JPS5750049B2 - - Google Patents
Info
- Publication number
- JPS5750049B2 JPS5750049B2 JP54028554A JP2855479A JPS5750049B2 JP S5750049 B2 JPS5750049 B2 JP S5750049B2 JP 54028554 A JP54028554 A JP 54028554A JP 2855479 A JP2855479 A JP 2855479A JP S5750049 B2 JPS5750049 B2 JP S5750049B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2855479A JPS55120138A (en) | 1979-03-12 | 1979-03-12 | Method for correcting aberation of electron-beam exposing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2855479A JPS55120138A (en) | 1979-03-12 | 1979-03-12 | Method for correcting aberation of electron-beam exposing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55120138A JPS55120138A (en) | 1980-09-16 |
| JPS5750049B2 true JPS5750049B2 (cg-RX-API-DMAC10.html) | 1982-10-25 |
Family
ID=12251865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2855479A Granted JPS55120138A (en) | 1979-03-12 | 1979-03-12 | Method for correcting aberation of electron-beam exposing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55120138A (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01295092A (ja) * | 1988-05-23 | 1989-11-28 | Nippon Steel Corp | 外径差のあるパイプ用の形状記憶合金製継手 |
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1979
- 1979-03-12 JP JP2855479A patent/JPS55120138A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01295092A (ja) * | 1988-05-23 | 1989-11-28 | Nippon Steel Corp | 外径差のあるパイプ用の形状記憶合金製継手 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55120138A (en) | 1980-09-16 |