す頁s13行reelとある記
載を「GC」と訂正する。
2-BAJl] On page 1, line s13, reel is corrected to "GC."

Claims (1)

【特許請求の範囲】 (υ シリコン樹脂、ポリエステル樹脂、低融点ガラス
及び高融点無機物からなり、各成分が均一に分散されて
−ることを特徴とする耐熱性粉体組成物 (幻 シリコノ樹脂5〜50重量−、ポリエステル樹脂
5〜50・重量饅、低融点ガラス20〜80重量−及び
高融点無機物04〜15重量−からな)、各成分が均一
に分散されて−ることを特徴とする耐熱性粉体組成物 (a)  シリコ/樹脂、ポリエステル*m、低融点ガ
ラス及び高融点無機物がそれぞれ個別に粉体化されて埴
る特許請求の範囲第1項及び萬2項記載O耐熱性粉体組
成物
[Scope of Claims] (υ A heat-resistant powder composition (phantom silicone resin 5 ~50 weight, polyester resin 5~50 weight, low melting point glass 20~80 weight, and high melting point inorganic material 04~15 weight), each component being uniformly dispersed. Heat resistant powder composition (a) silico/resin, polyester *m, low melting point glass, and high melting point inorganic material are each individually powdered and crushed O heat resistance as described in claims 1 and 2 powder composition
JP56134555A 1981-08-27 1981-08-27 Heat-resistant powder composition Pending JPS5837062A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56134555A JPS5837062A (en) 1981-08-27 1981-08-27 Heat-resistant powder composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56134555A JPS5837062A (en) 1981-08-27 1981-08-27 Heat-resistant powder composition

Publications (1)

Publication Number Publication Date
JPS5837062A true JPS5837062A (en) 1983-03-04

Family

ID=15131055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56134555A Pending JPS5837062A (en) 1981-08-27 1981-08-27 Heat-resistant powder composition

Country Status (1)

Country Link
JP (1) JPS5837062A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000012640A1 (en) * 1998-09-01 2000-03-09 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
WO2000018847A1 (en) * 1998-09-25 2000-04-06 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000012640A1 (en) * 1998-09-01 2000-03-09 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
WO2000018847A1 (en) * 1998-09-25 2000-04-06 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
US6451436B1 (en) 1998-09-25 2002-09-17 Catalysts & Chemicals Industries Co., Ltd. Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film

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