JPS5830710B2 - High frequency heating device - Google Patents
High frequency heating deviceInfo
- Publication number
- JPS5830710B2 JPS5830710B2 JP51083615A JP8361576A JPS5830710B2 JP S5830710 B2 JPS5830710 B2 JP S5830710B2 JP 51083615 A JP51083615 A JP 51083615A JP 8361576 A JP8361576 A JP 8361576A JP S5830710 B2 JPS5830710 B2 JP S5830710B2
- Authority
- JP
- Japan
- Prior art keywords
- opening
- heating chamber
- high frequency
- waveguide
- heating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Constitution Of High-Frequency Heating (AREA)
Description
【発明の詳細な説明】
本発明はマグネトロンからみた負荷インピーダンスの変
動が少なく、しかも加熱室内の電界攪拌効果は良好な高
周波加熱装置を実現するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention realizes a high-frequency heating device in which fluctuations in load impedance seen from the magnetron are small and the electric field stirring effect within the heating chamber is good.
導波管を介して高周波の供給を行い、加熱室内にスタラ
ーファンを備えた高周波加熱装置、いわゆる電子レンジ
において、最も代表的な給電構造は第1図に示すもので
あった。In a high-frequency heating device, a so-called microwave oven, in which high-frequency waves are supplied through a waveguide and a stirrer fan is provided in the heating chamber, the most typical power supply structure is shown in FIG.
すなわちマグネトロン1より発射された高周波は、導波
管2を介して給電開口3より加熱室4内に照射される。That is, the high frequency waves emitted from the magnetron 1 are irradiated into the heating chamber 4 through the power supply opening 3 via the waveguide 2 .
5がその高周波を攪拌する金属性のスジ2−ファンで、
負荷6の加熱ムラを改善する。5 is a metal streak 2-fan that stirs the high frequency,
To improve uneven heating of load 6.
1は誘電体の仕切板、81/′i外装を示す。1 shows a dielectric partition plate, 81/'i exterior.
第2図は給電開口3とスタラーファン5の位置関係を示
す装置の上面略図である。FIG. 2 is a schematic top view of the device showing the positional relationship between the power supply opening 3 and the stirrer fan 5.
このような従来の給電構造によれば、給電開口3をスタ
ラーファン5の翼部が断続的に横切るわけで、電界の攪
拌効果、すなわち加熱ムラの改善には効果を発揮しても
、マグネトロン1のアンテナを基準として加熱室側の負
荷インピーダンスを見たとき、あ1りに変化が大きくな
りすぎ、そのために第3図のり一ケ線図にその負荷イン
ピーダンスを示すように、マグネトロンはかなり大きな
動作点で動作せざるをえなかった。According to such a conventional power supply structure, the blades of the stirrer fan 5 intermittently cross the power supply opening 3, and although it is effective in stirring the electric field, that is, improving uneven heating, the magnetron When looking at the load impedance on the heating chamber side using antenna No. 1 as a reference, the change in the load impedance on the heating chamber side is too large. I had no choice but to operate at the operating point.
そこで出力中心をとらえても出力のレベルがちすり高く
なく、すた不安定発振領域が近いため(図中a/)、負
荷量や負荷位置によってはモーディングの如き異常発振
現象を呈することも多かった。Therefore, even when the output center is detected, the output level is not very high, and the unstable oscillation region is close (a/ in the figure), so depending on the load amount and load position, abnormal oscillation phenomena such as moding may often occur. Ta.
本発明はかかる点に着目し、負荷インピーダンスを大き
く変化させることなく、加熱ムラの改善をはかろうとす
るものである。The present invention focuses on this point and attempts to improve heating unevenness without significantly changing the load impedance.
以下図面に従って本発明の一実施例について説明する。An embodiment of the present invention will be described below with reference to the drawings.
第4図および第5図において、マグネトロン1より発射
された高周波は、導波管2を介して給電開口3より加熱
室4内にされる。In FIGS. 4 and 5, high frequency waves emitted from a magnetron 1 are introduced into a heating chamber 4 through a power supply opening 3 via a waveguide 2.
給電開口3は加熱室上面の略中炎に設けられ、加熱室内
の前後左右の電界の対称性をはかる。The power supply opening 3 is provided approximately in the middle of the upper surface of the heating chamber to ensure symmetry of the electric field in the front, rear, left and right directions within the heating chamber.
さてスタラーファン5は導電体よシなる攪拌翼部9と、
開口閉塞部。Now, the stirrer fan 5 has a stirring blade part 9 made of a conductor,
Orifice occlusion.
10とよう構成される。It is composed of 10.
開口閉塞部10は給電開口3と対向して位置し、スタラ
ーファンが回転しても開口部3から見た形状が一定なよ
うに、つ1す、図の例では、回転軸を開口3の中心に位
置させ、開口閉塞部10の外形を円形とし、かつその外
周が開口10の対角線より大きくなるよう構成されてい
る。The opening closing part 10 is located opposite the power supply opening 3, and is arranged so that the shape seen from the opening 3 remains constant even when the stirrer fan rotates. The outer shape of the opening closing portion 10 is circular, and the outer circumference thereof is larger than the diagonal line of the opening 10.
さてかかる構成により、マグネトロンから見た負荷イン
ピーダンスの変化が、従来に比べてはるかに小さなもの
となり、従ってマグネトロンの動作点を第6図に示すよ
うに小さく1とめることが可能となる。With this configuration, the change in load impedance seen from the magnetron becomes much smaller than in the conventional case, and therefore the operating point of the magnetron can be kept at a small value of 1 as shown in FIG.
しかも開口3とスタラーファン開口閉塞部10とが絶え
ず平行に向い合うため、等価的に一種の導波管がこの部
分で形成され、高周波は図中の矢印の如く前後左右に拡
散され、マグネトロンの動作点が小さいにもかかわらず
翼部9の攪拌効果が著しく向上する。Moreover, since the opening 3 and the stirrer fan opening closing part 10 constantly face each other in parallel, a type of waveguide is equivalently formed in this part, and the high frequency waves are diffused back and forth and left and right as shown by the arrows in the figure, and the magnetron Although the operating point of the blade section 9 is small, the stirring effect of the blade section 9 is significantly improved.
すなわちマグネトロンから被加熱物1でへの高周波のバ
スが長く延び、マグネトロンからは遠い位置で、被加熱
物には近い位置でスタラーファンが回転することになる
わけで、マグネトロンの動作は被加熱物の影響を受けに
くく安定なものとなり、しかも被加熱物に対するスタラ
ーファンの攪拌効果は絶大なものとなる。In other words, the high-frequency bus from the magnetron to the heated object 1 is extended, and the stirrer fan rotates at a position far from the magnetron but close to the heated object. It becomes stable and less susceptible to the effects of objects, and the stirring effect of the stirrer fan on the object to be heated is tremendous.
このように本発明によれば負荷インピーダンスの変化の
小さな、しかも加熱ムラの少ない給電構造を実現でき、
高いレベルの出力を効率良く、かつ安定に取り出せる。As described above, according to the present invention, it is possible to realize a power supply structure with small changes in load impedance and less uneven heating.
Able to efficiently and stably extract high level output.
不安定発振領域との距離dも出力中心をとらえつつ大き
くとることができるので、モーディング等の異常発振を
起しにくい。Since the distance d from the unstable oscillation region can also be set large while keeping the center of the output, abnormal oscillations such as moding are less likely to occur.
従ってマグネトロンの寿命を延ばす効果もある。Therefore, it also has the effect of extending the life of the magnetron.
第1図は従来例を示す装置断面図、第2図は同上面図、
第3図は同加熱室のインピーダンスを示すリーケ線図、
第4図は本発明の一実施例を示す高周波加熱装置の断面
図、第5図は同上面図、第6図は同加熱室のインピーダ
ンスを示すリーケ線図である。
2・・・・・・導波管、3・・・・・・給電開口、4・
・・・・・加熱室、9・・・・・・翼部、10・・・・
・・開口閉塞部。Figure 1 is a sectional view of the device showing a conventional example, Figure 2 is a top view of the same,
Figure 3 is a Rieke diagram showing the impedance of the heating chamber.
FIG. 4 is a sectional view of a high-frequency heating device showing an embodiment of the present invention, FIG. 5 is a top view of the same, and FIG. 6 is a Rieke diagram showing the impedance of the heating chamber. 2... Waveguide, 3... Power feeding opening, 4...
... Heating chamber, 9 ... Wing section, 10 ...
...Opening blockage.
Claims (1)
と、この加熱室の上面略中夫に配した前記導波管と加熱
室とが連通ずる開口と、この開口に対向位置して設けた
スタラーファンとより成り、前記スタラーファンは開口
の略中夫に回転軸を有し、開口の対角線長より大なる導
電体の円形開口閉塞部を備え、かつその外周部には攪拌
翼部を配する構成とした高周波加熱装置。1. A heating chamber for irradiating high frequency waves to an object to be heated via a waveguide, an opening disposed approximately in the middle of the upper surface of the heating chamber through which the waveguide and the heating chamber communicate, and a heating chamber located opposite to this opening. The stirrer fan has a rotating shaft approximately in the center of the opening, a circular opening closing part made of a conductive material that is larger than the diagonal length of the opening, and a circular opening closing part made of a conductor that is larger than the diagonal length of the opening. A high-frequency heating device configured with a stirring blade section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51083615A JPS5830710B2 (en) | 1976-07-13 | 1976-07-13 | High frequency heating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51083615A JPS5830710B2 (en) | 1976-07-13 | 1976-07-13 | High frequency heating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS538837A JPS538837A (en) | 1978-01-26 |
JPS5830710B2 true JPS5830710B2 (en) | 1983-06-30 |
Family
ID=13807383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51083615A Expired JPS5830710B2 (en) | 1976-07-13 | 1976-07-13 | High frequency heating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5830710B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5859920U (en) * | 1981-10-19 | 1983-04-22 | 株式会社汎建製作所 | Silencer |
JPH0158325B2 (en) * | 1983-10-18 | 1989-12-11 | Yanmar Diesel Engine Co |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5015139A (en) * | 1973-06-11 | 1975-02-18 |
-
1976
- 1976-07-13 JP JP51083615A patent/JPS5830710B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5015139A (en) * | 1973-06-11 | 1975-02-18 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5859920U (en) * | 1981-10-19 | 1983-04-22 | 株式会社汎建製作所 | Silencer |
JPH0158325B2 (en) * | 1983-10-18 | 1989-12-11 | Yanmar Diesel Engine Co |
Also Published As
Publication number | Publication date |
---|---|
JPS538837A (en) | 1978-01-26 |
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