JPS58105816U - 田植機の走行装置 - Google Patents
田植機の走行装置Info
- Publication number
- JPS58105816U JPS58105816U JP366682U JP366682U JPS58105816U JP S58105816 U JPS58105816 U JP S58105816U JP 366682 U JP366682 U JP 366682U JP 366682 U JP366682 U JP 366682U JP S58105816 U JPS58105816 U JP S58105816U
- Authority
- JP
- Japan
- Prior art keywords
- rice transplanter
- running device
- transplanter running
- walking
- headland
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Transplanting Machines (AREA)
- Reciprocating Conveyors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP366682U JPS58105816U (ja) | 1982-01-14 | 1982-01-14 | 田植機の走行装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP366682U JPS58105816U (ja) | 1982-01-14 | 1982-01-14 | 田植機の走行装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58105816U true JPS58105816U (ja) | 1983-07-19 |
JPH0212814Y2 JPH0212814Y2 (en, 2012) | 1990-04-10 |
Family
ID=30016576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP366682U Granted JPS58105816U (ja) | 1982-01-14 | 1982-01-14 | 田植機の走行装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58105816U (en, 2012) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6620723B1 (en) | 2000-06-27 | 2003-09-16 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
US6551929B1 (en) | 2000-06-28 | 2003-04-22 | Applied Materials, Inc. | Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques |
US7101795B1 (en) | 2000-06-28 | 2006-09-05 | Applied Materials, Inc. | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
US6998579B2 (en) | 2000-12-29 | 2006-02-14 | Applied Materials, Inc. | Chamber for uniform substrate heating |
US7211144B2 (en) | 2001-07-13 | 2007-05-01 | Applied Materials, Inc. | Pulsed nucleation deposition of tungsten layers |
US7085616B2 (en) | 2001-07-27 | 2006-08-01 | Applied Materials, Inc. | Atomic layer deposition apparatus |
US6936906B2 (en) | 2001-09-26 | 2005-08-30 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
US7049226B2 (en) | 2001-09-26 | 2006-05-23 | Applied Materials, Inc. | Integration of ALD tantalum nitride for copper metallization |
US6911391B2 (en) | 2002-01-26 | 2005-06-28 | Applied Materials, Inc. | Integration of titanium and titanium nitride layers |
US6833161B2 (en) | 2002-02-26 | 2004-12-21 | Applied Materials, Inc. | Cyclical deposition of tungsten nitride for metal oxide gate electrode |
WO2004113585A2 (en) | 2003-06-18 | 2004-12-29 | Applied Materials, Inc. | Atomic layer deposition of barrier materials |
-
1982
- 1982-01-14 JP JP366682U patent/JPS58105816U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0212814Y2 (en, 2012) | 1990-04-10 |
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