JPS58172614A - Incidence dark field object lens for microscope and method of adapting same to microscope - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] The objective lens of the present invention is an enemy.
I+ 1111 field objective lens VC@connected. The present invention also provides a special one-enemy mirror with an attached lens turret.
We arrive at a method to adapt the objective lens.

Epi-illuminated dark-field illumination is performed using a cone-shaped light beam of 1 wJ (1 wJ) in which the front lens of the objective lens is not busy receiving reflected light and only receives the light reflected by the sample. (Therefore, the intermittent parts of the test specimen appear bright in the dark field. This brightening is performed by the dark field zone formed by the front lens 1 of the objective lens. For large-diameter objectives, the distance Tll is adjusted to compensate for sorption.
(distance between the 0-plane lens and the sample) is small, so each objective lens supports the sample.
The front surface of the palate zone forming outer ring surrounding the 5trrN lens of the objective lens must be placed close to the stage to prevent the objective lens from touching the sample. It sticks out to the front. This I! Out*a is
- Front lens retention sound is non-1T to avoid blocking bright light.
This is necessary because it is thin and brittle.

Since it has an objective lens turret that supports a plurality of objective lenses, it is equipped with an objective lens turret having a rotation axis that is engaged at a fixed angle with the four objective lens axes 4I. By rotating the turret on which the objective lens is attached, the objective lens is moved along the arcuate path. With this movement, the objective lens turret axis is 4 m! This movement causes the front and rear areas of the lens 61111111 that form the dark field zone to enter the sample or stage during rotation of the turret axis. When approaching [the dark-field objective lens is 6 degrees, and when the W object lens is brought into contact with the sample, the front and rear areas of the front surface of the outer cylinder are close to the sample (contact It is configured to pass through the sample by rotating the turret axis without any movement.

When inserting the stage insertion plate that supports the sample into the stage of the inverted mirror mirror, the objective lens attached to the attached lens turret will rotate slightly when the objective lens turret is removed from the microscope stage. In addition, in the case of an upright 11-leaf test where the sample is pressed against the stage insertion plate by spring elasticity, there is so-called one polishing stage.

The above opening is in the case of this ward's examination (also a case of death).

Since it is necessary to rotate the objective lens turret with respect to the maw stage, it is necessary to separate the objective lens or the objective lens turret from the stage, which makes the operation of the 111-time frame even more difficult. JK objective lens #! In some cases, it is necessary to perform tI and point matching again for clarity.

Also, the instruction manual for the mirror is to rotate the W object turret.
ll1vc111 If you forget to remove the objective lens tank from the enemy mirror stage, the front surface of the objective lens outer cylinder or the front lens of the objective lens may collide with the stage insertion plate and be damaged.

OBJECTS OF THE INVENTION One object of the present invention is to provide an epi-illuminated dark-field anti-rotary lens for observation@l which has a lower risk of breakage than conventional objective lenses.
Chiru.

Another object of the present invention is to provide a b-objective lens that can be conveniently used without requiring focusing by changing the dW-objective lens.

Another object of the present invention is to provide a simple method for achieving a key distribution objective by combining the above-mentioned objectives in a specific manner.

According to the present invention, there is provided an epi-illuminated clear-field objective lens for an S-type mirror having an objective lens turret, and this objective lens has a front lens and a mirror lens (an outer cylinder forming a dark-field zone), and this dark-field The band is limited by the above-mentioned outer m+ projecting forward of the front lens, and since the front surface of this outer lens is inclined by both IIIK with respect to the inverted lens, the objective lens turret relative to the m-interval mirror stage can be easily rotated.

Therefore, according to +41jVc to Hon? The front surface of the objective lens outer cylinder is not a flat surface, but a #i#I4 surface starting from the longest straight part of the objective lens outer cylinder.

The line #1 has a sufficient slope, so that even if the objective lens is not 1tK closer to the intermittent mirror stage, the turret with the objective lens can be rotated relative to the intermittent mirror stage or stage insertion plate #c. ? At least the inner linear portion of the outer 1III-face is polished to the front 111 of the 11Ii-face lens 6 to prevent mechanical damage (this lens is maintained 1).

In principle, it is possible to thicken both sides of the linear portion of the objective lens outer cylinder to form an objective lens outer tll1m plane (Hata oblique plane). The front surface Wcvj is a constant curved surface, the radius of curvature is perpendicular to the plane (the radius of curvature is the straight line that interconnects the inner linear part of the outer surface of the objective lens in the radial plane, the axis of rotation of the W nose turret, and the objective It is particularly advantageous to form a curved surface approximately equal to the distance between the @l intersection with the axis of the lens.

As for the original image, it is also possible to form a curved inclined surface on a 1lIIIlI surface outside the dark-field objective lens using a specific method during the manufacturing stage. However, the #l-plane obtained by this method has a value surface angle of 9.5 mm, which allows good VCI transmission between the objective lens turret and the objective lens. In addition, the 4m acupuncture point outside the objective lens must protrude far beyond the front lens to prevent damage.

The present invention also provides a method for assembling four drop-resistant clear viewing objective lenses on a special stage having an objective lens turret. I[, 11
Polished within a plane that matches the 111m willow sample surface! ! +lf
Ball on which to place the polishing surface 4. Attach the outer tube that removes the dark field zone of the objective lens to the attached lens turret compatible device of the drill mirror. The process of polishing the front surface of the objective lens outer cylinder by rotating the objective lens turret compatible device by oscillating Vc while t-WAi: Aligning the objective lens turret in the objective lens turret of the mirror 1 It provides a method that includes the right to

With the above procedure, the curvature of the a-edge of the objective lens barrel can be adjusted in a simple manner and placed on a specific mirror. When inserting this objective lens into the turret of a specific leprosy, it is only necessary to check the exact 1 degree position between the objective lens and the objective lens turret. t, or the use of a more solid positioning connection device (thus easier to do).

Further features, details and advantages of the invention will become apparent from the following description, which is accompanied by the accompanying drawing, which shows a preferred embodiment of the invention.

Description of mt* The forward stage 2 shown in 1 has a hole 1 for accommodating the sample. The ship contains 4 objective lenses and 3 front lenses from Gu Junjing.

The sample is illuminated by a dark field zone 11, the dark field zone including an annular lens or a toroidal mirror surface 6, the second one showing a toroidal mirror #56 provided in the outer space 7 which subtends the dark field zone. The objective lens 8B'IC holds three objective lenses and is placed in the outer radius γ.

A conventional tin radiation I11 field objective has a surface 9 lying in a plane slightly above the #i-plane lens 3.

This structure prevents damage to the front lens 3 due to contact with the sample. This front surface is indicated by the wavy line in Figure @2. - Holding 7188 of surface lens 3 is 1 which passes through 11i1 field of view.
Since it has an extremely thin structure so as not to obstruct the passage of the bright beam, there is a considerable risk of damage.

When rotating the accessory lens turret 10 (Fig. 1) to R*f the objective lens, the rotation axis 1 of the accessory lens turret 10
1 and the axis 13C of the objective lens (schematically shown in Figure 1). The object lens axis $It3 located behind the turret rotation axis 11 in the drawing is shown obliquely to the right Ilc# of FIG. 1 for convenience of illustration.

A conventional objective lens is shown in FIG.

! Edge 14.1 of surface III 9! When the objective lens 4 is rotated around the axis using the first intersection a12, these marriage parts may come into contact with the stage insertion plate 16.

Some of these 14. Ig is actually (ha - dashed line 17 (11
Figure 42) Move along the VC.

1'1' When the lens is actually used heavily, the distance between the objective lens 4 and the III mirror stage 2 is increased to prevent the above-mentioned bumps before rotating the objective lens turret lO. But @I
! If the user forgets this operation, there is a risk of damaging the objective lens.

According to the invention, in front of the outside 1117 of the objective 4 or on the curved surface 18, a straight section 20.2 shown on 119 is provided.
From 1, a uniformly sloped surface is formed on both sides, and the above straight @
The shaped portion lies within a plane that encompasses the rotation axis 11 of the objective lens turret 100 and the axis 11t3 of the objective lens. Outside 1117
All @22.2B (including moth 4ton) on 0@diB1B are.

A position that is steeper by a certain distance from the @11 intersection 12 of the rotation axis 11 of the accessory lens turret 10 and the objective lens axis @tS (there is, and this distance @ is greater than the distance between @1 intersection a12 and the 22424th 1122424 is also smaller or equal to the axis of the objective lens 13 and the linear portion 20 degrees of the 111 plane 18 of the outer 1II7.
Two inclined surfaces may be formed. In the illustrated embodiment, the curved surface 18 of the outer ring 7 is formed with a generating cylindrical surface, and this curved surface has a radius of curvature defined by the turret rotation axis 4111 and the accessory lens axis @13. VC grinding is protruding in the direction perpendicular to the paper surface of ll2ji and 3rd. The radius of curvature of this generated cylindrical surface 9 is the straight line 19 passing through the linear portion 20, 21, the axis of the objective lens @13, and the axis of the objective lens)
The distance between the 100 rotation axis 4111 and the intersection 12 is equal to the distance, and this generating circle fI11 plane is shown by the curve @25 in FIG.

In order to fit the 1114-field objective lens into a positive fiK specific mirror, it is necessary to compensate for the manufacturing tolerance of 10cm and the different mounting positions of the objective lens 4 (which occurs due to this manufacturing tolerance) by 4km. To do this, the front surface 18 of the objective lens 4 is polished using a corresponding device whose structure and dimensions match the #A microscopic stage and the attached lens turret. surface, i.e. t
The rust layer corresponding to the large plate 160 (126) is placed in the plane.

The above-mentioned polishing surface may be a surface made of 4 tons of abrasive material or a plate material coated with 4 tons of abrasive material.

The outer cylinder 7 is used as a part of the polishing device corresponding to the objective lens lO of the mirror after polishing. Approach the polishing surface one by one while swinging this device part from side to side.

When the curved surface 18 of the outer cylinder 7 of the accessory lens 4.1 daWc is sc-polished, the radius of curvature of the generated cylindrical surface is positive and linearly coincides with the required sensitivity of the specific customer mirror.

During this polishing process, only the outer cylinder 7 is polished, so that there is no risk of damage to the 411-plane lens 3 of the objective lens 10. Objective lens 4 is Tama T
After that, it is fixed on the objective lens turret 10 of ##'s microscope. Here, an 11-size test is performed for the objective lens 404. For example, this alignment is performed between the objective lens turret lO and the objective lens 4 (
It will be held at a distance of 4 meters.

As a test case, it was found that the slope of the 4t1 surface 18 of the outer cylinder 7 may be relatively small. For example, about 150M
When a stage insertion plate of approximately 0.1- is inserted into the opening above the 11i enemy mirror stage 2 with a turret axis rotation radius of 1
The outer 1m1117 near point 22.23 is 0. Polishing below IH is sufficient.

Also, for double-row purposes, the entire objective lens 4 is mounted on the objective lens turret 1.
It is not always necessary to rotate the axis with respect to zero. Therefore, if outer l117 can rotate in a circular motion, *
To align the carpet 18, it is sufficient to rotate the outer cylinder fin with the rotation 9 of the axis 13 of the objective lens.

[Brief explanation of the drawing]

Fig. 1 is a schematic diagram of an objective lens turret and stage with an inverted lens of 1-. FIG. 3 is an fI4 view of the objective lens according to the present invention. 2... Omikami stage, 3... Kenmen lens,
4...Objective lens, S...Dark field zone, 6
... Annular lens, 7... External lens, 8... Holding-110... Objective lens turret, 11...
Turret rotation axis. 13... Objective lens axis line ・

Claims (1)

[Scope of Claims] 1. An optical dark field pair #Bv lens used for a 4II enemy mirror with an objective lens turret, the cough objective lens has a front lens and a front lens lens, and The dark field zone is limited by the outward protrusion ahead of the front lens, and the 411 edge of the nuclear outer cylinder is located at both 11
11c edge clear field objective lens for use by customers. 2 - Han It attached to the 11km objective lens turret
1iti 41 as the objective lens, the cough objective lens turret is aligned with the axis of the objective lens [WL, -1! Due to the rotation of the angular ring and the oblique axis, the 4th lens of the ** Lens
It has a wide field of view and an objective lens barrel that protrudes ahead of the lens. The outward front track is uniformly inclined on both sides of the opposing linear portion of 211i, which is defined by a radial plane passing through the axis of rotation of the objective lens turret, and is parallel to the axis of rotation of the objective lens turret and that of the accessory lens. The distance from the intersection with the axis to the entire circumference of the above-mentioned front is the first point and '? 41 above in the object lens axis and radius plane! 211 of skill! The maximum distance is equal to the distance between 42 points of intersection with the straight line passing through the linear portion of 1. 3 With the infrared dark field lens described in item 41 above,
The outer surface of the objective lens is formed by a cylindrical surface created in one line perpendicular to the radial plane, and this radius of curvature is within the radial plane (
and the distance between the straight line interconnecting both rectangular portions of the outer rII beak edge and the 12th axis of rotation of the objective lens om can and the objective lens turret * is approximately 1. Anti-reflection lens for enemy mirrors. 44@ A method of combining a clear-field objective lens with a time-periodic m1ca having an objective lens turret. A screw that guides the stage of the microscope and the objective lens turret and a corresponding device whose dimensions match. Place the polishing surface of the polishing device in a plane corresponding to the sample surface of the continuous process. Attach the objective lens outer tube that limits the dark field zone of the objective lens to the objective lens turret compatible device of the 1111 continuous mirror. The IN- of the till field zone shape of the SW lens is scratched after the attached lens turret compatible device is rotated. y<- A method of aligning the objective lens with the objective lens turret of the mirror described in 4 above (method of aligning the objective lens 4 times).