JPS58113766U - Evaporation source monitoring mechanism - Google Patents
Evaporation source monitoring mechanismInfo
- Publication number
- JPS58113766U JPS58113766U JP743682U JP743682U JPS58113766U JP S58113766 U JPS58113766 U JP S58113766U JP 743682 U JP743682 U JP 743682U JP 743682 U JP743682 U JP 743682U JP S58113766 U JPS58113766 U JP S58113766U
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- monitoring mechanism
- source monitoring
- vacuum chamber
- reflective surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
゛第１図は従来の蒸発源監視機構の構成の概要をあられ
した図、第２図は本考案の一実施例の構成の概要をあら
れした図、第３図は本考案の他の実−流側の構成の概要
をあられした図である。
記号の説明：１と１′は真空室の壁、２はのぞき窓、３
は蒸発源、５はシャッタ、６は遮蔽板、１１は回転台、
１２は駆動軸、１３と１４はミラー、１５は開孔を有す
る遮蔽板、１６は遮蔽板、１７はミラーをそれぞれあら
れしている。゛Figure 1 is a diagram showing an outline of the configuration of a conventional evaporation source monitoring mechanism, Figure 2 is a diagram showing an outline of the configuration of one embodiment of the present invention, and Figure 3 is a diagram showing another embodiment of the present invention. It is a diagram showing an outline of the configuration on the downstream side. Explanation of symbols: 1 and 1' are walls of the vacuum chamber, 2 is a peephole, 3
is an evaporation source, 5 is a shutter, 6 is a shielding plate, 11 is a rotating table,
12 is a drive shaft, 13 and 14 are mirrors, 15 is a shielding plate having an opening, 16 is a shielding plate, and 17 is a mirror.
Claims (1)
−ら反射面を介して監視する機構において、前記反射面
を前記真空室の外部から更新できる手段を設けたことを
特徴とする蒸発源監視機構。A mechanism for monitoring an evaporation source placed in a vacuum chamber through a reflective surface from a peephole provided in the vacuum chamber, characterized in that a means for updating the reflective surface from outside the vacuum chamber is provided. Evaporation source monitoring mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP743682U JPS58113766U (en) | 1982-01-25 | 1982-01-25 | Evaporation source monitoring mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP743682U JPS58113766U (en) | 1982-01-25 | 1982-01-25 | Evaporation source monitoring mechanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58113766U true JPS58113766U (en) | 1983-08-03 |
| JPS6129722Y2 JPS6129722Y2 (en) | 1986-09-01 |
Family
ID=30020184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP743682U Granted JPS58113766U (en) | 1982-01-25 | 1982-01-25 | Evaporation source monitoring mechanism |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58113766U (en) |
-
1982
- 1982-01-25 JP JP743682U patent/JPS58113766U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6129722Y2 (en) | 1986-09-01 |
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