JPS58225693A - Photocomposing method - Google Patents

Photocomposing method

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Publication number
JPS58225693A
JPS58225693A JP10754982A JP10754982A JPS58225693A JP S58225693 A JPS58225693 A JP S58225693A JP 10754982 A JP10754982 A JP 10754982A JP 10754982 A JP10754982 A JP 10754982A JP S58225693 A JPS58225693 A JP S58225693A
Authority
JP
Japan
Prior art keywords
photosensitive layer
film
transparent film
plate
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10754982A
Other languages
Japanese (ja)
Inventor
小沢 宏
小原 芳昭
細野 洋一
勝好 笹川
雅夫 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP10754982A priority Critical patent/JPS58225693A/en
Publication of JPS58225693A publication Critical patent/JPS58225693A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 オフセット印刷用の製版方法に関する。[Detailed description of the invention] This invention relates to a plate-making method for offset printing.

従来のオフセット印刷用製版方法においては。In the conventional plate-making method for offset printing.

文字,画像等をレイアウトし,写真法によって原画を構
成してフォトマスク等を作り,紫外線等で露光を行うこ
とによって製版する感光性樹脂製版が広く用いらhてい
る。近年は,製版速度のスピードアツブやコンビユータ
ーによる自動レイアウトに対応した製版技術として,写
真法に代って電送される情報,記憶装置に貯蔵された情
報等を直接レーザーの光信号に変換し,そのレーザー光
によって製版を行うレーザー製版技術に対する関心が高
まっている。しかしながら、レーザー光の照射によって
画線部,非画線部のパターン化を行う際のレーザー光に
対する印版材料の感度は必ずしも十分ではなく,その改
善が要望されている。
Photosensitive resin plate making is widely used, in which characters, images, etc. are laid out, an original picture is constructed using a photographic method, a photomask or the like is made, and the plate is made by exposing it to ultraviolet light or the like. In recent years, as a plate-making technology that is compatible with speed increases in plate-making speed and automatic layout using computer computers, in place of photography, information transmitted electronically and information stored in storage devices is directly converted into laser optical signals. There is increasing interest in laser plate making technology that performs plate making using laser light. However, when patterning image areas and non-image areas by irradiation with laser light, the sensitivity of printing plate materials to laser light is not necessarily sufficient, and there is a need for improvement.

本発明者等は,上記要望に答えるべく鋭意検討の結果,
可視又は近赤外線レーザーを用いた簡便なオフセット印
刷用の製版方法を発見し,本発明に到達した。
The inventors of the present invention have conducted extensive studies to meet the above requirements.
We have discovered a simple plate-making method for offset printing using visible or near-infrared lasers, and have arrived at the present invention.

すなわち、本発明は乙00〜/.200nmの可視光線
又は近赤外線領域に極大吸収を有する感光剤と熱溶融可
能な樹脂とからなる感光層を透明なフイルム−にに形成
し,水にぬれた際にインキ非受客層となる印版支持体と
圧着後、透明なフィルムを通して発振波長が乙0θ〜/
、200nmの可視又は近赤外線レーザー光を照射する
ことによって。
That is, the present invention is applicable to Otsu00~/. A printing plate in which a photosensitive layer consisting of a photosensitive agent that has maximum absorption in the visible light of 200 nm or in the near-infrared region and a heat-meltable resin is formed on a transparent film, and becomes a non-ink receiving layer when wet with water. After bonding with the support, the oscillation wavelength is 0θ~/ through the transparent film.
, by irradiation with 200 nm visible or near-infrared laser light.

感光層の照射部分を熱溶融させて支持体に転写ぜしめた
後、非照射部分を透明なフィルムと共にはく離して除去
することからなる製版方法である。
This is a plate-making method that consists of thermally melting the irradiated portion of the photosensitive layer and transferring it to a support, and then peeling off and removing the non-irradiated portion along with the transparent film.

本発明に用いられる感光剤は乙00〜ノ、200nmの
波長に極大吸収を有する化合物で1分子吸光係数が極大
吸収波長において10000以上のものが好ましく、大
別してS種類、すなわち芳香族ジアミン金属錯体、脂肪
属ジアミン金属錯体。
The photosensitizer used in the present invention is preferably a compound having maximum absorption at a wavelength of 00 to 200 nm, and has a single molecule extinction coefficient of 10,000 or more at the maximum absorption wavelength, and is roughly classified into S types, that is, aromatic diamine metal complexes. , aliphatic diamine metal complexes.

芳香族ジチオール金属錯体、脂肪族ジチオール金属錯体
及びメルカプトフェノール金属錯体等を用いることがで
きる。
Aromatic dithiol metal complexes, aliphatic dithiol metal complexes, mercaptophenol metal complexes, and the like can be used.

芳香族ジアミン系金属錯体は、一般式(■)C式中、X
は水素、アルキル基、置換アルキル基。
The aromatic diamine metal complex has the general formula (■) C, where X
is hydrogen, alkyl group, substituted alkyl group.

ハロゲン基、ニトロ基をInは/−4の整数を。For halogen groups and nitro groups, In is an integer of /-4.

M [=ツケル、コバルト、パラジウム、白金ヲ表わす
)で示される化合物で、そのうち特にビス(q−クロロ
−O−フェニレンジアミノ)ニッケル(吸収極太 入m
ax gθQ n m 、モル比吸光係数ε乙乙乙00
)及びビス(グーメチル−〇−フェニレンジ了ミノ)ニ
ッケル(入maX 7951m lε5sioo)が合
成が容易で、樹脂との相溶性がすぐれているので好まし
い。
M is a compound represented by nickel, cobalt, palladium, platinum), among which bis(q-chloro-O-phenylenediamino)nickel (extremely absorbent)
ax gθQ n m, molar specific extinction coefficient ε Otsu Otsu 00
) and bis(gumethyl-〇-phenylenedimethylamino)nickel (containing maX 7951mlε5sioo) are preferred because they are easy to synthesize and have excellent compatibility with resins.

脂肪族ジアミノ系金属錯体ば、一般式(■)C式中、Y
は水素、アルキル基、フェニル基、シアン基を、Mはニ
ッケル、コバルト、パラジウム。
For aliphatic diamino metal complexes, general formula (■) C, where Y
is hydrogen, alkyl group, phenyl group, cyan group, M is nickel, cobalt, palladium.

白金を表わす)で示される化合物で、そのうち特にビス
(ジイミノサクシノニトリロ)白金(入max l ’
IQ ++m 、  ε32θ00)及びビ、<(ジイ
ミノザクジノニトリロ)ニッケル(入max 700 
  .1n m 、ε、23!;00)が合成が容易で
、樹脂との相溶性がすぐれているので好ましい。
A compound represented by platinum (representing platinum), especially bis(diiminosuccinonitrilo)platinum (representing max l'
IQ ++m, ε32θ00) and Bi, <(diiminozakudinonitrilo)nickel (input max 700
.. 1n m, ε, 23! ;00) is preferred because it is easy to synthesize and has excellent compatibility with resins.

芳香族ジチオール系金属錯体は、一般式(III)0式
中、Zは水素、アルギル基、ハロゲン基を。
The aromatic dithiol metal complex has the general formula (III)0, where Z is hydrogen, an argyl group, or a halogen group.

nは7〜グの整数を1Mはニッケル、コバルト。n is an integer from 7 to 1M is nickel or cobalt.

パラジウム、白金を、 nlは一ノ又は−一の整数を。Palladium, platinum, nl is an integer of 1 or -1.

Aはmが−lのときは7価のカチオンを、Inが一一の
ときはΩ価のカチオンを表わす)で示される化合物で、
そのうち特にビス(/−メチル−3゜グージチオフェル
レート)ニッケル(II)テトラ−n−ブチルアンモニ
ウム(入maxgqOnm、ε/fり270)及びビス
(/、、2,3.グーテトラクロロ−s、b−ジチオフ
ェルレート)ニッケル(■)テトラ−n−ブチルアンモ
ニウム(入maxgg3nm、  ε/左700)が合
成が容易で、樹脂との相溶性がすぐれているので好まし
い。
A is a compound represented by (when m is -l, it represents a 7-valent cation; when In is 1, it represents an Ω-valent cation),
Among them, especially bis(/-methyl-3°goutithioferrate)nickel(II)tetra-n-butylammonium (maxgqOnm, ε/f 270) and bis(/, 2,3.gutetrachloro-s). , b-dithioferrate) nickel (■) tetra-n-butylammonium (input max 3 nm, ε/left 700) is preferred because it is easy to synthesize and has excellent compatibility with the resin.

脂肪族ジチオール系金属錯体は、一般式(IV)(式中
、Eは水素、アルキル基、フェニル基を。
The aliphatic dithiol-based metal complex has the general formula (IV) (wherein E represents hydrogen, an alkyl group, or a phenyl group.

Mはニッケル、コバルト、パラジウム、白金を表わす)
で示される化合物で、そのうち特にビス〔シスー/、2
−ビス(p−メトキシフェニル)エチレン−/、2−ジ
チオレート〕ニッケル(入max q、2onm 、e
3sooo)及びビス(シスー/、、2−ビスフェニル
エチレン−/、、:l−ジチオレート)白金(入max
 g QQ nm 、  t3/乙00)が合成が容易
で、樹脂との相溶性がすぐれているので好ましい。
M represents nickel, cobalt, palladium, platinum)
A compound represented by, among which bis[cis/,2
-bis(p-methoxyphenyl)ethylene-/,2-dithiolate]nickel (max q, 2onm, e
3sooo) and bis(cis/, 2-bisphenylethylene-/, , :l-dithiolate)platinum (max.
g QQ nm, t3/Otsu00) is preferred because it is easy to synthesize and has excellent compatibility with resins.

メルカプトフェノール系金属錯体は、一般式c式中、q
は水素、アルキル基、ハロゲン基を。
The mercaptophenol metal complex has the general formula c, q
is hydrogen, alkyl group, and halogen group.

M[ニッケル、コバルト、パラジウム、白金を。M [nickel, cobalt, palladium, platinum.

mは−)又は−一の整数を、Aけmが一/のときけ7価
のカチオンを1mが−Ωのときは2価のカチオンを表わ
す)で示される化合物で、そのうち特rCビス(/−メ
ルカプトーコーナフトレート)ニッケル(II)テトラ
−n−ブチルアンモニウム(入max / /θQnm
 、e /、22900)及びビス(/−メルカプトー
コーフェル−ト)ニッケル(■)テトラ−n−ブチルア
ンモニウム(入maX10.2左nm、  ε/270
0)が合成が容易で。
When m is -) or an integer of -1, when m is 1/1, it represents a heptavalent cation; when 1m is -Ω, it represents a divalent cation), and among them, especially rC bis ( /-mercaptoconaphthlate)nickel(II)tetra-n-butylammonium (max. / /θQnm
, e /, 22900) and bis(/-mercaptocofert) nickel (■) tetra-n-butylammonium (in maX10.2 left nm, ε/270
0) is easy to synthesize.

樹脂との相溶性がすぐれているので好ましい。It is preferred because it has excellent compatibility with the resin.

本発明に用いる熱溶融可能な樹脂は、上記の感光剤と混
合して使用されるが、一般には慣用の熱可塑性樹脂又は
若干の架橋の行われた樹脂であれば、原理的r(d−い
ずれも使用可能である。しかしなから、オフセット印刷
の際にインキによって侵されないことが必要で、レーザ
ー介照射時に熱硬化反応で硬化させたり、印版支持体に
転写後に加熱又は紫外線などticよって架橋させたシ
することができる。jl、体的には2例えばアクリル酸
エステル共重合体、ポリスチレン、酢酸ビニル共重合樹
脂、天然ゴム、ポリブテン、ポリブタジェン、ポリイソ
プレン、SBR,NBH,、アルキッド樹脂。
The heat-meltable resin used in the present invention is used in combination with the above-mentioned photosensitizer, but in general, any conventional thermoplastic resin or slightly crosslinked resin can be used, based on the principle r(d- Either of these can be used. However, it is necessary that the ink does not attack during offset printing, so it is necessary to cure it by a thermosetting reaction during laser irradiation, or to apply heat or ultraviolet rays after transferring it to the printing plate support. It can be cross-linked. Examples include acrylic ester copolymers, polystyrene, vinyl acetate copolymer resins, natural rubber, polybutene, polybutadiene, polyisoprene, SBR, NBH, and alkyd resins.

ポリエステル樹脂、ポリウレタン樹脂、エポキシ樹脂、
酢酸セルロース樹脂等加熱により熱溶融する高分子樹脂
が用いられ、更に架橋剤となるアミノボルムアルデヒド
樹脂、多価ビニル樹脂、イソシアネートオリゴマー等の
樹脂成分を併用するとともできる。
polyester resin, polyurethane resin, epoxy resin,
A polymer resin that melts when heated, such as a cellulose acetate resin, is used, and a resin component such as an aminoformaldehyde resin, a polyvalent vinyl resin, or an isocyanate oligomer, which serves as a crosslinking agent, may be used in combination.

上記の感光剤及び樹脂成分は1通常有機溶剤に溶解した
後、透明なフィルム上に塗布し、乾燥によって溶剤を除
去して、一般に厚み3〜30μの    □“感光層が
形成されるが、上記の感光剤及び樹脂成分を溶融混合し
て押出法でフィルムとした後に透明フィルムとの複層に
することもできる。
The above photosensitizer and resin components are usually dissolved in an organic solvent, then coated on a transparent film, and the solvent is removed by drying to form a photosensitive layer with a thickness of generally 3 to 30 μm. It is also possible to melt-mix the photosensitizer and resin component, form a film by extrusion, and then form a multilayer film with a transparent film.

本発明に用いる透明なフィルムはレーザー光を透過スる
平滑なフィルムで1例えばポリエステルフィルム、酢酸
セルロースフィルム、ポリエチレンフィルム、ポリプロ
ピレンフィルム、ポリカーボネートフィルム、塩化ビニ
ルフィルム、塩化ビニリデンフィルム、ポリアクリル酸
エステルフィルムなどがあげられる。本発明の方法にお
いては。
The transparent film used in the present invention is a smooth film that transmits laser light, such as polyester film, cellulose acetate film, polyethylene film, polypropylene film, polycarbonate film, vinyl chloride film, vinylidene chloride film, polyacrylic acid ester film, etc. can be given. In the method of the invention.

レーザー光の照射された感光層を上記シート状の支持体
に転写して、感光層の非照射部を上記透明フィルムと共
にはく離除去する際の感光層と透明フィルム間の接着力
をコントロールするために。
In order to control the adhesive force between the photosensitive layer and the transparent film when the photosensitive layer irradiated with laser light is transferred to the sheet-like support and the non-irradiated area of the photosensitive layer is peeled off together with the transparent film. .

接着力の増強に寄与する粘着用樹脂組成物又は逆に接着
力の低下に寄与するシリコーン系の離型性付与組成物等
を塗布した透明なフィルムを用いることもできる。
It is also possible to use a transparent film coated with an adhesive resin composition that contributes to increasing adhesive strength, or a silicone-based release property imparting composition that conversely contributes to decreasing adhesive strength.

本発明に使用する上記感光層を転写する印版支持体は、
浸し水でぬらした際に水を吸着してオフセット用印刷イ
ンキの非受容層となるアルミ板。
The printing plate support used in the present invention to which the photosensitive layer is transferred is as follows:
An aluminum plate that absorbs water when wet with soaking water and becomes a non-receptive layer for offset printing ink.

アルマイト処理板が最も一般的であるが、金属。Metal, although anodized plates are the most common.

プラスチック、紙等を親水性樹脂で処理した材料も用い
られ、形状は通常シート状又は円筒状である。
Materials such as plastic and paper treated with hydrophilic resin are also used, and the shape is usually sheet-like or cylindrical.

上記印版支持体は感光層を有する透明フィルムの感光層
面と真空吸引又はラミネーターで圧着して、透明フィル
ムを通してレーザー光を露光する。
The printing plate support is pressed against the photosensitive layer surface of a transparent film having a photosensitive layer using vacuum suction or a laminator, and the transparent film is exposed to laser light.

本発明に用いるレーザーは、toθ〜/、2θOnmの
発振波長を放出する可視又は近赤外線レーザーであって
1例えば各種の半導体レーザー、ヘリウム・ネオンレー
ザ−1YAGレーザー等が用いられる。レーザー光は、
電送された情報や貯蔵された情報を電気信号からレーザ
ー光信号に変換し1画線部に対応するレーザー光を光学
的に通常7〜70θμのスポットビームに絞って走査し
The laser used in the present invention is a visible or near-infrared laser that emits an oscillation wavelength of to[theta]~/2[theta] Onm, such as various semiconductor lasers, helium/neon lasers, YAG lasers, and the like. The laser light is
Transmitted information or stored information is converted from electrical signals to laser light signals, and the laser light corresponding to one drawing area is optically narrowed down to a spot beam of usually 7 to 70 θμ and scanned.

透明フィルムを通して感光層を照射する。レーザー光を
照射された部分は、感光剤がレーザー光線を吸収して急
速に発熱するため、レーザー光線照射部分の感光層温度
は瞬間的に100〜5000に達して感光層中の樹脂は
溶融し、印版支持体のレーザー光叩射部のみが融着する
。通當、レーザ−光照射直後に加圧ロール等を用いて感
光層面と印版支持体を圧着した後、感光層を有する透明
フィルムを印版支持体からはがすと、レーザー光の照射
された感光層部分のみが印版支持体面に転写されてオフ
セット印刷用版が得られる。
The photosensitive layer is irradiated through a transparent film. In the area irradiated with the laser beam, the photosensitizer absorbs the laser beam and rapidly generates heat, so the temperature of the photosensitive layer in the area irradiated with the laser beam instantly reaches 100 to 5,000 degrees Celsius, and the resin in the photosensitive layer melts, making the print. Only the portion of the plate support that is hit by the laser beam is fused. Generally, immediately after laser light irradiation, the photosensitive layer surface and the printing plate support are pressed together using a pressure roll or the like, and then when the transparent film having the photosensitive layer is peeled off from the printing plate support, the photosensitive layer irradiated with the laser light is removed. Only the layer portions are transferred to the surface of the printing plate support to obtain an offset printing plate.

このような本発明の製版方法が精度よく達成されるため
には、上記の透明フィルム、感光層及び感光層が転射さ
れる印版支持体間に次の接着力関係の成立することが望
ましい。
In order to achieve the plate-making method of the present invention with high accuracy, it is desirable that the following adhesive force relationship be established between the transparent film, the photosensitive layer, and the printing plate support to which the photosensitive layer is transferred. .

f】(A、B)  レーザー光未照射部分の透明フィル
ムと感光層の接着力 fl(BC)  レーザー光未照射部分の感光層とシー
ト状支持体の接着力 fz(Al1)  レーザー光照射部分の透明フィルム
と感光層の接着力 fz(BC)  レーザー光照射部分の感光層とシート
状支持体の接着力 fl(AB)  >  fl(BC) fz(Al1)   <    fz(BC)このよう
な接着力のバランスを調整するために。
f] (A, B) Adhesive force fl between the transparent film and the photosensitive layer in the area not irradiated with the laser beam fl (BC) Adhesive force fz between the photosensitive layer and the sheet support in the area not irradiated with the laser beam fz (Al1) In the area irradiated with the laser beam Adhesive force between the transparent film and the photosensitive layer fz (BC) Adhesive force between the photosensitive layer in the laser beam irradiated area and the sheet support fl (AB) > fl (BC) fz (Al1) < fz (BC) Such adhesive force to adjust the balance.

前述したような透明なフィルム材料、感光層用樹脂成分
及びシート状支持体を適宜糾合せて選択使用する。更に
、感光層の転射さfまた印版支持体を加熱したり、紫外
線、電子線、赤外線、マイクロウェーブ等を照射して感
光層に架橋反応を起させ。
The transparent film material, the resin component for the photosensitive layer, and the sheet-like support as described above are appropriately combined and used. Further, the transfer of the photosensitive layer or the printing plate support is heated or irradiated with ultraviolet rays, electron beams, infrared rays, microwaves, etc. to cause a crosslinking reaction in the photosensitive layer.

インク受容層となる感光層の強度を高めることも好まし
い。
It is also preferable to increase the strength of the photosensitive layer that becomes the ink-receiving layer.

上記の方法r(よって製版さhたオフセット版は。The above method r (thus, the offset plate made by plate making is.

慣用のオフセット用印刷機を用いて通常の操作方法でオ
フセット印刷することによって1画線部。
1 line by offset printing using a conventional offset printing machine in the normal operating manner.

非画線部の境界が鮮明で、地汚れのない良質な印刷物を
得ることができる。
It is possible to obtain high-quality printed matter with clear boundaries in non-image areas and no background stains.

以下、実施例によって本発明の製版方法を具体的に説明
する。
Hereinafter, the plate-making method of the present invention will be specifically explained with reference to Examples.

実施例/ 厚みS0μのポリエステルフィルム上に、メタクリル酸
メチルとアクリル酸エチル共重合体の30%メチルエチ
ルケトン溶液100 fとビス    □IC/、2,
3.グーテトラクロロ−3,乙−ジチオフェルレート)
ニッケル(II)テトラ−n−ブチルアンモニウム(入
max g g 5 n rn ) 3 fとを混合溶
解した溶液をリバースロールコータ−で塗布し、go’
aで、20分間加熱して溶剤を除去し、JワみSμの感
光層を形成した。
Example/ On a polyester film with a thickness of S0μ, 100 f of a 30% methyl ethyl ketone solution of methyl methacrylate and ethyl acrylate copolymer and bis □IC/, 2,
3. Gutetrachloro-3, O-dithioferlate)
A solution prepared by mixing and dissolving nickel (II) tetra-n-butylammonium (input max g g 5 n rn ) 3 f was applied using a reverse roll coater, and go'
In step (a), the solvent was removed by heating for 20 minutes to form a photosensitive layer of J warp Sμ.

この感光層を有するポリエステルフィルムを厚みθ、2
朋のアルマイト板と重ねて(感光層面とアルマイト板が
接触するように)1貫空吸引して密着させ、ボ11エス
テルフイルムーヒからアルミニウムーガリウム−砒素系
半導体レーザー(発振波長g 3 Q n rn 、出
カフ0mW)を光学的r(絞って直径、!θμのスポッ
トビームで走査した後アルマイト板からポリエステルフ
ィルムをはく離した。感光層のレーザー光照射部はアル
マイトに転写され。
The thickness of the polyester film having this photosensitive layer is θ, 2
Layer it on my friend's alumite plate (so that the photosensitive layer surface and the alumite plate are in contact), apply suction through the air, and make a close contact. rn, output cuff 0 mW) was scanned with an optical r (diameter, !θμ) spot beam, and then the polyester film was peeled off from the alumite plate. The laser beam irradiated portion of the photosensitive layer was transferred to the alumite.

非照射部はポリエステルフィルムと共にはく離された印
刷版が得られた。
A printing plate was obtained in which the non-irradiated area was peeled off together with the polyester film.

この印刷版を通常のオフセット輪転機にとりつけ、浸し
水を用いてオフセット印刷を行ったところ、地かぶりの
ない鮮明な画線部を有する印刷物が得られた。
When this printing plate was attached to an ordinary offset rotary press and offset printing was performed using soaking water, a printed matter with clear image areas without background fog was obtained.

実施例λ ヒドロキシル基含有ポリエステル樹脂30 # 。Example λ Hydroxyl group-containing polyester resin 30#.

ブチル化メチロールメラミン樹脂の50%ブタノール溶
液、!Ot及びビス(イミノサクシノニトリロ)白金(
入max l ’i Q n m )の感光剤3iをト
ルエン3乙を及びテトラヒドロフラン36tの溶剤に溶
解し、この溶液を厚み夕0μの架橋ポリエチレンフィル
ム上[+1バースロールコータ−で塗布し1g00で3
θ分間乾燥、溶媒を除去して厚み7μの感光層を形成し
た。
A 50% butanol solution of butylated methylolmelamine resin! Ot and bis(iminosuccinonitrilo)platinum (
A photosensitive agent 3i containing max l'i Qnm) was dissolved in a solvent of 3 toluene and 36 tons of tetrahydrofuran, and this solution was coated on a cross-linked polyethylene film with a thickness of 0 μ using a bath roll coater and coated with 1 g of 3
After drying for θ minutes, the solvent was removed to form a photosensitive layer with a thickness of 7 μm.

この感光層を有する架橋ポリエチレンフィルムを厚みθ
、2朋のアルマイト板と重ねて(感光層とアルマイト板
が接触するように)、真空吸引して密着させ、架橋ポリ
エチレンフィルム上からヘリウム・ネオンレーザ−(発
振波長乙、33 n m 、出力/ □ m W )を
光学的に絞って直径、20μのスポットビームで走査し
た後、アルマイト板からポリエチレンフィルムをはぐ離
した。感光層のレーザー光照射部はアルマイトに転写さ
れ、非照射部はポリエチレンフィルムと共にはく離され
た。この感光層の転写されたアルマイト板を熱風乾燥機
内で/ 5 Q ’Oに30分間加熱して、感光層の架
橋さhた印刷版を得た。
The thickness of the crosslinked polyethylene film having this photosensitive layer is θ
, and two alumite plates (so that the photosensitive layer and the alumite plate are in contact with each other), vacuum suction is applied to bring them into close contact, and a helium-neon laser (oscillation wavelength 33 nm, output / □ m W ) was optically focused and scanned with a spot beam having a diameter of 20 μm, and then the polyethylene film was peeled off from the alumite plate. The laser beam irradiated areas of the photosensitive layer were transferred to the alumite, and the non-irradiated areas were peeled off together with the polyethylene film. The alumite plate on which the photosensitive layer was transferred was heated in a hot air dryer to /5Q'O for 30 minutes to obtain a printing plate with the photosensitive layer crosslinked.

この印刷版を通常のオフセット輪転機にとりつけ、浸し
水を用いてオフセット印刷を行ったところ、地かぶりの
ない鮮明な画線部を有する印刷物か得られた。
When this printing plate was attached to an ordinary offset rotary press and offset printing was performed using soaking water, a printed matter with clear image areas without background fog was obtained.

実施例3 アクリル酸エチル−スチレン共TE 合体30 # 。Example 3 Ethyl acrylate-styrene co-TE combination 30#.

トリメチロールプロパントリアクリレートsit。Trimethylolpropane triacrylate sit.

ベンツインエチルエーテル0.!;f及(jビスC)−
メルカプト−2−ナフトレート)ニッケル(II)テト
ラ−n−ブチルアンモニウム(入max / / 00
龍m)の感光剤31をエチレングリコールモノメチルエ
ーテル乙02に溶解し、この溶液を離型性ンリコーン被
膜を塗布した厚み30μのポリカーボネートフィルム上
にリバースロールコータ−で塗布し、/θ0Cで30分
間乾燥、溶媒を除去して厚み3 ltの感光層を形成し
た。
Benzine ethyl ether 0. ! ;f and (j bis C)-
Mercapto-2-naphtholate) Nickel(II) Tetra-n-butylammonium (max. / / 00
Photosensitizer 31 of Ryu M) was dissolved in ethylene glycol monomethyl ether Otsu 02, and this solution was coated with a reverse roll coater on a 30μ thick polycarbonate film coated with a releasable silicone film, and dried at /θ0C for 30 minutes. , the solvent was removed to form a photosensitive layer with a thickness of 3 lt.

この感光層を有す乙ポリカーボネートフィルムを厚み0
.2龍のアルマイト板と重ねて(感光層とアルマイト板
が接触するように)、真空吸引して密着させ、ポリカー
ボネートフィルム上からYAGレーザ−(発振波長10
乙Q n m 、出力/QmW)を光学的に絞って直径
20μのスポットビームで走査し、た後、アルマイト板
からポリカーボネートフィルムをはぐ離した。感光層の
レーザー光照射部はアルマイトに転射され、非照射部は
ポリカーボネートフィルムと共にはく離された。この感
光層の転写さねたアルマイト板をgOW/c1nの高圧
水銀燈下を通して紫外線露光し、感光層を光硬化させた
印刷版を得た。
The polycarbonate film with this photosensitive layer is made into a film with a thickness of 0.
.. Layer the alumite plate of 2 Dragons (so that the photosensitive layer and the alumite plate are in contact), apply vacuum suction to bring them into close contact, and apply a YAG laser (oscillation wavelength 10) over the polycarbonate film.
The polycarbonate film was peeled off from the alumite plate after scanning with a spot beam having a diameter of 20 μm by optically focusing the beam (Q n m , output/QmW). The laser beam irradiated areas of the photosensitive layer were transferred to alumite, and the non-irradiated areas were peeled off together with the polycarbonate film. The alumite plate on which the photosensitive layer had been transferred was exposed to ultraviolet light by passing it under a gOW/c1n high-pressure mercury lamp to obtain a printing plate in which the photosensitive layer was photocured.

この印刷版を実施例1と同様にしてオフセット印刷に用
い、地かぷシのない鮮明な画線部を有する印刷物を得た
This printing plate was used for offset printing in the same manner as in Example 1 to obtain printed matter having clear image areas without background blemishes.

特許出願人 三井東圧化学株式会社patent applicant Mitsui Toatsu Chemical Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)AOθ〜ノ、20θnmの可視光線又は近赤外線
波長領域に極大吸収を有する感光剤と熱溶融可能な樹脂
からなる感光層を透明なフィルム上に形成し、水にぬれ
た際にインク非受容層となる印版支持体と圧着後、前記
透明なフィルムを通して発振波長が乙OO〜/ 、20
Q+1mの可視又は近赤外線レーザー光を照射するとと
によって、感光層の照射部分を熱溶融させて支持体に転
写せしめた後、非照射部分を透明なフィルムと共にはく
離、除去することを特徴とする製版方法。
(1) A photosensitive layer consisting of a photosensitizer that has maximum absorption in the visible light or near infrared wavelength region of AOθ~20θnm and a heat-meltable resin is formed on a transparent film, and when it gets wet with water, the ink does not disappear. After being pressure-bonded to the printing plate support that will become the receiving layer, the oscillation wavelength is 0~/, 20 through the transparent film.
A plate making process characterized by irradiating visible or near-infrared laser light of Q+1m to thermally melt the irradiated part of the photosensitive layer and transferring it to a support, and then peeling off and removing the non-irradiated part together with a transparent film. Method.
JP10754982A 1982-06-24 1982-06-24 Photocomposing method Pending JPS58225693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10754982A JPS58225693A (en) 1982-06-24 1982-06-24 Photocomposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10754982A JPS58225693A (en) 1982-06-24 1982-06-24 Photocomposing method

Publications (1)

Publication Number Publication Date
JPS58225693A true JPS58225693A (en) 1983-12-27

Family

ID=14461995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10754982A Pending JPS58225693A (en) 1982-06-24 1982-06-24 Photocomposing method

Country Status (1)

Country Link
JP (1) JPS58225693A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50102402A (en) * 1974-01-17 1975-08-13
JPS5129949A (en) * 1974-09-06 1976-03-13 Teijin Ltd HANSOBOBIN NOSHIKIBETSUHOHO
JPS54143303A (en) * 1978-04-28 1979-11-08 Nippon Telegraph & Telephone Method of making printing plate by thermal copying
JPS5711090A (en) * 1980-06-26 1982-01-20 Mitsui Toatsu Chem Inc Laser beam recording-reading medium

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50102402A (en) * 1974-01-17 1975-08-13
JPS5129949A (en) * 1974-09-06 1976-03-13 Teijin Ltd HANSOBOBIN NOSHIKIBETSUHOHO
JPS54143303A (en) * 1978-04-28 1979-11-08 Nippon Telegraph & Telephone Method of making printing plate by thermal copying
JPS5711090A (en) * 1980-06-26 1982-01-20 Mitsui Toatsu Chem Inc Laser beam recording-reading medium

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