JPS58101882U - Uniform electrodeposition plating installed - Google Patents
Uniform electrodeposition plating installedInfo
- Publication number
- JPS58101882U JPS58101882U JP19631981U JP19631981U JPS58101882U JP S58101882 U JPS58101882 U JP S58101882U JP 19631981 U JP19631981 U JP 19631981U JP 19631981 U JP19631981 U JP 19631981U JP S58101882 U JPS58101882 U JP S58101882U
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- uniform electrodeposition
- electrodeposition plating
- auxiliary electrode
- plating installed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図と第2図は従来の均一メッキ装置を示す図、第3
図は本考案による均一メッキ装置の実施例を示す図であ
る。 −
図面において、1は加工物、5は補助極(捨て板)−6
はメッキ浴、R1,82は可変抵抗器を夫々示す。゛Figures 1 and 2 show conventional uniform plating equipment, and Figure 3 shows a conventional uniform plating device.
The figure shows an embodiment of a uniform plating apparatus according to the present invention. - In the drawing, 1 is the workpiece, 5 is the auxiliary electrode (saved plate) - 6
indicates a plating bath, and R1 and 82 indicate variable resistors, respectively.゛
Claims (1)
置において、該加工物および補助極大々とメッキ回路の
電源との間に可変抵抗器を挿入後。 続して、陽極と加工物および補助極の間に流れる電流の
値を互いに独立して調節できるように構成した均一電着
メッキ装置。[Scope of Claim for Utility Model Registration] In an electroplating device that connects an auxiliary electrode to the cathode side in addition to the workpiece, after inserting a variable resistor between the workpiece and the auxiliary pole and the power source of the plating circuit. Next, a uniform electrodeposition plating apparatus is constructed so that the values of the currents flowing between the anode, the workpiece, and the auxiliary electrode can be adjusted independently of each other.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19631981U JPS58101882U (en) | 1981-12-28 | 1981-12-28 | Uniform electrodeposition plating installed |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19631981U JPS58101882U (en) | 1981-12-28 | 1981-12-28 | Uniform electrodeposition plating installed |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58101882U true JPS58101882U (en) | 1983-07-11 |
Family
ID=30109564
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19631981U Pending JPS58101882U (en) | 1981-12-28 | 1981-12-28 | Uniform electrodeposition plating installed |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58101882U (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5543174A (en) * | 1978-09-25 | 1980-03-26 | Otsuka Chem Co Ltd | Preparation of phosphazene polymer |
-
1981
- 1981-12-28 JP JP19631981U patent/JPS58101882U/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5543174A (en) * | 1978-09-25 | 1980-03-26 | Otsuka Chem Co Ltd | Preparation of phosphazene polymer |
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