JPS58133355A - Method for processing tungsten material - Google Patents

Method for processing tungsten material

Info

Publication number
JPS58133355A
JPS58133355A JP1657382A JP1657382A JPS58133355A JP S58133355 A JPS58133355 A JP S58133355A JP 1657382 A JP1657382 A JP 1657382A JP 1657382 A JP1657382 A JP 1657382A JP S58133355 A JPS58133355 A JP S58133355A
Authority
JP
Japan
Prior art keywords
processing
ingot
rolling
rate
tungsten material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1657382A
Other languages
Japanese (ja)
Inventor
Kuninari Kimura
木村 邦成
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Tungsten Co Ltd
Original Assignee
Tokyo Tungsten Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Tungsten Co Ltd filed Critical Tokyo Tungsten Co Ltd
Priority to JP1657382A priority Critical patent/JPS58133355A/en
Publication of JPS58133355A publication Critical patent/JPS58133355A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a processed product comprising a W-material free from deterioration in sag property, by a method wherein light impact processing and recrystallizing treatment are applied to the W-material so as to bring the same to the range of a predetermined cross area reduction ratio and the treated W- material is subjected to secondary processing. CONSTITUTION:For example, a W-ingot obtained by sintering a W-powder doped with K2O, SiO2 and Al2O3 is prepared. To this ingot, light impact processing is applied at 1,300-1,500 deg.C so as to adjust a cross area reduction ratio to 60- 90% and recrystallizing treatment is applied. In the next step, the W-ingot after recrystallizing treatment is subjected to secondary processing, for example, wire drawing processing at 800-1,000 deg.C by using a die having a cartridge heater mounted therein shown by Japanese Patent Application No.55-11819 to prepare a 170MG wire material. The resulting obtained wire material is good in sag property, low in a cracking ratio and size irregularity and the yield of the ingot material is enhanced.

Description

【発明の詳細な説明】 本発明はタングステン材料の加工方法に関する。[Detailed description of the invention] The present invention relates to a method for processing tungsten material.

一般に、この種の加工方法はタングステン材料として与
えられるインゴットに転打加工を行った後、線引加工等
を施し、タングステンフィラメント等を製作するのに用
いられる。
In general, this type of processing method is used to manufacture tungsten filaments and the like by rolling an ingot provided as a tungsten material and then subjecting it to wire drawing and the like.

従来、この加工方法として、線引加工前の転打加工にお
いて、タングステン材料を断面減少率。
Conventionally, this processing method involves rolling the tungsten material before wire drawing to reduce the area reduction rate.

即ち、[1−(+ii引開引時始時面積/インゴット断
面積〕)×100(イ)において、90〜97チになる
ように加工する方法が提案されている(特公昭53−7
26号)。
In other words, a method has been proposed in which [1-(+ii area at the start of pulling/ingot cross-sectional area]) x 100 (a) is processed so that it becomes 90 to 97 inches (Japanese Patent Publication No. 53-7
No. 26).

この方法によれば、フィラメント等の製品のサグ性を改
善できると共に、クラックもみられないことが指摘され
ている。
It has been pointed out that according to this method, the sagging properties of products such as filaments can be improved and no cracks are observed.

ここで、この方法では、特公昭53−15449号公報
にも述べられているように、転打加工中に挿入される再
結晶処理を皆無又は1回だけにすることが望ましい。こ
のように、再結晶処理を最小限に留めた場合、転打加工
の際に2割れが発生するおそれがある。この割れを防止
するために、1回当りの転打加工率(即ち、断面減少率
)を小さくすることが特公昭53−15449号公報で
提案されている。しかし、1回当りの転打加工率を低下
させて、全体の断面減少率を90〜97%にすることは
転打加工装置のメカニズム上非常に困難である。また、
転打加工の回数を多くしなければならず、コスト高にも
なる。
Here, in this method, as stated in Japanese Patent Publication No. 53-15449, it is desirable that no or only one recrystallization treatment be performed during the rolling process. In this way, if the recrystallization treatment is kept to a minimum, there is a risk that two cracks will occur during the rolling process. In order to prevent this cracking, it has been proposed in Japanese Patent Publication No. 15449/1983 to reduce the rate of rolling per round (ie, the rate of area reduction). However, it is very difficult to reduce the rolling rate per round to achieve an overall area reduction rate of 90 to 97% due to the mechanism of the rolling machine. Also,
The number of rolling operations must be increased, which also increases costs.

本発明の目的は断面減少率を小さくしても、サグ性の劣
化が見られないタングステン材料の加工方法を提供する
ことである。
An object of the present invention is to provide a method for processing tungsten material in which deterioration of sagging properties is not observed even if the area reduction rate is reduced.

本発明では、転打加工中に行われる再結晶処理の際、結
晶の粒度を制御すれば、60チから90チを越えない範
囲の断面減少率で、良好な結果が得られることを見い出
した。また、線引加工を特サグ性を改善できた。
In the present invention, it has been found that if the grain size of the crystals is controlled during the recrystallization treatment performed during the rolling process, good results can be obtained with a cross-sectional reduction rate in the range of 60 to 90 inches. . In addition, we were able to improve the sag resistance during wire drawing.

以下では、タングステンについてのみ説明するが1本発
明はタングステン合金にも適用可能である。
Although only tungsten will be described below, the present invention is also applicable to tungsten alloys.

まず* K2O* 5102+及びAt203をドープ
したタングステン粉末を焼結することによって得られる
タングステンインゴットを多数用意し、これらインゴッ
トに、1300〜1500℃で転打加工を施すと共に、
再結晶処理を施して1.結晶粒度200〜蔵のダイスを
用いて線引きし、 170 MGの線材を用意した。尚
、線引温度は800〜1000℃で行なった。
First, a large number of tungsten ingots obtained by sintering tungsten powder doped with *K2O* 5102+ and At203 are prepared, and these ingots are subjected to rolling processing at 1300 to 1500 °C,
After recrystallization treatment 1. A wire with a grain size of 200 to 170 MG was prepared by drawing using a die. Note that the drawing temperature was 800 to 1000°C.

以下本発明によって得られる材料の特性を従来の加工方
法によって得られる材料と比較しながら説明する。
The characteristics of the material obtained by the present invention will be explained below while comparing them with the materials obtained by conventional processing methods.

(1)サグ性 At203,5i02.に20を添加したドープタング
ステンから転打加工率を種々に変化させて170MG線
材を得る。第1図は縦軸に変形率、横軸に転打加工率を
とシ示した図である。この図から明らかなように転打加
工率60チ〜89チのものは変形率が少なく、サグ性が
良好であることが判る。そして、転打加工率が90%以
上のものはサグ性が低下している。
(1) Sag property At203,5i02. A 170MG wire rod is obtained by varying the rolling processing rate from doped tungsten to which 20% is added. FIG. 1 is a diagram showing the deformation rate on the vertical axis and the rolling processing rate on the horizontal axis. As is clear from this figure, it can be seen that when the rolling processing rate is 60 to 89 inches, the deformation rate is small and the sagging property is good. Further, those with a rolling processing rate of 90% or more have a decreased sagging property.

(2)材料の歩留 lサグ性と同様に170 MG線材を得る。第2図は縦
軸にクラ、り率、横軸に転打加工率をとり示した図、第
3図は縦軸にサイズ偏差、横軸に転打加工率をとり示し
た図である。これら“の図から明らかなように、転打加
工率を90チ未満にして線引きを行なったものが、クラ
ック率サイズばらつきが小さく、材料の歩留が向上した
(2) Yield of material 170 MG wire is obtained in the same manner as the sag property. FIG. 2 shows the cracking rate on the vertical axis and the rolling rate on the horizontal axis, and FIG. 3 shows the size deviation on the vertical axis and the rolling rate on the horizontal axis. As is clear from these figures, when drawing was carried out at a rolling rate of less than 90 inches, the variation in crack rate size was small and the yield of material was improved.

これは、転打加工率を小さくして強加工線引によシ繊維
組織を発達させたことによる効果である。
This is the effect of reducing the rolling rate and developing the fiber structure through strong drawing.

(3)2次再結晶 よシ長さ200關の線を切シ取シ、常温引張り強さと検
鏡によシ再結晶温度を判定した。この判定結果を第4図
に縦軸に再結晶温度、横軸に転打加工率をと9示す。こ
の図から明らかなように転打加工率を小にする程再結晶
温度は上昇する。そして転打加工率が90チ以上である
と再結晶温度は著しく下降する。
(3) During the secondary recrystallization, a 200 mm long line was cut out and the tensile strength at room temperature and the recrystallization temperature were determined using a microscope. The results of this determination are shown in FIG. 4, where the vertical axis represents the recrystallization temperature and the horizontal axis represents the rolling rate. As is clear from this figure, the smaller the rolling rate, the higher the recrystallization temperature. When the rolling rate is 90 inches or more, the recrystallization temperature drops significantly.

次に本発明加工方法によって得られたフィラメントをハ
ロダン電球に適用し、実用試験を行なっ0に、設計寿命
100時間のノ・ログン電球に本発表に示す。
Next, the filament obtained by the processing method of the present invention was applied to a Halodan light bulb, and a practical test was carried out to produce a Nologon light bulb with a design life of 100 hours, as shown in this presentation.

第  1  表 第1表に示されるように本発明加工方法を用いた線形開
始時の断面減少率60%〜89%のものはサグ性、寿命
とも良好である。
Table 1 As shown in Table 1, those having a cross-sectional area reduction rate of 60% to 89% at the start of linearization using the processing method of the present invention have good sag resistance and service life.

以上詳述したように本発明加工方法により加工されたタ
ングステン材料は特性がすぐれたものが得られる。
As detailed above, the tungsten material processed by the processing method of the present invention has excellent properties.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、第2図、第3図及び第4図は本発明の加工方法
を用いて製造されたタングステン材料の諸物件を示す図
で、第1図はサグ性、第2図と第3図は材料の歩留、第
4図は2次再結晶を示したものである。 転打カロエ礪ろ(o/□) 転打加工率(’/、)
Figures 1, 2, 3 and 4 are diagrams showing various properties of tungsten material manufactured using the processing method of the present invention. The figure shows the material yield, and FIG. 4 shows the secondary recrystallization. Rolling and rolling process (o/□) Rolling and processing rate ('/,)

Claims (1)

【特許請求の範囲】[Claims] 1、 タングステン材料を転打加工すると共に再結晶処
理した後、二次加工するタングステン材料の加工方法に
おいて、前記二次加工前の断面減少率が60チから90
、俤を越えない範囲になるように、前記タングステン材
料に転打加工を施すことを特徴とするタングステン材料
の加工方法。
1. A tungsten material processing method in which the tungsten material is rolled and recrystallized and then subjected to secondary processing, in which the cross-section reduction rate before the secondary processing is from 60 inches to 90 inches.
, a method for processing a tungsten material, characterized in that the tungsten material is subjected to a rolling process such that the tungsten material does not exceed .
JP1657382A 1982-02-04 1982-02-04 Method for processing tungsten material Pending JPS58133355A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1657382A JPS58133355A (en) 1982-02-04 1982-02-04 Method for processing tungsten material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1657382A JPS58133355A (en) 1982-02-04 1982-02-04 Method for processing tungsten material

Publications (1)

Publication Number Publication Date
JPS58133355A true JPS58133355A (en) 1983-08-09

Family

ID=11920026

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1657382A Pending JPS58133355A (en) 1982-02-04 1982-02-04 Method for processing tungsten material

Country Status (1)

Country Link
JP (1) JPS58133355A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58133356A (en) * 1982-02-04 1983-08-09 Tokyo Tungsten Co Ltd Tungsten material and preparation thereof
JPH03219039A (en) * 1990-01-23 1991-09-26 Toshiba Corp Rhenium-tungsten alloy material excellent in workability and its manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58133356A (en) * 1982-02-04 1983-08-09 Tokyo Tungsten Co Ltd Tungsten material and preparation thereof
JPH03219039A (en) * 1990-01-23 1991-09-26 Toshiba Corp Rhenium-tungsten alloy material excellent in workability and its manufacture

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