JPS58169923A - Sample fixing jig for ic tester using electron beam - Google Patents

Sample fixing jig for ic tester using electron beam

Info

Publication number
JPS58169923A
JPS58169923A JP57051406A JP5140682A JPS58169923A JP S58169923 A JPS58169923 A JP S58169923A JP 57051406 A JP57051406 A JP 57051406A JP 5140682 A JP5140682 A JP 5140682A JP S58169923 A JPS58169923 A JP S58169923A
Authority
JP
Japan
Prior art keywords
sample
tester
jig
electron beam
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57051406A
Other languages
Japanese (ja)
Inventor
Toru Tojo
東条 徹
Kazuyoshi Sugihara
和佳 杉原
Mitsuo Tabata
光雄 田畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP57051406A priority Critical patent/JPS58169923A/en
Publication of JPS58169923A publication Critical patent/JPS58169923A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To permit a sample to be surely fixed onto a sample mount with such a shape as causing no interference on a probe card by a structure wherein a jig for holding the sample is limited in its thickness. CONSTITUTION:A plurality of rollers 31 are attached onto a cassette 30. These rollers 31 are held in position by springs 32 or the like. A wire 34 is stretched among the plural rollers 31 and a wafer is fixed by the wire 34. A stopper 33 and a pin 35 for positioning an orientation flat are also attached onto the cassette 30, but it is enough for them to have a height not greater than 3mm., typically ca. 1mm.. When used, the wire 34 is first stretched. This causes each roller 31 to be retreated via the spring 32, so that the wire 34 comes out of the wafer to permit exchange of wafer. The wafer may be fixed in a reverse manner as compared with the above.

Description

【発明の詳細な説明】 〔発明に属する技術分野〕 本発明は、電子ビームを用いた工0テスタに係わり、畦
しくけ上記テス!に使用されるに料1%−ユウエハの固
定治具−二関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] The present invention relates to a work-0 tester using an electron beam, and the present invention relates to a work-0 tester using an electron beam. 1% of the material used for the wafer fixing jig.

〔従来技術とその間組点〕[Prior art and intervening points]

ICの故障診断と不良解析には、これまで細い探針をR
1j足個Pk−二重て、それ感−オシロスコープを接続
して波形皺IJする方法が用いられている。しかし、仁
の中法でFi集積度がiIbまり動作速縦が速くなると
、技術的内離さが増大する。これは探針の大′#ざ以下
−二9間分解能な為めることができす、七の1建が1麺
なためである。さら感二、探釦の持つ靜電谷量やインダ
クタンス等のため6二時間レスポンスが制約されるため
である。
Up until now, thin probes have been used for IC failure diagnosis and failure analysis.
A method is used to connect an oscilloscope and measure the waveform wrinkles. However, when the Fi integration degree becomes iIb and the operating speed becomes faster in the middle method of Jin, the technical gap increases. This can be achieved because the resolution is between -29 below the diameter of the probe, and one 7 in 1 is one noodle. This is because the 62-hour response is limited by the amount of static electricity and inductance of the probe button.

このような問題を解決するものとして、*a電子ビーム
を用いた工Cテスタ(以IF w Bアスクと略記する
)が注目されている。このKBテスタは電子ビームの持
つ空間分解能に加えて翻たに時間分解能が追加されたも
ので、サブミクロンの空間分解能とピコ秒の時間分解能
をlWJ時に侍ることができるーその結果、配縁の切断
1!IPkの羅認のはか(二、動作状態の観察こより故
障診断および不良解析を行うことがで自る0さらに、グ
イナ建ツクRム菖のと1i擺二は、直流状態で故障箇所
を確認できないため%轡ロー有用である。
As a solution to such problems, an IF C tester (hereinafter abbreviated as IF W B ask) using an *a electron beam is attracting attention. This KB tester has temporal resolution added to the spatial resolution of the electron beam, and can handle submicron spatial resolution and picosecond temporal resolution during IWJ. Cut 1! How to understand IPk (2. Fault diagnosis and defect analysis can be performed by observing the operating status. Furthermore, Guina Kentsuk Rum Irisono and 1i Kokuji confirm the failure location under DC conditions. %轡LOW is useful because it cannot be done.

1181−は文献(電子材料1981−2号 スト四&
81M法感=よるxOの故障診断と不真解技術)I:記
載されたIBテスタのM]imを示す模式図である〇−
中1は電子銃2、レンズ3.4および走査用コイル5か
らなる電子光学鏡筒であり、6は試料型、7は排気ポン
プ、8#i試料(xo)s’はシンチレーシ曹ンカウン
タである。また、 10は加違電律、11はレンズ電源
、121j:走査用電源、 13は1号増幅−114,
15tliそれぞれm&線管(OR?)%16はカメラ
である。
1181- is a document (Electronic Materials No. 1981-2 St. 4 &
81M method = xO failure diagnosis and unresolved technology) I: Schematic diagram showing M]im of the described IB tester.
1 is an electron optical column consisting of an electron gun 2, a lens 3.4 and a scanning coil 5, 6 is a sample mold, 7 is an exhaust pump, and 8#i sample (xo)s' is a scintillation cylinder counter. be. In addition, 10 is a differential electric power, 11 is a lens power supply, 121j is a scanning power supply, 13 is No. 1 amplification-114,
15tli each m&ray tube (OR?)%16 is the camera.

このIBテスタで#′i、電子ビームを0.01−0.
1〔μm) In絞り、このビームで工08を熱射走査
したときの2次電子レスポンを0RT14e15に2表
示し、10%の故障給断および不良解析を行っている。
This IB tester #'i, electron beam 0.01-0.
1 [μm) In aperture, the secondary electron response when thermal radiation scanning of the workpiece 08 with this beam is displayed on 0RT14e15, and 10% failure supply/disconnection and failure analysis are performed.

具体的響;は、第2図および編3図に示す如くxo80
入出力端子1:■定カード21の接触ビン22を接続し
、工08からの2次電子をクンテレーシロンカウンタ9
で検出し、上記故障診断および不^′解析を行なうよう
Cl、ている0なお図中23#′i試料台、24は集束
レンズ、25#′iコレクタを示している0 ところがこのような1!Bテスタ1;あって#i測測定
れる試料ウェハを固定するC二は次のような問題があっ
た。すなわちウェハを試料台上−二置くだけでは検査、
測定中に試料台が動くこと5二よってウェハも動いてし
まいウェハの絢定チップの位置合せが毎回くるってしま
う。第4図1−示すように、例えば電子と−ム#Ikm
装置で使用されているウェハ固定方法を使うことも可能
であるが、ICBテスタの場合ではプローブカードi=
は#I5図(ユ示すようにチップの形状や測定内容に応
じたプローブが立っているため固定部が厚いとぶつかっ
てしまい正常な接触ができない。  ・ その他の方法、例えば真空チャック、静電チャックなど
があるが、真空中では真空チャックが使用できないし、
静電チャックは#j定の際、グランドレベルを変化して
使用する場合、などがあり極力電界をかけた状lIにし
喪〈ない。また素子に電楯O移動を行させ良くないなど
使用ができない。
The specific sound is xo80 as shown in Figure 2 and Figure 3.
Input/output terminal 1: Connect the contact bin 22 of the constant card 21 and send the secondary electrons from the unit 08 to the counter 9.
In the figure, 23#'i is the sample stage, 24 is the focusing lens, and 25#'i is the collector. ! B tester 1; C2, which fixes the sample wafer for #i measurement, had the following problem. In other words, simply placing the wafer on the sample stage is not sufficient for inspection.
As the sample stage moves during measurement, the wafer also moves and the positioning of the wafer measurement chip becomes incorrect each time. FIG. 4 1 - As shown, for example, electron and m#Ikm
Although it is possible to use the wafer fixing method used in the equipment, in the case of an ICB tester the probe card i=
As shown in Figure I5 (U), there are probes that are erected depending on the shape of the chip and the content of the measurement, so if the fixing part is thick, they will collide and make normal contact impossible. Other methods, such as vacuum chucks, electrostatic chucks etc., but vacuum chucks cannot be used in a vacuum,
When using an electrostatic chuck with #j constant, the ground level may be changed and used, so it is best to apply an electric field as much as possible. Moreover, the element cannot be used because it is not good because it causes the element to undergo electric shield O movement.

〔発明の目的〕[Purpose of the invention]

本発明は、従来の固定方法では1Bテスタ用試料OwI
定方法としてふされしくないため、プループカード1;
干渉しない形状で確実に試料を試料台に固定て會る電子
ビームを用いfI−xOテスタの試料一定治臭を提供す
ることを目的としている0〔働明の概要〕 本発明はプルーブカードのプループ形状が塊状の長さ以
上In伸ばして使用することができないことと、すて−
二多くの所で現状のものが使用されていることに注目し
、試料を押える治具の厚さを限定したこと、さらC;そ
のための機構を操作性を考えて決めたものである。
In the present invention, the sample OwI for 1B tester cannot be fixed by conventional fixing method.
Proop card 1 because it is not suitable as a standard method;
The purpose of the present invention is to provide constant odor control of the sample of the fI-xO tester using electron beams that securely fix the sample on the sample stage in a shape that does not interfere with the sample. The shape is lumpy and cannot be stretched beyond the length.
(2) The thickness of the jig for holding the sample was limited, noting that the current one is used in many places, and (C) the mechanism for this was decided with operability in mind.

〔発明の効果〕〔Effect of the invention〕

本発明署二よるとプローブカードのプローブを変更する
ことな〈従来のものがそのまま使用できること、ウェハ
ーの全面積C二わ九って検査が可能であること、試料台
の異常な暴走などC二よってもプローブやグループカー
ドと固定治具とが接触することがなく事故が起きない仁
となど利点が多い。
According to the second aspect of the present invention, there is no need to change the probe of the probe card (the conventional one can be used as is, the total area of the wafer can be inspected, and there is no need to change the probe card). Therefore, there are many advantages such as the fact that the probe or group card and the fixing jig do not come into contact with each other, and accidents do not occur.

またウェハの脱着をワンタッチで出来るため試料台上1
;保持され、ウェハを固定したカセットを毎回取り出す
ことなく試料の交換ができるため操作性が良いことなど
があけられる。
In addition, since the wafer can be attached and detached with one touch,
; The sample can be replaced without having to take out the cassette in which the wafer is fixed each time, so it is easy to operate.

〔発明の実施例〕[Embodiments of the invention]

押えかつグローブカードと干渉しない薄い固定油^を提
供するためワイヤーを用いている。
A wire is used to provide a thin fixed oil that does not interfere with the presser foot or glove card.

カセット(資)上に複数個のローラ31を取つける。A plurality of rollers 31 are mounted on the cassette.

このローラ31性適楢なスプリング32などによって保
持されている0複数個の謬−ラ(図でti4個であるが
)には9イヤー凋が張られており、このワイヤーによっ
てウェハを同定しようとするものである。カセット上に
はウェハめある程度の位置決めを行なう大めオリフラ位
置決め用ストッパお、ビン35が取付けられているが、
これらの高さFiIW程度出すだけで位置決めは十分で
あることが実験的j−*められている0ワイヤーの太さ
#′i使用する材質によって異なるが十分細いものでも
良い。
This roller 31 is held by a suitable spring 32, etc., and a 9-year wire is attached to a plurality of wafers (there are 4 in the figure), and an attempt is made to identify the wafer using this wire. It is something to do. A large orientation flat positioning stopper and a pin 35 are installed on the cassette to position the wafer to a certain degree.
It has been experimentally determined that the positioning is sufficient by increasing the height FiIW.Thickness #'i of the 0 wire varies depending on the material used, but it may be thin enough.

使用は次のよう鑑二行なう。カセット内部にワイヤをた
るます機構(図示せず)たとえばドラムにワイヤーを巻
きつけるとか、引っばるようにし、適蟲な所6二ひっか
けるとか、じよってワイヤーを伸ばす。そうするとロー
ラ31はスプリング32菖−よって縮められワイヤーは
ウェハの外側に出てし壕い。
The usage is as follows. A mechanism for slackening the wire inside the cassette (not shown), for example, by winding the wire around a drum, pulling it, and hanging it in an appropriate place, or by twisting and stretching the wire. Then, the roller 31 is compressed by the spring 32, and the wire comes out to the outside of the wafer.

ウェハ0交換を可能6:する。ウェハーを同定するとき
は上記の逆を行なえば良い。
Enable wafer 0 exchange 6: Execute. When identifying a wafer, the above procedure may be reversed.

〔発明の他の実施例〕[Other embodiments of the invention]

#!7図は本褪明の他O実施例を示すものである。 #! FIG. 7 shows an embodiment other than this one.

ウェハを押えかつウェハ交換時にはじゃまミニならない
$C固定治具が逆けるようにするため實ふりの固定治具
を用いている。カセット(資)にウェハを固定する賃ふ
り治具菖を複W!1個設ける同図(b) I= A−ム
断面の拡大図を示す普ふり治具36はビン37とそれに
固定され良例えば板バネあによって連結されている0板
バネあは1定ビン39と偏心カム旬で保持されており、
カムが上に偏心した時は実線で示すよう1:、下1:な
った時は破線で示すよう一二板バネが移動する。これg
二伴って菫ふり治具は実線で示された時はストッパー4
2に接触し、下方向に移動するとともI:時針方向ζニ
ー転しウェハな固定する。反対に破線で示した時は上方
向に移動するとともにストッパ41に接触し、反時計方
向−二(ロ)転じウェハの変換を可能にする。このよう
な構造ではプローブの突起が通常2 m Ii &であ
るために押え部の厚さを0.5〜l■程度感ユしても十
分にウェハを押えることができる。板バネを円形にする
ことによって複数個の首ふり治具を同#C;作動させ−
の貧ふり治具を多少改良して上下方向8二移動できるよ
うc l、良ものである。
An actual fixing jig is used to hold the wafer and prevent the $C fixing jig from getting in the way during wafer exchange. The swing jig that fixes the wafer to the cassette (material) is double W! The flat jig 36 shown in FIG. 3(b) showing an enlarged view of the cross section of I=A is a pin 37 and a flat spring fixed to it and connected by a flat spring, for example, a constant pin 39. and is held by an eccentric cam,
When the cam is eccentric upward, the 12 leaf spring moves as shown by the solid line, and when it is eccentric downward, the 12 leaf spring moves as shown by the broken line. This is g
2. When the violet jig is indicated by a solid line, the stopper is 4.
2, and as it moves downward, it rotates in the hour hand direction ζ knee and fixes the wafer. On the other hand, when it is indicated by a broken line, it moves upward and contacts the stopper 41, making it possible to convert the wafer in the counterclockwise direction. In such a structure, since the protrusion of the probe is usually 2 m Ii &, it is possible to sufficiently press the wafer even if the thickness of the presser portion is approximately 0.5 to 1 cm. By making the leaf spring circular, multiple swinging jigs can be operated.
It is a good one, with some improvement to the poor swinging jig so that it can move 82 times in the vertical direction.

板バネlでつるされfI−固定治具■は円1か二つけら
れた段差C二よって上1:持ち上げられたり元にもどっ
たりする。この構造C二しても上述した方法と何ら変わ
るところがない。
The fI-fixing jig (2), which is suspended by a leaf spring (1), is lifted up and returned to its original position by a step (C2) attached with one or two circles. Even with this structure C2, there is no difference from the method described above.

ようする轟二ウェハを固定する良めの固定治具を颯在の
10−プカードのプループ突起寸法を変更しなくても良
いようi:31 m以下としたこと、円周全部を(2)
定するのではなく複数ケ屑で固定したこと、略々の位置
出しを行なえるよう舊;オリ72にm接できるストッパ
、ビン(前記固定油^を一部共用してもよい)を設けた
ことなの本JR1嘴の会旨を変更しない範囲で形状構造
面は種々変更して製作することができる。
In order to avoid having to change the dimensions of the protrusion of the existing 10-plate protrusion, a good fixing jig for fixing the Todoroki wafer was set to less than 31 m, and the entire circumference was set to (2).
In addition, a stopper and a bottle (some of the fixed oil may be shared) that can be in contact with the cage 72 are provided to allow approximate positioning. The shape and structure of the Kotona JR1 beak can be changed in various ways without changing the purpose of the original JR1 beak.

【図面の簡単な説明】[Brief explanation of the drawing]

第1−〜183図はそれぞれ従来装置を説明するための
ものでS第1図ではIBテスタの原理を示す模式図、[
2図は上記テスタの壁部構成を一部切欠して示す斜視図
、第3図は上記テスタの作用を示す模式図、#I4図1
sa来用いられていたウェハ固定用カセットを示す図、
萬S図は第4図のカセットを使用した場合の間罎点を示
す図、第6図〜第8図は本発明の詳細な説明するための
図である0 1−・・電子光学鏡筒  8・・・ウェハなど試料9・
・・シンチレーシ冒ンカ9ンタ 14.15・・・論極線管  21−・プ四−プカード
22−・プローブ    園−カセット31・・・基準
円板    敦−バネ お−ストッパ    あ・・・ワイヤ あ・・・ビン      あ−・ウェハ押え治^37−
・1転ビン    あ−・板バネ39−・固定ビン  
  旬・・・偏心カム41.42・・・ストッパ  ロ
・−板バネ■・・・ウェハ押え治具 柘−・円板 (7317)代塩人弁理士 則 近 憲 佑 (はが1
名)第1図 第2図 第3図 第  4  図 第5図 第6図 81 第7図 (仄) 42   、ム。
Figures 1 to 183 are for explaining the conventional devices, respectively. Figure 1 is a schematic diagram showing the principle of the IB tester, and [
Figure 2 is a partially cutaway perspective view of the wall configuration of the tester, Figure 3 is a schematic diagram showing the operation of the tester, #I4 Figure 1
A diagram showing a wafer fixing cassette used since SA.
1. Electron optical lens barrel 1. Electron optical lens barrel 8...Sample 9 such as wafer
...Scintillation intruder 9.14.15...Logic ray tube 21--P4 card 22--Probe Cassette 31...Reference disk Atsushi-Spring O-Stopper A...Wire A ...Bin A--Wafer presser treatment ^37-
・1 turn bin a-・plate spring 39-・fixed bin
Shun... Eccentric cam 41.42... Stopper Lo - Leaf spring ■... Wafer holding jig Tsuge - Disk (7317) Representative Kensuke Chika (Haga 1)
Fig. 1 Fig. 2 Fig. 3 Fig. 4 Fig. 5 Fig. 6 Fig. 81 Fig. 7 (廄) 42.

Claims (1)

【特許請求の範囲】[Claims] (1)  試料を搭載し移動可能なテーブル類と、前記
試料の検査を行なうために必要な電蝕と、イg号の授受
を行なうリード線と、前記試料に接触するプローブを備
えたプ日−ブカードと、賦料向に電子ビームを照射する
電子光学−筒と、上記電子ビーム照射による試料からの
2次電子を検出する電子検出命などを具備したICIテ
スタの試料16i足治具において、 試料を乗せる基板と前記試料の外周の畝ケバfを前記基
板i二試料を押えつけるよう番ニして保持する押え治具
とからなり、前記押え治具の厚さt−J臥杓面から3關
以下にしたことを特徴とする’vry y−iy、5l
lI声111f%電子ビームを用いた工Cテスタの試料
tI!11足治共。 (治具押え治具として、直径2M以下のワイヤーとah
個のワイヤー支持機構とからなり、ワイヤの一部をゆる
めることによって前記試料の脱嵩を町にとした6L+紀
轡計請求の範囲第1項記載の電子ビームを用いた工0テ
スタの賦M1.!、1足市共。 (岨 押え治具として、略々L字形の形状をし、一部に
回転可能な回転機構な愉えた#I構造体、偏心カムと、
vJ記−心力ムの動きを略々上下運動として細配栴造体
に伝える徐幕と前記構造体の上下連動と連動させて簀ふ
り運動を行なわせるストッパとを備えたことを4111
1とする前記特許請求の範1第IJj4記載の電子ビー
ムを用いた工Cテスタの試料b!11足治諷。 (4+  押え治具として、略々5手形の形状をし、上
下刃向ζニスライド可能なs瑣体と、前Ik8構造体を
上下するため、構造体、と接触し、平向カムの形状をし
た円板とからなることを%似とした罰記特ト梢水の範H
麩1穏記載の電子ビームを用いた工Cテスタの試料同定
治具。
(1) A platform equipped with movable tables on which samples can be loaded, electrolytic corrosion necessary for inspecting the samples, lead wires for sending and receiving the Ig, and probes that come into contact with the samples. In the sample 16i leg jig of the ICI tester, which is equipped with a sample card, an electron optical tube for irradiating an electron beam toward the specimen, and an electron detection unit for detecting secondary electrons from the sample by the electron beam irradiation, etc. It consists of a substrate on which the sample is placed, and a holding jig that holds the ridges f on the outer periphery of the sample so as to press down the substrate i and the sample, and the thickness of the holding jig is t - J from the lying surface. 'vry y-iy, 5l, characterized by having less than 3 seats
lI voice 111f% Sample of engineering C tester using electron beam tI! 11 feet together. (As a jig holding jig, use wire with a diameter of 2M or less and ah
A 6L + tester comprising a wire support mechanism, in which the bulk of the sample is removed by loosening a part of the wire. .. ! , one pair city co. (A) As a presser jig, the #I structure, which is approximately L-shaped and has a rotation mechanism that can rotate in part, and an eccentric cam,
vJ - 4111 that it is equipped with a slow curtain that transmits the movement of the mental force as an approximately vertical motion to the finely arranged structure, and a stopper that causes a swinging motion in conjunction with the vertical movement of the structure.
Sample b of the engineering C tester using the electron beam according to Claim 1 No. 1Jj4, which is referred to as 1! 11 foot rules. (4+ As a presser jig, it has an approximately 5-hand shape and can slide in the upper and lower blade directions), and a flat cam shape that comes into contact with the structure to move the front Ik8 structure up and down. Punishment special to Kozusui no H which is similar to consisting of a disk with a
A sample identification jig for an engineering C tester using an electron beam as described in Fu 1.
JP57051406A 1982-03-31 1982-03-31 Sample fixing jig for ic tester using electron beam Pending JPS58169923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57051406A JPS58169923A (en) 1982-03-31 1982-03-31 Sample fixing jig for ic tester using electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57051406A JPS58169923A (en) 1982-03-31 1982-03-31 Sample fixing jig for ic tester using electron beam

Publications (1)

Publication Number Publication Date
JPS58169923A true JPS58169923A (en) 1983-10-06

Family

ID=12886049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57051406A Pending JPS58169923A (en) 1982-03-31 1982-03-31 Sample fixing jig for ic tester using electron beam

Country Status (1)

Country Link
JP (1) JPS58169923A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142828A (en) * 1989-10-27 1991-06-18 Tokyo Electron Ltd Treatment apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55127034A (en) * 1979-03-16 1980-10-01 Varian Associates Device for mechanically urging semiconductor wafer to soft thermoconductive surface

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55127034A (en) * 1979-03-16 1980-10-01 Varian Associates Device for mechanically urging semiconductor wafer to soft thermoconductive surface

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142828A (en) * 1989-10-27 1991-06-18 Tokyo Electron Ltd Treatment apparatus

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