JPS58108628A - Cathode structure and manufacture thereof - Google Patents

Cathode structure and manufacture thereof

Info

Publication number
JPS58108628A
JPS58108628A JP56205239A JP20523981A JPS58108628A JP S58108628 A JPS58108628 A JP S58108628A JP 56205239 A JP56205239 A JP 56205239A JP 20523981 A JP20523981 A JP 20523981A JP S58108628 A JPS58108628 A JP S58108628A
Authority
JP
Japan
Prior art keywords
cathode
base metal
support tube
substrate metal
sleeve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56205239A
Other languages
Japanese (ja)
Inventor
Shigemasa Hamanishi
浜西 繁正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56205239A priority Critical patent/JPS58108628A/en
Publication of JPS58108628A publication Critical patent/JPS58108628A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/04Manufacture of electrodes or electrode systems of thermionic cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid Thermionic Cathode (AREA)

Abstract

PURPOSE:To obtain a cathode structure requiring small personal expenditure due to an yield and the selection and having a good characteristic while preventing damage of a punch and an ejector pin by allowing the outward expansion at the time of compressing a substrate metal layer to be released in a microrecess provided on a die through a cathode supporting tube. CONSTITUTION:A basic metal 33 of a cathode supporting tube 32 is made so that a part thereof for pressing in and fixing may form a microprojection part 36 together with a substrate metal 33 and a cathode sleeve 31 and in said micro- projection part 36 the cathode sleeve 31, the cathode supporting tube 32 and the substrate metal 33 are welded and fixed at a welding point 34 by resistance welding and laser welding and further an electron discharge substance layer 35 is formed by covering the top surface of the substrate metal 33. As to manufacture thereof, microrecesses (6 in the figure) (411) are axially provided on the part prepared facing to the substrate metal 33 of a die 41 so that a part of the substrate metal 33 expanding out at the time of compression of the substrate metal 33 may be released in the microrecesses (411) together with the cathode supporting tube 32 and the cathode sleeve 31.

Description

【発明の詳細な説明】 発明の技術分野 本発明は陰極構体の製造方法に係り、特に陰極支持筒の
頂部近傍の内壁に基体金属を嵌着L 、両者を溶接によ
シ固定12てなる陰極構体及びその製造方法に関するも
のである。
TECHNICAL FIELD OF THE INVENTION The present invention relates to a method for manufacturing a cathode assembly, and more particularly to a cathode comprising a base metal L fitted on the inner wall near the top of a cathode support tube and both fixed by welding. This invention relates to a structure and its manufacturing method.

発明の技術的背景 従来の陰極構体(10)は例えば、第1図に示すように
陰極スリーブ(1)の内部に陰極支持筒(2)を挿入し
、この陰極支持筒(2)の頂部近傍の内壁に基体金属(
3)を圧入し、この基体金属(3)の側壁部に対応する
陰極支持筒(2)を膨出したのち、この陰極支持筒(2
)と陰極スリーブ(1)を密接させ、円周を等間隔で分
割した溶接点(4)で抵抗溶接やレーザ溶接などで、陰
極スリーブ(1)、陰極支持筒(2)及び基体金属(3
)を固定し、更に基体金属(3)の頂面に電子放射物質
層(5)を被着形成することにより完成される。
TECHNICAL BACKGROUND OF THE INVENTION A conventional cathode assembly (10), for example, as shown in FIG. The base metal (
3) and expand the cathode support tube (2) corresponding to the side wall of this base metal (3).
) and cathode sleeve (1) are brought into close contact, and the cathode sleeve (1), cathode support tube (2), and base metal (3
) is fixed, and then an electron emitting material layer (5) is formed on the top surface of the base metal (3).

このような陰極構体は、第2図及び第3図に示すような
製造方法によって作られる。
Such a cathode structure is manufactured by a manufacturing method as shown in FIGS. 2 and 3.

即ち、ダイ(11)内部に摺動するエジェクタービン(
[り上に陰極スリーブ(1)及び陰極支持筒(2) f
c頂部を下にして挿入し、更にこの陰極支持筒(2)内
に基体金属(3)を挿入する。次に第1のストッパ03
による陰極スリーブ(1)の位置ぎめと、第2のストッ
パIによる陰極支持筒(2)の位置ぎめを行なう7、次
にエジェクタービンa鴎と同軸におかれたポンチ(I!
19で基体金属(3)を軸方向に圧縮し、この基体金属
(3)を径方向に膨出させ、この基体金属(3)の側壁
部と陰極支持筒(2)及び陰極スリーブ(1)を密接さ
せたのち製造装置よりとり出し溶接固定するようにガっ
ている。この場合エジェクタービン(1つとダイ(11
)との関係は第3図に示すように円形断面を持つように
なっており、更にエジェクタービンa鴎の直径はほぼ陰
極スリーブ(1)の外径に等しくされているため、陰極
スリーブ(1)の外径はダイIにより拘束されることに
なる。
That is, the eject turbine (
[Only the cathode sleeve (1) and cathode support tube (2) f
c Insert with the top facing down, and further insert the base metal (3) into this cathode support cylinder (2). Next, the first stopper 03
The cathode sleeve (1) is positioned by the second stopper I, and the cathode support tube (2) is positioned by the second stopper I7.Next, a punch (I!
At 19, the base metal (3) is compressed in the axial direction, and the base metal (3) is expanded in the radial direction, and the side wall of the base metal (3), the cathode support tube (2), and the cathode sleeve (1) are compressed. After the parts are brought into close contact with each other, they are removed from the manufacturing equipment and fixed by welding. In this case, one ejector turbine and one die (11
) has a circular cross section as shown in Figure 3, and the diameter of the ejector turbine a is approximately equal to the outer diameter of the cathode sleeve (1). ) will be constrained by die I.

背景技術の問題点 このような製造方法においては、陰極スリーブ(1)の
外周が全面にわたり、ダイ(11)により拘束されてい
るため、基体金属(3)を圧縮する時に、ポンチCIツ
とエジェクタービン(1り間には大きな圧力、実験によ
れば基体金属(3)の径が1.34w1φのものに対し
て約250Kfもの圧力を要し、この圧力のためポンチ
任→やエジェクタービンQりなどの工具の主として先端
が破損する場合が多くなる。その結果エジェクタービン
(1つの先端が破損すると第4図のように基体金属(3
)の外方に突起部(31)ができるし、またポンチ+1
51の先端が破損すると第5図のように基体金属(3)
の内方に突起部(32)ができる。この突起部(31)
は電子放射物質層の厚さを均一に形成することができず
、また突起部(32)は陰極加熱用ヒータとの組合せ時
挿入寸法のばらつきが発生し、基体金属(3)の加熱特
性を不安定とする欠点がある。
Problems with the Background Art In this manufacturing method, the entire outer periphery of the cathode sleeve (1) is restrained by the die (11), so when compressing the base metal (3), the punch CI and the ejector According to experiments, a pressure of about 250 Kf is required for the base metal (3) with a diameter of 1.34w1φ, and due to this pressure, the pressure of the punch and ejector turbine Q is large. In many cases, the tip of a tool such as the
) is formed on the outside of the protrusion (31), and the punch +1
If the tip of 51 is damaged, the base metal (3) will break as shown in Figure 5.
A protrusion (32) is formed inwardly. This protrusion (31)
It is not possible to form the electron emitting material layer with a uniform thickness, and when the protrusion (32) is combined with the cathode heater, the insertion dimension varies, which affects the heating characteristics of the base metal (3). It has the disadvantage of being unstable.

またダイ(11)により陰極スリーブ(1)の外周部を
全周にわたり拘束して陰極支持筒(2)に基体金属(3
)を圧入膨出させると、陰極スリーブ(1)と陰極支持
筒(2)間及び陰極支持筒(2)と基体金属(3)間の
嵌着力が弱く、位置ぎめが不安定なため、これら陰極ス
リーブ(1)、陰極支持筒(2)及び基体金属(3)を
溶接する場合、基体金属(3)が傾くとか、外れるなど
の現象が起り、安定した溶接ができず溶接後、不良の選
別をするという工程があり、人件費の上昇、歩留の低下
にもつながる欠点がある。
In addition, the outer circumference of the cathode sleeve (1) is restrained all around by the die (11), and the base metal (3
) is press-fitted and expanded, the fitting force between the cathode sleeve (1) and the cathode support tube (2) and between the cathode support tube (2) and the base metal (3) is weak, making the positioning unstable. When welding the cathode sleeve (1), cathode support tube (2), and base metal (3), phenomena such as the base metal (3) tilting or coming off may occur, making stable welding impossible and causing defects after welding. There is a process of sorting, which has the disadvantage of increasing labor costs and decreasing yield.

また嵌着力が不足するため、第6図に示すように溶接点
(4)で溶接するとき基体金属(3)の面と、陰極スリ
ーブ(1)、陰極支持筒(2)の端面がそろわず、ずれ
部(6)が発生し陰極の加熱特性を不安定にする欠点が
ある。
Also, due to insufficient fitting force, when welding at the welding point (4), the surface of the base metal (3) and the end surfaces of the cathode sleeve (1) and cathode support tube (2) are not aligned. , there is a drawback that a misaligned portion (6) occurs and the heating characteristics of the cathode become unstable.

また嵌着力の不足のため第7図及び第8図のように溶接
部(4)をレーザ溶接する場合、基体金属(3)と陰極
支持筒(2)の間には微小隙間(力、陰極支持筒(2)
と陰極スリーブ(1)間には微小隙間(8)ができたま
まl/−ザを照射することになり、第7図に示すような
部分的に溶接されたものや、第8図に示すよう々溶接さ
れず穴あき不良となる欠点がある。
In addition, due to insufficient fitting force, when laser welding the welded part (4) as shown in Figures 7 and 8, there is a small gap (force, Support tube (2)
The l/- laser is irradiated with a small gap (8) formed between the sleeve and the cathode sleeve (1), and the partially welded one shown in Figure 7 or the one shown in Figure 8 It has the disadvantage of not being properly welded and resulting in poor perforation.

更にまた、電子放射物質層を形成する場合、第9図に示
すように、上下にテーパ部(211) (212)を設
けた通孔部(221を有する゛スプレーチャックa4)
のテーパ部(212)に陰極スリーブ(1)を当接して
破線矢印(2■の方向からスプレー法により形成するが
、この場合第10図に示すように、スプレー範囲の直径
(φ1)は陰極スリーブ(1)の外径(φ2)に比例す
るため外径(φ2)を1.39mmφとすれば直径(φ
l)は1.20覇φ程度とカリ、有効電子放射物質層の
直径が小さくなシ、電子管に組み込み後の寿命特性がわ
るくなる欠点がある。
Furthermore, when forming an electron emitting material layer, as shown in FIG.
The cathode sleeve (1) is brought into contact with the tapered part (212) of the cathode and formed by spraying from the direction of the broken line arrow (2). In this case, as shown in Fig. 10, the diameter (φ1) of the spray area is Since it is proportional to the outer diameter (φ2) of the sleeve (1), if the outer diameter (φ2) is 1.39 mmφ, the diameter (φ2) is
l) has the disadvantage that the diameter of the effective electron emitting material layer is small, and the life characteristics after being incorporated into an electron tube are poor, with a diameter of about 1.20 mm.

発明の目的 本発明は前述した従来の陰極構体及びその製造方法の諸
欠点に鑑みなされたものであり、基体金属の圧縮時にお
ける膨出を陰極支持筒を介して、ダイに設けられた微小
凹部に逃がすことにより、第1に、基体金属の圧縮圧力
の減少と、ポンチ、エジェクタービンの破損防止、第2
に基体金属と少なくとも陰極支持筒の密接を局部的に大
にし、両者の位置ずれ々どの不良防止と溶接の不良防止
、及び位置ぎめ不良防止、第3に電子放射物質層の直径
を大に17寿命特性を良好とすることが可能な陰極構体
及びその製造方法を提供することを目的としている。
Purpose of the Invention The present invention has been made in view of the various drawbacks of the conventional cathode structure and its manufacturing method described above. Firstly, it reduces the compression pressure of the base metal and prevents damage to the punch and ejector turbine.
To locally increase the close contact between the base metal and at least the cathode support tube, to prevent misalignment of both, to prevent defects in welding, and to prevent defects in positioning, and thirdly, to increase the diameter of the electron emitting material layer. It is an object of the present invention to provide a cathode structure that can have good life characteristics and a method for manufacturing the same.

発明の概要 即ち、本発明の構成は陰極支持筒の基体金属を嵌入固定
部位が基体金属と共に陰極支持筒の外方に複数個の微小
突出部を形成するように膨出されてなる陰極構体とこの
陰極構体の製造方法である。
Summary of the Invention In other words, the present invention has a cathode structure in which the base metal of the cathode support tube is inserted and the fixed portion is bulged together with the base metal to form a plurality of minute protrusions on the outside of the cathode support tube. This is a method for manufacturing this cathode structure.

発明の実施例 次に本発明の陰極構体の一実施例を第11図及び第12
図により説明する。
Embodiment of the Invention Next, an embodiment of the cathode assembly of the present invention is shown in FIGS. 11 and 12.
This will be explained using figures.

即ち、陰極構体(41は陰極スリーブC11の内部に陰
極支持筒(132を挿入し、この陰極支持筒021の頂
部近傍の内壁に基体金属03を圧入固定する場合、陰極
支持筒03の基体金属(至)を圧入固定部位が基体金属
0濠、陰極スリーブG1)と共に微小突出部@(図では
6個)を形成するようにし、この微小突出部(ト)にお
いて溶接点04)で抵抗溶接やレーザ溶接などで陰極ス
リーブ01)、陰極古詩筒0擾及び基体金属(至)を溶
接固定し7、更に基体金属(ハ)の頂面に電子放射物質
層Gつを被着形成[7であることを特徴としている。
That is, when inserting the cathode support tube (132 into the cathode sleeve C11) and press-fitting and fixing the base metal 03 to the inner wall near the top of the cathode support tube 021, the base metal (41) of the cathode support tube 03 is fixed. (to) is press-fitted so that the fixation part forms a minute protrusion (6 in the figure) with the base metal 0 moat and cathode sleeve G1), and resistance welding or laser welding is performed at the welding point 04) at this minute protrusion Weld and fix the cathode sleeve 01), the cathode old cylinder 0, and the base metal (C) by welding or the like 7, and then deposit G layers of electron emitting material on the top surface of the base metal (C) [7] It is characterized by

このような構造の陰極構体は第13図及び第14図に示
すような製造方法によって作られる。
A cathode structure having such a structure is manufactured by a manufacturing method as shown in FIGS. 13 and 14.

即ち、ダイ(41)内部に摺動するエジェクタービン(
43上に陰極スリーブclD及び陰極支持筒(33を頂
部を下に1−て挿入、更にこの陰極支持筒02内に基体
金属0■を挿入し、第1のストッパ(4国で陰極スリー
ブ01)、第2のストッパ(44)で陰極支持筒03の
位置ぎめを行ガう。次にエジェクタービン(43及び陰
極支持筒0渇と同軸におかれたポンチ(4って基体金属
(3階を軸方向に圧縮するのは従来の場合とほぼ同様で
あるが、本実施例においてはダイ(41)の基体金属(
ハ)に対設する部位に微小凹溝(図では6ケ所) (4
1t)が軸方向に沿って設けられており基体金属(至)
の圧縮時に膨出する基体金属(ハ)の一部を陰極支持筒
鏝、陰極スリーブG1)と共に微小凹部(4b)に逃が
すようになされている。この微小凹部(411)は陰極
支持筒0湯の外径が1.39aφの場合幅(W)を0.
2〜03叫奥行き(T)を0.1〜0.2閣とし、数は
陰極支持筒国の外径から決定されるが、前述の1.39
+mφの場合、6〜8ケ所設けることが望ましい。
That is, the eject turbine (
Insert the cathode sleeve cD and the cathode support tube (33 with the top downwards) onto the cathode support tube 43, and then insert the base metal 0 into this cathode support tube 02, and insert the first stopper (cathode sleeve 01 in 4 countries). , position the cathode support cylinder 03 with the second stopper (44).Next, the punch (4) placed coaxially with the ejector turbine (43) and the cathode support cylinder 03 Compressing in the axial direction is almost the same as in the conventional case, but in this example, the base metal (
Micro-grooves (6 locations in the figure) located opposite to (4)
1t) is provided along the axial direction, and the base metal (to)
A part of the base metal (c) that bulges out when compressed is allowed to escape into the minute recess (4b) together with the cathode support tube trowel and the cathode sleeve G1). This minute recess (411) has a width (W) of 0.00 mm when the outer diameter of the cathode support tube is 1.39 aφ.
2~03 The depth (T) is set to 0.1~0.2 mm, and the number is determined from the outer diameter of the cathode support tube, but the above-mentioned 1.39
In the case of +mφ, it is desirable to provide 6 to 8 locations.

前述の製造方法によれば、ポンチ(4つとエジェクター
ビン(43間には陰極スリーブ(4υの外周が全面にわ
たりダイ(40により拘束されていないため、約200
に9程度の圧力で陰極スリーブC11)の突出部の高さ
0.03〜0.04aφ程度になるし、この突出部(至
)においては基体金属(ハ)、陰極支持筒cl邊、陰極
スリーブC31)が密接しているため、第15図に示す
ように、レーザ光(41を使用して溶接しても第16図
に示すように溶接点(34)においては基体金属(ハ)
、陰極支持筒C3邊、陰極スリーブ0υは極めて良好に
なる。また、突出部(至)が溶接点04)の位置ぎめと
なるので、レーザ溶接ばかりでなく、第17図に示すよ
うに2個の溶接電極(471) (472)のうち一方
の溶接電極(472)を矢印方向に移動することにより
陰極構体(41を矢印方向に回転し、突出部(2)を検
知し、図に示す位置において溶接電流を流し、固定する
ことも可能である。
According to the above-mentioned manufacturing method, between the four punches and the ejector turbine (43), there is a cathode sleeve (4υ) whose outer periphery covers the entire surface and is not constrained by the die (40, so about 20
The height of the protruding part of the cathode sleeve C11) becomes about 0.03 to 0.04 aφ with a pressure of about 9, and at this protruding part, the base metal (c), the area around the cathode support cylinder, and the cathode sleeve C31) are in close contact with each other, as shown in FIG. 15, even if welding is performed using a laser beam (41), as shown in FIG.
, the cathode support cylinder C3 side, and the cathode sleeve 0υ are extremely good. In addition, since the protrusion (to) serves as the position of the welding point 04), not only laser welding but also one of the two welding electrodes (471) (472) as shown in FIG. 472) in the direction of the arrow, it is also possible to rotate the cathode assembly (41) in the direction of the arrow, detect the protrusion (2), apply welding current at the position shown in the figure, and fix it.

また本実施例の陰極構体(41に電子放射物質層を第9
図と同様なスプレーチャック(財)のテーパ部(21ρ
に陰極スリーブ0υの突出部(至)を当接1−て破線矢
印(2濠の方向からスプレー法により形成する時、突出
部(至)があるため実質的に径が大となるため、従来と
同様に、カッドスリーブ外径(φ2) ”;e 1.3
9mとした場合、電子放射物質層の直径(φ3)を1.
26〜1.28mと増加することが可能であり、電子管
に組み込み後の寿命特性が良好と々る。
In addition, the cathode structure of this example (41 has an electron emitting material layer in the 9th layer)
The tapered part of the spray chuck (21ρ
When forming by spraying from the direction of the dotted line arrow (2) by contacting the protrusion (to) of the cathode sleeve 0υ, the diameter becomes substantially larger due to the protrusion (to), so conventional Similarly, quad sleeve outer diameter (φ2) ”; e 1.3
When it is 9 m, the diameter (φ3) of the electron emitting material layer is 1.
It is possible to increase the length to 26 to 1.28 m, and the life characteristics after being incorporated into an electron tube are excellent.

前記実施例は陰極スリーブを有する陰極構体について述
べたが、これに限定するものでは々く、例えば、第20
図に示す陰極構体SOtのように、陰極支持筒(52)
と基体金属(53)のみにて形成し突出部(56)に溶
接点(54)を設け、電子放射物質層(55)を被着し
たものや第21図に示す陰極構体(60)のように径小
部(62+)径大部(622)からなる陰極支持筒(6
2)と基体金属(63)で形成1−1突出部(66)に
溶接点(64)を設け、電子放射物質層(65)を被着
したものも同様であるし、更にまた陰極支持筒の少なく
とも内面を黒化した黒化陰極支持筒を使用した陰極構体
にも同様に適用されることは勿論である 発明の効果 上述のように本発明の陰極構体及びその製造方法によれ
ば、ポンチにより基体金属を圧縮する時にポンチやエジ
ェクタービンを破損させること々く、歩留、選別による
人件費を小さく特性の良好々陰極構体を得ることが可能
であり、その工業的価値は極めて犬である。
Although the above embodiment describes a cathode assembly having a cathode sleeve, it is not limited to this, and for example, the 20th embodiment
Like the cathode assembly SOt shown in the figure, the cathode support cylinder (52)
and a cathode structure (60) shown in FIG. The cathode support tube (6) consists of a small diameter part (62+) and a large diameter part (622).
2) and a base metal (63), a welding point (64) is provided on the protrusion (66) of 1-1, and an electron emitting material layer (65) is coated. Effects of the Invention As described above, according to the cathode structure and the manufacturing method thereof of the present invention, the punch Although the punch and ejector turbine are often damaged when compressing the base metal, it is possible to obtain a cathode structure with good characteristics by reducing yield and labor costs due to sorting, and its industrial value is extremely high. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の陰極構体の一例を示す一部切欠立面図、
第2図は第1図の陰極構体の製造方法を示す説明図、第
3図は第2図をA−A線に沿って切断して見た断面図、
第4図乃至第8図は従来の製造方法によって作られた陰
極構体のそれぞれ異なる不良状態を示す図であり、第4
図は基体金属にできた外部突出部を示す断面図、第5図
は基体金属の内部突出部を示す断面図、第6図は陰極ス
リーブと陰極支持筒の位置合せ不良を示す一部切欠立面
図、第7図は溶接点の不良溶接状態を示す要部断面図、
第8図は溶接点の溶接されない状態を示す要部断面図、
第9図は電子放射物質のスプレ一工程を示す断面図、第
10図は陰極スリーブ外径と電子放射物質の塗布部径と
の関係を示す立面図、第11図乃至第19図は本発明の
陰極構体及びその製造方法の一実施例を示す図であり、
第11図は本発明の陰極構体の一実施例介示す一部切欠
立面図、第12図は第11図をB−B線に沿って切断1
,7て見た断面図、第13図は第11図の陰極構体の製
造方法を示す説明図、第14図は第13図をC−C線に
沿って切断1.て見た断面図、第15図は微小突出部を
レーザ溶接している状態を示す説明図、第16図は溶接
点を示す要部拡大断面図、第17図は微小突出部の抵抗
溶接状態を示す説明図、第18図は電子放射物質のスプ
レ一工程を示す断面図、第19図は陰極スリーブ外径と
電子放射物質の塗布部径との関係を示す立面図、第20
図及び第21図は本発明の陰極構体のそれぞれ異なる変
形例を示す一部切欠立面図である。 1.31・・・陰極スリーブ 2,32,52.62・
・・陰極支持筒3.33,53.63・・・基体金属 
 4.34,54.64・・・溶接点5.35,55.
65・・・電子放射物質層11.41・・・ダイ   
    12,42・・・エジェクタービン15.45
・・・ポンチ     24・・・スプレーチャック3
6.56.66・・・微小突出部 411・・・微小凹
溝46・・・レーザ     47 b47z・・・溶
接電極代理人 弁理士  井 上 −男 第2図 第  I 図 第  3  図          第  4 図第2
0図 第21図
FIG. 1 is a partially cutaway elevational view showing an example of a conventional cathode structure;
FIG. 2 is an explanatory diagram showing a method for manufacturing the cathode structure shown in FIG. 1, and FIG. 3 is a cross-sectional view of FIG. 2 taken along line A-A.
4 to 8 are diagrams showing different failure states of cathode assemblies manufactured by conventional manufacturing methods, and FIG.
The figure is a cross-sectional view showing an external protrusion formed on the base metal, Figure 5 is a cross-sectional view showing an internal protrusion on the base metal, and Figure 6 is a partially cut-out ridge showing misalignment between the cathode sleeve and cathode support tube. 7 is a cross-sectional view of the main part showing the defective welding condition of the welding point,
Figure 8 is a cross-sectional view of the main part showing the state where the welding point is not welded,
Fig. 9 is a sectional view showing one step of spraying the electron emitting material, Fig. 10 is an elevational view showing the relationship between the outer diameter of the cathode sleeve and the diameter of the part coated with the electron emitting material, and Figs. FIG. 1 is a diagram showing an embodiment of a cathode structure of the invention and a method for manufacturing the same;
FIG. 11 is a partially cutaway elevational view showing one embodiment of the cathode structure of the present invention, and FIG. 12 is a cutaway view of FIG. 11 along line B-B.
, 7. FIG. 13 is an explanatory diagram showing a method of manufacturing the cathode structure of FIG. 11, and FIG. 14 is a cross-sectional view of FIG. 13 taken along line CC. 15 is an explanatory diagram showing a state in which a minute protrusion is being laser welded, FIG. 16 is an enlarged sectional view of the main part showing welding points, and FIG. 17 is a resistance welding state of a minute protrusion. FIG. 18 is a sectional view showing one step of spraying the electron emitting material, FIG. 19 is an elevational view showing the relationship between the outer diameter of the cathode sleeve and the diameter of the part coated with the electron emitting material, and FIG.
21 and 21 are partially cutaway elevational views showing different modifications of the cathode structure of the present invention. 1.31...Cathode sleeve 2,32,52.62.
・Cathode support tube 3.33, 53.63 ・Base metal
4.34, 54.64... Welding points 5.35, 55.
65...Electron emitting material layer 11.41...Die
12,42...Eject turbine 15.45
... Punch 24 ... Spray chuck 3
6.56.66...Minute protrusion 411...Minute groove 46...Laser 47 b47z...Welding electrode agent Patent attorney Inoue-Male Figure 2 Figure I Figure 3 Figure 4 Second
Figure 0Figure 21

Claims (2)

【特許請求の範囲】[Claims] (1)  陰極!支持筒と、この陰極支持筒の頂部近傍
に圧入固定された基体金属とを少なくとも具備する陰極
構体において、前記陰極支持筒の前記基体金属を圧入固
定部位に前記基体金属と共に前記陰極支持筒を膨出させ
た複数個の微小突出部を有することを特徴とする陰極構
体。
(1) Cathode! In a cathode assembly comprising at least a support tube and a base metal press-fitted near the top of the cathode support tube, the base metal of the cathode support tube is press-fitted into a fixed portion, and the cathode support tube is expanded together with the base metal. A cathode assembly characterized by having a plurality of protruding minute protrusions.
(2)陰極支持筒と、この陰極支持筒が頂部近傍に圧入
固定された基体金属とを少なくとも具備する陰極構体の
製造方法において、前記基体金属を前記陰極支持筒の頂
部近傍に挿入する工程と、前記頂部近傍に対設する内面
に軸方向に沿って複数の微小凹溝が形成されたダイの内
部に摺動するエジェクタービン上に載置する工程と、前
記陰極支持筒の軸にそって移動するポンチと前記エジェ
クタービンとにより前記基体金属を圧縮する工程とから
なり、この圧縮する工程による前記基体金属の膨出を前
記陰極支持筒と共に前記複数の微小凹溝に逃がすように
なされたことを特徴とする陰極構体の製造方法。
(2) A method for manufacturing a cathode assembly comprising at least a cathode support tube and a base metal to which the cathode support tube is press-fitted near the top, including the step of inserting the base metal near the top of the cathode support tube. , a step of placing the die on an ejector turbine that slides inside a die having a plurality of minute grooves formed along the axial direction on the inner surface opposite to the top portion; The method comprises a step of compressing the base metal using a moving punch and the ejector turbine, and the expansion of the base metal caused by the compressing step is released into the plurality of micro grooves together with the cathode support tube. A method for manufacturing a cathode structure characterized by:
JP56205239A 1981-12-21 1981-12-21 Cathode structure and manufacture thereof Pending JPS58108628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56205239A JPS58108628A (en) 1981-12-21 1981-12-21 Cathode structure and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56205239A JPS58108628A (en) 1981-12-21 1981-12-21 Cathode structure and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS58108628A true JPS58108628A (en) 1983-06-28

Family

ID=16503700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56205239A Pending JPS58108628A (en) 1981-12-21 1981-12-21 Cathode structure and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS58108628A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0594759A (en) * 1991-10-02 1993-04-16 Tokyo Tungsten Co Ltd Indirect-heated cathode for cathode ray tube and manufacture thereof
EP1067572A2 (en) * 1999-07-05 2001-01-10 Hitachi, Ltd. Cathode ray tube with indirectly heated cathode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0594759A (en) * 1991-10-02 1993-04-16 Tokyo Tungsten Co Ltd Indirect-heated cathode for cathode ray tube and manufacture thereof
EP1067572A2 (en) * 1999-07-05 2001-01-10 Hitachi, Ltd. Cathode ray tube with indirectly heated cathode
EP1067572A3 (en) * 1999-07-05 2002-08-21 Hitachi, Ltd. Cathode ray tube with indirectly heated cathode

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