JPS5834175A - Chemical liquid treatment device - Google Patents

Abstract

PURPOSE:To purify a chemical liquid in a chemical liquid tank, and to control a temperature, by using an overflow type as the chemical liquid tank, and making an overflow liquid circulate in a pipe which connects a pump, a filter and a circulating constant temperature oven. CONSTITUTION:A new chemical luquid in a constant temperature stored liquid tank 16 is supplied to a treatment part 2 of a chemical liquid tank 1, and etching treatment, etc. are executed. When the chemical liquid of the treatment part 2 overflows an overflow part 4 and collects in a circulating constant temperature oven 8, a valve 13 is closed, valves 21, 31 are opened, and a closed circuit is formed between ducts 22, 9 and 41 and the chemical liquid tank 1. As a result, the chemical liquid of the overflow part 4 circulates in a pump 10, a filter 11, the circulating constant temperature oven 8 and the treatment part 2. By this circulation, a dirty chemical liquid is purified, is controlled to a prescribed temperature, and return-flows to the treatment part 2. In this way, a satisfactory chemical liquid treatment is executed.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a chemical liquid processing device@WC, and particularly to a device designed for controlling the temperature of a chemical liquid.

For example, in the etching process of a conductor wafer, which is one of the processes for manufacturing conductors, a method is used in which the conductor wafer is immersed in an etching solution; In order to carry out the etching step 9, K is 4.1 tatami to maintain the etching chemical solution at a predetermined temperature. Conventionally, chemical processing equipment equipped with such a device for temperature maintenance, that is, temperature control, has a hot water tank installed outside the chemical tank, and the water inside this hot water tank is circulated through a cooling device. There have been proposed devices that indirectly control the temperature of the chemical solution in the chemical solution tank, devices that directly control the heating of the chemical solution using a heater (heater that incorporates a heater into the chemical solution tank), and devices that directly control the heating of the chemical solution using a heater.

However, in the former case, the temperature of the chemical solution is not directly controlled, so the followability of cold and heat is poor, and precise temperature control is difficult. Furthermore, in the latter case, local temperature non-uniformity is likely to occur, resulting in poor temperature control accuracy. Furthermore, in both cases, since the chemical solution in the chemical solution tank is in a stationary state, the chemical solution is significantly contaminated and deteriorated, and there is also the problem that the yield is greatly reduced due to foreign matter.

Therefore, the object of the present invention is to configure the chemical tank to be an overflow type, and to connect the pump, filter, and thermostatic chamber with piping above the chemical tank, thereby controlling the degree of Kffi in the chemical tank and allowing the chemical liquid to be purified in a cleaning field. It is an object of the present invention to provide a chemical liquid processing device that can circulate, thereby having good followability and control accuracy, and preventing contamination of the chemical liquid.

Hereinafter, explanation will be given based on the example shown in the figure. In the figure, 1 is a chemical tank containing, for example, a chemical solution for etching a semiconductor wafer, and a central processing section 2 and a partition wall 31% chamfered. ? ) 3bK is partitioned outside the processing section 2 and has nine overflows s4. And place 3! ! l
The top surface of ff1S2 has a supply port 5. A circulation lower is provided on the bottom of the overflow sister 4F.

The supply port 5 is connected to the conduit 9! ! Subsequently, this electric circuit 9 is connected to a pump lO, a filter 11. Pulp 31t - installed in series 11. In addition, this pipe line 9 is connected to a constant temperature liquid storage tank 16 storing the granule drug solution through a pipe line 14 with a pulp 13 interposed therebetween and a pipe l1815'Q, and when the pulp 13 is opened, the new drug solution in the liquid storage tank 16 The constant-temperature storage tank 16 is connected to a conduit 1 that is connected to a new chemical solution supply II (not shown) so that it can be supplied to the suction ports of all pumps 10.
7, arranged close to each other, and one of the forked ends 17a.
is the pulp 18 [through the constant temperature storage tank 16K, the other 17
m) are respectively installed in the pure water weighing tank 35 via the pulp 19t, and by selectively opening the pulps IS and IO, the new chemical liquid is directly stored or stored at constant temperature via the pure water weighing tank 35, the pulp 34, and the storage liquid supply 0201i. The liquid is supplied to the liquid tank 16 and is also supplied to the constant temperature liquid storage tank 16 through the liquid storage supply 020 from the open port of the chemical liquid T-pulp 330 of the chemical liquid measuring tank 37.

On the other hand, the tik loam lower Kti circulation thermostat 8 (air port 3
9) and a pipe line 22 with a valve 21 are connected, and the pipe line 22 is connected between the pipes #s9 and #s14. Further, the drain port 6 is connected to a pipe 24 connected to the pulp 231, and a pipe 40'qt connected to the pipe 41 with a valve 271 interposed therein, and this pipe 24.4G is connected to the constant temperature liquid storage tank 16. It is connected to the drainage pipe 26 connected through the lower sK pulp 25t. In addition, a pipe line 41 connecting the pulp 31 and the pump 10 is connected to the constant temperature liquid storage tank 16ffll via a pipe line 28t in which the pulp 32 is interposed.

Here, the pump IOK is a chemical-resistant diaphragm pump or air pump made of, for example, Teflon, and the filter IIK is a 0.2 μm mesh and a set of cartridge holders, and is equipped with 29 tons of degassing pulp. Also,
A liquid outage sensor 3011 is installed in the constant temperature liquid storage tank 16 to detect when the chemical solution in the constant temperature liquid storage tank has decreased! ! Occurs on alarm. Furthermore, the pulp 13.21.23.27.31
．． No. 32 has a structure that can be opened and closed by air pressure using an air operator valve, while pulp 1B.

Hand pulp is used for 19.25.29.33.34.

According to the above configuration tic, pulp 18.19.33.34
By appropriately opening and closing the Kl chemical solution in the thermostatic liquid storage tank 18, the pulp becomes 13.32% PM and the pump 1Gk is operated. After blending, the pulp 13 is opened and the pump 101 is operated, and the pulp is supplied to the processing section 2 of the chemical liquid tank 1 through the chemical liquid pipe line 14.9.41.

At the time of C, the chemical liquid is cleaned by removing foreign matter (as in the filter 1lff), and the chemical liquid supplied to the processing section 2 crosses the partition wall 3 and overflows into the overflow s4. Over 7a-1l IS
4 and circulation constant temperature bath BK When an appropriate amount of chemical solution has accumulated, valve 13 is closed and pulp 21.31 hair is opened, pipe Ws
22, 9, and 41 form a ma path with the chemical tank 1 and ON, and as a result, the overflowing chemical liquid is connected to pipes 22, 9, and 41.
Pump tO, filter 11. It circulates to the circulation chamber B1 processing section 2. In the past, the etching process was carried out in the processing section 2, and the chemical solution containing the etching particles overflowed from above the processing section 162 to the overflow s4, or was circulated as described above to clean δ. The chemical solution is then returned to the processing section after being controlled to a predetermined temperature, thereby ensuring that the processing section 2 is always filled with a clean chemical solution at a predetermined temperature to enable a good etching process. Moreover, this chemical solution is continuously circulated by the action of the pump,
Since the chemical liquid whose temperature has just been controlled in the circulation constant temperature bath 8 is supplied into the processing section 2, the followability of the 1llift control of the chemical liquid is extremely high, and it often becomes locally non-uniform, as well as contaminating the chemical liquid. , deterioration is also reduced.

In addition, when replacing the chemical solution in the chemical solution tank 1 with a new chemical solution, if the pulp 21, 23, 271M is left alone and the pump 10 is activated, the chemical solution will be drained into the conduit 24, 22. Further, by releasing the valve 25111%, it is also possible to drain the chemical solution in the constant temperature liquid storage tank 16.

As described above, according to the chemical liquid processing apparatus IK of the present invention, the chemical liquid tank is configured as an overflow type, and the chemical liquid tank t is connected to the pump, filter, circulating water constant temperature control and Kyowa piping, and the overflow liquid t is connected to these piping. Since it is configured so that 11 people can circulate, the temperature of the chemical solution in the chemical tank can be controlled and cleaned. In addition to improving the followability and control accuracy of temperature control, it also prevents contamination of the chemical solution, thereby achieving the effect that good chemical processing can be performed.

[Brief explanation of the drawing]

The figure is an overall configuration diagram of a chemical liquid processing apparatus according to the present invention. DESCRIPTION OF SYMBOLS 1... Chemical solution tank, 2... Processing section, 4... Oats (fluo part, B... Circulation thermostat, 10... Pump, 11
...Filter, 16... Constant temperature liquid storage tank, 35...
・Pure water weighing tank, 37...4 tanks for measuring chemical solutions. ', j”

Claims (1)

[Scope of Claims] 1. While the chemical tank containing the required chemical solution is constructed as an overflow type double structure, the chemical solution tank T is connected to the mK piping in a closed circuit together with the pump, filter, and constant temperature bath, and the chemical solution tank is 70. A chemical solution processing apparatus characterized in that the liquid is configured to be able to be circulated through the pump, filter, and constant temperature bath or can be circulated outside the constant temperature bath. 1. A volume ratio weighing tank for preparing the above chemical solution, a temperature-adjustable liquid storage tank, and a pump are connected to closed-circuit IIK piping, so that the chemical solution in the liquid storage tank can be circulated. The liquid medicine blending device according to claim 1, wherein the liquid medicine preparation device has f-% characteristics.