JPS58152893A - Novel ethynylenepolysilane compound and its preparation - Google Patents
Novel ethynylenepolysilane compound and its preparationInfo
- Publication number
- JPS58152893A JPS58152893A JP3382482A JP3382482A JPS58152893A JP S58152893 A JPS58152893 A JP S58152893A JP 3382482 A JP3382482 A JP 3382482A JP 3382482 A JP3382482 A JP 3382482A JP S58152893 A JPS58152893 A JP S58152893A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- novel
- general formula
- compound represented
- hexamethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【発明の詳細な説明】
本発明は、新規エチニレンボリシラン系化合物およびそ
の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel ethynyleneborisilane compound and a method for producing the same.
二価の反応性中間体であるシリレンは、極め【反応性に
富むことから、高分子の架橋剤や新しい有機合成反応へ
の利用が期待され、広く研究されている。有機シリレン
(:SiR,)の発生法としては、各種の方法が公知で
あり、例えばボリン2ン類を光分解する方法がある。こ
の方法は操作が容易であることから応用範囲が広い、上
記の方法の一つに鎮状フェニルジシラン類を光分解する
方法が知られているが、この方法によると1,3−ケイ
素転位したシラエテンを主に生成し、有機シリレンの生
成収率は低い。またその感光波長が紫外−領域に限られ
る。Silylene, a divalent reactive intermediate, is highly reactive and is widely studied as it is expected to be used as a cross-linking agent for polymers and in new organic synthesis reactions. Various methods are known for generating organic silylene (:SiR,), such as a method of photolyzing borine diphosphones. This method has a wide range of applications because it is easy to operate.One of the methods mentioned above is known to photodecompose dehydrated phenyldisilanes, but this method results in 1,3-silicon rearrangement. Silaethene is mainly produced, and the production yield of organic silylene is low. Moreover, its sensitivity wavelength is limited to the ultraviolet region.
本発明の目的は、光分解で有機シリレンを高収率で発生
する新規なエチニレンボリシラン系化合物およびその製
造方法を提供するKある。An object of the present invention is to provide a novel ethynylene polysilane compound that generates organic silylene in high yield through photolysis, and a method for producing the same.
上記目的のために各種のポリエチ二しンボリシラン系化
合物を合成し、有機シリレンの発生収率な調べた結果、
以下に示される新規なエテニレンボリシ2ン系化合物が
有用であることを見出した。For the above purpose, we synthesized various polyethyndidine polysilane compounds and investigated the yield of organic silylene.
It has been found that the novel ethenylene bolysine compounds shown below are useful.
本発明の新規エチニレンボリシラン系化合物は、以下、
一般式(1]で示される。The novel ethynylene borisilane compound of the present invention is as follows:
It is represented by general formula (1).
(但し、一般式(1)中のRはアルキル基を表わす。)
本発明の新規エチニレンポリシラン系化合物としては、
例えば、7,7,8,8,9.9−ヘキサメチル−7,
8,9−)リシラシクロー1.5−ノナジインなどがあ
げられる。(However, R in general formula (1) represents an alkyl group.)
The novel ethynylene polysilane compound of the present invention includes:
For example, 7,7,8,8,9.9-hexamethyl-7,
Examples include 8,9-)risilacyclo1,5-nonadiyne.
本発明による新規ポリエチニレンボリシラン系化合物は
、例えば次のような反応により合成できる。The novel polyethynylene polysilane compound according to the present invention can be synthesized, for example, by the following reaction.
7.7,8,8,9,9−ヘキサメチル−7,8,?−
トリシラシクロー1,5−ノナジイン(一般式(1)に
おいてR=メチル基、ル=1である化合物)は、−c
−f ル溶液中1 t ’−へキサジインとフェニルマ
グネシウムブロマイドから導かれるジグリニャール試薬
に、1.S−ジクロロヘキサメチルトリシランを加え、
室温にて反応させ、さらに還流させることにより合成で
きる。7.7,8,8,9,9-hexamethyl-7,8,? −
Trisilacyclo 1,5-nonadiyne (a compound in which R = methyl group and R = 1 in general formula (1)) is -c
-f in a digrignard reagent derived from 1t'-hexadiyne and phenylmagnesium bromide in a solution of 1. Add S-dichlorohexamethyltrisilane,
It can be synthesized by reacting at room temperature and further refluxing.
以下、本発明を実施例でさらに詳細に説明する。Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例t
200 mg 5つロフラスコを窒素置換した後、その
中に1,5−へキサジイン2t(10256モル)およ
びジエチルエーテル30sdを入れ、フラスコを氷冷し
た。この溶液に、攪拌しながらフェニルマグネシウムブ
ロマイドの2規定THF @液25.6−(フェニルマ
グネシウムブロマイドとして110512モル)を約1
0分間で滴下し、さらに室温で30分間攪拌した。この
溶液に1.3−ジクロロへキサメチルトリシラン&28
f(α0256モル)とジエチルエーテルAOsgの混
合#!箪を一度に添加し、室温にて1時間攪拌した後、
1時間還流させた。常法通りの処理ののち、粗生成物の
減圧蒸留により、本発明の7.7,8,8.?、?−ヘ
キサメチル−7,8,9−)リシラシクロー1,5−ノ
ナジ47を得f。収率4ss bp、1!16〜138
°0 / 20 wm jj t tこの化合物の構造
は核磁気共鳴スペクトルCM−NMR’)および高分解
能マススペクトルにおける以下の結果から確認された。Example t 200 mg After purging a 5-bottle flask with nitrogen, 2t (10256 mol) of 1,5-hexadiyne and 30sd of diethyl ether were placed therein, and the flask was cooled with ice. To this solution, add about 1 mol of phenylmagnesium bromide in 2N THF @25.6-(110512 mol as phenylmagnesium bromide) while stirring.
The mixture was added dropwise over 0 minutes, and further stirred at room temperature for 30 minutes. Add 1,3-dichlorohexamethyltrisilane &28 to this solution.
Mixture of f (α0256 mol) and diethyl ether AOsg #! After adding the bamboo shoots at once and stirring at room temperature for 1 hour,
It was refluxed for 1 hour. After conventional treatment, the crude product was distilled under reduced pressure to obtain 7.7, 8, 8. ? ,? -hexamethyl-7,8,9-)lysilacyclo1,5-nonadi 47 was obtained f. Yield 4ss bp, 1!16-138
The structure of this compound was confirmed from the following results in nuclear magnetic resonance spectrum (CM-NMR') and high resolution mass spectrum.
11+ ’H−NMR(δpp風/CDC1,)Q、
22.(6B 、シングレット、メチル基)α27 (
12B、シングレ、ト、メチル基)2.47 (4H、
シングレ、ト、メチレン基)(2)高分解能マススペク
トル
C□HIS−の計算値=251566
実欄値 =251564
実施例2゜
実施例1の方法により合成した7、7,8,8,9.9
−ヘキサメチル−7,8,9−)リシラシクロ−1゜5
−ノナジイン2Fをベンゼン50−に溶かし、さらにシ
リレン捕捉剤としてジエチルメチルシラン2.9tを加
え、500W低圧水銀燈で10分間光照射した。反応混
合物をガスクロマトグラフィーで分離し、標準試料との
比較ならびにマススペクトルによりて分析した。その結
果、シリレンの捕捉によりて生じた1、1−ジエチル−
1g2゜2−トリメチルジシラン(シリレン捕捉剤に対
して、収率80%)を得た。11+'H-NMR (δpp wind/CDC1,) Q,
22. (6B, singlet, methyl group) α27 (
12B, singlet, methyl group) 2.47 (4H,
singlet, t, methylene group) (2) Calculated value of high-resolution mass spectrum C□HIS- = 251566 Actual value = 251564 Example 2゜ 7, 7, 8, 8, 9. synthesized by the method of Example 1. 9
-hexamethyl-7,8,9-)lysilacyclo-1゜5
-Nonadiyne 2F was dissolved in benzene 50-, and 2.9 t of diethylmethylsilane was added as a silylene scavenger, and the mixture was irradiated with a 500W low-pressure mercury lamp for 10 minutes. The reaction mixture was separated by gas chromatography and analyzed by comparison with standard samples and mass spectroscopy. As a result, 1,1-diethyl-
1 g of 2°2-trimethyldisilane (80% yield, based on silylene scavenger) was obtained.
以上述べたように、本発明の新規エチニレンホリシラン
系化合物は、σ(Si−5i)−π共役に基づく強い吸
収を紫外線領域に有するため光分解による有機シリレン
の発生効率が高く、新しいシリレン発生剤として有用で
ある。As described above, the novel ethynylenepolysilane compound of the present invention has strong absorption in the ultraviolet region based on σ(Si-5i)-π conjugation, so it has a high efficiency of generating organic silylene through photolysis, and is a new type of silylene. Useful as a generator.
また次のように光電変換膜の形成に使用できる。例えば
、7,7,8,8,9.9−へキサメチル″″−7゜8
.9− )リシンシクロ−1,5−ノナジインのトルエ
ン溶液(5〜10g量チ)を導電性基板上に塗布し、乾
燥成膜の後、全面を低圧水銀値で照射すれば、不溶性の
光電変換薄膜を形成できる。Furthermore, it can be used to form a photoelectric conversion film as follows. For example, 7,7,8,8,9.9-hexamethyl''''-7°8
.. 9-) If a toluene solution (5 to 10 g) of lysinecyclo-1,5-nonadiyne is applied on a conductive substrate, and after drying and film formation, the entire surface is irradiated with low pressure mercury, an insoluble photoelectric conversion thin film can be formed. can be formed.
さらに、同様の方法により、レーザービームパターニン
グシステムにおける感光体として用いうる。即ち上記と
同様の方法により作製した本新規物質薄膜に対して、レ
ーザービーム照射により光電導性の不溶性薄膜パターン
を形成できる。Furthermore, it can be used as a photoreceptor in a laser beam patterning system in a similar manner. That is, a photoconductive insoluble thin film pattern can be formed by laser beam irradiation on a thin film of the novel substance produced by the same method as above.
Claims (1)
わされる化合物よりなることを特徴とする新規エチニレ
ンボリシラン系化合吻。 2、 7,7,8,8,9.?−へキサメチル−7,8
,? −)サシ2シクロー1,5−ノナジインであるこ
とを特徴とする特許請求範囲第1項記載の新規エチニレ
ンボリシラン系化合物。 五 一般式(2)で表わされる化合物と、一般式(3)
で表わされる化合物とを反応させて、一般式illで表
わされる化合物を得ることを特徴とする新規エチニレン
ボリシラン系化合物の製造方法。 但し、一般式(1)〜(3)中のλはアルキル基であり
、一般式(2)〜(4中のXはCIもしくはByであり
、一般式+13 、 (21中の為は1以上のsl数で
ある。 本 一般式(1)で表わされる化合物が7.7,8,8
,1゜9−へキサメチル−7,8,? −)リシラシク
ーー1,5−ノナジインであり、一般式(sl)で表わ
わされる化合物がClSi (CHs)* Si CC
Ha)家5i(CHs )m CjもしくはBrag
(CHs) 雪S番(C7/s)tSL(CE a )
* Brであることを特徴とする特許請求の範囲第5項
記載の新規エテニレンボリシラン系化合物の製造方法。[Scope of Claims] t A novel ethynylenebolysilane compound proboscis, characterized by being composed of a compound represented by the general formula 0) (wherein R in the general formula (1) represents an alkyl group). 2, 7, 7, 8, 8, 9. ? -hexamethyl-7,8
,? -) The novel ethynyleneborisilane compound according to claim 1, which is 2cyclo-1,5-nonadiyne. (5) A compound represented by general formula (2) and general formula (3)
1. A method for producing a novel ethynyleneborisilane compound, which comprises reacting a compound represented by the formula ill to obtain a compound represented by the general formula ill. However, in the general formulas (1) to (3), λ is an alkyl group, and in the general formulas (2) to (4, X is CI or By, and in the general formula +13, (21, 1 or more) The sl number of the compound represented by the general formula (1) is 7.7, 8, 8
,1゜9-hexamethyl-7,8,? -) Lisilathicou-1,5-nonadiyne, and the compound represented by the general formula (sl) is ClSi (CHs)* Si CC
Ha) House 5i (CHs)m Cj or Brag
(CHs) Snow S number (C7/s) tSL (CE a)
*The method for producing a novel ethenyleneborisilane compound according to claim 5, wherein the compound is Br.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3382482A JPS58152893A (en) | 1982-03-05 | 1982-03-05 | Novel ethynylenepolysilane compound and its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3382482A JPS58152893A (en) | 1982-03-05 | 1982-03-05 | Novel ethynylenepolysilane compound and its preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58152893A true JPS58152893A (en) | 1983-09-10 |
JPS6340436B2 JPS6340436B2 (en) | 1988-08-11 |
Family
ID=12397230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3382482A Granted JPS58152893A (en) | 1982-03-05 | 1982-03-05 | Novel ethynylenepolysilane compound and its preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58152893A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4996341A (en) * | 1990-07-05 | 1991-02-26 | Kanegafuchi Chemical Industry Co., Ltd. | Condensed bicyclic disilanylene-acetylene compound and method for preparing the same |
-
1982
- 1982-03-05 JP JP3382482A patent/JPS58152893A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4996341A (en) * | 1990-07-05 | 1991-02-26 | Kanegafuchi Chemical Industry Co., Ltd. | Condensed bicyclic disilanylene-acetylene compound and method for preparing the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6340436B2 (en) | 1988-08-11 |
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