JPS58153935A - Taking-in and-out system of photomask - Google Patents

Abstract

PURPOSE:To take in and out masks easily, by dividing many masks for one kind of semiconductor device by stages to support them in one mask storage box independently of one another and arranging plural mask storage boxes in lines and columns and taking in and out them by a computer. CONSTITUTION:A carrying machine 3 consists of a leg part 3a which runs on rails 5 laid in parallel with faces of shelves 2 where mask storage boxes are stored, a pole 3b vertical to the leg part 3a, and a head part 3c which is moved vertically along the pole and is stopped, and the head part is provided with a fork 3d. In case of taking-out of a mask storage box, when the kind of an LSI is inputted to a computer 6, the head approaches one mask storage box and is oriented, and the fork is projected, and the mask storage box is placed on the fork, and the fork is pulled back to hold the mask storage box. Next, the carrying machine runs and moves the mask storage box onto rails 5' in a taking-out part 4, and the mask storage box is transferred to a mask operating part 7, and a desired mask is taken in or out there.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a photomaster OaS storage system), and a storage system for a JA7OF mask used in a semiconductor manufacturing IIO exposure process.

[Invention O weight technology]

The 411M-1E 7 Otomask Hiro, semiconductor fabrication type, and lithography process are all different. Therefore, in the case of LIIIt, one type of steel has to be made up of more than ten grades, and since it is necessary to strip it every time it is exposed and placed, the number of sheets reaches several dozen.

In recent years, there has been a trend toward exposure devices having automatic alignment mechanisms, and thus exposure and the processes before and after it are also becoming automated. However, handling of photomasks during the exposure process is a very complicated problem since there are so many types of photomasks. Traditionally, everything was put into a computer by type,
By controlling the amount of input F, the desired Qff star can be disbursed and disbursed. In other words, there is.

In selecting the 7 otomasks of the pattern, 100
1! Depending on the combinator, for example, ooooo-.

(Type) -0-1-0 (0th resist exposure process I &) -
〇-0 (Number by loft) -0-0 (Renovation/remodeling number)-
It went through a stage of inputting data such as 0-0 (preliminary relationship) and waiting for the computer to specify.

[Problems with background technology]

According to the technology described above, semiconductor manufacturing workers are highly dependent on Punbieta! There are many cases in which masks used for the same product are stored and delivered sequentially, but it is extremely inefficient to enter long data starting from the above-mentioned product each time.)
However, the disadvantage is that the number of errors in data increases, and computers become more expensive. Another disadvantage is that if the combinator malfunctions, the mask cannot be removed or removed at all.

[Purpose of the invention]

The present invention is intended to correct the problems of the background art described above, and provides a photomask storage method that facilitates the storage and storage of photomasks.

[Summary of the invention]

This message! K Such a photomask storage method is such that a large number of masks used in the manufacture of semiconductor devices are separated by process on one mask storage surface for each type of semiconductor device, and each mask is supported independently, and each mask is supported independently on a plurality of mask storage surfaces. are arranged in rows and columns, and the storage and storage of each mask storage surface is performed by a computer.

[Embodiments of the invention]

This invention will be described in detail for each implementation 11 with reference to the drawings.
I will explain in 1. Iml exemplifies a storage device for controlling the storage and storage of photomasks into the mask storage surface shown in Figure 2 using a combiator. In Figure 1,
(x) * (t)・” is a sufu storage surface, an example of which is shown in FIG. Arranged horizontally (in rows and columns) with Ell rectangles, and the storage surface is handled by a conveyor (3).
Accordingly, the mask extractor (4) is sent to KIl. The conveyor consists of legs (3) that are laid parallel to the shelf surface and run on nine rails (5), a pole (3b) with 11 straight lines, and an IJI head that moves up and down along the pole and stops. (3c), the head part is equipped with a fork (34), and the fork (34) is placed on the lower side of the shelf, which can be instructed by the electric signal generated by the computer (6).
4) is placed so that it protrudes, and then the 7 orc is retracted and held. In front of the conveyor (3) K, feed the legs (3), head @ (3c) pole:: (3)
b) All of the above logic operations along K are performed by electrical signals generated by the combinator (6). Now, the operation of each part will be explained using the case of a mask storage box job as an example. When the L8I variety is entered into the computer (6)K, this variety &C)
After all the masks that can be needed are stored, the head of the conveyor is positioned close to the 91 mask storage surfaces, the fork is protruded and the mask storage surface is loaded on it, and then the fork is retracted and held. . Next, the conveyor travels, and the mask storing surface is transferred onto the rail (5') by the take-out section (4), and transferred to the mask operating section (), where a desired mask is output.

Next, the mask storage surface (1) has grooves (1m), (im), etc. on the opposing inner walls as shown in the m1m2 diagram.
Masks (8), (8), etc. are inserted and held in this. For example, the grooves determine the storage position of the master in the process (a) and the circumference, so it is only necessary to prepare three masks for each 1i, and therefore the number of mask usage processes for each type is determined. It can now store 45 masks, which is the number of masks that go through 15 processes.

Incidentally, the above-mentioned masks may be individually placed in a case, applied to each workshop, and stored in nine partitions.

〔Effect of the invention〕

According to the present invention, the mask O accounting is performed by computer signals for each mask storage surface, so the computer is extremely simplified and the input is reliable, so the reliability of the apparatus is significantly improved. Another advantage is that manual operation is possible even in the event of a computer malfunction or failure.

[Brief explanation of drawings]

FIG. 1 is a partially cutaway perspective view of a photomask storage device according to an embodiment of the present invention, and FIG. 2 is a perspective view showing a part of the mask storage surface used in the photomask storage device. be. 1, 1-... 2 shelves on the master storage side! Conveyor 3m Conveyor 0 leg 3b Conveyor pole 3c Conveyor head 4 Mask removal section 5.5' Rail 6: Inviator 7 Mask operation section 8.8 Master agent Patent attorney Inoue - Male 1: ,′″)1

Claims (1)

[Claims] A large number of masks used for manufacturing semiconductor devices can be stored in one 0-1 mask for one type of semiconductor device.If each mask is separated by process and supported vertically, one multiple@0 master can be stored in each area. A photomask dispensing method characterized by arranging pictures in rows and columns and instructing a convenience store 7 to dispense the masks in units of pictures.