JPS5833002B2 - Method for manufacturing filter media for water separation - Google Patents

Method for manufacturing filter media for water separation

Info

Publication number
JPS5833002B2
JPS5833002B2 JP53034723A JP3472378A JPS5833002B2 JP S5833002 B2 JPS5833002 B2 JP S5833002B2 JP 53034723 A JP53034723 A JP 53034723A JP 3472378 A JP3472378 A JP 3472378A JP S5833002 B2 JPS5833002 B2 JP S5833002B2
Authority
JP
Japan
Prior art keywords
water separation
present
filter media
silicon compound
porous sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53034723A
Other languages
Japanese (ja)
Other versions
JPS54126276A (en
Inventor
敏博 広津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP53034723A priority Critical patent/JPS5833002B2/en
Publication of JPS54126276A publication Critical patent/JPS54126276A/en
Publication of JPS5833002B2 publication Critical patent/JPS5833002B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
  • Paper (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Description

【発明の詳細な説明】 本発明は、多孔質シートの孔の性質を変えることなく、
はつ水性を付与することにより水分離用ろ過材を製造す
る方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides the following advantages:
The present invention relates to a method of manufacturing a water separation filter material by imparting water repellency.

さらに詳しくいえば、多孔質シートの表面にケイ素化合
物をプラズマ重合させることにより、多孔質シートのも
つ本来の孔の性質をそこなうことなく、はつ水性を付与
して水分離用ろ過材を製造する方法に関するものである
More specifically, by plasma polymerizing a silicon compound on the surface of a porous sheet, water repellency is imparted to the porous sheet without damaging its original pore properties, thereby producing a water separation filter material. It is about the method.

これまで、紙や不織布のような多孔質シートにはつ水性
を与えるための処理としては、シリコーンのようなはつ
水性物質を塗布又は含浸する方法が知られている。
Hitherto, as a treatment for imparting water repellency to porous sheets such as paper and nonwoven fabrics, a method of coating or impregnating them with a water repellent substance such as silicone has been known.

しかしながら、この方法によると、シリコーンなどが多
孔質材料の内部まで浸透し、この材料を形成している繊
維の表面全体を被覆するため、多孔質材料がもつ本来の
孔の性質がそこなわれ、通気性、通液性が低下するのを
免れない。
However, according to this method, the silicone etc. penetrates into the inside of the porous material and covers the entire surface of the fibers that make up this material, so the original pore properties of the porous material are damaged. It is inevitable that air permeability and liquid permeability will decrease.

本発明者らは、このような従来法の欠点を克服し、簡単
な操作で、多孔質シートのもつ孔の性質をそこなわず、
はつ水性のみを付与しうる方法を開発するために鋭意研
究を重ねた結果、多孔質シート表面にガス状ケイ素化合
物をプラズマ重合させることによりその目的を遠戚しう
ろことを見出し、この知見に基づいて本発明をなすに至
った。
The present inventors have overcome the drawbacks of such conventional methods, and have developed a method using simple operations without damaging the properties of the pores in the porous sheet.
As a result of intensive research to develop a method that can only impart water repellency, we discovered that the purpose could be achieved by plasma polymerizing a gaseous silicon compound on the surface of a porous sheet, and based on this knowledge, we Based on these findings, the present invention has been completed.

すなわち、本発明は、多孔質シートに、ガス状ケイ素化
合物を接触させ、高周波励起によるプラズマ重合を行わ
せ、多孔性を保ったまま、はり水性を付与させることを
特徴とする水分離用ろ過材の製造方法を提供するもので
ある。
That is, the present invention provides a filter material for water separation, characterized in that a porous sheet is brought into contact with a gaseous silicon compound and subjected to plasma polymerization by high-frequency excitation, thereby imparting water repellency while maintaining porosity. The present invention provides a method for manufacturing.

本発明方法において用いられる多孔質シートとしては、
紙、不織布、織布などの繊維質シートのほか、シリカゲ
ル薄板、通気性プラスチックフィルムなどがある。
Porous sheets used in the method of the present invention include:
In addition to fibrous sheets such as paper, nonwoven fabrics, and woven fabrics, there are also thin silica gel sheets and breathable plastic films.

また、本発明方法において用いられるケイ素化合物とし
ては、ガス化可能な有機ケイ素化合物、例えばテトラメ
チルシラン、トリメチルエチルシラン、ジメチルジエチ
ルシランのようなテトラアルキルシラン、ジメチルアミ
ノ) IJメチルシラン、ジエチルアミノトリメチルシ
ランのようなジアルキルアミノトリアルキルシラン、ヘ
キサメチルジシラザン、ヘキサエチルジシラザンのよう
なヘキサアルキルジシラザン、各種シロキサンなどをあ
げることができる。
The silicon compounds used in the method of the present invention include gasifiable organosilicon compounds, such as tetraalkylsilanes such as tetramethylsilane, trimethylethylsilane, and dimethyldiethylsilane; Examples include dialkylaminotrialkylsilanes such as hexamethyldisilazane, hexaalkyldisilazane such as hexaethyldisilazane, and various siloxanes.

本発明方法の処理時間は、他の処理条件によっである程
度変わるが、通常1分ないし30分間であり、この処理
によって数10〜数1000オングストロームの重合被
膜を形成させることが可能である。
The treatment time of the method of the present invention varies to some extent depending on other treatment conditions, but is usually 1 minute to 30 minutes, and it is possible to form a polymer film with a thickness of several tens to several thousand angstroms.

次に添付図面に従って本発明方法の実施態様の1例を説
明する。
Next, one example of an embodiment of the method of the present invention will be described with reference to the accompanying drawings.

図面は、本発明方法を実施するのに好適なプラズマ反応
管の略解説明図であって、プラズマ反応管1の内部には
、被処理物6が装入され、これは導入口4から分散管2
を通って導入され、高周波コイル3によって励起された
ケイ素化合物ガスと接触され、その表面でプラズマ重合
が行われる。
The drawing is a schematic explanatory diagram of a plasma reaction tube suitable for carrying out the method of the present invention, and a material to be treated 6 is charged inside the plasma reaction tube 1, which is passed through an inlet 4 into a dispersion tube. 2
The silicon compound gas is brought into contact with the silicon compound gas excited by the high frequency coil 3, and plasma polymerization occurs on the surface thereof.

この重合の際副生ずるガス状物質及び未反応のケイ素化
合物は排出口5から反応管外外へ排出される。
Gaseous substances and unreacted silicon compounds produced as by-products during this polymerization are discharged to the outside of the reaction tube through the discharge port 5.

この際の重合には、5X10 ”torr〜1×10
”torrの真空度及び5watt〜100wat
tの電力が用いられる。
For polymerization at this time, the pressure is 5×10” torr to 1×10
”Torr vacuum degree and 5 watts to 100 watts
A power of t is used.

本発明により得られる水分離用ろ過材は、水は通過させ
ないが、気体や有機溶剤例えばハロゲン化炭化水素、ア
ルコール、ベンゼン、トルエンなどはよく通過させうる
ので、空気ろ過材、含水有機溶剤の分離用材料などとし
て利用することができる。
The filter material for water separation obtained by the present invention does not allow water to pass through, but it can easily pass gases and organic solvents such as halogenated hydrocarbons, alcohol, benzene, toluene, etc., so it can be used to separate water-containing organic solvents. It can be used as a material etc.

次に実施例により本発明をさらに詳細に説明する。Next, the present invention will be explained in more detail with reference to Examples.

実施例 1 図面に示すプラズマ反応管において、本体1が内径4.
4crIL、長さ40crILのパイレックスガラス管
からなるものを用い、この中にろ紙片(2X5cIIL
)を置き約lXl0−4Torrまで排気後、導入口4
よりテトラメチルシランを6xI Q Torrs
導入する。
Example 1 In the plasma reaction tube shown in the drawings, the main body 1 has an inner diameter of 4.
A Pyrex glass tube with a length of 4crIL and 40crIL was used, and a piece of filter paper (2
), and after exhausting to about 1X10-4 Torr, open the inlet port 4.
Tetramethylsilane from 6xI Q Torrs
Introduce.

圧が一定になったならば、誘電コイルに13.56MH
zの高周波を印加し、プラズマを発生させる。
Once the pressure becomes constant, 13.56MHH is applied to the induction coil.
A high frequency wave of z is applied to generate plasma.

1.0分処理したのち、高周波の印加を停止し、反応管
を開放してろ紙片を取り出す。
After processing for 1.0 minutes, the application of high frequency is stopped, the reaction tube is opened, and the filter paper piece is taken out.

このようにして、表面に約100人の重合被膜を有する
ろ紙片が得られた。
In this way, a piece of filter paper was obtained which had a polymeric coating of about 100 people on its surface.

このろ紙片は、水は全く通過させないが、ベンゼン、エ
タノールは処理前と同様に通過させた。
This piece of filter paper did not allow any water to pass through it, but it allowed benzene and ethanol to pass through it in the same way as before the treatment.

種々の異なるケイ素化合物を用い、前記と同様にして、
次表に示す真空度で50Wattの電力の高周波を印加
し、次表に示す1分間当りの厚さをもつ重合被膜を得た
In the same manner as above using various different silicon compounds,
A high frequency wave with a power of 50 Watts was applied at the degree of vacuum shown in the table below to obtain a polymerized film having a thickness per minute shown in the table below.

実施例 2 プラズマ反応管内に、アセチルセルロース多孔質フィル
ム(孔径、約1μm)を置き、約1xio−4Torr
まで排気する。
Example 2 An acetylcellulose porous film (pore diameter, approximately 1 μm) was placed in a plasma reaction tube, and the temperature was approximately 1xio-4 Torr.
exhaust to.

導入口よりヘキサメチルジシラザン、5X10−2To
rr導入し、圧力が一定になったあとで、高周波を10
分間かげ、重合反応を行うと、表面に約1200人の重
合被膜を得ることができる。
Hexamethyldisilazane, 5X10-2To from the inlet
rr is introduced, and after the pressure becomes constant, the high frequency is
When the polymerization reaction is carried out in the shade for a minute, a polymer film of about 1200 layers can be obtained on the surface.

実施例 3 プラズマ反応管内に、クロマトグラフ用シリカゲル薄層
板(2,5crfLX 7.5CIrL)を置き約I×
1O−4Torrまで排気する。
Example 3 Place a thin silica gel plate for chromatography (2.5crfLX 7.5CIrL) in a plasma reaction tube and
Evacuate to 1O-4 Torr.

導入口より、6X10−2Torrのジエチルアミノト
リメチルシランを導入し、約5分間重合処理を行う。
Diethylaminotrimethylsilane at 6×10 −2 Torr is introduced through the inlet, and polymerization is performed for about 5 minutes.

このようにして、約800人の重合被膜を得ることがで
きる。
In this way, approximately 800 polymeric coatings can be obtained.

この薄層板は、エタノール、ベンゼン、トルエンなどの
有機系溶剤は容易に通過できるが、水は、これをはじき
、浸透させない。
Organic solvents such as ethanol, benzene, and toluene can easily pass through this thin plate, but water repels it and does not allow it to penetrate.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明方法を実施するためのプラズマ反応管の1
例を示す断面略解図であり、図中符号1は反応管本体、
2はケイ素化合物ガス分散管、3は高周波コイルである
The drawing shows one of the plasma reaction tubes for carrying out the method of the present invention.
This is a schematic cross-sectional view showing an example, and the reference numeral 1 in the figure indicates the reaction tube main body;
2 is a silicon compound gas dispersion tube, and 3 is a high frequency coil.

Claims (1)

【特許請求の範囲】 1 多孔質シートに、ガス状ケイ素化合物を接触させ、
高周波励起によるプラズマ重合を行わせ、多孔性を保っ
たまま、はつ水性を付与させることを特徴とする水分離
用ろ過材の製造方法。 2 多孔質シートが紙、不織布又は織布である特許請求
の範囲第1項記載の方法。 3 ケイ素化合物がシロキサン、テトラアルキルシラン
、ジアルキルアミノトリアルキルシラン又はヘキサアル
キルジシラザンである特許請求の範囲第1項記載の方法
[Claims] 1. Bringing a gaseous silicon compound into contact with a porous sheet,
A method for producing a filter material for water separation, characterized by performing plasma polymerization by high frequency excitation to impart water repellency while maintaining porosity. 2. The method according to claim 1, wherein the porous sheet is paper, nonwoven fabric, or woven fabric. 3. The method according to claim 1, wherein the silicon compound is siloxane, tetraalkylsilane, dialkylaminotrialkylsilane or hexaalkyldisilazane.
JP53034723A 1978-03-24 1978-03-24 Method for manufacturing filter media for water separation Expired JPS5833002B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53034723A JPS5833002B2 (en) 1978-03-24 1978-03-24 Method for manufacturing filter media for water separation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53034723A JPS5833002B2 (en) 1978-03-24 1978-03-24 Method for manufacturing filter media for water separation

Publications (2)

Publication Number Publication Date
JPS54126276A JPS54126276A (en) 1979-10-01
JPS5833002B2 true JPS5833002B2 (en) 1983-07-16

Family

ID=12422237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53034723A Expired JPS5833002B2 (en) 1978-03-24 1978-03-24 Method for manufacturing filter media for water separation

Country Status (1)

Country Link
JP (1) JPS5833002B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189372A (en) * 1984-10-02 1986-05-07 カネボウ株式会社 Water repellency processing of raised product
JPS61146871A (en) * 1984-12-21 1986-07-04 東レ株式会社 Resin processing of raised fiber structure
CA2507881A1 (en) * 2003-01-30 2004-08-12 Europlasma Method for providing a coating on the surfaces of a product with an open cell structure throughout its structure and use of such a method
GB2431173B (en) * 2005-09-15 2010-01-13 Alexium Ltd Method for attachment of silicon-containing compounds to a surface
CN103748150B (en) * 2011-10-20 2016-03-30 东丽电池隔膜株式会社 The preparation method of porous-film and this porous-film, battery separator and battery
EP3101170B1 (en) * 2015-06-03 2018-08-22 Europlasma NV Surface coatings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4988982A (en) * 1972-12-08 1974-08-26
JPS5265575A (en) * 1975-11-21 1977-05-31 Us Government Method of protection of surface of plastic material
JPS538669A (en) * 1976-07-13 1978-01-26 Kogyo Gijutsuin Method of prevention of dissolving of additive agents contained in polyvinyl chloride resin

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4988982A (en) * 1972-12-08 1974-08-26
JPS5265575A (en) * 1975-11-21 1977-05-31 Us Government Method of protection of surface of plastic material
JPS538669A (en) * 1976-07-13 1978-01-26 Kogyo Gijutsuin Method of prevention of dissolving of additive agents contained in polyvinyl chloride resin

Also Published As

Publication number Publication date
JPS54126276A (en) 1979-10-01

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