JPS5771126U - - Google Patents
Info
- Publication number
- JPS5771126U JPS5771126U JP14697480U JP14697480U JPS5771126U JP S5771126 U JPS5771126 U JP S5771126U JP 14697480 U JP14697480 U JP 14697480U JP 14697480 U JP14697480 U JP 14697480U JP S5771126 U JPS5771126 U JP S5771126U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14697480U JPS6117933Y2 (https=) | 1980-10-17 | 1980-10-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14697480U JPS6117933Y2 (https=) | 1980-10-17 | 1980-10-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5771126U true JPS5771126U (https=) | 1982-04-30 |
| JPS6117933Y2 JPS6117933Y2 (https=) | 1986-05-31 |
Family
ID=29506508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14697480U Expired JPS6117933Y2 (https=) | 1980-10-17 | 1980-10-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6117933Y2 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61142561U (https=) * | 1985-02-21 | 1986-09-03 | ||
| US9230826B2 (en) | 2010-08-26 | 2016-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Etching method using mixed gas and method for manufacturing semiconductor device |
| US9257561B2 (en) | 2010-08-26 | 2016-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
-
1980
- 1980-10-17 JP JP14697480U patent/JPS6117933Y2/ja not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61142561U (https=) * | 1985-02-21 | 1986-09-03 | ||
| US9230826B2 (en) | 2010-08-26 | 2016-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Etching method using mixed gas and method for manufacturing semiconductor device |
| US9257561B2 (en) | 2010-08-26 | 2016-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6117933Y2 (https=) | 1986-05-31 |