JPS5755966A - Light-transmitting heat-insulating material - Google Patents
Light-transmitting heat-insulating materialInfo
- Publication number
- JPS5755966A JPS5755966A JP13189780A JP13189780A JPS5755966A JP S5755966 A JPS5755966 A JP S5755966A JP 13189780 A JP13189780 A JP 13189780A JP 13189780 A JP13189780 A JP 13189780A JP S5755966 A JPS5755966 A JP S5755966A
- Authority
- JP
- Japan
- Prior art keywords
- light
- transmitting
- pref
- semiconductor film
- insulating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L59/00—Thermal insulation in general
- F16L59/02—Shape or form of insulating materials, with or without coverings integral with the insulating materials
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Thermal Insulation (AREA)
- Laminated Bodies (AREA)
Abstract
PURPOSE: A cheap light-transmitting heat-insulating material with excellent heat insulating property and selective transmittance, obtd. by incorporating a light-transmitting inorg. powder having a selectively transmitting semiconductor film on its surface in a synthetic resin.
CONSTITUTION: A synthetic resin is compounded with pref. 0.05W20wt% light- transmitting inorganic powder having a selectively transmitting semiconductor film on its surface. Said inorganic powder is pref. one excellent in heat resistance because of possibility of chemical treatment in the formation of the semiconductor film, and lamellar on of high aspect ratio such as powdered silica, mica or galss flake is pref. because of increased effect of selective transmittance when flatly arranged. A semiconductor doped with an oxide such as indium oxide or titanium oxide, a halide such as copper iodide, etc. is used as said selectively transmitting semiconductor.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13189780A JPS5755966A (en) | 1980-09-22 | 1980-09-22 | Light-transmitting heat-insulating material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13189780A JPS5755966A (en) | 1980-09-22 | 1980-09-22 | Light-transmitting heat-insulating material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5755966A true JPS5755966A (en) | 1982-04-03 |
JPH0137420B2 JPH0137420B2 (en) | 1989-08-07 |
Family
ID=15068707
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13189780A Granted JPS5755966A (en) | 1980-09-22 | 1980-09-22 | Light-transmitting heat-insulating material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5755966A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02173060A (en) * | 1988-12-26 | 1990-07-04 | Teijin Chem Ltd | Heat ray screening plate |
JP2002069258A (en) * | 2000-08-25 | 2002-03-08 | Asahi Glass Co Ltd | Fluororesin film |
CN103627318A (en) * | 2013-11-22 | 2014-03-12 | 上海海隆石油化工研究所 | Temperature-resistant, high-pressure-resistant and water-resistant epoxy organic silicon coating |
-
1980
- 1980-09-22 JP JP13189780A patent/JPS5755966A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02173060A (en) * | 1988-12-26 | 1990-07-04 | Teijin Chem Ltd | Heat ray screening plate |
JP2002069258A (en) * | 2000-08-25 | 2002-03-08 | Asahi Glass Co Ltd | Fluororesin film |
CN103627318A (en) * | 2013-11-22 | 2014-03-12 | 上海海隆石油化工研究所 | Temperature-resistant, high-pressure-resistant and water-resistant epoxy organic silicon coating |
Also Published As
Publication number | Publication date |
---|---|
JPH0137420B2 (en) | 1989-08-07 |
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