JPS5756068B2 - - Google Patents

Info

Publication number
JPS5756068B2
JPS5756068B2 JP11768377A JP11768377A JPS5756068B2 JP S5756068 B2 JPS5756068 B2 JP S5756068B2 JP 11768377 A JP11768377 A JP 11768377A JP 11768377 A JP11768377 A JP 11768377A JP S5756068 B2 JPS5756068 B2 JP S5756068B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11768377A
Other languages
Japanese (ja)
Other versions
JPS5451832A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11768377A priority Critical patent/JPS5451832A/en
Publication of JPS5451832A publication Critical patent/JPS5451832A/en
Publication of JPS5756068B2 publication Critical patent/JPS5756068B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP11768377A 1977-09-30 1977-09-30 Photomask material Granted JPS5451832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11768377A JPS5451832A (en) 1977-09-30 1977-09-30 Photomask material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11768377A JPS5451832A (en) 1977-09-30 1977-09-30 Photomask material

Publications (2)

Publication Number Publication Date
JPS5451832A JPS5451832A (en) 1979-04-24
JPS5756068B2 true JPS5756068B2 (en) 1982-11-27

Family

ID=14717697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11768377A Granted JPS5451832A (en) 1977-09-30 1977-09-30 Photomask material

Country Status (1)

Country Link
JP (1) JPS5451832A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0471827B2 (en) * 1984-12-28 1992-11-16 Fuji Shashin Fuirumu Kk

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6018870Y2 (en) * 1980-08-18 1985-06-07 株式会社東芝 Plug-in unit storage device
JPS5741638A (en) * 1980-08-25 1982-03-08 Fujitsu Ltd Photomask for electron beam
JPS5764739A (en) * 1980-10-09 1982-04-20 Dainippon Printing Co Ltd Photomask substrate and photomask
US4440841A (en) * 1981-02-28 1984-04-03 Dai Nippon Insatsu Kabushiki Kaisha Photomask and photomask blank
JPS5849945A (en) * 1981-08-31 1983-03-24 Konishiroku Photo Ind Co Ltd Manufacture of photomask material
US4563407A (en) * 1982-11-16 1986-01-07 Hoya Corporation Photo-mask blank comprising a shading layer having a variable etch rate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0471827B2 (en) * 1984-12-28 1992-11-16 Fuji Shashin Fuirumu Kk

Also Published As

Publication number Publication date
JPS5451832A (en) 1979-04-24

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