JPS58166646U - Photoresist substrate processing equipment - Google Patents
Photoresist substrate processing equipmentInfo
- Publication number
- JPS58166646U JPS58166646U JP6434682U JP6434682U JPS58166646U JP S58166646 U JPS58166646 U JP S58166646U JP 6434682 U JP6434682 U JP 6434682U JP 6434682 U JP6434682 U JP 6434682U JP S58166646 U JPS58166646 U JP S58166646U
- Authority
- JP
- Japan
- Prior art keywords
- photoresist substrate
- photoresist
- substrate processing
- processing equipment
- protective layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は本考案の処理装置の全体を示す図であり、１お
よび２は回転ローラー、３はフォトレジスト基板、４は
ノズル、６はスクレーパー、７はポンプである。
第２図は回転ローラー２の断面方向からの見取図であり
、第３図は回転ローラー２の正面方向からの見取図であ
り、いずれも２は回転ローラー、５は回転ローラー表面
に設けた溝、６はスクレーパーである。第２図ａと第３
図ａが、第２図すと第３図すがそれぞれ対応する。FIG. 1 is a diagram showing the entire processing apparatus of the present invention, in which 1 and 2 are rotating rollers, 3 is a photoresist substrate, 4 is a nozzle, 6 is a scraper, and 7 is a pump. FIG. 2 is a sketch of the rotating roller 2 from the cross-sectional direction, and FIG. 3 is a sketch of the rotating roller 2 from the front, in which 2 is the rotating roller, 5 is a groove provided on the surface of the rotating roller, and 6 is a scraper. Figures 2a and 3
Figure a corresponds to Figure 2 and Figure 3, respectively.
Claims (1)
，２の間を表面が保護層で被覆されたフォトレジスト基
板３が搬送され、その間にフォトレジスト基板３の上下
両面よりノズル４から液体が噴射されて保護層を脱離除
去するフォトレジスト基板の処理装置において、下列ロ
ーラー２の軸と直角方向にスクレーパー６を少なくとも
その先端力釦−ラー２の頂部より下に位置するように設
けることを特徴とするフォトレジスト基板の処理装置。Two rows of upper and lower rotating rollers 1 provided at appropriate intervals
, 2, a photoresist substrate 3 whose surface is covered with a protective layer is conveyed between the photoresist substrate 3 and a nozzle 4 injecting liquid from the upper and lower surfaces of the photoresist substrate 3 to detach and remove the protective layer. A processing apparatus for photoresist substrates, characterized in that a scraper 6 is provided in a direction perpendicular to the axis of the lower row roller 2 so as to be located at least below the top of the tip force button 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6434682U JPS58166646U (en) | 1982-04-30 | 1982-04-30 | Photoresist substrate processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6434682U JPS58166646U (en) | 1982-04-30 | 1982-04-30 | Photoresist substrate processing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58166646U true JPS58166646U (en) | 1983-11-07 |
Family
ID=30074382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6434682U Pending JPS58166646U (en) | 1982-04-30 | 1982-04-30 | Photoresist substrate processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58166646U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0252353A (en) * | 1988-08-16 | 1990-02-21 | Fuji Photo Film Co Ltd | Processing method and device for developing photosensitive planographic printing plate |
| JP2022112587A (en) * | 2021-01-22 | 2022-08-03 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate transport device, developing device, and developing method |
-
1982
- 1982-04-30 JP JP6434682U patent/JPS58166646U/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0252353A (en) * | 1988-08-16 | 1990-02-21 | Fuji Photo Film Co Ltd | Processing method and device for developing photosensitive planographic printing plate |
| JP2022112587A (en) * | 2021-01-22 | 2022-08-03 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate transport device, developing device, and developing method |
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