JPS58189389A - Production of galvanized steel plate with high efficiency - Google Patents

Production of galvanized steel plate with high efficiency

Info

Publication number
JPS58189389A
JPS58189389A JP6955782A JP6955782A JPS58189389A JP S58189389 A JPS58189389 A JP S58189389A JP 6955782 A JP6955782 A JP 6955782A JP 6955782 A JP6955782 A JP 6955782A JP S58189389 A JPS58189389 A JP S58189389A
Authority
JP
Japan
Prior art keywords
strip
plating
electrolyte
electrolytic
galvanized steel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6955782A
Other languages
Japanese (ja)
Other versions
JPS612758B2 (en
Inventor
Kango Sakai
酒井 完五
Katsushi Saito
斉藤 勝士
Hirobumi Nakano
寛文 中野
Ryoichi Yoshihara
良一 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP6955782A priority Critical patent/JPS58189389A/en
Publication of JPS58189389A publication Critical patent/JPS58189389A/en
Publication of JPS612758B2 publication Critical patent/JPS612758B2/ja
Granted legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To produce a galvanized steel plate having good quality with high efficiency in electric galvanization wherein an electrolyte is ejected between electrode surfaces and the surface of a strip, by using a low pH plating bath contg. H2SO4, and ZnSO4.7H2O in high concn. CONSTITUTION:An electrolytic device for the above-described electric galvanization is provided with an electrolytic cell 2 into which a strip 1 is passed while the strip is held in a space without immersion into an electrolyte 3. Electrode pads 4 which are disposed in proximity to the surface of the strip so as to face the same and are formed with nozzle holes which inject the electrolyte to the surface of the strip and act static pressure on the surface of the strip with said fluid are provided in the prescribed positions in the cell 2. A plating bath consisting essentially of 300-500g/l ZnSO4 7H2O and 20-60g/l H2SO4 is injected onto the surface of the strip 1, and the electrolysis is effected at >=0.5m/sec relative velocity of the strip 1 and the liquid 3 and 100-250A/dm<2> current density, whereby the galvanized steel plate is produced.

Description

【発明の詳細な説明】 本発明は高効率で品質の良い電気亜鉛めっき鋼板を製造
する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing electrogalvanized steel sheets with high efficiency and good quality.

電気亜鉛めっき鋼板は優れた特性から家庭電気製品、鋼
製家具、ショーケース、自動販売機等の防錆素材として
多岐に使用されている。特に近年、自動車4体に対する
社会的要求、即ち自−動車の耐久性の向上、軽量化、安
全対策、環境対策が急速にクローズアップされ、これら
の要求に答える素材として表面処理鋼板、高強度鋼板の
需要が伸びている。このような目的に使用される現在市
販の防錆鋼板としては、亜鉛めっき鋼板が主体である。
Due to its excellent properties, electrogalvanized steel sheets are used in a wide variety of applications as anti-rust materials for home appliances, steel furniture, showcases, vending machines, etc. Particularly in recent years, social demands for four types of automobiles, namely improved durability, weight reduction, safety measures, and environmental measures, have rapidly come into focus, and surface-treated steel sheets and high-strength steel sheets are being used as materials to meet these demands. demand is increasing. Currently, commercially available rust-proof steel sheets used for such purposes are mainly galvanized steel sheets.

亜鉛めっき鋼板は埃在溶融めつきによって製造される鋼
板と電気めっきによって製造される鋼板の2種類がある
。前者(溶融亜鉛めっき鋼板以下HGIと略)はめつき
厚みの厚い製品を得るには適しているが、薄いめっき厚
の製品は得られ難い製造上の欠点がある。一方後者(電
気亜鉛めっき鋼板以下EGIと略)は薄いめっき厚の製
品は出来るが、厚めつき品は電力費のコストアップや、
低速生産等によショストの高い製品となシネ利である。
There are two types of galvanized steel sheets: steel sheets manufactured by hot-dip galvanizing and steel sheets manufactured by electroplating. The former (hot-dip galvanized steel sheet, hereinafter abbreviated as HGI) is suitable for obtaining products with thick plating, but has a manufacturing drawback that makes it difficult to obtain products with thin plating. On the other hand, the latter (hereinafter abbreviated as EGI) can produce products with a thin plating thickness, but products with thick plating may increase electricity costs,
Due to low-speed production, etc., it is a product with high shortness and cine efficiency.

一方晶質的にはHG Iに比べBGIの方が鋼材の機械
的性質への影響が少いこと、片面メッキが得られやすい
等の利点を持っておシ、前記の自動車4体等の要求に答
える素材としては有利である。しかしながら前述したよ
うに電気めっきは電力費が高いことと厚めつき化が難し
い基本的な問題を内含しており、この点が電気めっきの
開発のポイントである。前記問題は電気めっきが高電流
密度で且つ極間を近接した状態で電解出来る方法即ち高
効率電気亜鉛めっき法を開発することによって初めて解
決出来る。以下高効率の電気亜鉛めっき方法について、
従来使用されている方法を引用し説明するO 従来用いられている連続亜鉛めっき鋼板の電解槽は竪型
の浸漬型セルが一般的である。竪型浸漬型セルでは、極
間距離が大きいため、本来電流と電圧の関係から電流密
度に制限がある、又電流密度を上げると可溶性アノード
の不働態化、あるいはガス溜りにより電圧上昇が生じる
。又品質面においても、めっきのヤケ、不均一、結晶の
粗大化、ピンホール、密着性不良等の問題が生ずるため
電解液を流動させても電流密度(以下DKと略す)はD
x −= 20〜50A/dm2が限界であるつそこで
本発明者等は近接高電流密度電解を行うと同時に、それ
に対応した亜鉛メッキ浴を新規に見い出すことによって
前記の問題点を解決することができた0 本発明は例えば本出願人がすでに開発している高電流密
度操業可能なセル(特開昭56−127789号公報に
開示)を使用しメッキ浴としてznso4・7H,,0
300〜500 g/lで、且つH2So430〜60
11/lからなる浴を使用することに特徴を有する。
On the other hand, in terms of crystallinity, BGI has advantages such as having less influence on the mechanical properties of the steel material than HG I, and it is easier to obtain single-sided plating. It is an advantageous material for answering questions. However, as mentioned above, electroplating has the basic problems of high power costs and difficulty in increasing the thickness of the plating, and these points are the key points in the development of electroplating. The above problem can only be solved by developing a high-efficiency electrolytic galvanizing method that allows electroplating to be carried out at a high current density and in close contact between the electrodes. The following is a highly efficient electrogalvanizing method.
Citation and explanation of conventionally used methods O The conventionally used electrolytic cell of continuous galvanized steel plate is generally a vertical immersion type cell. In a vertical immersion cell, since the distance between the electrodes is large, the current density is inherently limited due to the relationship between current and voltage, and when the current density is increased, the voltage increases due to passivation of the soluble anode or gas accumulation. In addition, in terms of quality, problems such as discoloration of plating, nonuniformity, coarsening of crystals, pinholes, and poor adhesion occur, so even if the electrolyte is allowed to flow, the current density (hereinafter abbreviated as DK) will be D.
x - = 20 to 50 A/dm2 is the limit. Therefore, the inventors of the present invention solved the above problem by performing close proximity high current density electrolysis and at the same time finding a new galvanizing bath compatible with it. The present invention uses, for example, a cell capable of high current density operation (disclosed in Japanese Patent Application Laid-Open No. 127789/1989), which has already been developed by the present applicant, and uses znso4.7H,,0 as a plating bath.
300-500 g/l, and H2So430-60
It is characterized by using a bath consisting of 11/l.

本発明を実施する場合の電解装置の例を第1図で説明す
る。その電解装置はストリップ1を電解液3に浸漬する
ことなく空間に保持した状態で通板させる電解槽2と、
該電解槽2内の所定位置に、前記ストリップ1面に対向
して近接して配置しかつストリップ面に電解液を噴射す
ると共に該流体によりストリップ面に静圧を作用せしめ
るノズル孔を形成した電極パッド4とからなる0このよ
うに電解槽内でのストリップを電解液に浸漬せずに空間
に保持せしめ、しかも槽内の所定位置にストリップ面に
対向して配置した静圧パッドとしても機能を併せもつ電
極パッドによシ、ストリップ面に電解メッキ液を噴射し
て電解処理を実施することを特色としている。
An example of an electrolytic device for carrying out the present invention will be explained with reference to FIG. The electrolytic device includes an electrolytic cell 2 in which the strip 1 is passed through the electrolytic solution 3 while being held in a space without being immersed in the electrolytic solution 3;
an electrode disposed at a predetermined position in the electrolytic cell 2, facing and close to the surface of the strip 1, and having a nozzle hole formed therein for injecting electrolyte onto the strip surface and applying static pressure to the strip surface by the fluid; In this way, the strip in the electrolytic tank is held in space without being immersed in the electrolyte, and it also functions as a static pressure pad placed at a predetermined position in the tank facing the strip surface. The feature is that electrolytic treatment is carried out by spraying electrolytic plating solution onto the electrode pads and the strip surface.

したがって、この電解・槽は従来の浸漬タイプと全く異
質であって、電解液が充満しておらず、しかも電解を行
なうための電極が中空のボックス構造であってそのノズ
ル孔からストリップに向って電解液を噴出するものであ
るから、浸漬タイプに見られた種々の不利益が解消され
ると共に、下ロールをもコンダクタ−ロールとして利用
でき、加えてストリップの振動を防止してかつ形状不良
を矯正して安定した通板が行なえるメリットが得られる
Therefore, this electrolytic bath is completely different from the conventional immersion type; it is not filled with electrolyte, and the electrode for electrolysis has a hollow box structure, and the electrode is a hollow box structure that extends from the nozzle hole toward the strip. Since the electrolyte is spouted out, various disadvantages seen with the immersion type are eliminated, and the lower roll can also be used as a conductor roll. In addition, it prevents strip vibration and shape defects. This provides the advantage of being able to perform stable sheet threading through correction.

以−L本発明で使用できるメッキ装置の1例を示したが
、本発明はこの例に限定されるものではなく、電極面と
被メッキ面との間に電解液を噴射して電極面と被メッキ
の間にメッキ液を保持しながら、ストリップと電解液の
相対速度を0.5m/sec以上にしてメッキできる装
置であれば良い。
Hereinafter, an example of a plating apparatus that can be used in the present invention has been shown, but the present invention is not limited to this example. Any device that can perform plating at a relative speed of 0.5 m/sec or more between the strip and the electrolyte while holding the plating solution between the plates to be plated may be used.

そのような条件に適合するその他の例として特公昭50
−8020に開示したようにストリップの進行方向と向
流的にストリップと電極間に電解液を噴射する電解メッ
キ装置、特願昭55−176518に開示したように電
極の中央部からストリップ面に電解液を噴射する装置な
どがあげられる。さらに本出願人が特許出願中の特願昭
57−18836に開示した静圧流体パッドを備えた水
子型電解装置があげられる0又本発明においては極間距
離は近接化するほど好ましい。その理由としては例えば
電流密度を100A/dm’又は200 A / dm
”に設定した場合に極間距離が太きいと極間電圧は20
〜30Vをこえてしまい電力費、整流器の容量が大きく
なり実用的ではない。本発明は極間電圧を少くとも20
V未満望ましくはIOV以下を目標としている。従って
極間距離を近接化するほど(軽重しくは15mm以下)
極間電圧が減少し、結果としてコストを大巾に節減する
ことができる。
Another example that meets such conditions is
-An electrolytic plating device that injects an electrolytic solution between the strip and the electrode countercurrently to the traveling direction of the strip, as disclosed in Japanese Patent Application No. 8020; Examples include devices that spray liquid. Further, in the present invention, the closer the distance between the electrodes, the more preferable the distance between the electrodes is, for example, a water-containing electrolyzer equipped with a hydrostatic fluid pad disclosed in Japanese Patent Application No. 57-18836, which is currently pending by the present applicant. The reason for this is, for example, when the current density is 100 A/dm' or 200 A/dm.
”, if the distance between the electrodes is large, the voltage between the electrodes will be 20.
If the voltage exceeds ~30V, the power cost and rectifier capacity will increase, making it impractical. The present invention reduces the voltage between electrodes to at least 20
The target is less than V, preferably less than IOV. Therefore, the closer the distance between poles is (less than 15 mm for light and heavy)
The voltage between the electrodes is reduced, resulting in significant cost savings.

このように極間距離を小さくするほどコスト的には有利
であるが、極間きよりを極端に小さくするとストリップ
と電極が接触するおそれがあるので極間きよりは5朋が
実用、上の限界といえる。
In this way, the smaller the distance between the electrodes, the more advantageous it is in terms of cost, but if the distance between the electrodes is made too small, there is a risk that the strip and the electrode will come into contact with each other. It can be said that there is a limit.

なお、本発明では前記のように極間距離をなるべく近接
化してメッキを行うが、メッキ中のストリップの振動や
位置変動、或はカテナリーを少なくして極間距離上より
縮少するために、前記説明した特開昭56−12778
9と特願昭57−18836に示したよりな静圧流体パ
ッドを有するメッキ装置を用いて静圧流体でストリップ
を支持しながらメッキを行うことが最も好ましい0その
結果ストリップは電極間の中心に静圧で自動的にセンタ
ーリングされるので極間距離を大巾に短縮でき、しかも
安定してメッキを行うことができる。
In addition, in the present invention, as described above, plating is performed with the distance between the electrodes as close as possible, but in order to reduce the vibration and positional fluctuation of the strip during plating, or the catenary, to reduce the distance between the electrodes, JP-A-56-12778 described above
9 and Japanese Patent Application No. 57-18836, it is most preferable to perform plating while supporting the strip with a hydrostatic fluid using a plating apparatus having a static pressure fluid pad as shown in Japanese Patent Application No. 57-18836. Since it is automatically centered using pressure, the distance between the electrodes can be greatly shortened, and moreover, plating can be performed stably.

以上説明したような電解装置を用いて電極面と被メッキ
面との間に電解液を噴出せしめて極面と被メッキ面との
間に液を保持しながらメッキを行なう場合には、1ガス
溜り”がなく極間距離が近接可能であるので、通電抵抗
が小さくなるため、電圧の上昇を抑制することが可能と
なるOさらに相対スピード(ラインスピード−流速)に
よるイi7供1# if換効率がよいことなどのため高
電流密度によるメッキが可能となる0以下本発明のメッ
キ浴について説明する0 本発明者等は前記第1図に示すような高効率が可能な電
解槽を見出すことが出来たが、実際に電気亜鉛めっきを
行うとまだ解決すべき課題があることが分った。即ち、
高効率な電解槽を用いて電気亜鉛めっきを近接高電流密
度で行うと、1)めっき焼け、めっきむらが発生する、
2)  電流効率が低下する、3)液抵抗による電圧ア
ップが大きい等の問題点があり、特に流速分布によって
めっき面にむらが生じ易いことが分った。そこで本発明
者等は高効率で品質の良い亜鉛めっき鋼板を製造するこ
とを目的として、近接高電流密度電解に適した新規の亜
鉛めっき浴を開発することによって多少電極面で流速む
らが生じても均質で良質な電気亜鉛めっきが得られるこ
とを見い出したものである。
When performing plating while maintaining the liquid between the electrode surface and the surface to be plated by spouting the electrolytic solution between the electrode surface and the surface to be plated using the electrolytic device as explained above, one gas is used. Since there is no accumulation and the distance between the poles can be close, the current carrying resistance is small, making it possible to suppress the rise in voltage. The present inventors have discovered an electrolytic bath capable of high efficiency as shown in FIG. However, it was found that there were still issues to be solved when electrolytic galvanizing was actually carried out.
When electrolytic galvanizing is performed at high current density in close proximity using a highly efficient electrolytic bath, 1) plating burn and plating unevenness occur;
There are problems such as 2) a decrease in current efficiency, and 3) a large increase in voltage due to liquid resistance, and it was found that unevenness is likely to occur on the plated surface, especially depending on the flow velocity distribution. Therefore, with the aim of manufacturing highly efficient and high quality galvanized steel sheets, the present inventors developed a new galvanizing bath suitable for close-in high current density electrolysis, which caused some flow velocity unevenness on the electrode surface. It was also discovered that homogeneous and high quality electrolytic galvanizing can be obtained.

本発明ではH2SO4及びZnSO4” 7H20濃゛
度の高い低…浴を使用する点に特徴を有している。この
浴と前述した電解槽を利用する結果上に述べたメッキ外
観不良は全く無くなυ、特に高流速で吹き出すノズルの
影響も皆無となる。また電流効率も93饅と低電流密度
の場合に匹敵するりしかも高電導度のため電解電圧が低
下して省電力が可能である〇本発明浴は硫酸を加えると
電流効率が下がるという従来の常識を破ったものであり
、それによって高電流密度化による高効率メッキにおい
て高品質の製品を得ることが可能になった。第2図は本
発明に基づきZIISO4・7H20500CEi/l
)、、 H2SO4= 40C9/l)、−一05のメ
ッキ浴を用い特開昭56−127789の電解槽で相対
流速1. Orry’s  でメッキした場合と従来の
メッキ浴ZnSO4・7H203009/ lH,5o
45 g/ l pH= 2.0を用いて同様にメッキ
した場合の電流効率(η)と電流密度(DK)との関係
を示しているO従来法(曲線2)では電流密度が高く々
るにつれて電流効率は低下するが、本発明法(曲線1)
でばDK= 100 (A、/ dm2)以上25OA
−/dm2の間では93%程度と電流効率が良く安定し
ている。しかしながらDK 300 A/ dm”では
本発明浴においても電流効率の低下や、メッキむらが生
じ始めるため本発明の好ましい適用DKは100〜25
0A、/ dm ’最適DKは150〜200 A/ 
dm2である。
The present invention is characterized by the use of a low-temperature bath with high concentrations of H2SO4 and ZnSO4"7H20. As a result of using this bath and the electrolytic bath described above, the above-mentioned poor plating appearance is completely eliminated. υ, especially the influence of the nozzle that blows out at a high flow rate is completely eliminated.Also, the current efficiency is 93cm, which is comparable to the case of low current density, and because of the high conductivity, the electrolytic voltage is reduced, making it possible to save power. The bath of the present invention breaks the conventional wisdom that current efficiency decreases when sulfuric acid is added, making it possible to obtain high-quality products through high-efficiency plating due to high current density.Figure 2 is based on the present invention ZIISO4・7H20500CEi/l
), H2SO4 = 40C9/l), using a plating bath of -105 and a relative flow rate of 1. When plating with Orry's and conventional plating bath ZnSO4・7H203009/lH,5o
45 g/l This shows the relationship between current efficiency (η) and current density (DK) when similarly plated using pH = 2.0. In the conventional method (curve 2), the current density is high. Although the current efficiency decreases as the current efficiency increases, the method of the present invention (curve 1)
If DK = 100 (A, / dm2) or more 25OA
-/dm2, the current efficiency is about 93% and stable. However, at a DK of 300 A/dm, current efficiency decreases and plating unevenness begins to occur even in the bath of the present invention, so the preferred application DK of the present invention is 100 to 25
0A,/dm 'Optimal DK is 150-200 A/
It is dm2.

第3図は6メツキかけ″(○印は良好、△は不良、×は
著るしく不良)に及ぼす電解液とストリップとの相対速
度(Vrn/s)と電流密度(DK A / dmつと
の関係を示したものである。斜線で示した領域はメッキ
外観が良好な範囲を示す0第3図はメッキ浴としてZn
SO4” 7l−(20500C1//l) 、H!8
0440(g/l )、pH=0.6、電導度K = 
] 80 (mtT/2m)のものを用い、温度60℃
でメッキを行った結果である0第3図に示すように本発
明浴を用いたものはDK=100(A/dm’)以上で
もV=0.5 (m/ 5ec)以上であれば、広範囲
にわたる流速及びラインスピードにおいて外観の良好な
メッキが得られる0従来実施されているメッキ浴ではV
=0.5m/s以上の流速を与えてもこのような高電流
密度においては良好な外観のものは得られなかった0又
、本発明のメッキ浴を用いてもV = O(rrV’s
\即ち浸漬静止メッキではDK = 100 (A/d
m’ )以上でメッキのヤケが生ずる。以上から良好な
メッキ外観を確保するためには、電解液とストリップと
の相対速度Vは0.5 (m/s )  以上が必要で
ある0なお相対速度Vを確保するためには流速を高める
のが最も効果がある○ 以上述べたように高電流密度でメッキ外観、電流効率、
低電圧操業を満足するためには、上メッキ浴および電極
間の流速および電解方法を含めた条件が必要である0 以下本発明に用いるメッキ浴についてさらに詳述する。
Figure 3 shows the effects of the relative velocity (Vrn/s) between the electrolyte and the strip and the current density (DK A / dm) on 6 platings (○ indicates good, △ indicates poor, × indicates extremely poor). The relationship is shown in Figure 3.The shaded area shows the range where the plating appearance is good.
SO4” 7l-(20500C1//l), H!8
0440 (g/l), pH=0.6, conductivity K=
] 80 (mtT/2m) at a temperature of 60°C.
As shown in Figure 3, which is the result of plating in Plating with good appearance can be obtained over a wide range of flow rates and line speeds.
Even if a flow rate of 0.5 m/s or more was applied, a good appearance could not be obtained at such a high current density.Also, even when using the plating bath of the present invention, V = O(rrV's
\That is, in immersion static plating, DK = 100 (A/d
m') or more will cause discoloration of the plating. From the above, in order to ensure a good plating appearance, the relative velocity V between the electrolyte and the strip must be 0.5 (m/s) or more.In order to ensure the relative velocity V, the flow velocity must be increased. ○ As mentioned above, high current density improves plating appearance, current efficiency,
In order to satisfy low voltage operation, conditions including the upper plating bath, the flow rate between the electrodes, and the electrolytic method are required.The plating bath used in the present invention will be described in further detail below.

第4図はH2SO4量と電導度(曲線K)及び電流効率
(曲線η)との関係を示したものである。H2SO。
FIG. 4 shows the relationship between the amount of H2SO4, conductivity (curve K), and current efficiency (curve η). H2SO.

量の増加とともに電導度は直線的に大きくなり電解電圧
の低下に寄与する。しかしH2SO4が60 g/l超
−Fでは電流効率が急激に低下するので実用的でなくな
るり本発明におけるDK 100〜250A/dm”に
おいてはI−(280,は20〜60 l/lの範囲で
操業可能な亀導度と電流効率が確保できる0 第5図はZnSO4・7H20量と電導度及び電流効率
の関係を示した。第5図から電導度はZn SO4・7
H20の増加に−より減少する。特に500 E//l
超では、低下が太きい。一方電流効率はZnSO4・7
H203009/1以上で90%以上を確保出来る。又
Zn5O,の濃度アップは電解液中に結晶を析出させる
危険が高<、500.9//超のZnSO4・7H20
の濃度は操業上好ましくない。従って本発明においては
ZnSO4・7H20300〜500 F//lが必要
である〇第6図に、H2SO,およびZnSO4* 7
H20とメッキ外観の関係を示した0図中○は良好、ム
は不良(ヤケ)×は著るしく不良(ヤケ)の状態を示す
0H2So4量およびZnSO4・7H20の増加に伴
いメッキの外観は向上する。DK 20 OA/ dm
”において外観が良好な範囲は第6図からZnSO4’
 7H20が300 fj/1以上で且つH2SO4が
20g/1以上である。
As the amount increases, the conductivity increases linearly, contributing to a decrease in electrolytic voltage. However, when H2SO4 exceeds 60 g/l-F, the current efficiency decreases rapidly, making it impractical. Figure 5 shows the relationship between the amount of ZnSO4.7H20, conductivity and current efficiency.
-Decreases as H20 increases. Especially 500 E//l
In super, the decline is steeper. On the other hand, the current efficiency is ZnSO4.7
90% or more can be secured with H203009/1 or higher. In addition, increasing the concentration of ZnSO4 has a high risk of precipitating crystals in the electrolyte.
The concentration of is unfavorable for operation. Therefore, in the present invention, ZnSO4*7H20300~500 F//l is required. In Figure 6, H2SO and ZnSO4*7
In Figure 0, which shows the relationship between H20 and plating appearance, ○ indicates good condition, and MU indicates poor condition (staining). do. DK 20 OA/dm
”, the range with good appearance is ZnSO4' from Figure 6.
7H20 is 300 fj/1 or more and H2SO4 is 20 g/1 or more.

以上本発明のメッキ浴について詳述した如く、1DK1
00〜250A/dm′において良好な電導度、電流効
率、メッキ外観を確保するためにはメッキ浴濃度として
ZnSO4@ 7H20300〜500 fj / l
  H280420〜60 i/lを最低限確保する必
要がある。0好ましくは、ZnSO4@ 7H2040
0±50 、li’ / l H2SO440±109
/lの範囲がよい。その他の添加剤としては従来性われ
ているNa25Oい(N)(4)tso+等を加えても
よい。
As described above in detail about the plating bath of the present invention, 1DK1
In order to ensure good conductivity, current efficiency, and plating appearance at 00 to 250 A/dm', the plating bath concentration should be ZnSO4@7H20300 to 500 fj/l.
It is necessary to secure a minimum of 20 to 60 i/l of H2804. 0 Preferably ZnSO4@7H2040
0±50, li'/l H2SO440±109
/l range is good. As other additives, conventionally used Na25O(N)(4)tso+ and the like may be added.

実施例1 第1図の装置を用いテznso4−7H2050o (
g/l )、(NH4)28045 o(yA)、Na
2SO430(g/l )、H2SO44゜(9/l 
) (7)組成浴を用い温度55〜6o′cDK=20
゜A/dm2、極間5朋 V=0.5m/sでメッキし
た結果衡量電圧は13Vでメッキ外観の良いものが得ら
れた表その際の電流効率は93%であった。比較として
従来浴ZnSO4@ 7H20250(1/ l )、
Na2SO43o(9/l)、)(、、so、 10 
(g/l )を用いて同上の条件でメッキを行なった結
果、極間電圧は20Vと高くなり、メッキ外観不良を起
こし、かつ電流効率は88チであった。
Example 1 Teznso4-7H2050o (
g/l), (NH4)28045 o(yA), Na
2SO430 (g/l), H2SO44° (9/l
) (7) Using a composition bath at a temperature of 55 to 6 o'cDK = 20
As a result of plating at °A/dm2, electrode spacing of 5 mm, and V=0.5 m/s, the equilibrium voltage was 13 V, and a good plating appearance was obtained.The current efficiency at that time was 93%. For comparison, conventional bath ZnSO4@7H20250 (1/l),
Na2SO43o(9/l), )(,,so, 10
(g/l) under the same conditions as above, the interelectrode voltage was as high as 20 V, the plating appearance was poor, and the current efficiency was 88 cm.

以上説明したように本発明は亜鉛メッキの近接高電流密
度電解における外観不良及び電流効率の低下、電圧上昇
をすべて解決した画期的な高効率亜鉛めっき鋼板の製造
方法である。
As explained above, the present invention is an epoch-making method for producing highly efficient galvanized steel sheets that solves all of the problems of appearance defects, current efficiency decreases, and voltage increases that occur during galvanizing in close proximity high current density electrolysis.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に用いる電解槽の一例を示す。 第2図は、電流密度と電流効率の関係を本発明条件の+
1)と比較条件(2)について示した。 第3図は、メッキ外観に及ぼす相対流速(V)と電流密
度(DK)の関係を示す。○印はメッキ外観の良好であ
る。 第4図は硫酸濃度と電導度(K)、電流効率(η)の関
係を示す図、第5図は同様に7.n S 04・7H2
0濃度の関係を示した図である。 第6図は電流密度200 A/ dm”で、ZnSO4
・7H20およびH2SO4濃度とメッキ外観の関係を
示す図である。図中の○印および斜線で示した領域が良
好な範囲を示す。 葆 /fI 不2呂 第3 粗 V (騎〕 茅 4 口 ρ  /(74040g6 /h 5o4(1/l ) 扇5 ztv    4 Zn3()p・。 あ乙
FIG. 1 shows an example of an electrolytic cell used in the present invention. Figure 2 shows the relationship between current density and current efficiency under the conditions of the present invention.
1) and comparison condition (2) are shown. FIG. 3 shows the relationship between relative flow velocity (V) and current density (DK) on plating appearance. The ○ mark indicates a good plating appearance. Figure 4 shows the relationship between sulfuric acid concentration, electrical conductivity (K), and current efficiency (η), and Figure 5 shows the relationship between 7. n S 04・7H2
FIG. 3 is a diagram showing the relationship at 0 concentration. Figure 6 shows ZnSO4 at a current density of 200 A/dm”.
- It is a diagram showing the relationship between 7H20 and H2SO4 concentrations and plating appearance. The areas indicated by circles and diagonal lines in the figure indicate good ranges.葆 /fI Fu2ro Dai 3 Coarse V (Knight) Chi 4 Mouth ρ /(74040g6 /h 5o4(1/l) Fan 5 ztv 4 Zn3()p・. Aot

Claims (1)

【特許請求の範囲】[Claims] 電極面とストリップ面との間に電解液を噴出せしめて電
極とストリップ間に電解液を保持しながら電気亜鉛めっ
きを行う方法において、メッキ浴としてznso、 @
 7H20300〜500 Lj/l S H2SO4
20〜609/lを主成分とする電気亜鉛めっき浴を使
用し、ストリップと電解液の相対速度を0.5m/se
c以上、電流密度100〜250 A/ dm ’で電
解することを特徴とする高効率亜鉛めっき鋼板の製造方
法0
In the method of electrolytic galvanizing while maintaining the electrolyte between the electrode and the strip by jetting the electrolyte between the electrode surface and the strip surface, znso, @ as the plating bath is used.
7H20300~500 Lj/l S H2SO4
An electrogalvanizing bath containing 20 to 609/l as the main component was used, and the relative velocity between the strip and the electrolyte was set at 0.5 m/sec.
A method for producing a highly efficient galvanized steel sheet characterized by electrolyzing at a current density of 100 to 250 A/dm'
JP6955782A 1982-04-27 1982-04-27 Production of galvanized steel plate with high efficiency Granted JPS58189389A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6955782A JPS58189389A (en) 1982-04-27 1982-04-27 Production of galvanized steel plate with high efficiency

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6955782A JPS58189389A (en) 1982-04-27 1982-04-27 Production of galvanized steel plate with high efficiency

Publications (2)

Publication Number Publication Date
JPS58189389A true JPS58189389A (en) 1983-11-05
JPS612758B2 JPS612758B2 (en) 1986-01-27

Family

ID=13406161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6955782A Granted JPS58189389A (en) 1982-04-27 1982-04-27 Production of galvanized steel plate with high efficiency

Country Status (1)

Country Link
JP (1) JPS58189389A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0313676U (en) * 1989-06-26 1991-02-12
JPH0313675U (en) * 1989-06-26 1991-02-12

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS492264A (en) * 1972-04-25 1974-01-10
JPS49123131A (en) * 1973-03-31 1974-11-25
JPS54138831A (en) * 1978-04-21 1979-10-27 Nippon Steel Corp One-side electrolytic treatment method for metal sheet
JPS55141588A (en) * 1979-04-24 1980-11-05 Nippon Steel Corp Zinc electroplating method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS492264A (en) * 1972-04-25 1974-01-10
JPS49123131A (en) * 1973-03-31 1974-11-25
JPS54138831A (en) * 1978-04-21 1979-10-27 Nippon Steel Corp One-side electrolytic treatment method for metal sheet
JPS55141588A (en) * 1979-04-24 1980-11-05 Nippon Steel Corp Zinc electroplating method

Also Published As

Publication number Publication date
JPS612758B2 (en) 1986-01-27

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