JPS58116489A - Carboxylic acid amide derivative - Google Patents

Carboxylic acid amide derivative

Info

Publication number
JPS58116489A
JPS58116489A JP56215860A JP21586081A JPS58116489A JP S58116489 A JPS58116489 A JP S58116489A JP 56215860 A JP56215860 A JP 56215860A JP 21586081 A JP21586081 A JP 21586081A JP S58116489 A JPS58116489 A JP S58116489A
Authority
JP
Japan
Prior art keywords
group
phenyl
lower alkyl
alkyl group
pyridine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56215860A
Other languages
Japanese (ja)
Other versions
JPS6237038B2 (en
Inventor
Yoshihiko Tsuda
可彦 津田
Yoshiaki Tsuda
津田 嘉章
Tadahiro Doi
土肥 忠博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Pharmaceutical Co Ltd
Otsuka Pharmaceutical Factory Inc
Original Assignee
Otsuka Pharmaceutical Co Ltd
Otsuka Pharmaceutical Factory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Pharmaceutical Co Ltd, Otsuka Pharmaceutical Factory Inc filed Critical Otsuka Pharmaceutical Co Ltd
Priority to JP56215860A priority Critical patent/JPS58116489A/en
Publication of JPS58116489A publication Critical patent/JPS58116489A/en
Publication of JPS6237038B2 publication Critical patent/JPS6237038B2/ja
Granted legal-status Critical Current

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Abstract

NEW MATERIAL:An carboxylic acid amide derivative shown by the formulaI (R<1> is H, or halogen; R<2> and R<3> are H, lower alkyl, cycloalkyl, phenyl lower alkyl, lower alkenyl, etc.; X is lower alkylene which may have phenyl group). EXAMPLE:N-Methyl-alpha-(thiazolo[5,4-b]pyridine-2-yl)thiophenylacetic amide. USE:An antiphlogistic. A hypotensor, anodyne, and antipyretic. PROCESS:A 2-mercaptothiazolo[5,4-b]pyridine derivative shown by the formula II is reacted with a haloamide derivative shown by the formula III(Y is halogen such as F, Cl, Br, orI) in the presence of a deoxidizer (e.g., pyridine, triethylamine, etc., preferably NaOH, etc.), to give a compound shown by the formulaI. The reaction is carried out in a proper solvent (e.g., benzene, toluene, etc.).

Description

【発明の詳細な説明】 本発明は新規なカルボン酸アミド誘導体に関する。[Detailed description of the invention] The present invention relates to novel carboxylic acid amide derivatives.

本発明のカルボン酸アミド誘導体は文献未載の新規化合
物であって、下記一般式〔I〕で表わされる。
The carboxylic acid amide derivative of the present invention is a novel compound that has not been described in any literature, and is represented by the following general formula [I].

〔式中R1は水素原子又はハロゲン原子を示す。[In the formula, R1 represents a hydrogen atom or a halogen atom.

R2及びR3は同−又は異なって水素原子、低級アル中
ル基、シフ0アル中ル基、フェニル低級アル中ル基、低
級アルケニル基、又はニド0基、ハロゲン原子、低級ア
ルコ中シ基、低級アルコ牛ジカルボニル基、低級アル中
ル基及びへ〇ゲン置換低級アル中ル基からなる群から選
ばれ九1〜3個の置換基を有するととのあるフェニル基
を示す。Xはフェニル基を置換基として有することのあ
る低級アル中しン基を示す。〕 上記一般式CI)で表わされる本発明の化合物は、優れ
た抗炎症作用、降圧作用、鎮痛作用、解熱作用等を有し
、抗炎症剤、降圧剤、鎮痛剤及び解熱剤として有用であ
る。
R2 and R3 are the same or different and are a hydrogen atom, a lower alkyl group, a phenyl lower alkyl group, a lower alkenyl group, a nido group, a halogen atom, a lower alkyl group, a lower alkoxy group Refers to a phenyl group having 91 to 3 substituents selected from the group consisting of a dicarbonyl group, a lower alkyl group, and a hexogen-substituted lower alkyl group. X represents a lower alkyl group which may have a phenyl group as a substituent. ] The compound of the present invention represented by the general formula CI) has excellent anti-inflammatory, hypotensive, analgesic, and antipyretic effects, and is useful as an anti-inflammatory agent, antihypertensive agent, analgesic agent, and antipyretic agent.

上記一般式(:I) において示される各基は具体的に
はそれぞれ以下の基を例示できる。
Specifically, each group shown in the above general formula (:I) can be exemplified by the following groups.

ハロゲン原子としては、例えば弗素原子、塩素原子、臭
素原子、沃素原子等を挙げることができる。
Examples of the halogen atom include fluorine atom, chlorine atom, bromine atom, and iodine atom.

低級アル牛ル基としては、例えばメチル、エチル、づ口
じル、イソプロピル、ブチル%tgrt−ブチル、ペン
チル、へ士シル基等を挙げることができる。
Examples of the lower alkyl group include methyl, ethyl, dimethyl, isopropyl, butyl, pentyl, and hesyl groups.

シフ0アル中ル基としては、例えばシフ0プ0ピル、シ
クロブチル、シフ0ペンチル、シフ0へ士シル、シフO
へづチル、シフ0オクチル基等を挙げることができる。
Examples of the Schifol group include Schifopyl, cyclobutyl, Schiffpentyl, Schiffoxyl, SchiffO
Examples include heptyl, Schiffoctyl, and the like.

ジル、α−フェネチル、β−フェネチル、3−フェニル
プロピル、4−フェニルブチル、1.1−ジメチル−2
−フェニルエチル、5−フェニルエチル、6−フェニル
へ中シル基等を挙げることができる。
Zyl, α-phenethyl, β-phenethyl, 3-phenylpropyl, 4-phenylbutyl, 1,1-dimethyl-2
-phenylethyl, 5-phenylethyl, 6-phenyl, and the like.

低級アルケニル基としては、例えば2−づ0ベニル、2
−ブテニル、3−ブテニル、2−ペンテニル、3−ペン
テニル、4−ペンテニル、4−へ十セニル基勢を挙ける
ことができる。
Examples of the lower alkenyl group include 2-benyl, 2-benyl,
-butenyl, 3-butenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl and 4-hedecenyl radicals may be mentioned.

低級アルコ+シ基としては、例えばメト十シ、エト十シ
、プロポ士シ、イソづロポ士シ、づト士シ、tart−
ブト士シ基等を挙げることができる。
Examples of the lower alkoxy groups include meth-10, etho-10, prop-2, iso-1, iso-1, and tart-.
Examples include butoshi group.

低級アルコ十ジカルボニル基としては、例えばメト十ジ
カルボニル、エト十ジカルボニル、づDポ+ジカルボニ
ル、イソづ0ボ牛ジカルボニル、ツト4=シbルボニル
、tart−ブト十ジカルボニル基尋を挙げることがで
きる。
Examples of the lower alkoxycarbonyl group include methocodicarbonyl, ethocyclodicarbonyl, dicarbonyl, isozodicarbonyl, carbonyl, and tart-butocodicarbonyl. can be mentioned.

フルオロメチル、トリクロ0メチル、 2,2.2−ト
リフルオロエチル基等を挙げることができる。
Examples include fluoromethyl, trichloromethyl, and 2,2.2-trifluoroethyl groups.

ニドO基、ハロゲン原子、低級アルコ牛シ基、た1〜3
個の置換基を有することのあるフェニル基としては、例
えばフェニル、4−メチルフェニル、3−トリフルオロ
メチルフェニル、3,4−ジ、エチルフェニル、3,4
.5− )リメチルフェニル、2−エチルフェニル、4
−トリクOOメチルフェニル、2−メト士ジフェニル、
3.4−ジメト+ジフェニル、3,4,5− )リメト
+ジフェニル、3−エト士ジフェニル1.4−メト士ジ
フェニル、今一り0ロフエニル、2=4− 、l;り0
0フエニル、2.6−ジク0ロフエニル、3,4.5−
 )リクOOフェニル、3,4−ジづ(]E”7閏ニル
、4−?ジオ0フエニル、2−フルオロフェニル、2−
200フエニル、3−4− 、;メト士シー2−り00
フエニル、4−ニトOフエニル、2−ニド0フエニル、
2−メト十シカ、ルポニルフェニル、4−エト牛ジカル
ボニルフェニル基等を挙げることができる。
Nido O group, halogen atom, lower alkoxy group, Ta1-3
Examples of the phenyl group which may have 4 substituents include phenyl, 4-methylphenyl, 3-trifluoromethylphenyl, 3,4-di,ethylphenyl, 3,4
.. 5-) Limethylphenyl, 2-ethylphenyl, 4
-tricOOmethylphenyl, 2-methoxydiphenyl,
3.4-dimeth+diphenyl, 3,4,5-)rimeth+diphenyl, 3-ethodiphenyl1.4-methodiphenyl, 0 lophenyl, 2=4-, l;
0 phenyl, 2,6-dichlorophenyl, 3,4.5-
) RikuOO phenyl, 3,4-diz(]E”7enyl, 4-?dio0 phenyl, 2-fluorophenyl, 2-
200 phenyl, 3-4-;
phenyl, 4-nido phenyl, 2-nido phenyl,
Examples include 2-methoxycarboxylic acid, luponylphenyl, and 4-ethoxycarbonylphenyl groups.

フェニル基を置換基として有することのある低級アル中
し・ン基として社、例えばメチレジ、エチレン、づ0ピ
レン、イソづ0ピレシ、づチレシ、ペンタメチレン、へ
牛すメチレン、メチルメチレジ、フェニルメチレン、1
−フェニルエチレン、2−フェニルエチレン、l−フェ
ニルプロピレン、2−フェニルプロピレン、3−フェニ
ルづ0ピレン、l−フェニルづチレシ、2−フェニルづ
チレシ、3−フェニルブチレン、4−フェニルづチレン
、■−フェニルペンタメチレジ、2−フェニルペンタメ
チレン、3−フェニルペンタメチしυ、4−フェニルペ
ンタメチレン、5−フェニルペンタメチレン、1−フェ
ニルへ士すメチレン、2−フェニルへ牛すメチレン、3
−フェニルへ牛廿メチレy、4−フェニルへ牛すメチレ
ン、5−フェニルへ士すメチレン、6−フェニルへ士す
メチレυ基等を挙げることができる。
Examples of lower alkali groups which may have a phenyl group as a substituent include methylenedi, ethylene, pyrene, isozylene, pyrene, pentamethylene, hesylmethylene, methylmethylene, phenylmethylene, 1
-Phenylethylene, 2-phenylethylene, l-phenylpropylene, 2-phenylpropylene, 3-phenylpyrene, l-phenylethylene, 2-phenylethylene, 3-phenylbutylene, 4-phenylbutylene, ■ -Phenylpentamethylene, 2-phenylpentamethylene, 3-phenylpentamethylene, 4-phenylpentamethylene, 5-phenylpentamethylene, 1-phenylbentamethylene, 2-phenylbentamethylene, 3
Examples include -phenyl methylene, 4-phenyl methylene, 5-phenyl methylene, 6-phenyl methylene, and the like.

本発明の化合物は種々の方法により製造されるが、その
好ましい一例を挙げれば例えば下記反応式に示す如く、
脱酸剤の存在下に一般式[II)で表わされる2−メル
カづトチアジロ[5,4−h )ピリジン誘導体と一般
式(ト)で表わされるハ0ア三ド誘導体とを反応させる
ことにより製造される。
The compound of the present invention can be produced by various methods, but one preferred example is as shown in the reaction formula below:
By reacting the 2-merca-dithiazilo[5,4-h)pyridine derivative represented by the general formula [II] with the haO3do derivative represented by the general formula (I) in the presence of an acid absorbing agent. Manufactured.

反応式 %式% 〔式中Yけ弗素、塩素、臭素、沃素原子等の八〇じ。〕 一般式〔■〕の化合物と一般式圃の化合物との反応にお
いて用いられる脱酸剤としては、従来公知の塩基性化合
物を広く使用でき、具体的′にはピリジン、トリエチル
ア三シ、ジェチルアニリシ、N−メチルモルホリシ、ト
リエチレシジアミシ等つム、ナトリウムメト十シト、カ
リウムメト士シト、ナトリウムエト中シト、カリウムエ
ト士シト等の無機塩基等を例示できる。これらのうち無
機塩基として脱酸剤を使用するのが有利である。ト記反
応は一般には適商な溶媒中にて行なわれる。
Reaction formula % Formula % [In the formula, Y represents fluorine, chlorine, bromine, iodine atoms, etc. ] As the deoxidizing agent used in the reaction between the compound of the general formula [■] and the compound of the general formula, a wide variety of conventionally known basic compounds can be used. Examples include inorganic bases such as N-methylmorpholoxy, triethylene, sodium methoxy, potassium methoxy, sodium ethyl ester, and potassium ethyl ester. Among these, it is advantageous to use deoxidizers as inorganic bases. The above reactions are generally carried out in a suitable solvent.

溶媒としては反応に悪影響を及はさない限り公知の本の
をいずれも使用でき、具体的にはペンt!シ、トルエ孔
十シレシ、石油エーテル等の芳香族かいし脂肪族炭化水
素類、エチルエーテル、メチルフエニんエーテル、テト
ラしドロフラジ、ジオ士サン等の鎖状ないし環状エーテ
ル類、アセトン、メチルエチルケトン、アセトフェノン
等のケトン類、メタノール、エタノール、イソづOパノ
ール等の低級アルコール類等が、用いられる脱酸剤の種
類、原料物質の性状、その他の反応条件に応じて適宜選
択使用される。該反応において、一般式圃の化合物のう
ちYが沃素原子以外のハロゲン原子を示す化合物を出発
原料として使用する場合は、反応系内に沃化カリウム、
沃化ナトリウム等の沃化アルカリ金属化合物を存在させ
ておくのが好適である。
As a solvent, any known book can be used as long as it does not adversely affect the reaction. Specifically, Pent! Aromatic or aliphatic hydrocarbons such as toluene, toluene, petroleum ether, chain or cyclic ethers such as ethyl ether, methylphenylene ether, tetrahydrofurazine, dioxane, acetone, methyl ethyl ketone, acetophenone, etc. Ketones, methanol, ethanol, lower alcohols such as isodol-panol, and the like are appropriately selected and used depending on the type of deoxidizing agent used, the properties of the raw materials, and other reaction conditions. In this reaction, when using as a starting material a compound in which Y represents a halogen atom other than an iodine atom among the compounds of the general formula, potassium iodide,
Preferably, an alkali metal iodide compound such as sodium iodide is present.

ヒ記反応において一般式(IIIの化合物と一般式圃の
化合物との使用割合としては特に限定されず広い範囲内
から適宜選択できるが、通常前者に対して後者を等モル
−過剰量、好ましくは等tル稈度用いるのがよい。該反
応は冷却下、室温下及び加温下のいずれでも行なわれる
が、通常は室温〜溶媒の還流温度下にて行なうのがよい
。該反応は一般に3〜12時間程時間路了する。
In the above reaction, the ratio of the compound of general formula (III) and the compound of general formula (III) to be used is not particularly limited and can be appropriately selected from a wide range, but usually the latter is used in equimolar excess to the former, preferably It is preferable to use an equivalency culm.The reaction may be carried out under cooling, at room temperature, or under heating, but it is usually preferable to carry out between room temperature and the reflux temperature of the solvent.The reaction is generally carried out at 3. It will take about 12 hours.

斯くして得られる本発明の化合物は、慣用の分離手段、
例えば溶媒抽出、再結晶、カラムク0マトク5フイー、
づレバラテイプ薄層り0マドグラフイー等によシ容易に
単離精製される。  次に実施例を挙げて本発明をさら
に具体的に説明する。
The compounds of the invention thus obtained can be separated by conventional separation means,
For example, solvent extraction, recrystallization, column extraction,
It can be easily isolated and purified using a thin layer of magnetic tape. Next, the present invention will be explained in more detail with reference to Examples.

実施例 I N−メチル−a−200フエニル酢eアミド1.8 f
をアセトン30i1に溶解し、次いで沃化ナトリウム1
.5 fを加え、3時間加熱還流する。放冷後、攪拌下
に2−メルカづトチアジ[1[5,4−b〕ピリジン1
.6を及び無水炭酸ナトリウム1.Ofを加え、再び6
時間加熱還流する。放冷後、反応混合物中に水100−
を加え、り00ホルムで抽出する。ポウ硝上で乾燥扱、
溶媒を留去する。
Example I N-methyl-a-200 phenyl acetic acid eamide 1.8 f
was dissolved in 30 μl of acetone, then 1 μl of sodium iodide
.. Add 5 f and heat to reflux for 3 hours. After cooling, add 2-merkazutothiadi[1[5,4-b]pyridine 1 while stirring.
.. 6 and anhydrous sodium carbonate 1. Add Of and 6 again
Heat to reflux for an hour. After cooling, 100% of water was added to the reaction mixture.
and extracted with RI00 form. Dry over porcelain, treat
The solvent is distilled off.

残渣をシリhゲル力5ムク0マトグ5フィー(り00ホ
ルム/メタノール(20:1)で溶出>IIC付し、N
−メチル−α−(チアリロ[5,4−b )ピリジン−
2−イル)チオフェニル酢酸アミドを得た。ベンゼン−
ルーへ+サシよシ再結晶し、淡褐色針状晶1.3tを得
た。 mp 155.5−157.0℃(分解) 実施例 2〜14 上記実施例1と同様にして下記第1表に記載の各化合物
を得る。
The residue was eluted with gel strength 5 muk 0 methanol (20:1) with form/methanol (20:1) > IIC, and N
-Methyl-α-(thiarylo[5,4-b)pyridine-
2-yl)thiophenyl acetate amide was obtained. Benzene-
The mixture was recrystallized into roux and sashimi to obtain 1.3 tons of light brown needle crystals. mp 155.5-157.0°C (decomposition) Examples 2 to 14 Each compound listed in Table 1 below is obtained in the same manner as in Example 1 above.

Claims (1)

【特許請求の範囲】 ■ 一般式 [式中R1は水素原子又はハロゲン原子を示す。 R2及びR3は同−又は異なって水素原子、低級アル士
ル基、シフ0アル牛ル基、フェニル低級アル+ル基、低
級アルケニル基、又はニド0基、ハロゲン原子、低級ア
ルコ士シ基、低級アルコ士ジカルボニル基、低級アル+
ル基及びへ〇ゲン置換低級アル士ル基からまる群から選
ばれた1〜3個の置換基を有することのあるフェニル基
を示す。Xはフェニル基を置換基として有することのあ
る低級アル中しン基を示す。〕で表わきれるカルポジ酸
アミド誘導体。
[Claims] ■ General formula [wherein R1 represents a hydrogen atom or a halogen atom]. R2 and R3 are the same or different and are a hydrogen atom, a lower alkyl group, a phenyl lower alkyl group, a lower alkenyl group, a nido group, a halogen atom, a lower alkyl group, lower alkoxydicarbonyl group, lower alk+
represents a phenyl group which may have 1 to 3 substituents selected from the group consisting of a 2-alkyl group and a hexogen-substituted lower alkyl group. X represents a lower alkyl group which may have a phenyl group as a substituent. ] Carposi acid amide derivatives.
JP56215860A 1981-12-28 1981-12-28 Carboxylic acid amide derivative Granted JPS58116489A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56215860A JPS58116489A (en) 1981-12-28 1981-12-28 Carboxylic acid amide derivative

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56215860A JPS58116489A (en) 1981-12-28 1981-12-28 Carboxylic acid amide derivative

Publications (2)

Publication Number Publication Date
JPS58116489A true JPS58116489A (en) 1983-07-11
JPS6237038B2 JPS6237038B2 (en) 1987-08-10

Family

ID=16679467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56215860A Granted JPS58116489A (en) 1981-12-28 1981-12-28 Carboxylic acid amide derivative

Country Status (1)

Country Link
JP (1) JPS58116489A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03218377A (en) * 1989-06-29 1991-09-25 Meiji Seika Kaisha Ltd Azole compound and antiulcer agent containing the derivative as active component
US5200407A (en) * 1989-06-29 1993-04-06 Meiji Seika Kaburhiki Kaisha Azole derivatives and anti-ulcerative composition containing same
EP1020451A1 (en) * 1997-03-25 2000-07-19 Kowa Co., Ltd. Novel anilide compounds and drugs containing the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03218377A (en) * 1989-06-29 1991-09-25 Meiji Seika Kaisha Ltd Azole compound and antiulcer agent containing the derivative as active component
US5079255A (en) * 1989-06-29 1992-01-07 Meiji Seika Kabushiki Kaisha Thiazolo [4,5-6] pyridine derivatives and anti-ulcerative composition containing same
US5141946A (en) * 1989-06-29 1992-08-25 Meiji Seika Kabushiki Kaisha Azole derivatives and anti-ulcerative composition containing same
US5200407A (en) * 1989-06-29 1993-04-06 Meiji Seika Kaburhiki Kaisha Azole derivatives and anti-ulcerative composition containing same
EP1020451A1 (en) * 1997-03-25 2000-07-19 Kowa Co., Ltd. Novel anilide compounds and drugs containing the same
US6797717B2 (en) * 1997-03-25 2004-09-28 Kowa Company, Ltd. Anilide compounds and drugs containing the same
EP1020451B1 (en) * 1997-03-25 2005-06-15 Kowa Co., Ltd. Anilide compounds and drugs containing the same
JP4647726B2 (en) * 1997-03-25 2011-03-09 興和株式会社 Novel anilide compound and pharmaceutical containing the same

Also Published As

Publication number Publication date
JPS6237038B2 (en) 1987-08-10

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