JPS5815657U - Etching device - Google Patents
Etching deviceInfo
- Publication number
- JPS5815657U JPS5815657U JP10742081U JP10742081U JPS5815657U JP S5815657 U JPS5815657 U JP S5815657U JP 10742081 U JP10742081 U JP 10742081U JP 10742081 U JP10742081 U JP 10742081U JP S5815657 U JPS5815657 U JP S5815657U
- Authority
- JP
- Japan
- Prior art keywords
- etching
- screen member
- etching solution
- tank
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来のエツチング装置の断面図、第2図は、こ
の考案のエツチング装置の正面図、第3図は第2図A−
A’線の断面図を各々示す。
21・・・・・・エツチング槽、22・・・・・・筒状
側壁、26・・・・・・搬送手段、27.27’・・・
・・・噴射手段、28・・・・・・左端部、29・・・
・・・右端部、30・・・・・・排出 ′口、31・
・・・・・スクリーン部材、33・・・・・・エツチン
グ残渣回収手段、35・・・・・・メツシュ、36・・
・・・・エツチング液貯溜槽。Fig. 1 is a sectional view of a conventional etching device, Fig. 2 is a front view of the etching device of this invention, and Fig. 3 is Fig. 2A-
A sectional view taken along line A' is shown in each case. 21... Etching tank, 22... Cylindrical side wall, 26... Conveying means, 27.27'...
...Injection means, 28...Left end portion, 29...
...Right end, 30...Discharge port, 31.
... Screen member, 33 ... Etching residue collection means, 35 ... Mesh, 36 ...
...Etching liquid storage tank.
Claims (1)
るエツチング液の噴射手段とを内部に有するエツチング
槽の下部において、該エツチング槽の筒状側壁の左右両
端部を互いに段違いにして形成したエツチング液の排出
口を設け、エツチング液の大部分を透過して降下させる
がエツチング残渣を小量のエツチング液とともに搬送し
うるように下方に傾斜したスクリーン部材を前記排出口
の下方に位置する端部に連続的に接続してなり、該スク
リーン部材により搬送されたエツチング残渣を収容し且
つエツチング液を通過させるメツシュを底部に設けたエ
ツチング残渣回収手段を設け、下方にエツチング液貯溜
槽を設けてなるエツチング装置。An etching liquid discharge port is formed in the lower part of the etching tank, which has a means for transporting the material to be etched and a means for injecting the etching liquid to the material to be etched therein, with the left and right ends of the cylindrical side wall of the etching tank having different levels from each other. A downwardly inclined screen member is continuously installed at the end located below the discharge port so that most of the etching solution can pass through and fall, but a small amount of the etching residue can be carried along with the etching solution. An etching apparatus comprising: an etching residue collecting means connected to the screen member, the bottom of which is provided with a mesh that accommodates the etching residue conveyed by the screen member and allows the etching solution to pass therethrough; and an etching solution storage tank provided below.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10742081U JPS5815657U (en) | 1981-07-20 | 1981-07-20 | Etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10742081U JPS5815657U (en) | 1981-07-20 | 1981-07-20 | Etching device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5815657U true JPS5815657U (en) | 1983-01-31 |
JPS6215240Y2 JPS6215240Y2 (en) | 1987-04-17 |
Family
ID=29901858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10742081U Granted JPS5815657U (en) | 1981-07-20 | 1981-07-20 | Etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5815657U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0473970U (en) * | 1990-11-05 | 1992-06-29 |
-
1981
- 1981-07-20 JP JP10742081U patent/JPS5815657U/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0473970U (en) * | 1990-11-05 | 1992-06-29 |
Also Published As
Publication number | Publication date |
---|---|
JPS6215240Y2 (en) | 1987-04-17 |
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