JPS5757858B2 - - Google Patents
Info
- Publication number
- JPS5757858B2 JPS5757858B2 JP3809772A JP3809772A JPS5757858B2 JP S5757858 B2 JPS5757858 B2 JP S5757858B2 JP 3809772 A JP3809772 A JP 3809772A JP 3809772 A JP3809772 A JP 3809772A JP S5757858 B2 JPS5757858 B2 JP S5757858B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Diaphragms For Cameras (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3809772A JPS5757858B2 (sr) | 1972-04-13 | 1972-04-13 | |
| US304841A US3871764A (en) | 1972-04-05 | 1972-11-08 | Pattern generator apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3809772A JPS5757858B2 (sr) | 1972-04-13 | 1972-04-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS48103273A JPS48103273A (sr) | 1973-12-25 |
| JPS5757858B2 true JPS5757858B2 (sr) | 1982-12-07 |
Family
ID=12515959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3809772A Expired JPS5757858B2 (sr) | 1972-04-05 | 1972-04-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5757858B2 (sr) |
-
1972
- 1972-04-13 JP JP3809772A patent/JPS5757858B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS48103273A (sr) | 1973-12-25 |