JPS5824515B2 - Closed System - Google Patents

Closed System

Info

Publication number
JPS5824515B2
JPS5824515B2 JP50068014A JP6801475A JPS5824515B2 JP S5824515 B2 JPS5824515 B2 JP S5824515B2 JP 50068014 A JP50068014 A JP 50068014A JP 6801475 A JP6801475 A JP 6801475A JP S5824515 B2 JPS5824515 B2 JP S5824515B2
Authority
JP
Japan
Prior art keywords
nickel plating
plating bath
solid particles
water
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50068014A
Other languages
Japanese (ja)
Other versions
JPS51143532A (en
Inventor
関口旭司
沼尾光喜
石山公一
塚本輝嘉
武田光史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Ebara Udylite Co Ltd
Original Assignee
Ebara Infilco Co Ltd
Ebara Udylite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Infilco Co Ltd, Ebara Udylite Co Ltd filed Critical Ebara Infilco Co Ltd
Priority to JP50068014A priority Critical patent/JPS5824515B2/en
Publication of JPS51143532A publication Critical patent/JPS51143532A/en
Publication of JPS5824515B2 publication Critical patent/JPS5824515B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は、固形粒子を懸濁させた多層ニッケルめっき工
程をクローズド化せしめる方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for closing a multilayer nickel plating process in which solid particles are suspended.

多層ニッケルめっき工程において、被めっき物の耐蝕性
の向上のため、あるいはサテン様仕上の外観を得る目的
のため、固形粒子を懸濁させたニッケルめっき浴による
めっき方法が行なわれている。
In the multilayer nickel plating process, a plating method using a nickel plating bath in which solid particles are suspended is used in order to improve the corrosion resistance of the object to be plated or to obtain a satin-like appearance.

すなわち、おおむね第1図示のように、被めっき物Mは
半光沢ニッケルめっき浴A1光沢ニッケルめっき浴B、
固形粒子懸濁ニッケルめっき浴Cの順に移送されたのち
、水洗槽D1.D2.D3にて水洗が繰り返されてクロ
ムめっき浴Eへ移送される。
That is, roughly as shown in the first diagram, the object to be plated M is a semi-bright nickel plating bath A, a bright nickel plating bath B,
After being transferred to the solid particle suspension nickel plating bath C, the washing tank D1. D2. Water washing is repeated in D3 and the product is transferred to chrome plating bath E.

この場合、被めっき物Mの移送に伴なって固形粒子懸濁
ニッケルめっき浴Cの液が次の水洗槽D1へ、さらにこ
の水洗槽D1の液は次の水洗槽D2へと、順次物品に伴
なわれて汲み出されてゆく。
In this case, as the object M to be plated is transferred, the liquid in the solid particle suspension nickel plating bath C is transferred to the next washing tank D1, and the liquid in this washing tank D1 is further transferred to the next washing tank D2, and the object is sequentially transferred to the next washing tank D2. It is being drawn out along with it.

このように、通常この汲み出し液が最終的にクロムめっ
き浴Eに持ち込まれるわけであるが、クロムめっきに悪
影響を及ぼすことのないように、水洗槽へ水を補給して
水洗を完全ならしめるような繰作が行なわれている。
In this way, normally this pumped-out liquid is finally brought into the chrome plating bath E, but in order to avoid having a negative effect on the chrome plating, water is supplied to the washing tank to ensure complete washing. A lot of repetition is being done.

ここで水洗槽から溢流する水には、当然のことながら懸
濁固形粒子と共にニッケル分が多量に含まれているから
、これを廃水処理施設へ導き、薬品により凝集沈殿処理
する方法が一般に行なわれているが、かかる方法では処
理するための薬品が必要であり、かつ沈殿したニッケル
スラジの処理をも必要とする。
The water that overflows from the washing tank naturally contains a large amount of nickel as well as suspended solid particles, so it is generally carried out to a wastewater treatment facility where it is coagulated and sedimented using chemicals. However, such methods require chemicals for treatment and also require treatment of the precipitated nickel sludge.

通常、前記多層ニッケルめっきにおける半光沢ニッケル
めっき浴、光沢ニッケルめっき浴、固形粒子懸濁ニッケ
ルめっき浴の基本液組成は下記の如く同じである。
Usually, the basic liquid composition of the semi-bright nickel plating bath, bright nickel plating bath, and solid particle suspension nickel plating bath in the multilayer nickel plating is the same as shown below.

硫酸ニッケル 300 &/l塩化ニッケル
60 g/lホウ酸 4
5 El/IJそこで、固形粒子懸濁ニッケルめっき
後の水洗水を、ニッケル分はそのままの形で半光沢ニッ
ケルめっき浴などの前段のめつき浴へ返すことができれ
ば、貴重なニッケル金属を再利用できると同時に高価な
排水処理設備や、それに伴なう処理薬品が不要となり、
該工程をクローズトループとすることができる。
Nickel sulfate 300 &/l Nickel chloride
60 g/l boric acid 4
5 El/IJ Therefore, if the rinse water after solid particle suspension nickel plating can be returned to the previous plating bath, such as a semi-bright nickel plating bath, with the nickel content intact, valuable nickel metal can be reused. At the same time, it eliminates the need for expensive wastewater treatment equipment and associated treatment chemicals.
The process can be a closed loop.

しかしながら、ここで問題となるのは次のことがらであ
る。
However, the problem here is the following.

第一に、固形粒子懸濁ニッケルめっき浴には固形粒子を
懸濁させであるが、半光沢ニッケルめっき浴や光沢ニッ
ケルめっき浴では、この固形粒子が混入するとめつきに
悪影響を及ぼすために、この固形粒子を除去してやらな
ければならない。
First, solid particles are suspended in solid particle suspension nickel plating baths, but in semi-bright nickel plating baths and bright nickel plating baths, if these solid particles are mixed in, it will have a negative effect on plating. These solid particles must be removed.

固形粒子を除去する方法としては、沈降や濾過による方
法が考えられるが、この固形粒子は沈降性がかなりよい
ものの完全に沈降することができず、一方濾過による方
法では完全に除去できるが、濾過されるべき固形粒子が
多いために目詰まりが早く、実際の使用は不適であった
Possible methods for removing solid particles include sedimentation and filtration, but although these solid particles have fairly good sedimentation properties, they cannot be completely settled.On the other hand, filtration can completely remove them, but filtration Since there were a large number of solid particles to be removed, clogging occurred quickly, making it unsuitable for actual use.

因みに、固形粒子懸濁ニッケルめっき浴よりの汲み出し
液が10II/hrあるとすると、約250 Vhrの
固形粒子を除去しなければならない。
Incidentally, if the pumped liquid from the solid particle suspended nickel plating bath is 10 II/hr, approximately 250 Vhr of solid particles must be removed.

第二の問題点は、このめっき工程における各浴の基本液
組成は同じであるが、光沢剤等の特殊添加剤がそれぞれ
異なるため、回収水洗中に持ち込まれる固形粒子懸濁ニ
ッケルめっき液中の光沢剤成分を除去してやらなければ
ならない。
The second problem is that although the basic liquid composition of each bath in this plating process is the same, the special additives such as brighteners are different, so the solid particles suspended in the nickel plating solution brought in during recovery water washing are The brightener component must be removed.

第三の問題点は、補給される水洗水の全量を戻すことに
よる水量と、半光沢ニッケルめっき浴などの前後のめつ
き浴の液面よりの自然蒸発量とをバランスさせなければ
ならないことである。
The third problem is that it is necessary to balance the amount of water generated by returning the entire amount of rinse water that is replenished with the amount of natural evaporation from the liquid surface of the plating bath before and after the semi-bright nickel plating bath. be.

本発明は、上記諸問題を解決し、有効適切にニッケルめ
っき液を回収し、もって固形粒子を懸濁させた多層ニッ
ケルめっき工程をクローズド化する方法を提供すること
を目的とするものである。
An object of the present invention is to provide a method for solving the above-mentioned problems, effectively and appropriately recovering a nickel plating solution, and thereby closing a multilayer nickel plating process in which solid particles are suspended.

本発明は、第一段を半光沢ニッケルめっき浴。In the present invention, the first stage is a semi-bright nickel plating bath.

第二段を光沢めっき浴、第三段を固形粒子懸濁ニッケル
めっき浴よりなる固形粒子を懸濁させた多層ニッケルめ
っき工程において、懸濁固形粒子を含むニッケル含有水
洗排水を加圧下にマイクロポーラス膜ないし限外濾過膜
に通水して固形粒子を除去する一方、膜透過水をイオン
交換樹脂に接触せしめて該水中の光沢剤を吸着除去した
のち、そのままあるいは濃縮して前記多層ニッケルめっ
き工程中の半光沢ニッケルめっき浴又は光沢ニッケルめ
っき浴に返送することを特徴とする固形粒子を懸濁させ
た多層ニッケルめっき工程のクローズドシステム化方法
In a multi-layer nickel plating process in which solid particles are suspended, the second stage is a bright plating bath and the third stage is a solid particle suspended nickel plating bath, nickel-containing washing water containing suspended solid particles is made into microporous under pressure. While water is passed through a membrane or an ultrafiltration membrane to remove solid particles, the membrane-permeated water is brought into contact with an ion exchange resin to adsorb and remove the brightener in the water, and then the multilayer nickel plating process is carried out as it is or concentrated. A closed system method for a multilayer nickel plating process in which solid particles are suspended, characterized in that the solid particles are returned to a semi-bright nickel plating bath or a bright nickel plating bath.

さらに本発明の一実施態様を第2図を参照しながら説明
すると、被めっき物品Mは、半光沢ニッケルめっき浴A
、光沢ニッケルめっき浴B、固形粒子懸濁ニッケルめっ
き浴Cを順次移送され、第1水洗槽D1、第2水洗槽D
2、第3水洗槽D3を通過したのちクロムめっき浴Eに
至る。
Further, one embodiment of the present invention will be described with reference to FIG.
, bright nickel plating bath B, and solid particle suspension nickel plating bath C are sequentially transferred to the first washing tank D1 and the second washing tank D.
2. After passing through the third washing tank D3, it reaches the chrome plating bath E.

このとき、補給水洗水量を少なくするために、水洗槽を
多段向流式水洗槽とし、第3水槽D3に系外から補給す
る水量は、その後のクロムめっきに悪影響を及ぼさない
最低水量とするが、できれば半光沢ニッケルめっき浴A
において蒸発して失う量に見合う程度の最低水量にまで
減少させることが望ましい。
At this time, in order to reduce the amount of replenishment rinsing water, the rinsing tank is a multi-stage countercurrent rinsing tank, and the amount of water replenished from outside the system to the third tank D3 is the minimum amount that does not adversely affect the subsequent chrome plating. , preferably semi-bright nickel plating bath A
It is desirable to reduce the amount of water to the minimum amount commensurate with the amount lost by evaporation.

この第3水洗槽D3へ補給された水洗水は、第2水洗槽
D2、第1水洗槽D1を経て貯槽1へ送られるが、この
送られる水洗水中にはニッケル分、添加剤、固形粒子が
含まれている。
The rinsing water replenished to the third rinsing tank D3 is sent to the storage tank 1 via the second rinsing tank D2 and the first rinsing tank D1, but this rinsing water contains nickel, additives, and solid particles. include.

次いで貯槽1内の水洗水をポンプ2によって加圧下で細
孔2.5〜0.1μ程度のマイクロポーラス膜ないし限
外濾過膜を装着したウルトラフィルター3へ送られ、こ
こで固形粒子のみを捕捉濃縮し、ニッケル分やその他の
添加剤を含む膜透過液4を貯槽5に貯留する。
Next, the washing water in the storage tank 1 is sent under pressure by a pump 2 to an ultra filter 3 equipped with a microporous membrane or ultrafiltration membrane with pores of about 2.5 to 0.1 μm, where only solid particles are captured. The concentrated membrane permeate liquid 4 containing nickel and other additives is stored in a storage tank 5.

一方膜を透過せず濃縮された液6は、貯槽1へ返送され
るが、その一部は濃縮槽7へ送られる。
On the other hand, the concentrated liquid 6 that does not pass through the membrane is returned to the storage tank 1, but a part of it is sent to the concentration tank 7.

濃縮槽7においては、自然沈降により一定の固形粒子を
沈殿させ、濃度のうずくなった上澄液8を貯槽1へ戻し
てやれば、貯槽1内の固形粒子濃度は一定に保たれる。
In the concentration tank 7, a certain amount of solid particles are precipitated by natural sedimentation, and if the supernatant liquid 8 with a reduced concentration is returned to the storage tank 1, the concentration of solid particles in the storage tank 1 can be kept constant.

また、濃縮槽7で沈降した固形粒子は定期的に取り出し
て、固形粒子懸濁ニッケルめっき浴Cへ戻してやる。
In addition, the solid particles that have settled in the concentration tank 7 are periodically taken out and returned to the solid particle suspended nickel plating bath C.

次に、貯槽5内に貯えられた液には、前述したようにニ
ッケル分以外に添加剤が含まれているために、これをポ
ンプ9によってイオン交換樹脂塔10へ通液する。
Next, since the liquid stored in the storage tank 5 contains additives in addition to nickel as described above, the liquid is passed through the ion exchange resin tower 10 by the pump 9.

このイオン交換樹脂塔10で使用されるイオン交換樹脂
は、光沢剤を選択的に吸着する弱塩基性陰イオン交換樹
脂を使用する。
The ion exchange resin used in this ion exchange resin tower 10 is a weakly basic anion exchange resin that selectively adsorbs brighteners.

そして、イオン交換樹脂塔10から流出する処理液11
は、貯槽5へ戻られると同時に一部は処理液貯槽12へ
送られたのち、ポンプ13によって半光沢ニッケルめっ
き浴Aまたは光沢ニッケルめっき浴Bへ返送される。
Then, the treatment liquid 11 flowing out from the ion exchange resin tower 10
is returned to the storage tank 5, and at the same time, a portion is sent to the processing liquid storage tank 12, and then returned to the semi-bright nickel plating bath A or the bright nickel plating bath B by the pump 13.

また、本プロセスにおいて、固形粒子懸濁ニッケルめっ
き浴Cにおける液温は、常温で水分の蒸発は殆んどなく
、ここに返送することは水量バランス維持の上で望まし
くない。
In addition, in this process, the liquid temperature in the solid particle suspension nickel plating bath C is room temperature, and there is almost no evaporation of water, so returning the liquid to this bath is not desirable in terms of maintaining water balance.

これに対して半光沢ニッケルめっき浴A、光沢ニッケル
めっき浴Bにおける液温は50℃程度と高く、槽の表面
積も大きく、液面よりの水分の自然蒸発量が多いため、
入ってくる処理液量とバランスさせることが可能である
On the other hand, the liquid temperature in semi-bright nickel plating bath A and bright nickel plating bath B is high at around 50°C, the surface area of the bath is large, and the amount of natural evaporation of water from the liquid surface is large.
It is possible to balance the amount of incoming processing liquid.

もし、入ってくる処理液量よりも自然蒸発量の方が少な
い場合、例えば系外から供給する補給水洗水を増加させ
たときや、向流水洗槽の洗浄段数を減少させたことによ
る水洗水量の増加等の場合には、半光沢ニッケルめっき
浴Aへ返送する処理液を自然蒸発量と同量になるように
濃縮してやればよい。
If the amount of natural evaporation is less than the amount of incoming processing liquid, for example, the amount of washing water due to increasing the make-up washing water supplied from outside the system or reducing the number of washing stages in the countercurrent washing tank. In the case of an increase in nickel plating bath A, the treatment liquid to be returned to the semi-bright nickel plating bath A may be concentrated to the same amount as the natural evaporation amount.

その場合の濃縮方法としては、大気蒸発濃縮、真空蒸発
濃縮、イオン交換膜による電気透析、逆浸透などを利用
した濃縮装置14にて濃縮する。
In this case, concentration is performed using a concentrator 14 that uses atmospheric evaporation, vacuum evaporation, electrodialysis using an ion exchange membrane, reverse osmosis, or the like.

また、これらの濃縮手段において同時に回収される淡水
は、水洗水として再度利用することも可能である。
Moreover, the fresh water collected at the same time in these concentration means can be reused as washing water.

以上述べたように本発明によれば、固形粒子を懸濁させ
た多層ニッケルめっき工程の懸濁固形粒子を含むニッケ
ル含有水洗水を系外に排出することなく、有効適切に有
価成分を回収、再使用できて該工程を完全にクローズド
化し、排水処理設備等をも不要にすることができるもの
である。
As described above, according to the present invention, valuable components can be effectively and appropriately recovered without discharging nickel-containing washing water containing suspended solid particles from the multilayer nickel plating process in which solid particles are suspended. It can be reused, making the process completely closed and eliminating the need for wastewater treatment equipment.

次に、汲み出し量が] Ol/brで3槽の多段向流水
洗時における本発明の実施例を示す。
Next, an example of the present invention will be shown in which the pumping amount is [Ol/br] during multi-stage countercurrent water washing in three tanks.

第3水洗槽には100ノ/hr以下の水洗水を補給し、
この水洗水を第2水洗槽、第1水洗槽を経て貯槽へ送っ
たが、送られた液の組成はNi1Of!/L固形粒子2
.5g/11であった。
The third washing tank is supplied with washing water at a rate of 100 rpm or less,
This washing water was sent to the storage tank via the second washing tank and the first washing tank, but the composition of the sent liquid was Ni1Of! /L solid particles 2
.. It was 5g/11.

この液を限外沢過膜を装着したウルトラフィルターへ供
給した結果は、次表に示す通りであった。
This liquid was supplied to an ultrafilter equipped with an ultrafiltration membrane, and the results were as shown in the following table.

: 注SSは懸濁固形粒子 なお、上表中針槽のSS濃度が25 g/11となって
いるのは、濃縮液の一部を貯槽へ戻すことによる貯槽の
定常濃度を示したものであり、また供給液量とはウルト
ラフィルターへ供給された液量を示す。
Note: SS stands for suspended solid particles.The SS concentration in the needle tank in the table above is 25 g/11, which indicates the steady state concentration in the storage tank by returning a portion of the concentrate to the storage tank. Yes, and the amount of liquid supplied indicates the amount of liquid supplied to the ultra filter.

上表から明らかなように、透過液の組成はNi分はその
ままで、88分(懸濁固形粒子)は完全に除去された。
As is clear from the table above, the composition of the permeated liquid was such that the Ni content remained unchanged, and 88% (suspended solid particles) were completely removed.

また前述の如く水洗槽へ補給され、貯槽へ送られてくる
水洗水量は10M/brrキ1、7 l/m1n)程度
であり、それに対して透過液量(処理液量)は2A/m
inあるので、処理能力としては十分である。
In addition, as mentioned above, the amount of washing water supplied to the washing tank and sent to the storage tank is about 10M/brr, 7 l/m1n), whereas the amount of permeated liquid (processed liquid amount) is 2A/m2.
Since there is in, the processing capacity is sufficient.

なお、限外沢過膜透過液量は運転時間と共に膜面汚染に
より減少し、透過液量が流入する補給水洗欠量より少な
くなった時点で、フラッシングによる膜の物理的洗浄法
によって十分に性能を回復させることができた。
Note that the amount of permeate through the ultrasonic membrane decreases over time due to membrane surface contamination, and when the amount of permeate becomes less than the amount of make-up water flowing in, physical cleaning of the membrane by flushing can be used to ensure sufficient performance. was able to recover.

さらに、上記固形粒子が除去された透過液をダイヤイオ
ンWA30(弱塩基性陰イオン交換樹脂商品名)を充填
したカラム中に5V=5で通液したところ、流出液中に
は、添加剤は痕跡程度しか検出されず、はとんど樹脂に
吸着さへしかもニッケル塩およびホウ酸は全く減少しな
かった。
Furthermore, when the permeate from which the solid particles had been removed was passed through a column filled with Diaion WA30 (trade name of a weakly basic anion exchange resin) at 5V=5, no additives were found in the effluent. Only traces were detected, and most of the nickel salts and boric acid were adsorbed to the resin, and nickel salts and boric acid were not reduced at all.

かかるイオン交換処理の流出液が樹脂容量の約250倍
に達したとき、流出液中には対原液3係の添加剤が漏洩
してきた。
When the effluent from the ion exchange treatment reached approximately 250 times the resin capacity, the third additive relative to the stock solution leaked into the effluent.

それまでに流出した液をすべて一ケ所に集め、各成分の
濃度を分析した結果は下表の通りであった。
All the liquid that had flowed up to that point was collected in one place and the concentration of each component was analyzed, and the results are shown in the table below.

この処理液は、そのまま半光沢ニッケルめっき浴へ戻す
ことができた。
This treatment solution could be directly returned to the semi-bright nickel plating bath.

なお、イオン交換樹脂の再生処理を10係苛性ソーダお
よび5係硫酸で行ない、再度使用したが、樹脂の吸着能
力はほぼ完全に再現された。
The ion exchange resin was regenerated with 10% caustic soda and 5% sulfuric acid and used again, but the adsorption capacity of the resin was almost completely reproduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、一般の固形粒子を懸濁させた多層ニッケルめ
っき工程の系統説明図で、第2図は本発明の一実施態様
を示す系統説明図である。 M:被めっき物、A;半光沢ニッケルメッキ浴、B;光
沢ニッケルめっき浴、C;固形粒子懸濁ニッケルめっき
浴、Do、D2.D3;水洗槽、E;クロムめっき浴、
1;貯槽、3;ウルトラフィルター、5;貯槽、10;
イオン交換樹脂塔、12;処理液貯槽、14;濃縮装置
FIG. 1 is a system explanatory diagram of a multilayer nickel plating process in which solid particles are suspended in general, and FIG. 2 is a system explanatory diagram showing one embodiment of the present invention. M: object to be plated, A: semi-bright nickel plating bath, B: bright nickel plating bath, C: solid particle suspension nickel plating bath, Do, D2. D3: Washing tank, E: Chrome plating bath,
1; storage tank, 3; ultra filter, 5; storage tank, 10;
Ion exchange resin tower, 12; treated liquid storage tank, 14; concentrator.

Claims (1)

【特許請求の範囲】[Claims] 1 第一段を半光沢ニッケルめっき浴、第二段を光沢め
っき浴、第三段を固形粒子懸濁ニッケルめっき浴よりな
る固形粒子を懸濁させた多層ニッケルめっき工程におい
て、懸濁固形粒子を含むニッケル含有水洗排水を加圧下
にマイクロポーラス膜ないし限外濾過膜に通水して固形
粒子を除去する一方、膜透過水をイオン交換樹脂に接触
せしめて該水中の光沢剤を吸着除去したのち、そのまま
あるいは濃縮して前記多層ニッケルめっき工程中の半光
沢ニッケルめっき浴又は光沢ニッケルめっき浴に返送す
ることを特徴とする固形粒子を懸濁させた多層ニッケル
めっき工程のクローズドシステム化方法。
1 In a multilayer nickel plating process in which solid particles are suspended, the first stage is a semi-bright nickel plating bath, the second stage is a bright plating bath, and the third stage is a solid particle suspended nickel plating bath. The nickel-containing washing waste water is passed under pressure through a microporous membrane or an ultrafiltration membrane to remove solid particles, while the membrane-permeated water is brought into contact with an ion exchange resin to adsorb and remove the brightener in the water. A closed system method for a multilayer nickel plating process in which solid particles are suspended, characterized in that the solid particles are returned as is or after being concentrated to a semi-bright nickel plating bath or a bright nickel plating bath in the multilayer nickel plating process.
JP50068014A 1975-06-05 1975-06-05 Closed System Expired JPS5824515B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50068014A JPS5824515B2 (en) 1975-06-05 1975-06-05 Closed System

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50068014A JPS5824515B2 (en) 1975-06-05 1975-06-05 Closed System

Publications (2)

Publication Number Publication Date
JPS51143532A JPS51143532A (en) 1976-12-09
JPS5824515B2 true JPS5824515B2 (en) 1983-05-21

Family

ID=13361544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50068014A Expired JPS5824515B2 (en) 1975-06-05 1975-06-05 Closed System

Country Status (1)

Country Link
JP (1) JPS5824515B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1056222A (en) * 1963-01-09 1967-01-25 Res Holland Nv A process for obtaining composite high lustre-nickel/chromium coatings, and objects coated by this process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1056222A (en) * 1963-01-09 1967-01-25 Res Holland Nv A process for obtaining composite high lustre-nickel/chromium coatings, and objects coated by this process

Also Published As

Publication number Publication date
JPS51143532A (en) 1976-12-09

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