JPS58192038A - Treating liquid replenishing method of automatic photosensitive material developing machine - Google Patents

Abstract

PURPOSE:To make a flow rate controlling means such as a needle valve, etc. unnecessary, to reduce a cost and to simplify maintenance, by controlling the discharge quantity by varying an energizing signal applied to an energizing coil of an electromagnetic vibrating pump. CONSTITUTION:A movable iron core 23 functioning as a vibrator is provided in an energizing coil 22 on which a permanent magnet 21 is fixed and a rubber tube 24 in which a suction valve 26 and a discharge valve 27 are installed is stuck to said iron core. When a pulsating current whose voltage is varied is applied to the coil 22, the vibrator vibrates to the left and right and operates as a pump. In this case, the discharge quantity can be controlled by varying voltage, phase, frequency, etc. of an energizing signal. Therefore, the discharge quantity is controlled so as to become a prescribed quantity at all times, through a controlling circuit 19, and a pump 18 is driven for a necessary time through a timer 7 for the liquid replenishing quantity measured by a blackened area measuring device 6. Accordingly, a needle valve, etc. become unnecessary, the cost is reduced and the maintenance can be simplified.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a processing liquid replenishing device for replenishing a processing liquid such as a developer in a processing apparatus for photosensitive materials such as film, photographic paper, and 28 plates (hereinafter referred to as an automatic film processor). This is related to the improvement of.

Generally, when developing a film using an automatic film processing machine, the condition of the developer and fixer is checked by properly replenishing the developer and fixer according to the fatigue of the developer by measuring the amount of blackening on the film, etc. Maintaining a constant value is important for quality control in the operation of automatic processors. There are various types of devices commonly used for replenishing the processing solution, including simple automatic, semi-automatic, and automatic types.1 For example, in the case of an automatic plate-making film developing machine, basically all of them are used to replenish the processed film's black color. It consists of a means for measuring or predicting the total amount of silver oxide, that is, a blackened area, and a means for sending a replenishment amount corresponding to the measurement or the blackened area from a chemical tank to an automatic developing machine. The former blackening area measuring means includes a rechargeable silver blackening amount measuring device or a position detector such as a microswitch to determine the length of the film to be processed in the transport direction and its expected length. However, there are no known devices that measure the blackening area according to the blackening ratio.

Since it is not directly related to the present invention, the details will be omitted. The present invention particularly relates to the improvement of the latter liquid feeding means.

In order to clarify the difference from the present invention, a conventional liquid feeding device will be briefly explained based on FIG. 1. Chemical tank (1),
When feeding liquid to the developing tank (5) of an automatic developing machine using a liquid replenishment system (4) consisting of a metering pump (2) and an air chamber (3), the above-mentioned measuring device such as a weighted area measuring device (
6) to find the required fluid replenishment amount -cc.

For example, the metering pump (2) is controlled via a timer (7), etc.
) is converted into a driving time of ■sec, and the pump (2) is driven by the AC electric train (8). If this pump (second set in advance) has a constant flow rate (v) and CC/SCC toss, the drive time T can be determined by T=Q/V, and this allows the above-mentioned required liquid volume (Q) to be replenished.This quantitative formula Pump (2
), bellows-type metering pumps have traditionally been used.
The stiffness is that there is a synchronous motor (10 on the inner edge 1) inside the cover (9) and an eccentric cam mechanism (12) on its rotating shaft.

By adjusting the mounting angle of the cam αb via the screw α1, the stroke of the rod 141 in the vertical (arrow a) direction can be adjusted. This allows the rod aa to move up and down in response to the rotation of the motor, and the bellows west to expand and contract, for example, 20 times per minute, thereby setting a predetermined discharge (jlCv). However, this pump (2) generates inertial flow due to the fact that the driving source is a motor, and in order to suppress this as much as possible, an air chamber (3) is attached to the flow rate. This cannot be completely eliminated, and the expansion and contraction of the bellows decoy causes a pulsating flow of the replenisher, so even if you install a float-type flow meter to monitor the flow rate in the flow path, the position of the float will fluctuate. Accurate flow measurement is not possible.

Therefore, in order to adjust the flow rate of this metering pump (2), the processing liquid actually used is sucked in and discharged.

By actually measuring the amount of liquid, the flow rate per unit time is measured, and the eccentric cam mechanism Qlla'a is adjusted until a predetermined flow rate is reached.

For this reason, such flow rate adjustment has been a major hindrance to improving efficiency in the assembly and use of automatic film processors.

In order to solve the above problems, the present applicant developed an electromagnetic vibration pump, that is, a vibrator installed in an electromagnetic coil and excited by the magnetic force of the coil with alternating current or pulsating current.・Using a pump that pumps liquid by vibrating a valve fixed to the vibrator, and by vibrating the valve at high frequency, the liquid can be pumped without causing pulsation. As a result, by making it possible to measure the flow rate per unit time in water using a flowmeter, etc., we created a device that could easily adjust the flow rate using a flow control valve such as a needle valve. -179421r Chemical solution replenishment device for sensitive material processing equipment''.

The chemical replenishment device for single-material processing equipment described above does not require the trouble of actually measuring the discharge amount of a metering pump during factory assembly, unlike the conventional device described above, and the flow rate can be easily adjusted using an M water flowmeter. It has many excellent characteristics. However, since the flow rate control valve tg, such as a needle valve, is provided, liquid leakage is likely to occur, and the valve portion is easily clogged with minute dust, requiring maintenance. In addition, if the flow path of the valve part is narrowed to reduce the flow rate, the diameter error during manufacturing will greatly affect the flow rate, so a highly accurate flow control valve must be used, which is difficult and expensive to manufacture. arrived.

The present invention is to provide a drug solution replenishment method that eliminates the disadvantages of the drug solution replenishment device without impairing the advantages of the drug solution replenishment device described in the above-mentioned Utility Model Application No. 56-179421, and makes maintenance free and cost reduction possible. This will be explained below with reference to the drawings.

FIG. 2 is a block diagram showing an example of an apparatus directly used for carrying out the method according to the present invention, and the liquid-feeding vibrator system is indicated by a thick solid line arrow. However, the same reference numbers are attached to the same parts as in Figure 1, and the electromagnetic vibration pump α
A is a cross-sectional view.

The electromagnetic vibration pump αa has an excitation coil (2) fixed inside a 9-cylindrical iron core, and a cylindrical permanent magnet (2) on the side of the coil (on the left side of the paper in Figure 2). Fixed.

Inside the hollow part of the filter, a thin-walled cylindrical movable iron core (2) is installed concentrically with the coil as a vibrator capable of reciprocating in the direction of the coil axis. This movable iron core (
C) is a flexible rubber tube that forms the flow path (
0. The rubber tube (1) is provided with elastic pleats (1) on both sides of the joint with the movable iron core opening. Inside this rubber tube (goods) there is a suction valve (
The suction valve (to) and the discharge valve cylinder are fixed to the inner wall and are internally installed 1, and the suction valve (to) and the discharge valve @ are located at the front in the liquid feeding direction (toward the right in the drawing) with this valve as the boundary. It is configured to close when the pressure is higher than the rear pressure, but open when it is lower. Therefore, when the excitation coil (2) is energized with a pulsating current whose voltage changes as shown in Fig. 3, when the voltage is 0, the movable iron core @ is attracted to the permanent magnet (2) and the It is located on the left side of the paper, but as the voltage increases, the output to the help coil becomes a permanent magnet (2)
The magnetic force becomes stronger than the magnetic force of , and the movable iron core @ is pulled to the right of the page of the drawing.1. When the voltage drops, it is attracted to the permanent magnet again and returns to the left. Therefore, if the frequency of the pulsating flow is, for example, 60H4.

In conjunction with the movable iron core, the suction valve (to) reciprocates in the direction of the coil axis at a rate of 3600 times/minute. Note that in order to carry out the method according to the present invention, it is not limited to the vibration pump having the configuration shown in FIG.
It is also possible to change the material to permanent foundation stone without changing its shape, and use an electromagnetic vibration pump driven by an AC power source. The present invention controls the vibration of the vibrator by controlling the voltage, two phases, one frequency, etc. of the excitation signal of the excitation coil @.

The stroke and number of reciprocating movements are increased or decreased, thereby controlling the discharge amount of the electromagnetic vibration pump itself. The heat control circuit (to) is a circuit for controlling the excitation signal of the coil (support), and an embodiment thereof is shown in FIG.

The circuit shown in lI4 is a phase control circuit for pulsating flow.

It is a publicly known thing. In the same figure, (8) is AC power, (1
) is a thyristor, and variable resistor (2) and resistor (
To) (To), Capacitor (To), and Trigger element (To) constitute a thyristor trigger circuit. In this thyristor trigger circuit, when the capacitor (To) is charged and reaches a certain potential, the trigger element (To) is activated. This is a circuit that operates in such a way that when the country is connected, a discharge occurs through the resistor (to), the gate of the thyristor (to) opens, and an excitation signal flows to the coil (to) of the vibration pump (to). By changing the resistance value of the capacitor (goods), the charging time of the capacitor (goods) changes,
The timing at which the gate of thyristor ■ opens changes, thereby controlling the phase. The diode (to) and the resistor (to) discharge the electricity accumulated in the capacitor (to) when the phase of the AC voltage generator (8) is opposite to the phase when voltage is applied to the vibration pump α excitation. A capacitor discharge circuit for
The capacitor (1) and the resistor (-) are a so-called surge circuit, which is a protection circuit against a voltage drop when the oscillator 1 is started. In the circuit shown in FIG. 4, when the resistance value of the variable resistor increases, the waveform of the excitation signal of the coil of the vibration pump (2) shown in FIG. 92 changes as shown in FIG. Decreased.

Therefore, the discharge amount decreases. Note that the defect in the flow control circuit a shown in FIG. 4 is merely an example, and other appropriate circuits may be used. For example, if the thyristor shown in FIG. 4 is replaced with a bidirectional thyristor and the capacitor discharge circuit is removed, the present invention can be applied to a vibration pump driven by alternating current.

The flow rate control circuit (2) is in addition to the above-mentioned phase control circuit.

The voltage may be controlled by a variable resistor or slider provided in series with the vibration pump (2) to control the discharge amount, or a zero frequency conversion circuit may be used.

The discharge amount can be controlled by increasing or decreasing the number of reciprocating movements of the vibrator (1) or its stroke per unit time. In the illustrated embodiment, the flow control circuit 1 (2) controls the electromagnetic vibration pump (to) so that the discharge amount per unit time is always a predetermined amount based on the instructions from the flow meter.

In addition, a timer (7) is set so that the amount of replenishment liquid is sent according to the blackened surface structure based on the signal measured by the blackened surface structure measuring device (6).
), the electromagnetic vibration pump α♂ is driven for the necessary time to replenish the processing solution to the automatic film processor. Of course, the present invention is not limited to the above embodiments,
In addition, the signal measured by the blackening area measuring device (6) instructs the flow rate control circuit to change the discharge amount per unit time of the electromagnetic vibration pump at any time, thereby replenishing the necessary amount of processing liquid. Furthermore, it can be used not only for replenishing chemical solutions to automatic film processors, but also for replenishing chemical solutions to various liquid processing devices.

When replenishing the processing liquid, it is also possible to easily increase the discharge amount per unit time of the vibration pump (2) so as to gradually increase the amount of liquid replenishment as the development process progresses.

As described above, the present invention uses an electromagnetic vibration pump to replenish a chemical solution to an automatic photosensitive material developing machine, and by a simple operation of controlling the excitation signal of the electromagnetic vibration pump, the discharge of the electromagnetic vibration pump can be controlled. Since the amount itself can be controlled reliably,
Costs can be easily reduced by eliminating the need for flow control means such as needle valves, which have many drawbacks such as clogging with liquid@r+1 and minute dust, as in conventional methods, and also make maintenance-free possible. This has many practical advantages.

[Brief explanation of the drawing]

Fig. 1 is a block diagram showing the conventional processing solution of the II optical material automatic processor, and Fig. 3 is a diagram illustrating the waveform of the signal that excites the coil (2) of the vibration pump (2) shown in Fig. 2. fl! Figure 4 is a circuit diagram showing an embodiment of the flow rate control circuit shown in Figure 2;
The figure is a diagram showing the waveform of the signal obtained by the circuit shown in the fourth figure. 1...Processing liquid tank 5...Automatic film processor (tank) 6-...Liquid replenishment amount measuring device (blackened area needle, etc.) 18...Electromagnetic Vibration pump 2
2...Excitation coil 23...Movable iron core (vibrator) 24...Rubber tube 26...
...Suction valve 27...Discharge valve (9)...
...Thyristor 35...Trigger element.

Claims (4)

[Claims] (1) Using an electromagnetic vibration pump that is equipped with a vibrator that vibrates in the axial direction of the coil in the hollow part of a cylindrical excitation coil, and discharges a predetermined amount of processing liquid by the vibration of the vibrator, !
The present invention is characterized in that when replenishing the processing liquid to the automatic optical material developing machine, the discharge amount per unit time is controlled by changing the excitation signal applied to the excitation coil. A method of replenishing processing liquid in an automatic photosensitive material processing machine. (2) A processing liquid replenishment method for an automatic photosensitive material developing machine according to claim 1, wherein the waveform of the excitation signal is controlled by at least one of the voltage zero phases of the signal. (3) A method of replenishing a processing solution for an automatic photosensitive material developing machine according to claim 1, wherein the frequency of the excitation signal is changed. (4) The excitation signal is alternating current or pulsating current. A method for replenishing a processing solution for an automatic photosensitive material developing machine according to claim 1.