JPS58134483A - Light emitting photodetector - Google Patents

Light emitting photodetector

Info

Publication number
JPS58134483A
JPS58134483A JP57017977A JP1797782A JPS58134483A JP S58134483 A JPS58134483 A JP S58134483A JP 57017977 A JP57017977 A JP 57017977A JP 1797782 A JP1797782 A JP 1797782A JP S58134483 A JPS58134483 A JP S58134483A
Authority
JP
Japan
Prior art keywords
layer
light
emitter
collector
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57017977A
Other languages
Japanese (ja)
Inventor
Fumihiko Sato
文彦 佐藤
Tsukasa Takeuchi
司 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Tateisi Electronics Co
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tateisi Electronics Co, Omron Tateisi Electronics Co filed Critical Tateisi Electronics Co
Priority to JP57017977A priority Critical patent/JPS58134483A/en
Publication of JPS58134483A publication Critical patent/JPS58134483A/en
Pending legal-status Critical Current

Links

Classifications

    • H01L33/0025
    • H01L31/1105

Landscapes

  • Led Devices (AREA)
  • Light Receiving Elements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)

Abstract

PURPOSE:To obtain a low application voltage element by reducing the energy gaps of emitter, base and collector in this sequence when an N-P-N type phototransistor having an emitter layer, a base layer and a collector layer from upper layer is formed on a semiconductor substrate, and setting the emitter to a negative voltage, the base to a positive voltage at the light emitting time, and the emitter to the negative voltage and the collector to the positive voltage at the light receiving time. CONSTITUTION:An N<-> type GaAS layer 2 to become an emitter of an N-P-N type phototransistor, a P type Ga0.95Al0.05As layer 3 to become a base and an N type Ga0.65Al0.34As layer 4 to become a collector are sequentially laminated on an n<+> type GaAs substrate 1. In this configuration, the energy gap of the respective layers are set to the relationship of the layer 4 the layer 3 the layer 2. Thereafter, a collector electrode 5 is mounted on the back surface of the substrate 1, a base electrode 6 is mounted on the layer 3, and an emitter electrode 7 is mounted on the layer 4, the polarities of the voltages to be applied to the electrodes are selected and light is emitted and received.

Description

【発明の詳細な説明】 ζノ発明は、単一〇光ファイバによる双方向光伝送等に
使用される発光、受光の両機能をもつ九発光受光素千に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION The invention relates to a nine-light-emitting and light-receiving element having both light-emitting and light-receiving functions, which is used for bidirectional optical transmission through a single optical fiber.

光フアイバ過信の実用化において、1本の光ファイバを
使って双方向光伝送を可能にする発光受光素子は、簡易
な低価格Vステムを実現しうる九め期待が大きい。
In the practical application of optical fiber overconfidence, there are great expectations for light-emitting and light-receiving devices that enable bidirectional optical transmission using a single optical fiber as a means of realizing a simple, low-cost V-stem.

発光受光素子を実現する方法の1つとして、従来発光ダ
イオード(LID)・を使用して発光時は順バイアスし
て発光させ一受光時は逆バイアスしてアバヲンジエフオ
トダイオード(ムPD)として成立させて受光させるも
のが6つ九。
One way to realize a light-emitting and light-receiving device is to use a conventional light-emitting diode (LID), which is forward biased when emitting light and reverse biased when receiving light, and used as an abawon photodiode (PD). There are 6 and 9 things that are established and receive light.

仁の4のは構造が簡単なものの、受光時にムPDとして
使用する丸め、高い印加電圧を必要とし、雑音が大きい
という欠点がある。を九、同一のp−n接金で発光と受
光を行なう丸め、発光波長スペクトルと受光感度スペク
ト〜を比較すると、発光波長スペクトμは受光感度スペ
ク)Nの長波長側・Kずれ、発光液長領域の一部にしか
受光感度をもたないことになる。
Although the structure of No. 4 is simple, it has the disadvantage that it requires rounding to be used as a mu PD when receiving light, requires a high applied voltage, and generates large noise. (9) When emitting and receiving light with the same p-n welding, comparing the emission wavelength spectrum and the light-receiving sensitivity spectrum, we find that the light-emitting wavelength spectrum μ is the light-receiving sensitivity spectrum). This means that only a part of the long region has light-receiving sensitivity.

ζO発明は、簡単な構造であることは勿論Oこと、低雑
音、低印加電圧で駆動でき、受光感度の高い発光受光素
子を得ることを目的とする。
The object of the invention is to obtain a light-emitting light-receiving element that has a simple structure, can be driven with low noise, low applied voltage, and has high light-receiving sensitivity.

以下、この発明の一実施例を図面にもとづいて説明する
Hereinafter, one embodiment of the present invention will be described based on the drawings.

第1図はこの発明に係る発光受光素子の一例を示す断面
図である。
FIG. 1 is a sectional view showing an example of a light emitting light receiving element according to the present invention.

同図において、lはn −GIAS基板で、この基板l
の主面上には、fl”−Gnムsol!、P=G510
.96ムlo、Obム11および11 Glo、eaA
lo、siA@層4が順次積重状に形成されている。こ
れらは、液相エピタキシャル法によって形成されたもの
で、厚さはそれぞれ3μm、1μmおよび4μmである
。このものは上記n −G a O,・aAlo、s6
ムS層4、P−GlO,96ムi0.06ム$層3およ
びIII−0118層2をそれぞれエミッタ、ベースお
よびコレクタトスるnpn形の“7オトトランジスタを
構成してお夛、エミッタ4のエネルギーギャップ〉ベー
ス1のエネルギーギャップ〉コレクタ意のエネルギーギ
ャップの関係をもつように設定されてい畢。
In the same figure, l is an n-GIAS substrate, and this substrate l
On the main surface of
.. 96 Mlo, Obm 11 and 11 Glo, eaA
The lo, siA@ layers 4 are sequentially formed in a stacked manner. These were formed by liquid phase epitaxial method and have thicknesses of 3 μm, 1 μm, and 4 μm, respectively. This one is the above n −G a O,・aAlo, s6
An npn-type "7" transistor is constructed by tossing the emitter, base, and collector of the emitter, base, and collector of the emitter, base, and collector layers, respectively. It is set to have the following relationship: energy gap>base 1 energy gap>collector's energy gap.

Sはムu−Geからなるコレクタ電極、6社ムU−Zn
からなるベース電極、?′云ムu−Geからなるエミッ
タ電極である。
S is a collector electrode made of Mu-Ge, 6 companies Mu-U-Zn
The base electrode, consisting of ? This is an emitter electrode made of U-Ge.

上記構成において、発光モードを第2図で説明する。電
源IC,によ)エミッタ電!1i7KjlL、ベース電
極6に正の電圧を印加すると、これはシングルへテロ接
合の発光ダイオードとして働く。その動作を第3図のエ
ネルギーバンド図とともに説明すればつぎのようである
。上記接合に順バイアスを印加すると、n−Ga0.・
暴ムl・、■ムS層4側よシP−GlG、9易ムJo、
os1ムs @ B側へ電子の注入がおこシ、この電子
がホーpと再結合する際このG、・、・暴ム10、・i
ム$のエネルギーギャップに相当する830nmの波長
の光が放出される。
In the above configuration, the light emission mode will be explained with reference to FIG. Power supply IC, emitter voltage! 1i7KjlL, when a positive voltage is applied to the base electrode 6, it works as a single heterojunction light emitting diode. The operation will be explained as follows with reference to the energy band diagram shown in FIG. When a forward bias is applied to the above junction, n-Ga0.・
Violence l・、■MuS layer 4 side P-GlG, 9 easymu Jo,
os1mus @ Electron injection occurs to the B side, and when this electron recombines with hope p, this G...
Light with a wavelength of 830 nm, which corresponds to an energy gap of $1,000, is emitted.

一方、受光電−ドを第4図で説明する。電源IC。On the other hand, the photodetector will be explained with reference to FIG. Power IC.

によシエミツタ電極7に負、コレクタ電極lK正の電圧
を印加すると、これはフォトトランジスタとして働く。
When a negative voltage is applied to the collector electrode 7 and a positive voltage is applied to the collector electrode 1K, this acts as a phototransistor.

その動作を第5図のエネルギーバンド図とともに説明す
ればつぎのようである。つまシ、フォトトラ・:1ンジ
スタに光があたると、エミッタ(ト))およびベーj−
を通過した光はコレクタ空乏層、1′:、1 で吸収され、光1−・、流にかわる。この時、このフォ
トトランジスタの波長感度はエミッタのエネルギーギャ
ップと、コレクタのエネルギーギャップに相当する7 
00 nm〜g 7 Q nm  の間である。
The operation will be explained as follows with reference to the energy band diagram shown in FIG. When light hits the phototransistor, the emitter (g) and base j-
The light that has passed through is absorbed by the collector depletion layer, 1':,1, and is converted into a light stream. At this time, the wavelength sensitivity of this phototransistor is 7, which corresponds to the energy gap of the emitter and the energy gap of the collector.
00 nm to g 7 Q nm.

第6図に、この素子の発光波長スペクトルを曲線1で、
受光感度スペクトルを曲線すで示す。
In Figure 6, the emission wavelength spectrum of this device is shown by curve 1.
The light receiving sensitivity spectrum is also shown as a curve.

第6図からも明らかなように、上記構成においては、受
光波長スペクトA/bが発光スペクトル畠の全域をカバ
ーできる九め、受光性が大きく向上する。
As is clear from FIG. 6, in the above configuration, the light receiving wavelength spectrum A/b can cover the entire emission spectrum, and the light receiving property is greatly improved.

上記実施例ではG51AJム$系の素子で説明したが、
これに代えて、たとえば工n()li!!I’系にも適
用できるものである。
In the above example, the explanation was made using a G51AJ mu$ system element, but
Instead of this, for example, 工n()li! ! This can also be applied to the I' system.

オ九、受光時、ベース1を解放で使用したが、これを接
続すれば、よ)高速で使える。
Oku, when receiving light, I used base 1 in the open state, but if you connect it, you can use it at high speed.

この発明によれば、n−p−・nの3層という簡単な構
造で発光および受光の両機能を有することは勿論のこ−
と、発光波長スベク゛トルの全域をカバーするような受
光感度スペクトルをもつ丸め、効率がよ゛く、トランジ
スタの増巾作用で光電流も大きい。さらに印加電圧も数
ポA/)と小さく、雑音も少ないという利点がある。
According to this invention, it is possible to have both light emitting and light receiving functions with a simple structure of three layers of n-p-n.
It has a rounded light-receiving sensitivity spectrum that covers the entire emission wavelength spectrum, has high efficiency, and has a large photocurrent due to the amplification effect of the transistor. Furthermore, the applied voltage is as small as several points A/), and there is an advantage that there is little noise.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明に係る発光受光素子の一例を示す素子
断面図、第2図および第3図線それぞれ第1図における
素子の発光モードを示す接続図およびエネルギーバンド
図、第4図および第5図はそれぞれ受光モードを示ネ接
続図およびエネルギーバンド図、第6図は第1図におけ
る素子の発光波長スペク)μと受光感度スペク)ルを示
す特性図である。 l・・・半導体基板、2・・・コレクタ層、1・・・ベ
ース層、4・・・エミツタ層、・5・・・コレクタ電極
、6・・・ベース電st、y・・・エミッタ電極。 特許出願人  立石電機株式会社 第1図 第2図 第3図 n P :キ::、。 第4図 第5図 η    Pn 第6図 ′:、A
FIG. 1 is a device cross-sectional view showing an example of a light-emitting light-receiving device according to the present invention, FIGS. 2 and 3 are connection diagrams and energy band diagrams showing the light emission mode of the device in FIG. FIG. 5 is a connection diagram and energy band diagram showing the light reception mode, respectively, and FIG. 6 is a characteristic diagram showing the light emission wavelength spectrum μ and light reception sensitivity spectrum of the device in FIG. 1. l...Semiconductor substrate, 2...Collector layer, 1...Base layer, 4...Emitter layer, 5...Collector electrode, 6...Base electrode st, y...Emitter electrode . Patent applicant: Tateishi Electric Co., Ltd. Figure 1 Figure 2 Figure 3 n P:K::,. Figure 4 Figure 5 η Pn Figure 6':, A

Claims (1)

【特許請求の範囲】[Claims] (1)、半導体基板と、この半導体基板上に層状に形成
され九MPN形フオトトッンνスタとを備え、上記トフ
ンジスタにおけるエミッタのエネルギーギャップ、ペー
スのエネルギーギャップおよびコレクタの二ネμギー1
、ギャップを仁の順のあとのものほど小さく設定し、発
”光時には上記エミッタに負電圧、ベースに正電圧をそ
れぞれ印加し、受光時には上記エミッタに負電圧、コレ
クタに正電圧をそれぞれ印加させるように構成し九発光
受光素子。
(1) comprising a semiconductor substrate and a nine-MPN type photon ν star formed in layers on the semiconductor substrate;
, the gap is set smaller as the gap goes further in the order of nicks, and when emitting light, a negative voltage is applied to the emitter and a positive voltage is applied to the base, and when receiving light, a negative voltage is applied to the emitter and a positive voltage is applied to the collector. It consists of nine light-emitting light-receiving elements.
JP57017977A 1982-02-05 1982-02-05 Light emitting photodetector Pending JPS58134483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57017977A JPS58134483A (en) 1982-02-05 1982-02-05 Light emitting photodetector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57017977A JPS58134483A (en) 1982-02-05 1982-02-05 Light emitting photodetector

Publications (1)

Publication Number Publication Date
JPS58134483A true JPS58134483A (en) 1983-08-10

Family

ID=11958777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57017977A Pending JPS58134483A (en) 1982-02-05 1982-02-05 Light emitting photodetector

Country Status (1)

Country Link
JP (1) JPS58134483A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6062167A (en) * 1983-09-14 1985-04-10 Omron Tateisi Electronics Co Light emitting and receiving element
JPS61131491A (en) * 1984-11-29 1986-06-19 Oki Electric Ind Co Ltd Bipolar transistor
JPS61131490A (en) * 1984-11-29 1986-06-19 Oki Electric Ind Co Ltd Bipolar transistor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6062167A (en) * 1983-09-14 1985-04-10 Omron Tateisi Electronics Co Light emitting and receiving element
JPS61131491A (en) * 1984-11-29 1986-06-19 Oki Electric Ind Co Ltd Bipolar transistor
JPS61131490A (en) * 1984-11-29 1986-06-19 Oki Electric Ind Co Ltd Bipolar transistor

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