JPS5781308U - - Google Patents
Info
- Publication number
- JPS5781308U JPS5781308U JP15819580U JP15819580U JPS5781308U JP S5781308 U JPS5781308 U JP S5781308U JP 15819580 U JP15819580 U JP 15819580U JP 15819580 U JP15819580 U JP 15819580U JP S5781308 U JPS5781308 U JP S5781308U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electric Ovens (AREA)
- Electric Stoves And Ranges (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15819580U JPS6135847Y2 (enrdf_load_stackoverflow) | 1980-11-05 | 1980-11-05 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15819580U JPS6135847Y2 (enrdf_load_stackoverflow) | 1980-11-05 | 1980-11-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5781308U true JPS5781308U (enrdf_load_stackoverflow) | 1982-05-19 |
JPS6135847Y2 JPS6135847Y2 (enrdf_load_stackoverflow) | 1986-10-18 |
Family
ID=29517273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15819580U Expired JPS6135847Y2 (enrdf_load_stackoverflow) | 1980-11-05 | 1980-11-05 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6135847Y2 (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016209633A (ja) * | 2010-06-11 | 2016-12-15 | プレスコ アイピー エルエルシー | 狭帯域照射調理用の調理容器および調理パック、ならびにシステムおよびその方法 |
US10687391B2 (en) | 2004-12-03 | 2020-06-16 | Pressco Ip Llc | Method and system for digital narrowband, wavelength specific cooking, curing, food preparation, and processing |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6620723B1 (en) | 2000-06-27 | 2003-09-16 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
US7405158B2 (en) | 2000-06-28 | 2008-07-29 | Applied Materials, Inc. | Methods for depositing tungsten layers employing atomic layer deposition techniques |
US6551929B1 (en) | 2000-06-28 | 2003-04-22 | Applied Materials, Inc. | Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques |
US7101795B1 (en) | 2000-06-28 | 2006-09-05 | Applied Materials, Inc. | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
US6765178B2 (en) | 2000-12-29 | 2004-07-20 | Applied Materials, Inc. | Chamber for uniform substrate heating |
US6998579B2 (en) | 2000-12-29 | 2006-02-14 | Applied Materials, Inc. | Chamber for uniform substrate heating |
US6951804B2 (en) | 2001-02-02 | 2005-10-04 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
US6878206B2 (en) | 2001-07-16 | 2005-04-12 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |
US6734020B2 (en) | 2001-03-07 | 2004-05-11 | Applied Materials, Inc. | Valve control system for atomic layer deposition chamber |
US7211144B2 (en) | 2001-07-13 | 2007-05-01 | Applied Materials, Inc. | Pulsed nucleation deposition of tungsten layers |
US7085616B2 (en) | 2001-07-27 | 2006-08-01 | Applied Materials, Inc. | Atomic layer deposition apparatus |
US6936906B2 (en) | 2001-09-26 | 2005-08-30 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
US7049226B2 (en) | 2001-09-26 | 2006-05-23 | Applied Materials, Inc. | Integration of ALD tantalum nitride for copper metallization |
US6916398B2 (en) | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
US6911391B2 (en) | 2002-01-26 | 2005-06-28 | Applied Materials, Inc. | Integration of titanium and titanium nitride layers |
US6998014B2 (en) | 2002-01-26 | 2006-02-14 | Applied Materials, Inc. | Apparatus and method for plasma assisted deposition |
US6833161B2 (en) | 2002-02-26 | 2004-12-21 | Applied Materials, Inc. | Cyclical deposition of tungsten nitride for metal oxide gate electrode |
US7439191B2 (en) | 2002-04-05 | 2008-10-21 | Applied Materials, Inc. | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications |
US7262133B2 (en) | 2003-01-07 | 2007-08-28 | Applied Materials, Inc. | Enhancement of copper line reliability using thin ALD tan film to cap the copper line |
WO2004113585A2 (en) | 2003-06-18 | 2004-12-29 | Applied Materials, Inc. | Atomic layer deposition of barrier materials |
-
1980
- 1980-11-05 JP JP15819580U patent/JPS6135847Y2/ja not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10687391B2 (en) | 2004-12-03 | 2020-06-16 | Pressco Ip Llc | Method and system for digital narrowband, wavelength specific cooking, curing, food preparation, and processing |
JP2016209633A (ja) * | 2010-06-11 | 2016-12-15 | プレスコ アイピー エルエルシー | 狭帯域照射調理用の調理容器および調理パック、ならびにシステムおよびその方法 |
JP2020022767A (ja) * | 2010-06-11 | 2020-02-13 | プレスコ アイピー エルエルシー | 狭帯域照射調理用の調理容器および調理パック、ならびにシステムおよびその方法 |
US10882675B2 (en) | 2010-06-11 | 2021-01-05 | Pressco Ip Llc | Cookware and cook-packs for narrowband irradiation cooking and systems and methods thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6135847Y2 (enrdf_load_stackoverflow) | 1986-10-18 |