JPS5792332A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS5792332A
JPS5792332A JP16899980A JP16899980A JPS5792332A JP S5792332 A JPS5792332 A JP S5792332A JP 16899980 A JP16899980 A JP 16899980A JP 16899980 A JP16899980 A JP 16899980A JP S5792332 A JPS5792332 A JP S5792332A
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin composition
composition
photopolymn
initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16899980A
Other languages
Japanese (ja)
Other versions
JPS6365932B2 (en
Inventor
Kohei Umetani
Toshiaki Fujimura
Akira Tomita
Shinichi Tanaka
Hisashi Uhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP16899980A priority Critical patent/JPS5792332A/en
Publication of JPS5792332A publication Critical patent/JPS5792332A/en
Publication of JPS6365932B2 publication Critical patent/JPS6365932B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Abstract

PURPOSE:To enhance the moisture resistance, solvent resistance, wear resistance, etc. of a photosensitive resin composition by preparing the composition from polyamide contg. basic nitrogen, a specified monomer having a photopolymerizable unsatd. bond and a photopolymn. initiator. CONSTITUTION:A photosensitive resin composition is prepared from polyamide contg. basic nitrogen, all or part of a monomer having a photopolymerizable unsatd. bond and represented by formulaIand a photopolymn. initiator. The composition is formed into a sheetlike body having a desired thickness such as a sheet, a film or foil by hot pressing, casting, melt extrusion or other method.
JP16899980A 1980-11-28 1980-11-28 Photosensitive resin composition Granted JPS5792332A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16899980A JPS5792332A (en) 1980-11-28 1980-11-28 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16899980A JPS5792332A (en) 1980-11-28 1980-11-28 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5792332A true JPS5792332A (en) 1982-06-08
JPS6365932B2 JPS6365932B2 (en) 1988-12-19

Family

ID=15878468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16899980A Granted JPS5792332A (en) 1980-11-28 1980-11-28 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5792332A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0107621A2 (en) * 1982-10-22 1984-05-02 Ciba-Geigy Ag Composition suitable for obtaining positive images, process for obtaining positive images and images obtained using the same
JPS5994755A (en) * 1982-10-22 1984-05-31 チバ−ガイギ−・アクチエンゲゼルシヤフト Positive image formation composition
JP2000327914A (en) * 1999-05-24 2000-11-28 Tomoegawa Paper Co Ltd Aromatic polyamide resin composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0107621A2 (en) * 1982-10-22 1984-05-02 Ciba-Geigy Ag Composition suitable for obtaining positive images, process for obtaining positive images and images obtained using the same
JPS5994755A (en) * 1982-10-22 1984-05-31 チバ−ガイギ−・アクチエンゲゼルシヤフト Positive image formation composition
JPH0430577B2 (en) * 1982-10-22 1992-05-22
JP2000327914A (en) * 1999-05-24 2000-11-28 Tomoegawa Paper Co Ltd Aromatic polyamide resin composition

Also Published As

Publication number Publication date
JPS6365932B2 (en) 1988-12-19

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