JPS5814874B2 - Evaporation material supply device for vacuum processing equipment - Google Patents

Evaporation material supply device for vacuum processing equipment

Info

Publication number
JPS5814874B2
JPS5814874B2 JP53066160A JP6616078A JPS5814874B2 JP S5814874 B2 JPS5814874 B2 JP S5814874B2 JP 53066160 A JP53066160 A JP 53066160A JP 6616078 A JP6616078 A JP 6616078A JP S5814874 B2 JPS5814874 B2 JP S5814874B2
Authority
JP
Japan
Prior art keywords
evaporation material
opening
evaporation
evaporative
outer cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53066160A
Other languages
Japanese (ja)
Other versions
JPS54157782A (en
Inventor
関村信行
神谷攻
西田敬次郎
筧光夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP53066160A priority Critical patent/JPS5814874B2/en
Priority to US05/928,435 priority patent/US4226208A/en
Priority to DE2834353A priority patent/DE2834353C2/en
Publication of JPS54157782A publication Critical patent/JPS54157782A/en
Publication of JPS5814874B2 publication Critical patent/JPS5814874B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は真空処理装置の蒸発材を自動的に連続的に供給
する供給装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a supply device for automatically and continuously supplying evaporation material to a vacuum processing apparatus.

光学素子や電気磁気素子等に薄膜を施す装置として本件
出願人は先に真空処理装置を出願した。
The applicant previously filed an application for a vacuum processing apparatus as an apparatus for applying thin films to optical elements, electromagnetic elements, etc.

(出願番号昭和52年93798号出願日一昭和52年
8月4日) 更にこの種の装置として実公昭38−第 25633号一ターレット式真空蒸着装置が知られてい
る。
(Application No. 93798, 1978, Application date: August 4, 1977) Furthermore, as an apparatus of this type, a turret type vacuum evaporation apparatus is known, which is disclosed in Utility Model Publication No. 25633 of 1972.

更に処理室の前後に供給・取出室を設けた所謂インライ
ン式の真空処理装置も知られている。
Furthermore, a so-called in-line type vacuum processing apparatus is also known in which a supply/take-out chamber is provided before and after a processing chamber.

これらの真空処理装置や真空蒸着装置の内部に載置した
光学素子や電気磁気素子等に薄膜を施す蒸発材の供給装
置として従来種々の装置が提案されている。
Various devices have been proposed in the past as evaporation material supply devices for applying thin films to optical elements, electromagnetic elements, etc. placed inside these vacuum processing devices and vacuum evaporation devices.

第1図は粒状の蒸発材を供給する場合の供給方式を示し
、ロート状の貯蔵容器1に粒状の蒸発材2を貯蔵し、パ
イブレーク−4で貯蔵容器の投入部1aに振動を加え、
適宜量の蒸発材を蒸発源6に投入するものである。
FIG. 1 shows a supply method for supplying granular evaporative material, in which granular evaporative material 2 is stored in a funnel-shaped storage container 1, vibration is applied to the input part 1a of the storage container with a pie break-4,
An appropriate amount of evaporation material is put into the evaporation source 6.

第1図に示す供給方式は粒状の蒸発材のみでなく、固形
タイプの蒸発材を供給する場合にも適用できる装置であ
る。
The feeding system shown in FIG. 1 is an apparatus that can be applied not only to granular evaporative material but also to solid type evaporative material.

しかるに従来の第1図に示すようなパイブレークーの振
動作用によって蒸発材を供給する方式では正確な量又は
数の蒸発材を蒸発源に投入することができず所望の薄膜
を得ることが困難であった.光学素子や電気蒸気素子に
所望の薄膜を効率よく施すためには正しい量の蒸発材を
蒸発源に投入する必要がある。
However, with the conventional method of supplying evaporation material by the vibration action of a pie breaker as shown in FIG. 1, it is not possible to introduce an accurate amount or number of evaporation material into the evaporation source, making it difficult to obtain a desired thin film. Ta. In order to efficiently apply a desired thin film to an optical element or an electric vapor element, it is necessary to introduce the correct amount of evaporation material into the evaporation source.

その為、一定量(数)の光学素子や電気磁気素子に対し
ては一定の容量の蒸発材を球状又は棒状の固形にし、一
個ずつ又は数個ずつ規定正しく蒸発源に投入することに
より正確な薄膜を得ることができる。
Therefore, for a certain amount (number) of optical elements or electromagnetic elements, it is necessary to form a certain volume of evaporation material into a spherical or rod-shaped solid and introduce it into the evaporation source one by one or several at a time. A thin film can be obtained.

本発明は球状又は棒状に形成した固形蒸発材に適する供
給装置に関し、連続的かつ自動的に蒸発源に供給できる
装置を提供するものである。
The present invention relates to a supply device suitable for solid evaporation material formed in a spherical or rod shape, and provides a device that can continuously and automatically supply the solid evaporation material to an evaporation source.

本発明は蒸発源に蒸発材を供給する蒸発材供給路に供給
制御手段を設けて必要以上の蒸発材の供給を制御すると
ともに、供給路から供給された蒸発材を受ける受給部を
供給路の開口部に設け、該受給部内の蒸発材を蒸発源に
移動・投入することにより真空処理装置内の蒸発源に自
動的・連続的に蒸発材を供給できるものである。
The present invention provides a supply control means in an evaporation material supply path that supplies evaporation material to an evaporation source to control the supply of more evaporation material than necessary, and also controls a receiving section of the supply path for receiving evaporation material supplied from the supply path. The evaporation material can be automatically and continuously supplied to the evaporation source in the vacuum processing apparatus by providing the evaporation material in the opening and moving and introducing the evaporation material in the receiving section to the evaporation source.

以下に図面を参照して本発明を詳述する。The present invention will be explained in detail below with reference to the drawings.

図において、10は真空処理装置の加熱室,蒸着室等の
真空処理室であり、12は真空処理室10の外部から銀
(Ag)・金(Au)・銅(Cu)等の蒸発材14を供
給する供給路である。
In the figure, 10 is a vacuum processing chamber such as a heating chamber or a vapor deposition chamber of a vacuum processing apparatus, and 12 is an evaporation material 14 such as silver (Ag), gold (Au), copper (Cu), etc. from the outside of the vacuum processing chamber 10. It is a supply route that supplies

16は供給路と連設し、蒸発材14の供給を制御する第
1の制御棒18と第2の制御棒20を摺動可能に支持す
る固定部で真空処理室に固定されている。
Reference numeral 16 is connected to the supply path and is fixed to the vacuum processing chamber by a fixed part that slidably supports a first control rod 18 and a second control rod 20 that control the supply of the evaporation material 14.

22はカム板で、モーター24によって軸26を介して
矢印方向に不図示の支持棒に沿って摺動可能に構成され
る。
A cam plate 22 is configured to be slidable by a motor 24 via a shaft 26 in the direction of the arrow along a support rod (not shown).

18a・20aはカム板22のカム面22aに接触回転
するローラーで、それぞれ前記第1の制御棒18、第2
の制御棒20の一端に回転可能に取り付けられる。
18a and 20a are rollers that rotate in contact with the cam surface 22a of the cam plate 22, and are connected to the first control rod 18 and the second control rod, respectively.
is rotatably attached to one end of the control rod 20 of.

28・30は第1の制御棒18、第2の制御棒20を付
勢するためのバネ部材である。
28 and 30 are spring members for urging the first control rod 18 and the second control rod 20.

蒸発材を供給制御する制御棒18・20は固定部の貫通
穴内に摺動可能に保持され、他端は供給路16内に進退
可能に構成する。
The control rods 18 and 20 for controlling the supply of evaporative material are slidably held in the through holes of the fixed part, and the other ends are configured to be movable into the supply path 16.

32は蒸発材供給路12から蒸発材14を受ける受給部
を示しその詳細図は第3図に示す。
Reference numeral 32 denotes a receiving section that receives the evaporative material 14 from the evaporative material supply path 12, and a detailed view thereof is shown in FIG.

第3図において、受給部32は内筒32a・外筒32b
の一対の円筒から構成されている。
In FIG. 3, the receiving part 32 includes an inner cylinder 32a and an outer cylinder 32b.
It consists of a pair of cylinders.

32aは円筒形をしており点線で示す棒状の蒸発材14
aを入れる入口32a1と出口32a2を有する略長方
体の収納部32a3を有している。
32a is a rod-shaped evaporator material 14 which has a cylindrical shape and is indicated by a dotted line.
It has a substantially rectangular storage section 32a3 having an inlet 32a1 and an outlet 32a2 into which the a is inserted.

32bは前記円筒形32aに嵌合する中空円筒で、内筒
32aと外筒32bと外筒フク32cとで受給部32を
構成する。
32b is a hollow cylinder that fits into the cylindrical shape 32a, and the receiving portion 32 is constituted by the inner cylinder 32a, the outer cylinder 32b, and the outer cylinder hook 32c.

中空円筒の外筒32bには内筒32aを挿入したとき内
筒の入口32a1及び出口32a2と一致する第1の開
口部321)lと第2の開口部(出口)3 2 1:)
2を設け、開口部32b2は開口部32b1と角度18
0°以内の任意角位置に設ける。
The hollow cylindrical outer cylinder 32b has a first opening 321)l and a second opening (outlet) 321) which coincide with the inlet 32a1 and outlet 32a2 of the inner cylinder when the inner cylinder 32a is inserted.
2, and the opening 32b2 is at an angle of 18 with the opening 32b1.
Installed at any angle within 0°.

32b3は外筒32l〕の円周面に設けた鍔部である。32b3 is a flange provided on the circumferential surface of the outer cylinder 32l.

内筒32aに外筒32bを被せ人口32a1と開口部3
2b1を一致させると供給路12からの蒸発材14が受
給部の収納部に収納される。
Cover the inner cylinder 32a with the outer cylinder 32b and connect the opening 32a1 and the opening 3.
2b1, the evaporative material 14 from the supply path 12 is stored in the storage section of the receiving section.

内筒32aの入口32a1の反対側は出口32a2とし
て開口しているか外筒32bの対応位置は開口していな
いので蒸発材14は外筒32bと内筒32a内の収納部
に収納される。
The side opposite to the inlet 32a1 of the inner cylinder 32a is open as an outlet 32a2, or the corresponding position of the outer cylinder 32b is not open, so the evaporative material 14 is stored in the storage parts in the outer cylinder 32b and the inner cylinder 32a.

第3図に示す蒸発材受給部32は蒸発材が14aのよう
な棒状の場合を示したが丸薬状等の種々の形状の蒸発材
に適用することができ、外筒,内筒の形状も蒸発材の形
状に合わせて球形にしてもよいことはもとよりである。
The evaporative material receiving part 32 shown in FIG. 3 is shown in the case where the evaporative material is rod-shaped like 14a, but it can be applied to various shapes of evaporative material such as pill-shaped, and the shape of the outer cylinder and inner cylinder can also be applied. It goes without saying that the shape may be spherical depending on the shape of the evaporator.

更に第3図に示す受給部の実施例において内筒32aを
除いて外筒32bのみを用いても実用上差しつかえない
Furthermore, in the embodiment of the receiving section shown in FIG. 3, it is practically acceptable to use only the outer cylinder 32b, excluding the inner cylinder 32a.

第2図に戻って、34は前述受給部32を蒸発源36の
位置まで移動する移動手段を示す。
Returning to FIG. 2, reference numeral 34 indicates a moving means for moving the receiving section 32 to the position of the evaporation source 36.

移動手段は前述受給部32と連設したラツク36とラツ
ク36を点線で示す受給部32′の位置まで移動するピ
ニオン38,ピニオン38にモーター40からの1駆動
力を伝達する歯車列42,伝導軸44等を介して伝える
伝導手段からなる。
The moving means includes a rack 36 connected to the receiving section 32, a pinion 38 that moves the rack 36 to the position of the receiving section 32' indicated by the dotted line, a gear train 42 that transmits the driving force from the motor 40 to the pinion 38, and a transmission. It consists of a conduction means for transmitting information via a shaft 44 or the like.

46は蒸発材14aを蒸発源36に投入する為の投入制
御棒であり蒸発材投入位置(点線で示す受給部の位置)
にきた受給部32のツバ32b3を押し上げることによ
り受給部32の外筒32bが時計方向に回動し、外筒3
2bの開口部32b2と内筒32aの出口32a2とが
一致し蒸発材14aが蒸発源36に投入される。
Reference numeral 46 is a charging control rod for charging the evaporative material 14a into the evaporation source 36, and the evaporative material charging position (the position of the receiving part shown by the dotted line)
By pushing up the collar 32b3 of the receiving part 32, the outer cylinder 32b of the receiving part 32 rotates clockwise, and the outer cylinder 3
The opening 32b2 of the inner cylinder 32a matches the outlet 32a2 of the inner cylinder 32a, and the evaporative material 14a is introduced into the evaporation source 36.

(投入制御棒46が下降移動すると外筒32bのツバ3
2b3は一方荷重のため自重降下する) 48は投入制御棒を上下移動するモーターである。
(When the closing control rod 46 moves downward, the collar 3 of the outer cylinder 32b
(2b3 is lowered by its own weight due to the load) 48 is a motor that moves the input control rod up and down.

50は当装置が蒸発源36の蒸発にともなう蒸発物付着
を防止するためのカバーであり、52は当装置が蒸発源
36の蒸発にともなう蒸発物付着を防止するためのシャ
ッターである。
Reference numeral 50 is a cover for preventing the device from adhering to evaporated matter due to evaporation of the evaporation source 36, and 52 is a shutter for preventing the device from adhering to evaporated matter as the evaporation source 36 evaporates.

54は前記蒸発物付着防止シャッターを上下移動するモ
ーターである。
Reference numeral 54 is a motor that moves the evaporative matter adhesion prevention shutter up and down.

次に本発明の実施例を第4図a−b−c−dに示すカム
板22の位置制御に応答して蒸発材が必要量供給される
作動を説明する。
Next, an explanation will be given of the operation of supplying the necessary amount of evaporative material in response to the position control of the cam plate 22 in accordance with the embodiment of the present invention shown in FIGS. 4a-b-c-d.

真空処理室10の外部の不図示の蒸発材貯蔵部から送ら
れる蒸発材14a・14b・14c・・・・・・は供給
部12内を下降して固定部16と連設する供給路12a
に第4図a図示の如く整列して供給される。
Evaporative materials 14a, 14b, 14c, .
They are arranged and supplied as shown in FIG. 4a.

(1)第4図aに示すカム板22は第2制御棒20の先
端位置で供給路12aを塞ぐ位置に移動する。
(1) The cam plate 22 shown in FIG. 4a moves to a position where it closes the supply path 12a at the tip of the second control rod 20.

第1制御棒18のローラーはカム板22のカム面底部に
位置し、前述バネ部材18(第4図不図示)により第1
制御棒18の先端部は供給路12aから退避する。
The roller of the first control rod 18 is located at the bottom of the cam surface of the cam plate 22, and the spring member 18 (not shown in FIG. 4)
The tip of the control rod 18 is retracted from the supply path 12a.

従って蒸発材14a・14bは第2の制御棒20で塞が
れる位置まで供給路12a内を移動する。
Therefore, the evaporative materials 14a and 14b move within the supply path 12a to a position where they are blocked by the second control rod 20.

(2)次に、カム22が第4図bに示す位置まで、即ち
、各ローラー18a・20aがカム面22aの頂面に乗
り上げる位置までくると第1の制御棒18の先端位置は
図示上3番目の蒸発材14cを押える位置に移動する。
(2) Next, when the cam 22 reaches the position shown in FIG. Move to a position where the third evaporator 14c is held down.

(3)更に、カム板22が第4図Cに示す位置に移動す
ると、第2制御棒のローラー20aはカム面の底部に乗
り、第2制御棒20は前述バネ部材30のバネカで左方
向に移動し、その先端部は供給路12aから退避し蒸発
材14a・14bは第2図に示す受給部32に収納され
る。
(3) Further, when the cam plate 22 moves to the position shown in FIG. The evaporative materials 14a and 14b are stored in the receiving section 32 shown in FIG. 2.

蒸発材14c以降の蒸発材は第1制御棒18の先端部で
移動阻止されているため受給部32に供給されない。
The evaporative material after the evaporative material 14c is prevented from moving by the tip of the first control rod 18, so that it is not supplied to the receiving section 32.

(4)次に、カム板22は今までとは逆に上部方向に移
動する。
(4) Next, the cam plate 22 moves upward in the opposite direction.

第4図d参照。ローラー18a・20aはカム面22a
の頂部に乗り、第2制御棒20は供給路12aを塞ぐ。
See Figure 4d. The rollers 18a and 20a are cam surfaces 22a
The second control rod 20 blocks the supply path 12a.

上述したようζこカム板22は軸26を介してモーター
24等の手段及び不図示の制御カムによって(1)〜(
4)の行程を間欠的かつ連続的に移動制御され、それに
応じて第1及び第2の制御棒18・20,ローラー18
a・20a,バネ部材28・30等で構成される供給制
御手段により蒸発材14a・14b・14c・・・・・
・が供給路から受給部32に送られる。
As described above, the ζ cam plate 22 is operated by means such as the motor 24 and a control cam (not shown) via the shaft 26 (1) to (
4) is controlled to move intermittently and continuously, and the first and second control rods 18 and 20 and the roller 18 are moved accordingly.
Evaporative materials 14a, 14b, 14c...
* is sent to the receiving section 32 from the supply path.

蒸発材14a・14bが受給部に送られると蒸発物付着
防止シャッター52が開きモーター40,歯車列42,
伝導軸44,ピニオン38,ラック36等の搬送手段に
より受給部32は点線で示す蒸発材投入位置迄搬送され
る。
When the evaporative materials 14a and 14b are sent to the receiving section, the evaporative adhesion prevention shutter 52 opens and the motor 40, gear train 42,
The receiving portion 32 is conveyed by conveying means such as the transmission shaft 44, pinion 38, rack 36, etc. to the evaporative material input position shown by the dotted line.

投入位置に搬送された受給部32はモーター48で駆動
される投入制御棒46が矢印方向に移動し、その先端で
受給部の外筒32bに固設した鍔部23b3と当接し、
外筒32bを時計方向に回動ずる。
The receiving section 32 is transported to the loading position, and the closing control rod 46 driven by the motor 48 moves in the direction of the arrow, and its tip abuts against the flange 23b3 fixed to the outer cylinder 32b of the receiving section.
Rotate the outer cylinder 32b clockwise.

外筒32bを時計方向に所定角回転すると内筒32aの
出口32a2と外簡の開口部32b2が一致し、収納さ
れている蒸発材14a・14bは蒸発源36内に投入さ
れる。
When the outer cylinder 32b is rotated clockwise by a predetermined angle, the outlet 32a2 of the inner cylinder 32a and the opening 32b2 of the outer cylinder coincide, and the stored evaporation materials 14a and 14b are thrown into the evaporation source 36.

蒸発源への投入が終了すると受給部32は元の実線で示
す位置に戻り投入制御棒46が下降移動すると外筒32
bのツバ32b3は自重降下し更に蒸発物付着防止シャ
ッター52がしまると前述(1)〜(4)の行程を繰り
返して必要量の蒸発材を受給部に供給する作業が行なわ
れる。
When the injection into the evaporation source is completed, the receiving part 32 returns to the original position shown by the solid line, and when the injection control rod 46 moves downward, the outer cylinder 32
When the brim 32b3 falls under its own weight and the evaporative matter adhesion prevention shutter 52 is closed, the steps (1) to (4) described above are repeated to supply the required amount of evaporative material to the receiving section.

蒸発源36に投入された蒸発材14a・14bは公知の
方法によって加熱・蒸発された光学素子や電気磁気素子
への蒸着作業が行なわれる。
The evaporation materials 14a and 14b introduced into the evaporation source 36 are heated and evaporated by a known method to be deposited onto optical elements and electromagnetic elements.

本実施例において、モーター24を駆動源とするカム板
22の上下の往復運動はカム等を用いた公知の技術によ
って構成することができる。
In this embodiment, the vertical reciprocating movement of the cam plate 22 using the motor 24 as a driving source can be configured by a known technique using a cam or the like.

更に前述供給制御手段及びカム板22の移動制御と搬送
手段のタイミングの制御並びに搬送手段と投入制御用の
モーター48の駆動制御のタイミングの制御はカム・タ
イマー,リレー等を用いた技術によって構成される。
Further, the movement control of the supply control means and the cam plate 22, the timing control of the conveyance means, and the control of the drive control timing of the conveyance means and the motor 48 for charge control are constructed by techniques using cam timers, relays, etc. Ru.

次に本発明の効果ζこついて述べる。Next, the effects ζ of the present invention will be described.

1)本発明は固形の蒸発材を蒸発源(こ投入するべく構
成したことにより線材又は粉材供給方式に比し必要な蒸
発材を供給することが可能であり正確な薄膜を得ること
ができる。
1) Since the present invention is structured so that a solid evaporation material is introduced into the evaporation source, it is possible to supply the necessary evaporation material and obtain an accurate thin film, compared to wire or powder supply systems. .

2)従って光学系反射ミラー,プリント回路のパターン
部の蒸着、コンデンサーの蒸着等薄膜寸法を特に高精度
にする必要のない蒸着装置にあっては薄膜厚測定装置を
不必要とすることができる。
2) Therefore, a thin film thickness measuring device can be made unnecessary in vapor deposition apparatuses that do not require particularly high accuracy in thin film dimensions, such as those used for vapor deposition of reflective mirrors for optical systems, pattern portions of printed circuits, and vapor deposition of capacitors.

3)本発明の蒸発材供給装置は真空処理室の外部に設け
た供給路の供給口に蒸発材を充填したカセットを装着す
ることにより全く手数を必要とすることなく自動的に連
続供給を行ない得る。
3) The evaporation material supply device of the present invention automatically and continuously supplies the evaporation material without requiring any effort by attaching the cassette filled with the evaporation material to the supply port of the supply path provided outside the vacuum processing chamber. obtain.

4)本発明の装置で蒸発材を供給する場合、供給路12
aを蒸発材の形成した形状に合わせることにより蒸発材
をスムーズに供給できる。
4) When supplying the evaporator with the apparatus of the present invention, the supply path 12
By matching a to the shape formed by the evaporator, the evaporator can be supplied smoothly.

蒸発材を棒状にすることにより供給路12・12aを長
方形断面に形成する必要があるが、この長方形断面を利
用することにより供給量を変えることができる。
By making the evaporative material rod-shaped, it is necessary to form the supply paths 12 and 12a with a rectangular cross section, but by utilizing this rectangular cross section, the supply amount can be changed.

即ち、第5図に示すように第2図に示した第1の制御棒
18,第2の制御棒20等からなる第1の供給制御手段
と隣接して第3の制御棒60,バネ部材62,第4の制
御棒64,バネ部材66,カム板68等からなる第2の
供給制御手段を配設することができる。
That is, as shown in FIG. 5, the third control rod 60 and the spring member are adjacent to the first supply control means consisting of the first control rod 18, second control rod 20, etc. shown in FIG. 62, a fourth control rod 64, a spring member 66, a cam plate 68, etc., may be provided.

第1の供給制御手段又は第2の供給制御手段を選択駆動
することによりカム板22又は68を作動し、第1と第
2の制御棒の先端部間の距離又は第3と第4の制御棒の
先端部間の距離により供給する蒸発材の量(数)を変え
ることができる。
By selectively driving the first supply control means or the second supply control means, the cam plate 22 or 68 is actuated to control the distance between the tips of the first and second control rods or the third and fourth control rods. The amount (number) of evaporation material supplied can be changed by changing the distance between the tips of the rods.

5)本発明の供給装置は受給部32に供給した蒸発材を
搬送千段34で蒸発源36まで搬送し、投入後元の位置
に復帰する為、供給制御手段と受給部並びに搬送手段を
蒸発源から離れた位置に配置することができる。
5) The supply device of the present invention transports the evaporation material supplied to the receiving section 32 to the evaporation source 36 using the conveying stage 34, and returns to the original position after feeding, so the supply control means, the receiving section and the transporting means are connected to the evaporator. It can be located far away from the source.

この為、蒸発源から蒸発した蒸発材の蒸発物質は真空処
理室に配置した光学素子,電気磁気素子にのみ蒸着し、
供給制御手段・受給部・搬送手段はカバで保護されるた
め蒸発材が付着することがない。
Therefore, the evaporation material evaporated from the evaporation source is deposited only on the optical elements and electromagnetic elements placed in the vacuum processing chamber.
Since the supply control means, the receiving section, and the conveying means are protected by covers, evaporation material does not adhere to them.

以上のように本発明は前述した1)〜5)に示す効果を
有する優れた発明である。
As described above, the present invention is an excellent invention having the effects shown in 1) to 5) mentioned above.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来装置の説明図、第2図は本発明に係る蒸発
材供給装置の要部断面図、第3図は本発明の実施例に用
いる供給部の構成部を示す斜視図で外筒32bと内筒3
2aで構成する。 第4図は第2図に示すカム板22と制御棒18・20の
移動制御にともなう供給路12aの開閉状態を示す説明
図。 第5図は本発明の応用例の要部を示す説明図。 10・・・・・・真空処理室、12・12a・・・・・
・蒸発材供給路、14・14a・14b・14c・・・
・・・蒸発材、16・・・・・・処理室に固定した固定
部、18・20・・・・・・供給路開閉制御部、22・
・・・・・カム板、32・・・・・・受給部、36・・
・・・・蒸発源。
FIG. 1 is an explanatory diagram of a conventional device, FIG. 2 is a sectional view of essential parts of an evaporative material supply device according to the present invention, and FIG. 3 is a perspective view showing the components of a supply section used in an embodiment of the present invention. Cylinder 32b and inner cylinder 3
Consists of 2a. FIG. 4 is an explanatory diagram showing the opening and closing states of the supply path 12a in accordance with movement control of the cam plate 22 and control rods 18 and 20 shown in FIG. FIG. 5 is an explanatory diagram showing a main part of an application example of the present invention. 10... Vacuum processing chamber, 12/12a...
・Evaporation material supply path, 14, 14a, 14b, 14c...
... Evaporation material, 16... Fixed part fixed to the processing chamber, 18.20... Supply path opening/closing control part, 22.
...Cam plate, 32...Receiving section, 36...
...Evaporation source.

Claims (1)

【特許請求の範囲】 1 蒸発材を導入する第1の開口と前記蒸発材をとり出
す第2の開口を有する中空外筒と 前記中空外筒内に収容し前記中空外筒の第1の開口から
入ってきた蒸発材を受け入れ開口ととり出す開口と蒸発
材を収納する収納部を有する内筒とから成る収納体と、 前記中空外筒と前記内筒を相対的に回動ずる手段と、 前記収納体を蒸発材供給位置と蒸発材搬出位置に搬送す
る手段を有し、 蒸発材供給装置にて前記中空外筒の第1の開口と内筒の
受け入れ開口を合わせて内筒の収納部に蒸発材を収納し
、蒸発材搬出位置にて前記回動手段により前記中空外筒
と前記内筒を相対的に回動して前記中空外筒の第2の開
口と前記内筒の取り出し開口を合わせて蒸発材を取り出
すように構成したことを特徴とする真空処理装置の蒸発
材供給装置。
[Scope of Claims] 1. A hollow outer cylinder having a first opening for introducing the evaporative material and a second opening for taking out the evaporative material, and a first opening of the hollow outer cylinder accommodated in the hollow outer cylinder. a storage body comprising an inner cylinder having an opening for receiving the evaporative material, an opening for taking out the evaporative material, and a storage section for storing the evaporative material; means for relatively rotating the hollow outer cylinder and the inner cylinder; It has means for transporting the storage body to an evaporation material supply position and an evaporation material discharge position, and the evaporation material supply device aligns the first opening of the hollow outer cylinder and the receiving opening of the inner cylinder to the storage part of the inner cylinder. evaporation material is stored in the evaporation material, and at the evaporation material delivery position, the hollow outer cylinder and the inner cylinder are relatively rotated by the rotation means to open the second opening of the hollow outer cylinder and the take-out opening of the inner cylinder. An evaporation material supply device for a vacuum processing apparatus, characterized in that the evaporation material supply device is configured to take out the evaporation material by combining the two.
JP53066160A 1977-08-04 1978-06-01 Evaporation material supply device for vacuum processing equipment Expired JPS5814874B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP53066160A JPS5814874B2 (en) 1978-06-01 1978-06-01 Evaporation material supply device for vacuum processing equipment
US05/928,435 US4226208A (en) 1977-08-04 1978-07-27 Vapor deposition apparatus
DE2834353A DE2834353C2 (en) 1977-08-04 1978-08-04 Vacuum evaporation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53066160A JPS5814874B2 (en) 1978-06-01 1978-06-01 Evaporation material supply device for vacuum processing equipment

Publications (2)

Publication Number Publication Date
JPS54157782A JPS54157782A (en) 1979-12-12
JPS5814874B2 true JPS5814874B2 (en) 1983-03-22

Family

ID=13307819

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53066160A Expired JPS5814874B2 (en) 1977-08-04 1978-06-01 Evaporation material supply device for vacuum processing equipment

Country Status (1)

Country Link
JP (1) JPS5814874B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3200848C2 (en) * 1982-01-14 1984-09-27 GfO Gesellschaft für Oberflächentechnik mbH, 7070 Schwäbisch Gmünd Device for charging evaporators in evaporation systems

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4893399A (en) * 1972-03-10 1973-12-03
JPS4913181A (en) * 1972-06-01 1974-02-05

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4893399A (en) * 1972-03-10 1973-12-03
JPS4913181A (en) * 1972-06-01 1974-02-05

Also Published As

Publication number Publication date
JPS54157782A (en) 1979-12-12

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