JPS5759306B2 - - Google Patents
Info
- Publication number
- JPS5759306B2 JPS5759306B2 JP53102867A JP10286778A JPS5759306B2 JP S5759306 B2 JPS5759306 B2 JP S5759306B2 JP 53102867 A JP53102867 A JP 53102867A JP 10286778 A JP10286778 A JP 10286778A JP S5759306 B2 JPS5759306 B2 JP S5759306B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10286778A JPS5531115A (en) | 1978-08-25 | 1978-08-25 | Anti-contamination, vacuum plasma film-forming apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10286778A JPS5531115A (en) | 1978-08-25 | 1978-08-25 | Anti-contamination, vacuum plasma film-forming apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5531115A JPS5531115A (en) | 1980-03-05 |
JPS5759306B2 true JPS5759306B2 (ko) | 1982-12-14 |
Family
ID=14338849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10286778A Granted JPS5531115A (en) | 1978-08-25 | 1978-08-25 | Anti-contamination, vacuum plasma film-forming apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5531115A (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599502A (ja) * | 1982-07-08 | 1984-01-18 | Sumitomo Light Metal Ind Ltd | 内面塗装管の検査方法 |
JPS632154U (ko) * | 1986-06-23 | 1988-01-08 | ||
JPH02141651A (ja) * | 1988-11-22 | 1990-05-31 | Mitsui Petrochem Ind Ltd | 管内面コート金属管のコート状態検査方法及び装置 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57111031A (en) * | 1980-12-27 | 1982-07-10 | Clarion Co Ltd | Sputtering device |
JPS58161634U (ja) * | 1982-04-21 | 1983-10-27 | 日本電気株式会社 | 反応性イオンプレ−テイング装置 |
KR100526007B1 (ko) * | 2000-12-28 | 2005-11-08 | 엘지.필립스 엘시디 주식회사 | 플라즈마 에칭장치 |
CN106903412A (zh) * | 2017-04-28 | 2017-06-30 | 成都大漠石油技术有限公司 | 利于提高大型管道焊接质量的装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS579430A (en) * | 1980-06-18 | 1982-01-18 | Hitachi Ltd | Electric cleaner |
-
1978
- 1978-08-25 JP JP10286778A patent/JPS5531115A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS579430A (en) * | 1980-06-18 | 1982-01-18 | Hitachi Ltd | Electric cleaner |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599502A (ja) * | 1982-07-08 | 1984-01-18 | Sumitomo Light Metal Ind Ltd | 内面塗装管の検査方法 |
JPS632154U (ko) * | 1986-06-23 | 1988-01-08 | ||
JPH02141651A (ja) * | 1988-11-22 | 1990-05-31 | Mitsui Petrochem Ind Ltd | 管内面コート金属管のコート状態検査方法及び装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS5531115A (en) | 1980-03-05 |