JPS5748237Y2 - - Google Patents

Info

Publication number
JPS5748237Y2
JPS5748237Y2 JP18222178U JP18222178U JPS5748237Y2 JP S5748237 Y2 JPS5748237 Y2 JP S5748237Y2 JP 18222178 U JP18222178 U JP 18222178U JP 18222178 U JP18222178 U JP 18222178U JP S5748237 Y2 JPS5748237 Y2 JP S5748237Y2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18222178U
Other versions
JPS5597098U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18222178U priority Critical patent/JPS5748237Y2/ja
Priority claimed from IT2227379U external-priority patent/IT7922273V0/en
Publication of JPS5597098U publication Critical patent/JPS5597098U/ja
Application granted granted Critical
Publication of JPS5748237Y2 publication Critical patent/JPS5748237Y2/ja
Application status is Granted legal-status Critical

Links

JP18222178U 1978-12-28 1978-12-28 Granted JPS5748237Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18222178U JPS5748237Y2 (en) 1978-12-28 1978-12-28

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP18222178U JPS5748237Y2 (en) 1978-12-28 1978-12-28
IT2227379U IT7922273V0 (en) 1978-08-08 1979-08-02 Roller shutter with openings for the passage of light and air.

Publications (2)

Publication Number Publication Date
JPS5597098U JPS5597098U (en) 1980-07-05
JPS5748237Y2 true JPS5748237Y2 (en) 1982-10-22

Family

ID=29193901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18222178U Granted JPS5748237Y2 (en) 1978-12-28 1978-12-28

Country Status (1)

Country Link
JP (1) JPS5748237Y2 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8859362B2 (en) 2005-03-28 2014-10-14 Micron Technology, Inc. Integrated circuit fabrication
US8871648B2 (en) 2007-12-06 2014-10-28 Micron Technology, Inc. Method for forming high density patterns
US8871646B2 (en) 2008-11-24 2014-10-28 Micron Technology, Inc. Methods of forming a masking pattern for integrated circuits
US8877639B2 (en) 2005-08-30 2014-11-04 Micron Technology, Inc. Method and algorithm for random half pitched interconnect layout with constant spacing
US8883644B2 (en) 2006-08-30 2014-11-11 Micron Technology, Inc. Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
US8889020B2 (en) 2006-04-25 2014-11-18 Micron Technology, Inc. Process for improving critical dimension uniformity of integrated circuit arrays
US8928111B2 (en) 2008-07-03 2015-01-06 Micron Technology, Inc. Transistor with high breakdown voltage having separated drain extensions
US8932960B2 (en) 2007-12-18 2015-01-13 Micron Technology, Inc. Methods for isolating portions of a loop of pitch-multiplied material and related structures
US9003651B2 (en) 2005-09-01 2015-04-14 Micron Technology, Inc. Methods for integrated circuit fabrication with protective coating for planarization
US9035416B2 (en) 2006-09-14 2015-05-19 Micron Technology, Inc. Efficient pitch multiplication process
US9099314B2 (en) 2005-09-01 2015-08-04 Micron Technology, Inc. Pitch multiplication spacers and methods of forming the same
US9099402B2 (en) 2005-05-23 2015-08-04 Micron Technology, Inc. Integrated circuit structure having arrays of small, closely spaced features
US9184159B2 (en) 2006-04-07 2015-11-10 Micron Technology, Inc. Simplified pitch doubling process flow
US9412591B2 (en) 2007-07-31 2016-08-09 Micron Technology, Inc. Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0137094Y2 (en) * 1983-08-13 1989-11-09
JPH0245434Y2 (en) * 1983-08-26 1990-11-30

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8859362B2 (en) 2005-03-28 2014-10-14 Micron Technology, Inc. Integrated circuit fabrication
US9412594B2 (en) 2005-03-28 2016-08-09 Micron Technology, Inc. Integrated circuit fabrication
US9147608B2 (en) 2005-03-28 2015-09-29 Micron Technology, Inc. Integrated circuit fabrication
US9099402B2 (en) 2005-05-23 2015-08-04 Micron Technology, Inc. Integrated circuit structure having arrays of small, closely spaced features
US8877639B2 (en) 2005-08-30 2014-11-04 Micron Technology, Inc. Method and algorithm for random half pitched interconnect layout with constant spacing
US9003651B2 (en) 2005-09-01 2015-04-14 Micron Technology, Inc. Methods for integrated circuit fabrication with protective coating for planarization
US9099314B2 (en) 2005-09-01 2015-08-04 Micron Technology, Inc. Pitch multiplication spacers and methods of forming the same
US9184159B2 (en) 2006-04-07 2015-11-10 Micron Technology, Inc. Simplified pitch doubling process flow
US8889020B2 (en) 2006-04-25 2014-11-18 Micron Technology, Inc. Process for improving critical dimension uniformity of integrated circuit arrays
US9553082B2 (en) 2006-04-25 2017-01-24 Micron Technology, Inc. Process for improving critical dimension uniformity of integrated circuit arrays
US9478497B2 (en) 2006-08-30 2016-10-25 Micron Technology, Inc. Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
US8883644B2 (en) 2006-08-30 2014-11-11 Micron Technology, Inc. Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
US9035416B2 (en) 2006-09-14 2015-05-19 Micron Technology, Inc. Efficient pitch multiplication process
US9412591B2 (en) 2007-07-31 2016-08-09 Micron Technology, Inc. Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures
US8871648B2 (en) 2007-12-06 2014-10-28 Micron Technology, Inc. Method for forming high density patterns
US8932960B2 (en) 2007-12-18 2015-01-13 Micron Technology, Inc. Methods for isolating portions of a loop of pitch-multiplied material and related structures
US8928111B2 (en) 2008-07-03 2015-01-06 Micron Technology, Inc. Transistor with high breakdown voltage having separated drain extensions
US8871646B2 (en) 2008-11-24 2014-10-28 Micron Technology, Inc. Methods of forming a masking pattern for integrated circuits

Also Published As

Publication number Publication date
JPS5597098U (en) 1980-07-05

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