JPS5789256U - - Google Patents
Info
- Publication number
- JPS5789256U JPS5789256U JP16671680U JP16671680U JPS5789256U JP S5789256 U JPS5789256 U JP S5789256U JP 16671680 U JP16671680 U JP 16671680U JP 16671680 U JP16671680 U JP 16671680U JP S5789256 U JPS5789256 U JP S5789256U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1980166716U JPS6223014Y2 (cg-RX-API-DMAC7.html) | 1980-11-20 | 1980-11-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1980166716U JPS6223014Y2 (cg-RX-API-DMAC7.html) | 1980-11-20 | 1980-11-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5789256U true JPS5789256U (cg-RX-API-DMAC7.html) | 1982-06-02 |
| JPS6223014Y2 JPS6223014Y2 (cg-RX-API-DMAC7.html) | 1987-06-11 |
Family
ID=29525358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1980166716U Expired JPS6223014Y2 (cg-RX-API-DMAC7.html) | 1980-11-20 | 1980-11-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6223014Y2 (cg-RX-API-DMAC7.html) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004228077A (ja) * | 2003-01-24 | 2004-08-12 | Leica Microsystems Lithography Ltd | 電子ビームを誘導するための装置の冷却 |
| JP2009123542A (ja) * | 2007-11-15 | 2009-06-04 | Institute Of Physical & Chemical Research | 電磁コイル |
| JP2014011313A (ja) * | 2012-06-29 | 2014-01-20 | Kyocera Corp | 流路部材およびこれを用いた熱交換器ならびに半導体製造装置 |
| JP2018518013A (ja) * | 2015-04-21 | 2018-07-05 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 流体導管が埋め込まれた半導体製造装置 |
| JP2024100229A (ja) * | 2023-01-13 | 2024-07-26 | 株式会社日立パワーソリューションズ | 工業用マグネトロン |
| JP2024100228A (ja) * | 2023-01-13 | 2024-07-26 | 株式会社日立パワーソリューションズ | 工業用マグネトロンの製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5235975A (en) * | 1975-09-16 | 1977-03-18 | Hitachi Ltd | Exciting coil for electron microscope and others |
| JPS52104370U (cg-RX-API-DMAC7.html) * | 1976-02-04 | 1977-08-08 | ||
| JPS5397137U (cg-RX-API-DMAC7.html) * | 1977-01-10 | 1978-08-07 |
-
1980
- 1980-11-20 JP JP1980166716U patent/JPS6223014Y2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5235975A (en) * | 1975-09-16 | 1977-03-18 | Hitachi Ltd | Exciting coil for electron microscope and others |
| JPS52104370U (cg-RX-API-DMAC7.html) * | 1976-02-04 | 1977-08-08 | ||
| JPS5397137U (cg-RX-API-DMAC7.html) * | 1977-01-10 | 1978-08-07 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004228077A (ja) * | 2003-01-24 | 2004-08-12 | Leica Microsystems Lithography Ltd | 電子ビームを誘導するための装置の冷却 |
| JP2009123542A (ja) * | 2007-11-15 | 2009-06-04 | Institute Of Physical & Chemical Research | 電磁コイル |
| JP2014011313A (ja) * | 2012-06-29 | 2014-01-20 | Kyocera Corp | 流路部材およびこれを用いた熱交換器ならびに半導体製造装置 |
| JP2018518013A (ja) * | 2015-04-21 | 2018-07-05 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 流体導管が埋め込まれた半導体製造装置 |
| US11213891B2 (en) | 2015-04-21 | 2022-01-04 | Varian Semiconductor Equipment Associates, Inc. | Semiconductor manufacturing device with embedded fluid conduits |
| JP2024100229A (ja) * | 2023-01-13 | 2024-07-26 | 株式会社日立パワーソリューションズ | 工業用マグネトロン |
| JP2024100228A (ja) * | 2023-01-13 | 2024-07-26 | 株式会社日立パワーソリューションズ | 工業用マグネトロンの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6223014Y2 (cg-RX-API-DMAC7.html) | 1987-06-11 |