JPS58155541A - Information recording medium - Google Patents
Information recording mediumInfo
- Publication number
- JPS58155541A JPS58155541A JP57036421A JP3642182A JPS58155541A JP S58155541 A JPS58155541 A JP S58155541A JP 57036421 A JP57036421 A JP 57036421A JP 3642182 A JP3642182 A JP 3642182A JP S58155541 A JPS58155541 A JP S58155541A
- Authority
- JP
- Japan
- Prior art keywords
- eutectic
- film
- elements
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
- G11B7/0045—Recording
- G11B7/00453—Recording involving spectral or photochemical hole burning
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2531—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising glass
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はレーザ光等のエネルギービームによって所定の
基板上に設けられた記録媒体に、たとえば映像や音声信
号や電子計算機のデータ等の情報を記録することを可能
とする記録用部材に関するものである。[Detailed Description of the Invention] The present invention makes it possible to record information such as video, audio signals, computer data, etc. onto a recording medium provided on a predetermined substrate using an energy beam such as a laser beam. This invention relates to a recording member.
近年、基板上に設けられた金属薄膜にレーザ元号によっ
て情報の書き込みを行なう情報記録方式が注目されてい
る。この種の記録方式は、レーザ光等の加工用ビームの
熱的エネルギーによづて金属薄膜に穴または凹部を形成
することによって行なうものである。この金属薄膜は、
厚さが100〜100OAでガラスやプラスチックなど
の基板上へ蒸着法等で付着されている。この情IN記録
用の金属薄膜材料として心安な条件u、(1)低エネル
ギービームで容易に穴あけまたは凹部形成ができること
、(2)穴または凹部の形状がエネルギービームの断面
形状に近く滑らかな周縁を持つこと、(3)長期保存あ
るいは0〜100C程度の熱サイクルに対して膜質の経
時変化がないこと、である。これらの条件tfcJMえ
て二次的な条件として、(4) 1000人以F0厚さ
の均質な膜を再現性よく製造できること、(5)毒性が
ないこと、などが加わる。In recent years, an information recording method in which information is written on a metal thin film provided on a substrate using a laser era has been attracting attention. This type of recording method is performed by forming holes or recesses in a metal thin film using the thermal energy of a processing beam such as a laser beam. This metal thin film is
It has a thickness of 100 to 100 OA and is attached to a substrate such as glass or plastic by vapor deposition or the like. Conditions for making this metal thin film material for information recording are safe: (1) holes or recesses can be easily formed with a low-energy beam; (2) the shape of the hole or recess is close to the cross-sectional shape of the energy beam and has a smooth periphery. and (3) no change in film quality over time during long-term storage or thermal cycles of about 0 to 100C. In addition to these conditions for tfcJM, secondary conditions include (4) being able to produce a homogeneous film with a thickness of F0 for more than 1000 people with good reproducibility, and (5) being non-toxic.
従来用いられていた膜の代表的な材料としてTeが知ら
れている。この材料は融点が4500と低く、シかも熱
電導率が悪いのでレーザ等のエネルギービームを照射し
たとき、1.2nJ/μm!程度の低いエネルギ〜で穴
を容易にあけることができる。さらに、形成される孔の
形状を改善したり、高湿度の環境中での安定性を高める
ため、TeにAs、Seなどの元素を加えた合金も使用
されている。しかしながら感度は未だ十分高くはない。Te is known as a typical material for conventionally used films. This material has a low melting point of 4,500 and poor thermal conductivity, so when irradiated with an energy beam such as a laser, it has a melting point of 1.2 nJ/μm! Holes can be easily drilled with a low amount of energy. Furthermore, alloys in which elements such as As and Se are added to Te are also used in order to improve the shape of the pores formed and to increase stability in high humidity environments. However, the sensitivity is still not high enough.
また、Te、As、F3eは重金属であり、毒性の点で
も取扱上の注意が必要である。Further, Te, As, and F3e are heavy metals, and care must be taken when handling them in terms of toxicity.
本発明は、これらの問題点を解決するためになされたも
のであり、その目的は比較的低いエネルギービームで穴
あけがoT能で、しかも膜質の経時変化も少なく、毒性
も少ない、情報記録用の膜を提供することにある。以下
、本発明の基本原理について説明する。The present invention was made in order to solve these problems, and its purpose is to provide a material for information recording that can perform hole drilling with a relatively low energy beam, has little change in film quality over time, and is less toxic. The goal is to provide a membrane. The basic principle of the present invention will be explained below.
第1図は、本発明の詳細な説明図である。ガラス、プラ
スチック等から成る基板1上に、2mMの膜2,3を付
層させる。ここで2種類の膜の組会せは、その各々の構
成元素が互いに共晶を形成する組合せとする。すなわち
、構成元素を混合することによって、その融点がそれぞ
れの単体元素の融点より低下する組合せに選ぶ。例えば
、元素の組合せと共晶点の温度を示すと具体的には以下
の例がある。ここで共晶組成は第2元素の割合を原子パ
ーセントで示す。すなわち、Ag 26Qe(651
C)、Ag−95Bi (271c)。FIG. 1 is a detailed explanatory diagram of the present invention. 2mM films 2 and 3 are layered on a substrate 1 made of glass, plastic, or the like. Here, the combination of two types of films is such that the respective constituent elements form a eutectic with each other. That is, by mixing the constituent elements, a combination is selected in which the melting point thereof is lower than the melting point of each element alone. For example, specific examples of element combinations and eutectic point temperatures are as follows. Here, the eutectic composition indicates the proportion of the second element in atomic percent. That is, Ag 26Qe (651
C), Ag-95Bi (271c).
Ag−41Sb (485C)、Ag−67Te(35
1C)、At−30,3Ge (424G>。Ag-41Sb (485C), Ag-67Te (35
1C), At-30,3Ge (424G>.
At−11,3S i (597U)、At−87F
e(414C)、Au−27Ge (356c)。At-11,3S i (597U), At-87F
e (414C), Au-27Ge (356c).
Au−348i (37(N:’)、B−45Ni(
990C) 、 S n −43B i (139
C) 、 B 1−90.3Te(413C)、Cu
−71Te (340c)。Au-348i (37 (N:'), B-45Ni (
990C), Sn-43B i (139
C), B 1-90.3Te (413C), Cu
-71Te (340c).
Mn−53Ge (697C)、5b−17Ge(59
0C)、Ge−85Te (375tl。Mn-53Ge (697C), 5b-17Ge (59
0C), Ge-85Te (375tl.
Mn−81Sb (570G)、Pb−17,5Sb(
252C)、Pb−85,5Te (405C)。Mn-81Sb (570G), Pb-17,5Sb (
252C), Pb-85,5Te (405C).
Pb−89Sb (590C)、Pd−4581(72
0C)、5b−89Te(424C)、などである。第
1図(a)に示すように、下層膜2、上ノー膜3に上記
組合せの各々の元素の膜を付着させる。ここで、2つの
膜に分離して各々の元素を膜状に付着させるのは、以F
の理由による。構成元素だけの膜の場合その融点は、三
元素を混合した場合よりはるかに高い。例えば、At−
Geの場合融点はAt(660C)、Ge (940C
)。Pb-89Sb (590C), Pd-4581 (72
0C), 5b-89Te (424C), etc. As shown in FIG. 1(a), a film of each element in the above combination is deposited on the lower film 2 and the upper film 3. Here, separating into two films and attaching each element in the form of a film is as follows.
Due to reasons. The melting point of a film containing only the constituent elements is much higher than that of a film containing three elements. For example, At-
In the case of Ge, the melting point is At (660C), Ge (940C
).
At−30,3Ge (424C)であり、合金′組成
よシ単体元素の融点の方が200C以上も高い。It is At-30,3Ge (424C), and the melting point of the single element is 200C or more higher than that of the alloy composition.
融点が高いと元素の拡散が起シ難いため、その膜の加熱
サイクルや長期保存に対する経時変化を小さくすること
ができる。ついで、この2層膜の上方からレーザビーム
のようなエネルギービームを照射すると、第1図(b)
に示すように2層膜の界面で2つの元素が混合し共晶化
が起こり、共晶層4が生成する。共晶になると融点が急
激に低下するので2層膜は急速に溶融あるいは蒸発して
、第1図(C)に示すような穴5が形成される。When the melting point is high, diffusion of elements is difficult to occur, so that changes over time during heating cycles and long-term storage of the film can be reduced. Next, when an energy beam such as a laser beam is irradiated from above this two-layer film, the image shown in Fig. 1(b)
As shown in the figure, two elements are mixed at the interface of the two-layer film, eutectic formation occurs, and a eutectic layer 4 is generated. When it becomes eutectic, the melting point drops rapidly, so the two-layer film rapidly melts or evaporates, forming holes 5 as shown in FIG. 1(C).
このような2層膜構造を便用することにより、0−10
01:”程度の加熱サイクルや長期間保存に対して経時
変化がなく、シかも共晶化現象を利用することにより比
較的低いエネルギービームで穴あけもしくは凹部形成が
できる情報記録用の膜を実現できる。ここで2層膜の下
層膜としては、エネルギービーム照射時に熱が基板へ拡
散するのを防ぐため、2種類の元素のうち熱電導率の悪
い元素の膜を使用するのが望ましい。また、使用元素と
しては一般的に耐酸化性、耐触性の良いものが望ましく
、酸素等に対して活性なMg、Ca。By using such a two-layer membrane structure, 0-10
01: By utilizing the eutectic phenomenon, it is possible to create a film for information recording that does not change over time even after several heating cycles or long-term storage, and can be used to form holes or recesses with a relatively low energy beam. Here, as the lower layer of the two-layer film, in order to prevent heat from diffusing into the substrate during energy beam irradiation, it is desirable to use a film of an element with poor thermal conductivity among the two types of elements. Generally, it is desirable to use elements that have good oxidation resistance and contact resistance, such as Mg and Ca, which are active against oxygen and the like.
artなどの元素は望ましくない。毒性が問題となる場
合には、毒性の小さい元素の組合せを選ぶことが必要に
なる。さらに、基本的にはそれぞれ単体元素から成る下
層膜と上層膜を使用するが、この情報記録用の膜の経時
変化特性、エネルギービームであける穴の形状、等を改
善するため、それぞれの膜に他の元素を加えることも有
効である。Elements such as art are undesirable. If toxicity is an issue, it is necessary to select a combination of elements with low toxicity. Furthermore, a lower layer film and an upper layer film are basically used, each consisting of a single element, but in order to improve the aging characteristics of the information recording film, the shape of the hole made by the energy beam, etc. Adding other elements is also effective.
例えば、kl−Ge2層膜の場合AtにSi。For example, in the case of a kl-Ge double layer film, At and Si are used.
QeにBiを数パーセント程度加えてA4,8i−Qe
、13iの2層膜にすることにより、より低いエネルギ
ービームで穴をあけることができる。Add a few percent of Bi to Qe to make A4,8i-Qe
, 13i makes it possible to make holes with a lower energy beam.
また、三元素又は合金のそれぞれの融点と、それらの共
晶点の温度とは200C以上差があることが好ましい。Further, it is preferable that there is a difference of 200 C or more between the melting points of each of the three elements or alloys and the temperature of their eutectic point.
以下実施例を用いて本発明を説明する。The present invention will be explained below using Examples.
実施例1
本実施例は、At (S i )−Ge2層膜を用いた
情報記録膜に関する。蒸着基板として直径30口、厚さ
1mの透明プラスチック円板を使用した。Example 1 This example relates to an information recording film using an At(S i )-Ge two-layer film. A transparent plastic disk with a diameter of 30 holes and a thickness of 1 m was used as a deposition substrate.
10−’〜10−’Torrの真空中テ、X空蒸着法テ
tず約100人のQe膜を付着させ、ついてAt−10
原子%Si膜を約70大村着させ、下層膜がQe、上層
膜がSiを含むAtから成る2層膜を形成した。ここで
上層膜としてAt中KSiを少iit添〃口したのは、
後の工程のレーザビームによる穴あけの際にレーザビー
ムがAtによって反射されるのを防ぐためである。Approximately 100 Qe films were deposited in a vacuum of 10-' to 10-' Torr using an X-vacuum deposition method, followed by At-10
A Si film having a thickness of about 70 atomic % was deposited to form a two-layer film consisting of a lower layer of Qe and an upper layer of At containing Si. Here, a small amount of KSi in At was added as the upper layer because
This is to prevent the laser beam from being reflected by At when drilling with a laser beam in a later step.
ついでこの円板を記録書き込み装置に取りつけ、情報の
書き込みを行なった。円板を180Orpmで回転させ
ながら、記録用レーザビームのヘッドを円板面上から一
定距離を保って接近させた。ついで、2層膜面上におい
て約0.8μmφに絞った波長488OAのアルゴンレ
ーザ光をパルス状に照射して情報の記録を行なった。こ
の2層膜の界面において共晶化を進行させて穴をあける
のに必要なレーザ光のパワーは約15mWであった。ま
た、この2層膜を溶融するのに必要なレーザエネルギー
感度は1.5 n J 7μm2であった。これらの値
は従来のTe系の記録材料とほぼ同等である。Next, this disk was attached to a recording/writing device and information was written on it. While rotating the disk at 180 rpm, the recording laser beam head was brought close to the disk surface while maintaining a constant distance. Next, information was recorded by irradiating pulsed argon laser light with a wavelength of 488 OA focused to approximately 0.8 μmφ on the surface of the two-layer film. The power of the laser beam required to advance eutectic formation and create a hole at the interface of this two-layer film was about 15 mW. Further, the laser energy sensitivity required to melt this two-layer film was 1.5 nJ 7 μm2. These values are almost equivalent to those of conventional Te-based recording materials.
穴の短径約1μmφの楕円形の穴を形成することができ
た。It was possible to form an oval hole with a short diameter of about 1 μmφ.
情報を記録した円板を0−60tll’の繰り返し加熱
試験に供した。104の加熱サイクルを与えた後、2層
膜の状態を調べた結果、膜質はほとんど変化しておらず
、記録情報は良好に保たれていることが確認された。The disc on which information was recorded was subjected to a repeated heating test from 0 to 60 tll'. After applying 104 heating cycles, the state of the two-layer film was examined, and it was confirmed that the film quality had hardly changed and the recorded information was well maintained.
実施例2
本実施例は各種2ノー膜の評価に関するものであり、穴
をあけるのに必要なレーザ光のパワー、レーザエネルギ
ー感度、および繰り返し加熱試験後2層膜の状態を比較
検討した。Example 2 This example relates to the evaluation of various types of 2-layer films, and the power of the laser beam required to make holes, the laser energy sensitivity, and the state of the 2-layer film after repeated heating tests were compared and studied.
30wX60mX1+mのガラス基板上に、スパッタ法
もしくは蒸着法によって、下層膜として100A、上層
膜として約70人の金属膜を付着させて2層膜を形成し
た。これらの膜について、実施例1と同様な手順で、穴
をあけるのに必要なレーザ光のパワー、レーザエネルギ
ー感度、および0−60Cの10’回加熱サイクル特性
を調べた。結果をまとめて表1に示す。繰り返し加熱の
結果、全く異常の生じなかった場合はO印、一部で異常
が生じたものはΔ印で示しである。A two-layer film was formed by depositing a metal film of 100 A as a lower layer film and a metal film of about 70 A as an upper layer film on a 30 w x 60 m x 1+ m glass substrate by sputtering or vapor deposition. Regarding these films, the power of the laser beam necessary to make the hole, the laser energy sensitivity, and the heating cycle characteristics of 10' times from 0 to 60 C were examined in the same manner as in Example 1. The results are summarized in Table 1. As a result of repeated heating, if no abnormality occurred at all, it is marked O, and if some abnormality occurred, it is marked Δ.
本実施例で明らかなように、2層膜構造を利用すること
により、経時変化がほとんど生ぜず、しかも情報の記録
は従来のTe系膜の場合とほぼ同様に行なうことができ
る、f11記録用の膜を実現することができる。As is clear from this example, by using a two-layer film structure, there is almost no change over time, and information can be recorded in almost the same way as with conventional Te-based films. It is possible to realize a film of
−茨-Thorns
第1図(a)(b)(C)は本発明の詳細な説明する図
でろる。
1・・・基板、2・・・下層膜、3・・・上層膜、4・
・・共晶層、224−
第 1 図
(a)
(C)FIGS. 1(a), 1(b), and 1(C) are diagrams for explaining the present invention in detail. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Lower layer film, 3... Upper layer film, 4...
...eutectic layer, 224- Figure 1 (a) (C)
Claims (1)
成る情報記録媒体において、該薄膜が下膚と上層の28
類の薄膜の積層から成り、この2層を形成するそれぞれ
の元素又は合金がその二元系状態図の少なくとも一箇所
において共晶を形成する組合せであることを特徴とする
情報記録用媒体。1. An information recording medium consisting of a substrate and a thin film for information recording attached to the substrate, in which the thin film has 28 parts of the lower skin and the upper layer.
1. An information recording medium comprising a stack of thin films of the same type, characterized in that the respective elements or alloys forming the two layers form a eutectic at at least one location in the binary phase diagram.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57036421A JPS58155541A (en) | 1982-03-10 | 1982-03-10 | Information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57036421A JPS58155541A (en) | 1982-03-10 | 1982-03-10 | Information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58155541A true JPS58155541A (en) | 1983-09-16 |
Family
ID=12469358
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57036421A Pending JPS58155541A (en) | 1982-03-10 | 1982-03-10 | Information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58155541A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6331035A (en) * | 1986-07-25 | 1988-02-09 | Fuji Photo Film Co Ltd | Recording medium and recording and reproducing method thereof |
JPH04209344A (en) * | 1989-12-21 | 1992-07-30 | Gold Star Co Ltd | Optical recording medium and manufacture thereof |
JP2003535422A (en) * | 2000-05-30 | 2003-11-25 | コミツサリア タ レネルジー アトミーク | Irreversible optical recording medium |
JP2006155872A (en) * | 2004-11-25 | 2006-06-15 | ▲らい▼徳科技股▲ふん▼有限公司 | Two-layer recordable optical disk and its manufacturing method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5724035A (en) * | 1980-07-18 | 1982-02-08 | Sony Corp | Optical information recording medium |
-
1982
- 1982-03-10 JP JP57036421A patent/JPS58155541A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5724035A (en) * | 1980-07-18 | 1982-02-08 | Sony Corp | Optical information recording medium |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6331035A (en) * | 1986-07-25 | 1988-02-09 | Fuji Photo Film Co Ltd | Recording medium and recording and reproducing method thereof |
JPH04209344A (en) * | 1989-12-21 | 1992-07-30 | Gold Star Co Ltd | Optical recording medium and manufacture thereof |
JP2003535422A (en) * | 2000-05-30 | 2003-11-25 | コミツサリア タ レネルジー アトミーク | Irreversible optical recording medium |
JP2006155872A (en) * | 2004-11-25 | 2006-06-15 | ▲らい▼徳科技股▲ふん▼有限公司 | Two-layer recordable optical disk and its manufacturing method |
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