JPS5816740B2 - display device - Google Patents

display device

Info

Publication number
JPS5816740B2
JPS5816740B2 JP13860577A JP13860577A JPS5816740B2 JP S5816740 B2 JPS5816740 B2 JP S5816740B2 JP 13860577 A JP13860577 A JP 13860577A JP 13860577 A JP13860577 A JP 13860577A JP S5816740 B2 JPS5816740 B2 JP S5816740B2
Authority
JP
Japan
Prior art keywords
electron beam
electrode
hole
focusing
accelerating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13860577A
Other languages
Japanese (ja)
Other versions
JPS5471559A (en
Inventor
竹迫義信
渡辺正則
野々村欽造
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13860577A priority Critical patent/JPS5816740B2/en
Publication of JPS5471559A publication Critical patent/JPS5471559A/en
Publication of JPS5816740B2 publication Critical patent/JPS5816740B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は平面状電子源から放出される電子ビームを一対
のマI−IJソックス電子ビーム制御電極によって制御
し、加速して螢光体面上に衝突させることによって画像
表示を行なう平板状の表示装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention displays an image by controlling the electron beam emitted from a planar electron source by a pair of MAI-IJ sock electron beam control electrodes, accelerating it and colliding it onto a phosphor surface. The present invention relates to a flat display device that performs.

平板状電子源から放出される電子ビームを一対のマt−
IJラックス電子ビーム制御電極によって制御し、文字
または画像を表示する平板状の表示装置を構成する試み
がなされている。
The electron beam emitted from the flat electron source is passed through a pair of matrices.
Attempts have been made to construct a flat display device that displays characters or images and is controlled by IJ Lux electron beam control electrodes.

第1図にこの種の表示装置の要部構成図の一例を示す。FIG. 1 shows an example of a main part configuration diagram of this type of display device.

1は平板状電子源であって熱陰極、電界放出冷陰極など
が使用される。
1 is a flat electron source, and a hot cathode, a field emission cold cathode, etc. are used.

2は多数の貫通孔6を穿設した格子状電極板で、陰極1
に対して正の電圧を印加し、電子ビームを取り出す。
2 is a grid-like electrode plate with a large number of through holes 6, and the cathode 1
A positive voltage is applied to the electron beam, and an electron beam is extracted.

電子ビームの一部は格子状電極板2の貫通孔を通過し、
電子ビーム制御電極板3の表面に達する。
A part of the electron beam passes through the through holes of the grid electrode plate 2,
The electron beam reaches the surface of the electron beam control electrode plate 3.

制御板3および4には多数の貫通孔6aおよび6bが縦
横に規則正しく穿設されており、各行、各列毎に短冊状
電極7および8が設けられていて、お互に直交するよう
に適当な間隔を保って、かつ直交する各交点において両
電極板に設けた貫通孔5a。
A large number of through holes 6a and 6b are regularly drilled in the control plates 3 and 4, vertically and horizontally, and strip-shaped electrodes 7 and 8 are provided in each row and each column, and are arranged in appropriate positions so as to be perpendicular to each other. Through-holes 5a are provided in both electrode plates at each orthogonal intersection point with a certain distance maintained between them.

6bが一致するように配置されている。6b are arranged so that they match.

電子ビーム制御電極板3の表面に達した電子ビームは各
短冊状電極7に印加する信号電圧に対応してビーム電流
が変調され、貫通孔6aを通過して電子ビーム制御電極
板4の表面に達する。
The beam current of the electron beam that has reached the surface of the electron beam control electrode plate 3 is modulated in accordance with the signal voltage applied to each strip-shaped electrode 7, and passes through the through hole 6a to reach the surface of the electron beam control electrode plate 4. reach

電極板4についても電極板3と同様なメカニズムによっ
て電子ビームは変調され貫通孔6bを通過する。
Regarding the electrode plate 4, the electron beam is modulated by the same mechanism as the electrode plate 3 and passes through the through hole 6b.

貫通孔6bを通過した電子ビームは加速電極板9に印加
する正の高電圧によって加速され、加速電極9の表面に
塗着した螢光体膜11に衝突して発光せしめる。
The electron beam passing through the through hole 6b is accelerated by a positive high voltage applied to the accelerating electrode plate 9, collides with the phosphor film 11 coated on the surface of the accelerating electrode 9, and emits light.

一般に電子ビーム制御板4と加速電極板9の間に、電子
ビームを集束またはコリメートし、かつ、加速用の高電
圧によって制御電極3,4の電位が影響を受けないよう
に集束電極板5を挿入する。
Generally, a focusing electrode plate 5 is provided between the electron beam control plate 4 and the accelerating electrode plate 9 to focus or collimate the electron beam and to prevent the potentials of the control electrodes 3 and 4 from being affected by the high voltage for acceleration. insert.

このように構成した表示装置において、電子ビーム制御
電極板3および4の各電極に信号電圧を順次印加すると
文字または画像を表示することができる。
In the display device configured in this manner, characters or images can be displayed by sequentially applying signal voltages to each electrode of the electron beam control electrode plates 3 and 4.

10は透明ガラス基板である。従来集束電極板5には電
子ビーム制御電極板3および4に設けた貫通孔6aおよ
び6bの位置に対応して貫通孔12を穿設したもの、ま
たは網状の電極板が使用されていた。
10 is a transparent glass substrate. Conventionally, the focusing electrode plate 5 has been provided with through holes 12 corresponding to the positions of the through holes 6a and 6b provided in the electron beam control electrode plates 3 and 4, or a mesh electrode plate has been used.

前記貫通孔12を穿設した集束電極板5を使用した場合
の電子ビームの集束状態を第2図に示す。
FIG. 2 shows the focused state of the electron beam when the focusing electrode plate 5 having the through holes 12 is used.

集束電極板5と加速電極11の間には10〜20KVの
高電圧が印加されるため、集束電極板5に設けた貫通孔
12の近傍には強い電界歪が生じ、13に示すような等
電位面が形成される。
Since a high voltage of 10 to 20 KV is applied between the focusing electrode plate 5 and the accelerating electrode 11, a strong electric field distortion occurs near the through hole 12 provided in the focusing electrode plate 5, and as shown in 13. A potential surface is formed.

貫通孔12近傍の凹形電界歪は電子ビームを集束する作
用がある。
The concave electric field distortion near the through hole 12 has the effect of focusing the electron beam.

集束作用の度合は貫通孔12の孔径と印加電圧および電
子ビームの平行性あるいは発散角によって異なり、一般
に貫通孔12の孔径が大きいほど、また、加速電圧が高
いほど集束作用は強くなる。
The degree of the focusing effect varies depending on the diameter of the through hole 12, the applied voltage, and the parallelism or divergence angle of the electron beam. Generally, the larger the diameter of the through hole 12 and the higher the accelerating voltage, the stronger the focusing effect.

例えば、加速電圧10KVを印加した場合、貫通孔の直
径が0.3mm$以上では、集束作用が強いため、電子
ビームの軌跡14はクロスポイント15を形成し加速電
極9面上では再び拡がって、微細な電子ビームを得られ
なくなる。
For example, when an accelerating voltage of 10 KV is applied, if the diameter of the through hole is 0.3 mm or more, the focusing effect is strong, so the trajectory 14 of the electron beam forms a cross point 15 and spreads again on the surface of the accelerating electrode 9. It becomes impossible to obtain a fine electron beam.

一方、できるだけ多くの電子ビームを貫通孔12を通過
させるためには貫通孔12の孔径を大きくする必要があ
り、したがって通過する電子ビーム電流を大きくするこ
とと微細な電子ビームを得ることはお互いに矛盾する関
係にある。
On the other hand, in order to allow as many electron beams as possible to pass through the through-hole 12, it is necessary to increase the diameter of the through-hole 12. Therefore, increasing the electron beam current passing through the through-hole and obtaining a fine electron beam are mutually important. They have a contradictory relationship.

また、ピッチが0.3 mm以下の格子状の網状電極を
使用した場合は、十分に集束しなかったり、網状電極の
複数個の孔を通過した電子ビームは各々の孔に対応した
電子ビームとなり、全体としては一点に集束する微細な
電子ビームとはならす、電子ビーム制御電極4に設けた
貫通孔12の直径より大きい電子ビームしか得られない
欠点があった。
In addition, when using grid-like mesh electrodes with a pitch of 0.3 mm or less, the electron beam may not be focused sufficiently or the electron beam that passes through multiple holes in the mesh electrode will become an electron beam corresponding to each hole. As a whole, there is a drawback that only an electron beam larger than the diameter of the through hole 12 provided in the electron beam control electrode 4 can be obtained, rather than a fine electron beam focused on one point.

本発明は上記欠点を取り除くことのできる電極構造を提
供するもので、集束電極板の貫通孔近傍の電界歪を一定
形状になるようにし、常に加速電極または螢光体面上で
、第2図に示す電子ビームのクロスポイントが形成され
るようにしたものである。
The present invention provides an electrode structure that can eliminate the above-mentioned drawbacks, by making the electric field distortion near the through hole of the focusing electrode plate into a constant shape, and always on the accelerating electrode or phosphor surface as shown in FIG. The cross point of the electron beam shown in the figure is formed.

以下本発明を図面とともに実症例に従って説明する。The present invention will be described below with reference to drawings and actual cases.

第3図a 、 b、第4図a、bは本発明の一実施例を
示すものである。
FIGS. 3a and 3b and FIGS. 4a and 4b show an embodiment of the present invention.

第3図a、bに示す集束電極20は、0.8mm間隔に
0.6mm9!fのメツシュ状貫通孔21を格子状に、
ホトエツチング技術によって厚さ0.1 mmの金属板
に形成し、第3図aに断面図を示すように曲率半径12
m7ILの凹面を各貫通孔21毎に形成したものである
The focusing electrodes 20 shown in FIGS. 3a and 3b are spaced at 0.8 mm intervals by 0.6 mm9! The mesh-like through holes 21 of f are arranged in a grid pattern,
It is formed on a metal plate with a thickness of 0.1 mm by photo-etching technology, and has a radius of curvature of 12 mm as shown in the cross-sectional view in Figure 3a.
A concave surface of m7IL is formed for each through hole 21.

また、第4図a、bに示す集束電極は、第3図に示す集
束電極20と同様、0.8mm間隔に0.6 mmダの
メツシュ状貫通孔21を格子状に設けた厚さ0、1 y
nmの金属板23と、同間隔で、0.6mrn9!5の
貫通孔る設けた厚さ0.2 mmの金属板24を重ね合
わせて構成したものである。
In addition, the focusing electrode shown in FIGS. 4a and 4b is similar to the focusing electrode 20 shown in FIG. , 1 y
It is constructed by overlapping a metal plate 23 with a thickness of 0.2 mm and a metal plate 24 with a thickness of 0.2 mm provided with through holes of 0.6 mrn9!5 at the same interval.

前記2つの実施例において、集束電極20と加速電極9
との間隔を4. mmとし、加速電圧10KV印加した
時、電子ビーム径は0.1〜0.2mmg;に集束され
た。
In the two embodiments, the focusing electrode 20 and the accelerating electrode 9
4. mm, and when an accelerating voltage of 10 KV was applied, the electron beam diameter was focused to 0.1 to 0.2 mm.

実施例に示す電極構造とした場合、いずれの場合も、第
3図aおよび第4図aに示すように、集束電極近傍の電
界は従来のものほどもひどくない一定形状の歪を生じ、
同図に示すような等電位面22が得られ、電子ビームに
集束作用を与えるものである。
When the electrode structures shown in the examples are used, in both cases, as shown in FIGS. 3a and 4a, the electric field near the focusing electrode causes a constant shape distortion that is not as severe as that of the conventional one.
An equipotential surface 22 as shown in the figure is obtained, which gives a focusing effect to the electron beam.

メツシュ状貫通孔21は本実施例では0.15ピツチと
したが、0.3ピッチ程度までは集束作用に犬さな変化
はなく、■型に貫通孔を形成することも可能である。
Although the mesh-like through-holes 21 are formed at a pitch of 0.15 in this embodiment, there is no significant change in the focusing effect up to a pitch of about 0.3, and it is also possible to form the through-holes in a square shape.

ビーム径は両電極間に印加する電圧と、第3図a、bの
場合はメツシュ状貫通孔2′の凹形の曲率、第4図a、
bの場合は電極24の板厚によって決定され、両電極間
隔にはあまり影響されない。
The beam diameter depends on the voltage applied between both electrodes, the concave curvature of the mesh-like through hole 2' in the case of Figures 3a and b, and the concave curvature of the mesh-like through hole 2' in Figures 4a and 4.
In case b, it is determined by the thickness of the electrode 24 and is not affected much by the distance between the two electrodes.

従って、加速電圧と必要とするビーム径によって、曲率
半径または板厚が決定されるべきものである。
Therefore, the radius of curvature or plate thickness should be determined depending on the accelerating voltage and the required beam diameter.

以上説明したように本発明は、集束電極の貫通孔に形成
された複数個の貫通孔群が凹状になされているため、加
速電圧と凹状の曲率半径を決めれば、任意のビーム径の
電子ビームを螢光面上に得ることができ、ビーム径を微
細化して解像度を高め得る。
As explained above, in the present invention, since the plurality of through-hole groups formed in the through-hole of the focusing electrode are formed in a concave shape, if the accelerating voltage and the radius of curvature of the concave shape are determined, an electron beam of an arbitrary beam diameter can be obtained. can be obtained on a fluorescent surface, and the beam diameter can be made finer to improve resolution.

また、メツシュ状電板を用いることによって、高電圧の
印加に伴なう漏洩電界によって、前段の電子ビーム制御
電極に悪影響を及ぼすこともなくなる。
Further, by using a mesh-like electric plate, leakage electric fields caused by application of high voltage will not have an adverse effect on the electron beam control electrode in the previous stage.

【図面の簡単な説明】 第1図は従来の平板状表示装置の主要構成図、第2図は
従来の貫通孔を有する集束電極の貫通孔近傍の電界歪の
状態を示す図、第3図a 、 b、第4図a、bは本発
明の表示装置の各実症例を示す拡大断面図および同平面
図である。 1・・・・・・電子源、2・・・・・・電極手段、3,
4・・・・・・制御電極、20、23、24・・・・・
・集束電極、21・・・・・・貫通孔群、22・・・・
・・等電位面、11・・・・・・発光面、9・・・・・
・加速電極。
[Brief Description of the Drawings] Fig. 1 is a diagram showing the main configuration of a conventional flat panel display device, Fig. 2 is a diagram showing the state of electric field distortion near the through-hole of a conventional focusing electrode having a through-hole, and Fig. 3 FIGS. 4A and 4B are an enlarged sectional view and a plan view of each actual case of the display device of the present invention. 1... Electron source, 2... Electrode means, 3,
4... Control electrode, 20, 23, 24...
・Focusing electrode, 21...Through hole group, 22...
... Equipotential surface, 11 ... Light emitting surface, 9 ...
・Acceleration electrode.

Claims (1)

【特許請求の範囲】[Claims] 1 平板状の電子源と、前記電子源から電子を取り出し
電子ビームを放射するための電極手段と、前記電子ビー
ムの選択的な通過を制御する制御手段と前記電子ビーム
を集束するための集中電極と、前記電子ビームを加速す
る加速手段と、前記電子ビームの衝突によって発光する
発光板とを備えてなる表示装置において、前記集束電極
が、前記電極手段から放射された電子ビームに対応する
位置に設けられた貫通孔と、前記貫通孔内に形成せられ
た複数個の貫通孔群とからなり、さらに前記貫通孔群が
前記加速手段方向に対して凹状に形成されてなることを
特徴とする表示装置。
1. A flat electron source, an electrode means for extracting electrons from the electron source and emitting an electron beam, a control means for controlling selective passage of the electron beam, and a concentrating electrode for focusing the electron beam. and a display device comprising an acceleration means for accelerating the electron beam, and a light emitting plate that emits light upon collision of the electron beam, wherein the focusing electrode is located at a position corresponding to the electron beam emitted from the electrode means. It is characterized by comprising a through hole provided and a plurality of through hole groups formed in the through hole, and further characterized in that the through hole group is formed in a concave shape with respect to the direction of the accelerating means. Display device.
JP13860577A 1977-11-17 1977-11-17 display device Expired JPS5816740B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13860577A JPS5816740B2 (en) 1977-11-17 1977-11-17 display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13860577A JPS5816740B2 (en) 1977-11-17 1977-11-17 display device

Publications (2)

Publication Number Publication Date
JPS5471559A JPS5471559A (en) 1979-06-08
JPS5816740B2 true JPS5816740B2 (en) 1983-04-01

Family

ID=15225988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13860577A Expired JPS5816740B2 (en) 1977-11-17 1977-11-17 display device

Country Status (1)

Country Link
JP (1) JPS5816740B2 (en)

Also Published As

Publication number Publication date
JPS5471559A (en) 1979-06-08

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