JPS5756068B2 - - Google Patents
Info
- Publication number
- JPS5756068B2 JPS5756068B2 JP11768377A JP11768377A JPS5756068B2 JP S5756068 B2 JPS5756068 B2 JP S5756068B2 JP 11768377 A JP11768377 A JP 11768377A JP 11768377 A JP11768377 A JP 11768377A JP S5756068 B2 JPS5756068 B2 JP S5756068B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11768377A JPS5451832A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11768377A JPS5451832A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5451832A JPS5451832A (en) | 1979-04-24 |
JPS5756068B2 true JPS5756068B2 (en) | 1982-11-27 |
Family
ID=14717697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11768377A Granted JPS5451832A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5451832A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0471827B2 (en) * | 1984-12-28 | 1992-11-16 | Fuji Shashin Fuirumu Kk |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6018870Y2 (en) * | 1980-08-18 | 1985-06-07 | 株式会社東芝 | Plug-in unit storage device |
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS5764739A (en) * | 1980-10-09 | 1982-04-20 | Dainippon Printing Co Ltd | Photomask substrate and photomask |
US4440841A (en) * | 1981-02-28 | 1984-04-03 | Dai Nippon Insatsu Kabushiki Kaisha | Photomask and photomask blank |
JPS5849945A (en) * | 1981-08-31 | 1983-03-24 | Konishiroku Photo Ind Co Ltd | Manufacture of photomask material |
US4563407A (en) * | 1982-11-16 | 1986-01-07 | Hoya Corporation | Photo-mask blank comprising a shading layer having a variable etch rate |
-
1977
- 1977-09-30 JP JP11768377A patent/JPS5451832A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0471827B2 (en) * | 1984-12-28 | 1992-11-16 | Fuji Shashin Fuirumu Kk |
Also Published As
Publication number | Publication date |
---|---|
JPS5451832A (en) | 1979-04-24 |