JPS58132649U - Polishing table for vacuum melted base material - Google Patents

Polishing table for vacuum melted base material

Info

Publication number
JPS58132649U
JPS58132649U JP3052682U JP3052682U JPS58132649U JP S58132649 U JPS58132649 U JP S58132649U JP 3052682 U JP3052682 U JP 3052682U JP 3052682 U JP3052682 U JP 3052682U JP S58132649 U JPS58132649 U JP S58132649U
Authority
JP
Japan
Prior art keywords
base material
polishing table
melted base
vacuum melted
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3052682U
Other languages
Japanese (ja)
Inventor
松本　邦英
Original Assignee
山陽特殊製鋼株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 山陽特殊製鋼株式会社 filed Critical 山陽特殊製鋼株式会社
Priority to JP3052682U priority Critical patent/JPS58132649U/en
Publication of JPS58132649U publication Critical patent/JPS58132649U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はこの考案の第１の実施例の平面図、第２図は同
実施例の使用状態を示す側面図、第３図はこの考案の第
２の実施例の平面図である。 １・・・・・・第１０−ラ、２・・・・・・第２０−ラ
、３・・・・・・第３０−ラ、４・・・・・・固定基盤
、５・・・・・・軸受、６゜５・・・・・・真空溶解母
材、７・・・・・・回転ワイヤブラシ。FIG. 1 is a plan view of a first embodiment of this invention, FIG. 2 is a side view showing the usage state of this embodiment, and FIG. 3 is a plan view of a second embodiment of this invention. 1...10th La, 2...20th La, 3...30th La, 4...Fixed base, 5... ... Bearing, 6゜5 ... Vacuum melting base material, 7 ... Rotating wire brush.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 各々が略水平方向に間隔を隔てて順次隣合うように平行
配置されかつ回転自在に水平に支持された第１、第２、
第３０−ラからなり、その中間の第２０−ラを共用して
第１０−ラと第２０−ラ上及び第２０−ラと第３０−ラ
上の夫々に被研磨棒材を載置した状態においてその双方
の被研磨棒材の外周が接近するように上記第１、第２、
第３０−ラの相互の軸間距離を定めてなる真空溶解母材
の研磨台。A first, a second, which are arranged parallel to each other so as to be adjacent to each other at intervals in a substantially horizontal direction, and are rotatably supported horizontally;
Consisting of 30th la, the middle 20th la was shared and the bar to be polished was placed on the 10th la and the 20th la, and on the 20th la and the 30th la, respectively. The first, second, and
30th - A polishing table for a vacuum melted base material, which is formed by determining the distance between the mutual axes of the la.
JP3052682U 1982-03-03 1982-03-03 Polishing table for vacuum melted base material Pending JPS58132649U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3052682U JPS58132649U (en) 1982-03-03 1982-03-03 Polishing table for vacuum melted base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3052682U JPS58132649U (en) 1982-03-03 1982-03-03 Polishing table for vacuum melted base material

Publications (1)

Publication Number Publication Date
JPS58132649U true JPS58132649U (en) 1983-09-07

Family

ID=30042236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3052682U Pending JPS58132649U (en) 1982-03-03 1982-03-03 Polishing table for vacuum melted base material

Country Status (1)

Country Link
JP (1) JPS58132649U (en)

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