JPS5814126A - Slit illumination device - Google Patents

Slit illumination device

Info

Publication number
JPS5814126A
JPS5814126A JP11266581A JP11266581A JPS5814126A JP S5814126 A JPS5814126 A JP S5814126A JP 11266581 A JP11266581 A JP 11266581A JP 11266581 A JP11266581 A JP 11266581A JP S5814126 A JPS5814126 A JP S5814126A
Authority
JP
Japan
Prior art keywords
slit
light
longitudinal direction
light source
slit region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11266581A
Other languages
Japanese (ja)
Inventor
Masamichi Tatsuoka
立岡 正道
Susumu Seto
瀬戸 進
Hiroaki Tsuchiya
土屋 廣明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP11266581A priority Critical patent/JPS5814126A/en
Publication of JPS5814126A publication Critical patent/JPS5814126A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/04Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00Apparatus for electrographic processes using a charge pattern
    • G03G15/04Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
    • G03G15/043Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure
    • G03G15/0435Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure by introducing an optical element in the optical path, e.g. a filter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Optical Systems Of Projection Type Copiers (AREA)

Abstract

PURPOSE:To compensate the light intensity distribution in a slit region to be irradiated, by directing the light from a light source toward the peripheral part in the longitudinal direction of the slit region by a side mirror to increase the quantity of light in the peripheral part. CONSTITUTION:A side mirror 8 is provided for the purpose of utilizing effectively a part (indicated by oblique lines), which is at the outside of a slit region W, of the luminous flux which goes from a light source 1 in the longitudinal direction of the slit region. The side mirror 8 is bent into mirrors 8a and 8b so that the luminous flux from each of plural regions, into which the part indicated by oblique lines is divided, is reflected toward the slit region, and luminous fluxes reflected by respective reflecting parts 8a and 8b are irradiated not to the center but to the peripheral part in the longitudinal direction of the slit.

Description

【発明の詳細な説明】 本発明は、複写機、ファクシミリ等におけるスリット照
明装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a slit illumination device for copying machines, facsimile machines, etc.

スリット露光方式の複写機等における原稿照明用の光源
としては一般に複写原稿幅に、はぼ等しい長さの竿部状
光源が用いられることが多いが、光量分布の均一性が得
られる反面、フィラメントが長く細いため衝撃に弱い欠
点がある。この竿部状光源に対し、特公昭53−419
76 、特公昭56−2956号公報等に知られるよう
な点発光の光源が用いられるものがある。
As a light source for document illumination in a slit exposure type copying machine, a rod-shaped light source with a length approximately equal to the width of the document to be copied is often used. Because it is long and thin, it has the disadvantage of being weak against shock. For this rod-shaped light source,
76, Japanese Patent Publication No. 56-2956, etc., a point-emitting light source is used.

特公昭53−41976号公報に示されるものでは、点
発光の光源からの光束を放物面鏡で反射させ平行光束と
し、原稿幅相当まで拡げ放物線鏡でスリット状に原稿面
を照明するもので均一な照度を得ることができる。しか
し放物面鏡、放物線鏡を用いるため装置のコンパクト化
とりわけ天地方向のコンパクト化が困難である。これに
対し、特公昭56−2956−1!公報に示されるもの
は、結像素子として集束性光学繊維素子(商品名セルフ
ォック)を複数個アレイ状に配列した複眼結像系を用い
、複写機のコンパクト化を図るもので、点発光の光源を
内部に配置する扁平な筐体の内面を反射鏡に形成し、光
源からの光束を順次反射転送する所謂ライドガイドと同
等の方式で原稿面を照明するものである。しかしながら
、これによって照射されるスリット領域の長手方向の照
度分布は必ずしも一様にできない。これは単に多重反射
による重畳効果を狙ったものであるからである。一般に
スリット長手方向中央部に点発光の光源を用いる照明系
にあってはその直接光によって、照射されるべきスリッ
ト領域の長手方向の周辺部より中央部で光強度が高くな
る。
In the system disclosed in Japanese Patent Publication No. 53-41976, a light beam from a point-emitting light source is reflected by a parabolic mirror to form a parallel beam of light, which is expanded to a width equivalent to the width of the original, and the parabolic mirror illuminates the surface of the original in the form of a slit. Uniform illuminance can be obtained. However, since a parabolic mirror or a parabolic mirror is used, it is difficult to make the device compact, especially in the vertical direction. On the other hand, special public official Sho 56-2956-1! The system disclosed in the publication uses a compound eye imaging system in which a plurality of focusing optical fiber elements (trade name SELFOC) are arranged in an array as an imaging element to make the copying machine more compact, and uses a point-emitting light source. The inner surface of a flat casing in which the light source is placed is formed into a reflecting mirror, and the surface of the document is illuminated in a manner similar to a so-called ride guide that sequentially reflects and transfers the light beam from the light source. However, the illuminance distribution in the longitudinal direction of the slit region irradiated by this method cannot necessarily be made uniform. This is because the aim is simply to achieve a superimposition effect due to multiple reflections. In general, in an illumination system that uses a point-emitting light source at the longitudinal center of the slit, the direct light causes the light intensity to be higher at the center than at the longitudinal periphery of the slit area to be irradiated.

本発明は点発光の光源を用い、照射されるべきスリット
領域の光強度分布を補償し、複眼結像系を用いたコンパ
クトな複写機に適する照明装置を提供することを目的と
する。
SUMMARY OF THE INVENTION An object of the present invention is to provide an illumination device that uses a point-emitting light source, compensates for the light intensity distribution of a slit region to be illuminated, and is suitable for a compact copying machine that uses a compound eye imaging system.

この目的は光源からの光を所定角度を有する側面鏡又は
背面鏡等によりスリット領域長手方向の周辺部に指向さ
せ周辺部の光量を上げることにより達成される。
This purpose is achieved by directing the light from the light source to the periphery in the longitudinal direction of the slit region using a side mirror or rear mirror having a predetermined angle, thereby increasing the amount of light in the periphery.

以下、添付する図面を用いて本発明の詳細な説明する。Hereinafter, the present invention will be described in detail using the accompanying drawings.

第1図は本発明を用いる複写機の概略図である。FIG. 1 is a schematic diagram of a copying machine using the present invention.

雄 背面鏡、6は平面鏡で、光源1はN内反射鏡2a原稿面
4の照射されるべきスリット領域5の直前近傍で収れん
される。2aは楕円反射鏡の他、多平面鈍等であっても
良い。8a、8bは後述する側面鏡である。原稿面4の
スリット領域5は複眼結像系乙により移動感光体7にス
リット状に投影される。
The male rear mirror 6 is a plane mirror, and the light source 1 is converged in the vicinity of the slit area 5 to be irradiated on the N internal reflecting mirror 2a of the document surface 4. 2a may be an elliptical reflecting mirror or a multi-plane obtuse mirror. 8a and 8b are side mirrors to be described later. The slit area 5 on the document surface 4 is projected in the form of a slit onto the movable photoreceptor 7 by the compound eye imaging system B.

第2図は光源1と原稿面4のスリット領域5との相対関
係を示す図である。光源1からの直接光によるスリット
領域5の光強度分布は図示する如く、光源の設定される
スリット長手方向の中央部で高く、周辺部で低くなる。
FIG. 2 is a diagram showing the relative relationship between the light source 1 and the slit area 5 on the document surface 4. As shown in FIG. As shown in the figure, the light intensity distribution in the slit area 5 due to the direct light from the light source 1 is high at the center in the longitudinal direction of the slit where the light source is set, and is low at the periphery.

ここで光源10幅Wはスリット領域50幅Wの50+%
以下である。光源1はスリット長手方向中央部に1個設
けるものであるが、付加的にスリット長手方向と平行に
複数個直線状に設けても良い。
Here, the width W of the light source 10 is 50+% of the width W of the slit area 50.
It is as follows. Although one light source 1 is provided at the center in the longitudinal direction of the slit, a plurality of light sources 1 may be additionally provided in a straight line parallel to the longitudinal direction of the slit.

合算すると第2図のような光強度分布となり、スリット
領域中央部に比べ周辺部で低下する。
When added together, the light intensity distribution becomes as shown in FIG. 2, with the light intensity being lower at the periphery than at the center of the slit area.

第4図は本発明の実施例の図である。FIG. 4 is a diagram of an embodiment of the present invention.

第4図で光源1よりスリット領域長手方向に向かう光束
のうち、スリット領域Wより外側にはみ出す部分(斜線
部)を有効に利用するため側面鏡ここで斜線部を光源の
配光特性により光強度に応じて複数個の領域に区分し、
各領域からの光束をスリット領域に向けて反射させるよ
う側面鏡8を各々8a、!3bと折り曲げて構成し、各
反射部により反射された光束がスリット領域長手方向の
中央部でなく周辺部を照射するようにする。
In Fig. 4, in order to effectively utilize the part of the light beam directed from the light source 1 in the longitudinal direction of the slit area (the shaded area) that protrudes outside the slit area W, we use a side mirror. Divide into multiple areas according to
The side mirrors 8 are each 8a, ! so as to reflect the light flux from each region toward the slit region. 3b, so that the light beam reflected by each reflecting portion illuminates not the central portion in the longitudinal direction of the slit region but the peripheral portion.

側面鏡8の反射部の個数、各反射部の角度、長(ト) さは光源の大きさ、配光特性を考慮して定められる。Number of reflective parts of side mirror 8, angle and length of each reflective part (g) The height is determined by considering the size of the light source and the light distribution characteristics.

第4図で半画角θ1までの光束は直接スリット領域を照
射し、半画角θ1からθ2までの光束、半画角θ2から
θ3までの光束は各々側面鏡8a、8bで反射されスリ
ット領域長手方向の周辺部を照射する。
In Fig. 4, the light flux up to the half-field angle θ1 directly illuminates the slit area, and the light flux between the half-field angles θ1 and θ2, and the light flux between the half-field angles θ2 and θ3 are reflected by the side mirrors 8a and 8b, respectively, to the slit area. Irradiate the longitudinal periphery.

反射された反射光に対しても、スリット領域長手方向の
周辺部を照射して、スリット長手方向の直接光による光
強度分布を補償するよう作用する。
The periphery of the slit region in the longitudinal direction is also irradiated with respect to the reflected light to compensate for the light intensity distribution due to the direct light in the longitudinal direction of the slit.

ここでは背面鏡2bの反射面をスリット長手方向と平行
なもの、即ちシリンドリカル状としているが、異なる実
施例として第5図に示されるように背面鏡2bの反射部
を反射光がスリット領域長手方向の周辺部を照射するよ
う9g、9bの如く斜めに設けても良い。なお斜面部は
平面であっても曲面であっても良い。このような側面鏡
等によリ、原稿面のスリット領域長手方向の光強度分布
は第6図に示されるように中央部と周辺部での差が緩和
される。第6図で実線が本発明を用いる表破線が本発明
を用いない系である。
Here, the reflective surface of the rear mirror 2b is parallel to the longitudinal direction of the slit, that is, it is cylindrical, but as a different embodiment, as shown in FIG. They may be provided obliquely, such as 9g and 9b, so as to irradiate the peripheral area of the area. Note that the slope portion may be a flat surface or a curved surface. By using such a side mirror or the like, the difference in the light intensity distribution in the longitudinal direction of the slit area on the document surface between the center and the periphery is reduced, as shown in FIG. In FIG. 6, the solid line represents a system in which the present invention is used, and the broken line represents a system in which the present invention is not used.

以上本発明によれば、点発光光源を用いて原稿面のスリ
ット領域長手方向の光強度分布を補償する複写機等のス
リット照明装置を提供できる。
As described above, according to the present invention, it is possible to provide a slit illumination device for a copying machine or the like that uses a point-emitting light source to compensate for the light intensity distribution in the longitudinal direction of a slit area on a document surface.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明を用いる複写機の概略図、第2図は光源
と原稿面のスリット領域の相対間s′111・  。 第3図は光源の配青巷性図、 第4図は本発明の実施例で側面鏡に関する図、第5図は
本発明の実施例で前面鏡に関する図、内反射鏡、2bは
前面鏡、6は平面鏡、4は原稿面、5はスリット領域、
6は複眼結像系、7は移動感光体、8a、13bは側面
鏡、9a、9bは前面鏡の斜面部である。 153−
FIG. 1 is a schematic diagram of a copying machine using the present invention, and FIG. 2 shows the relative distance s'111 between the light source and the slit area on the document surface. Fig. 3 is a blueprint diagram of the light source, Fig. 4 is an embodiment of the present invention and a diagram relating to a side mirror, Fig. 5 is an embodiment of the invention and a diagram relating to a front mirror, an internal reflecting mirror, and 2b is a front mirror. , 6 is a plane mirror, 4 is a document surface, 5 is a slit area,
6 is a compound eye imaging system, 7 is a movable photoreceptor, 8a and 13b are side mirrors, and 9a and 9b are sloped portions of the front mirror. 153-

Claims (2)

【特許請求の範囲】[Claims] (1)照明されるべきスリット領域から所定距離隔たり
スリット長手方向のほぼ中央部に固設されスリット長手
幅Wの50チ以下の幅Wを有する前記光源のスリット長
手方向への配向特性に応じ複数個に区分された発光領域
をスリット領う 域の長手方向周辺部に反射するよ与複数個の反射面を有
する側面鏡とを有し、 前記スリット領域における前記光源からの直接光による
光強度分布を補償することを特徴とするスリット照明装
置。
(1) A plurality of light sources according to the orientation characteristics in the longitudinal direction of the slit, which are fixed at a predetermined distance from the slit area to be illuminated and substantially at the center in the longitudinal direction of the slit, and have a width W of 50 inches or less than the longitudinal width W of the slit. and a side mirror having a plurality of reflective surfaces to reflect the light-emitting regions divided into individual light-emitting regions to the periphery in the longitudinal direction of the region surrounding the slit region, and a light intensity distribution of direct light from the light source in the slit region. A slit lighting device characterized by compensating for.
(2)前記反射笠の光源に対する背面部がスリット長手
方向に対し斜めの反射面を有することを特徴とする特許
請求の範囲第1項記載のスリット照明装置。
(2) The slit illumination device according to claim 1, wherein the back surface of the reflective shade with respect to the light source has a reflective surface oblique to the longitudinal direction of the slit.
JP11266581A 1981-07-17 1981-07-17 Slit illumination device Pending JPS5814126A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11266581A JPS5814126A (en) 1981-07-17 1981-07-17 Slit illumination device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11266581A JPS5814126A (en) 1981-07-17 1981-07-17 Slit illumination device

Publications (1)

Publication Number Publication Date
JPS5814126A true JPS5814126A (en) 1983-01-26

Family

ID=14592412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11266581A Pending JPS5814126A (en) 1981-07-17 1981-07-17 Slit illumination device

Country Status (1)

Country Link
JP (1) JPS5814126A (en)

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