JPS5748237B2 - - Google Patents
Info
- Publication number
- JPS5748237B2 JPS5748237B2 JP10578775A JP10578775A JPS5748237B2 JP S5748237 B2 JPS5748237 B2 JP S5748237B2 JP 10578775 A JP10578775 A JP 10578775A JP 10578775 A JP10578775 A JP 10578775A JP S5748237 B2 JPS5748237 B2 JP S5748237B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10578775A JPS5229344A (en) | 1975-08-30 | 1975-08-30 | Machine with automatic thread cutter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10578775A JPS5229344A (en) | 1975-08-30 | 1975-08-30 | Machine with automatic thread cutter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5229344A JPS5229344A (en) | 1977-03-05 |
JPS5748237B2 true JPS5748237B2 (ko) | 1982-10-14 |
Family
ID=14416835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10578775A Granted JPS5229344A (en) | 1975-08-30 | 1975-08-30 | Machine with automatic thread cutter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5229344A (ko) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8859362B2 (en) | 2005-03-28 | 2014-10-14 | Micron Technology, Inc. | Integrated circuit fabrication |
US8871646B2 (en) | 2008-11-24 | 2014-10-28 | Micron Technology, Inc. | Methods of forming a masking pattern for integrated circuits |
US8883644B2 (en) | 2006-08-30 | 2014-11-11 | Micron Technology, Inc. | Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures |
US8889020B2 (en) | 2006-04-25 | 2014-11-18 | Micron Technology, Inc. | Process for improving critical dimension uniformity of integrated circuit arrays |
US9003651B2 (en) | 2005-09-01 | 2015-04-14 | Micron Technology, Inc. | Methods for integrated circuit fabrication with protective coating for planarization |
US9048194B2 (en) | 2008-03-21 | 2015-06-02 | Micron Technology, Inc. | Method for selectively modifying spacing between pitch multiplied structures |
US9082829B2 (en) | 2005-09-01 | 2015-07-14 | Micron Technology, Inc. | Methods for forming arrays of small, closely spaced features |
US9117766B2 (en) | 2005-06-02 | 2015-08-25 | Micron Technology, Inc. | Method for positioning spacers in pitch multiplication |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6138542Y2 (ko) * | 1980-06-17 | 1986-11-06 | ||
US4566395A (en) * | 1984-11-05 | 1986-01-28 | Clinton Industries, Inc. | Sewing machine needle thread capturing and severing mechanism |
JP6623962B2 (ja) | 2016-07-26 | 2019-12-25 | 株式会社デンソー | 冷凍サイクル装置 |
-
1975
- 1975-08-30 JP JP10578775A patent/JPS5229344A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8859362B2 (en) | 2005-03-28 | 2014-10-14 | Micron Technology, Inc. | Integrated circuit fabrication |
US9117766B2 (en) | 2005-06-02 | 2015-08-25 | Micron Technology, Inc. | Method for positioning spacers in pitch multiplication |
US9003651B2 (en) | 2005-09-01 | 2015-04-14 | Micron Technology, Inc. | Methods for integrated circuit fabrication with protective coating for planarization |
US9082829B2 (en) | 2005-09-01 | 2015-07-14 | Micron Technology, Inc. | Methods for forming arrays of small, closely spaced features |
US8889020B2 (en) | 2006-04-25 | 2014-11-18 | Micron Technology, Inc. | Process for improving critical dimension uniformity of integrated circuit arrays |
US8883644B2 (en) | 2006-08-30 | 2014-11-11 | Micron Technology, Inc. | Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures |
US9048194B2 (en) | 2008-03-21 | 2015-06-02 | Micron Technology, Inc. | Method for selectively modifying spacing between pitch multiplied structures |
US8871646B2 (en) | 2008-11-24 | 2014-10-28 | Micron Technology, Inc. | Methods of forming a masking pattern for integrated circuits |
Also Published As
Publication number | Publication date |
---|---|
JPS5229344A (en) | 1977-03-05 |