JPS58193236U

JPS58193236U - One-tank embedding equipment processing tank lid

Info

Publication number: JPS58193236U
Application number: JP9088482U
Authority: JP
Inventors: 池内　久夫
Original assignee: 株式会社千代田製作所
Priority date: 1982-06-19
Filing date: 1982-06-19
Publication date: 1983-12-22
Also published as: JPS6344769Y2

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Brief explanation of drawings]

第１図は一槽式包埋装置の概要を説明する略図、第２〜
３図は従来の液滴流出防止装置を示し、第２図は開蓋状
態における蓋の内面図、第３図は第２図のＡ−Ａ断面図
、第４〜６図はこの考案の第一実施例を示し、第４図は
第２図同様の蓋の内面図、第５図は第４図のＢ−Ｂ断面
図、第６図は第５図のＣ−Ｃ断面図、第７〜８図はこの
考案の第二例を示し、第７図は第４図同様の蓋の縦断面
図、第８図は第７図のＤ−Ｄ断面図である。１：切換弁、２：真空ポンプ、３：フィルタ、４：処理
槽、４ａ：蓋、４ｂ：蝶番、４Ｃ：本体、５：ロータリ
切換弁、＄ａ、　　（５ｂ、　　６Ｃ：薬液槽、７：籠
、８゜９：ヒータ、１０：樋、１１：切欠き、１２：傾
斜板、１３：バッキング、１４：隙間、１５：溝、１７
：凹部、１８：突縁、１８ａ：内面、１９：室、２０：
抑え板。Figure 1 is a schematic diagram explaining the outline of the single-tank embedding device, Figure 2-
Fig. 3 shows a conventional droplet outflow prevention device, Fig. 2 is an inner view of the lid in an open state, Fig. 3 is a sectional view taken along line A-A in Fig. 2, and Figs. Fig. 4 is an inner view of the lid similar to Fig. 2, Fig. 5 is a sectional view taken along line B-B in Fig. 4, Fig. 6 is a sectional view taken along line C-C in Fig. 5, and Fig. 7 is a sectional view taken along line C-C in Fig. 5. 8 show a second example of this invention, FIG. 7 is a longitudinal sectional view of the lid similar to FIG. 4, and FIG. 8 is a sectional view taken along line DD in FIG. 7. 1: Switching valve, 2: Vacuum pump, 3: Filter, 4: Processing tank, 4a: Lid, 4b: Hinge, 4C: Main body, 5: Rotary switching valve, $a, (5b, 6C: Chemical tank, 7: Basket, 8° 9: Heater, 10: Gutter, 11: Notch, 12: Inclined plate, 13: Backing, 14: Gap, 15: Groove, 17
: recess, 18: ridge, 18a: inner surface, 19: chamber, 20:
Holding board.

Claims

[Scope of utility model registration request]

A hinge 4b is attached to the edge of the main body 4C of the processing tank 4 of the single-tank embedding device.
The lid 4a is attached to the lid 4a so that it can be opened and closed freely, and an endless backing 13 is provided on the inside surface to maintain airtightness between the lid 4a and the main body 4C when the lid 4a is opened. It reaches the backing 13 located at , forming a recess 17 that gradually becomes deeper at the bottom, and in front of the lower end of the recess 17 is a lateral protrusion 18 whose left and right ends reach the backing 13 .
is provided to form a chamber 19 at the lower end of the recess 17, and the projecting edge 18
The lid of the processing tank of the one-tank embedding apparatus has a height such that the upper end of the ridge faces the inside of the main body 4C when the lid is closed, and the inner surface of the ridge is inclined toward the outside of the chamber 19.