JPS58110465A - Hydroxy apatite target - Google Patents
Hydroxy apatite targetInfo
- Publication number
- JPS58110465A JPS58110465A JP56208639A JP20863981A JPS58110465A JP S58110465 A JPS58110465 A JP S58110465A JP 56208639 A JP56208639 A JP 56208639A JP 20863981 A JP20863981 A JP 20863981A JP S58110465 A JPS58110465 A JP S58110465A
- Authority
- JP
- Japan
- Prior art keywords
- target
- hydroxyapatite
- hydroxy apatite
- fluorine
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明はトナースパッタリングの為のハイドロキシ・ア
パタイト・ターゲットに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to hydroxyapatite targets for toner sputtering.
従来、リン酸カルシウム系のターゲットに関する研究・
開発レポートは少ない。Ｘ線回折パターン・レベルで純
粋なハイドロキシ・アパタイトからなるターゲットはス
パッタリングの際、一部分解してアパタイト、リン酸三
カルシウム、酸化カルシウムとなる。これは、ハイドロ
キシ・アパタイトの結晶構造に帰因するものでＯＨの欠
陥、 Ｃａの欠陥によるものと思われる。これに対して
フッ素を含有したハイドロキシ・アパタイトは、ＯＨの
欠陥部を補なう様にフッ素が置換されているため、スパ
ッタリングにおいてもより安定に存在するものと推察さ
れる。Previous research on calcium phosphate targets
There are few development reports. A target made of hydroxyapatite that is pure at the X-ray diffraction pattern level is partially decomposed into apatite, tricalcium phosphate, and calcium oxide during sputtering. This is thought to be due to the crystal structure of hydroxyapatite and is caused by OH defects and Ca defects. On the other hand, in fluorine-containing hydroxyapatite, fluorine is substituted to compensate for OH defects, so it is presumed that it exists more stably even during sputtering.
本発明の目的は純粋なハイドロキシ・アパタイトの上記
欠点を解消する為に、フッ素アパタイトを含むハイドロ
キシ・アパタイトのターゲットを提供する二とである。The object of the present invention is to provide a hydroxyapatite target containing fluoroapatite in order to overcome the above-mentioned drawbacks of pure hydroxyapatite.
以下、図によって本発明の概要を述へる。Hereinafter, an overview of the present invention will be described with reference to figures.
第１図及び第２図は本発明に係わるハイドロキシ・アパ
タイト・ターゲットの−・例を示すものであり、第１図
はその平面図、第２図はその側面図である。図中１はハ
イドロキシ・アパタイト焼結体、２は冷却用裏板、３は
ターゲット固定用穴である。1 and 2 show an example of a hydroxyapatite target according to the present invention, with FIG. 1 being a plan view thereof and FIG. 2 being a side view thereof. In the figure, 1 is a hydroxyapatite sintered body, 2 is a cooling back plate, and 3 is a target fixing hole.
本発明に用いるハイドロキシ・アパタイト焼結体１はフ
ッ素を含んだハイドロキシ・アパタイト粉体を成形・焼
成して得られる。以下、焼結体の作製手順を述べる。The sintered hydroxyapatite body 1 used in the present invention is obtained by molding and firing fluorine-containing hydroxyapatite powder. The procedure for producing the sintered body will be described below.
Ｃａ（ＯＨ）□と１１．ＰＯ４を出発原料とするハイド
ロキシ・アパタイトの湿式合成法において、滴下物であ
るＨ３ＰＯ４溶液に所要のフッ素化合物例えばフッ化ア
ンモニウム、フッ化カリウム、フッ化水素アンモニウム
、フッ化水素酸、フッ化水素ナトリウム。Ca(OH)□ and 11. In the wet synthesis method of hydroxyapatite using PO4 as a starting material, necessary fluorine compounds such as ammonium fluoride, potassium fluoride, ammonium hydrogen fluoride, hydrofluoric acid, and sodium hydrogen fluoride are added to the H3PO4 solution that is dropped.
フッ化ナトリウム等の一部を添加する。Ｃａ （ＯＨ）
。Add some sodium fluoride, etc. Ca(OH)
.
の撹拌懸濁液にフッ素を含んだＨ，ＰＯ４溶液を滴下す
る。反応槽のｐＨ値が中性になった時点で滴下を停止す
る。反応生成物である沈澱物をスプレードライヤーによ
り乾燥・造粒する。非晶質のハイドロキシ・アパタイト
粉体を凪焼・成形して焼成する。このようにしてハイド
ロキシ・アパタイト焼結体が得られる。A fluorine-containing H,PO4 solution is added dropwise to the stirred suspension. The dropping is stopped when the pH value of the reaction tank becomes neutral. The reaction product, the precipitate, is dried and granulated using a spray dryer. Amorphous hydroxyapatite powder is calcined, shaped and fired. In this way, a sintered hydroxyapatite body is obtained.
一方、冷却用裏板２は銅、あるいはステンレスで作られ
ておリスバッタリングによりターゲット部材であるハイ
ドロキシ・アパタイト焼結体の温度が上昇することを抑
制している。On the other hand, the cooling back plate 2 is made of copper or stainless steel and suppresses the rise in temperature of the hydroxyapatite sintered body, which is the target member, due to squirrel battering.
次に１以上のようにして作られたターゲット部材である
焼結体と冷却用裏板を加熱して、インジウムろうを使っ
てボンディングする。Next, the sintered body, which is the target member made as described above, and the cooling back plate are heated and bonded using indium solder.
次に、本発明の一実施例をさらに詳しく説明する。０．
２５Ｍ濃度のＣａ（０）１）２撹拌懸濁液１２０１．に
４．５ｇｒのフッ化水素アンモニウムＮＨ，ＦＨＦ （
この場合にはハイドロキシ・アパタイトに対するフッ素
の含有量は０．１％である）を溶解した０、３Ｍ濃度の
１１．ＰＯ。Next, one embodiment of the present invention will be described in more detail. 0.
Stirred suspension of Ca(0)1)2 at a concentration of 25M 1201. 4.5 gr of ammonium hydrogen fluoride NH, FHF (
In this case, the fluorine content with respect to hydroxyapatite is 0.1%) dissolved in 0.3M concentration of 11. P.O.
希釈液を供給速度３Ｌ／ｈで滴下する。反応槽のｐＨ値
が１０に下った時点で−・時Ｈ、ＰＯ４の滴下を中断す
る。反応槽のｐｈ値をｌＯに保留した状態で一昼夜撹拌
する。保留終了後Ｈ，ＰＯ，，の滴トを再開する。The diluted solution is added dropwise at a feed rate of 3 L/h. When the pH value of the reactor drops to 10, the dropping of PO4 is stopped. The reaction vessel was stirred all day and night while maintaining the pH value at 1O. After the hold is completed, the dripping of H, PO, etc. is resumed.
反応槽のｐｉ値が７に下った時点でＩＩ Ｐ（ｌの滴ド
髪終ｒする。生成沈澱物をスプレー・ドライヤーで乾燥
造粒する。こうして得られた粉体を７００℃で■焼して
φ５“Ｘ５ｍ／ｍの円板状に成形する。二のディスクを
１０００℃、４ｈ焼成して焼結体を得る。When the pi value of the reaction tank has fallen to 7, a drop of II P (l) is stopped. The resulting precipitate is dried and granulated using a spray dryer. The powder thus obtained is calcined at 700°C. The second disk is then fired at 1000° C. for 4 hours to obtain a sintered body.
二の焼結体（寸法φ４’Ｘ４．５）と冷却用裏板Ｃｕを
１５０℃に加熱した状態でインジウムろうでボンディン
グする。このようにして作製されたターゲットを用いて
Ｔｉ基板にコーティングする。コート膜をＸ線回折９分
元売度計で調べた結果、組成はハイドロキシ・アパタイ
トの非晶質体、膜厚は１．２μであった。The second sintered body (dimensions φ4'×4.5) and the cooling back plate Cu are bonded with indium solder while heated to 150°C. A Ti substrate is coated using the target thus prepared. As a result of examining the coated film using a 9-minute X-ray diffraction meter, it was found that the composition was an amorphous hydroxyapatite and the film thickness was 1.2 μm.
読上のように′本発明のフッ素を含んだアパタイト・タ
ーゲットはスパッタリングの際、純粋なハイドロキシ・
アパタイト・ターゲットに比べて。As you can see above, the fluorine-containing apatite target of the present invention is a pure hydroxyl target during sputtering.
compared to the apatite target.
アパタイト構造から低級リン酸カルシウム化合物への分
解が少ないという利点を有する。従って、本発明のター
ゲットを利用してスパッタリングを行えば、所要のコー
ティング素子の実現が可能となり、生体材料、工業材料
としての利用に有用である。It has the advantage that the apatite structure is less likely to decompose into lower calcium phosphate compounds. Therefore, by performing sputtering using the target of the present invention, it becomes possible to realize a desired coating element, which is useful for use as a biological material or an industrial material.
第１図は本発明のハイドロキシ・アパタイト・ターゲッ
トの一実施例の平面図、第２図はその側面図である。
１：ハイドロキシ・アパタイト焼結体
２：冷却用裏板
３：ターゲット固定用穴
第１図 第２図FIG. 1 is a plan view of an embodiment of the hydroxyapatite target of the present invention, and FIG. 2 is a side view thereof. 1: Hydroxy apatite sintered body 2: Cooling back plate 3: Target fixing hole Figure 1 Figure 2
Claims (1)
．８％のフッ素を含むことを特徴とするハイドロキシ・
アパタイト・ターゲット。0.01 to 3 for target member in sputtering
．． Hydroxy, which is characterized by containing 8% fluorine.
Apatite target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56208639A JPS58110465A (en) | 1981-12-23 | 1981-12-23 | Hydroxy apatite target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56208639A JPS58110465A (en) | 1981-12-23 | 1981-12-23 | Hydroxy apatite target |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58110465A true JPS58110465A (en) | 1983-07-01 |
| JPS6127348B2 JPS6127348B2 (en) | 1986-06-25 |
Family
ID=16559564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56208639A Granted JPS58110465A (en) | 1981-12-23 | 1981-12-23 | Hydroxy apatite target |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58110465A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0339468A (en) * | 1989-07-06 | 1991-02-20 | Mitsui Eng & Shipbuild Co Ltd | Hydroxyapatite target |
| CN1048291C (en) * | 1997-12-12 | 2000-01-12 | 清华大学 | Preparation of reinforced ion beam-deposited hydroxyl apatite coating for medical implant |
| CN102181840A (en) * | 2011-06-22 | 2011-09-14 | 苏州晶纯新材料有限公司 | Lithium cobalt oxide target material and preparation method thereof |
| CN102206802A (en) * | 2010-03-29 | 2011-10-05 | 北京品一材料科技有限责任公司 | All-solid-state film lithium ion battery related target material and manufacturing method thereof |
| CN102249661A (en) * | 2011-06-22 | 2011-11-23 | 苏州晶纯新材料有限公司 | Lithium phosphate target and preparation method thereof |
| CN102285790A (en) * | 2011-06-22 | 2011-12-21 | 苏州晶纯新材料有限公司 | Lithium iron phosphate target materials and preparation method thereof |
| GB2452823B (en) * | 2007-08-30 | 2012-08-22 | Hoya Corp | Method of producing fluoroapatite |
| CN114956790A (en) * | 2022-07-28 | 2022-08-30 | 广州市尤特新材料有限公司 | Near-infrared high-transmittance TCO (transparent conductive oxide) target material and preparation method thereof |
-
1981
- 1981-12-23 JP JP56208639A patent/JPS58110465A/en active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0339468A (en) * | 1989-07-06 | 1991-02-20 | Mitsui Eng & Shipbuild Co Ltd | Hydroxyapatite target |
| CN1048291C (en) * | 1997-12-12 | 2000-01-12 | 清华大学 | Preparation of reinforced ion beam-deposited hydroxyl apatite coating for medical implant |
| GB2452823B (en) * | 2007-08-30 | 2012-08-22 | Hoya Corp | Method of producing fluoroapatite |
| US8609055B2 (en) | 2007-08-30 | 2013-12-17 | Hoya Corporation | Method of producing fluoroapatite, fluoroapatite, and adsorption apparatus |
| CN102206802A (en) * | 2010-03-29 | 2011-10-05 | 北京品一材料科技有限责任公司 | All-solid-state film lithium ion battery related target material and manufacturing method thereof |
| CN102181840A (en) * | 2011-06-22 | 2011-09-14 | 苏州晶纯新材料有限公司 | Lithium cobalt oxide target material and preparation method thereof |
| CN102249661A (en) * | 2011-06-22 | 2011-11-23 | 苏州晶纯新材料有限公司 | Lithium phosphate target and preparation method thereof |
| CN102285790A (en) * | 2011-06-22 | 2011-12-21 | 苏州晶纯新材料有限公司 | Lithium iron phosphate target materials and preparation method thereof |
| CN114956790A (en) * | 2022-07-28 | 2022-08-30 | 广州市尤特新材料有限公司 | Near-infrared high-transmittance TCO (transparent conductive oxide) target material and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6127348B2 (en) | 1986-06-25 |
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