JPS5744749B2 - - Google Patents
Info
- Publication number
- JPS5744749B2 JPS5744749B2 JP11771377A JP11771377A JPS5744749B2 JP S5744749 B2 JPS5744749 B2 JP S5744749B2 JP 11771377 A JP11771377 A JP 11771377A JP 11771377 A JP11771377 A JP 11771377A JP S5744749 B2 JPS5744749 B2 JP S5744749B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11771377A JPS5450440A (en) | 1977-09-29 | 1977-09-29 | Plasma etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11771377A JPS5450440A (en) | 1977-09-29 | 1977-09-29 | Plasma etching device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5450440A JPS5450440A (en) | 1979-04-20 |
| JPS5744749B2 true JPS5744749B2 (en) | 1982-09-22 |
Family
ID=14718451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11771377A Granted JPS5450440A (en) | 1977-09-29 | 1977-09-29 | Plasma etching device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5450440A (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5640661U (en) * | 1979-09-07 | 1981-04-15 | ||
| JPS5694745A (en) * | 1979-12-28 | 1981-07-31 | Sony Corp | Plasma treatment device |
| US4340461A (en) * | 1980-09-10 | 1982-07-20 | International Business Machines Corp. | Modified RIE chamber for uniform silicon etching |
| US4340462A (en) * | 1981-02-13 | 1982-07-20 | Lam Research Corporation | Adjustable electrode plasma processing chamber |
| JPS58214337A (en) * | 1982-06-08 | 1983-12-13 | Unitika Ltd | Treatment of sheet material with low-temp. plasma |
| JPS59199037A (en) * | 1983-04-26 | 1984-11-12 | Fuji Electric Corp Res & Dev Ltd | Device for forming thin film |
| US4464223A (en) * | 1983-10-03 | 1984-08-07 | Tegal Corp. | Plasma reactor apparatus and method |
| JPS6081826A (en) * | 1983-10-12 | 1985-05-09 | Fujitsu Ltd | Dry etching device |
| JPH0750701B2 (en) * | 1985-04-01 | 1995-05-31 | 日電アネルバ株式会社 | Discharge reactor |
| US4600464A (en) * | 1985-05-01 | 1986-07-15 | International Business Machines Corporation | Plasma etching reactor with reduced plasma potential |
| JPS61285719A (en) * | 1985-06-12 | 1986-12-16 | Nec Corp | Dry etching device |
| JPS63175427A (en) * | 1987-01-16 | 1988-07-19 | Nec Corp | Dry etching apparatus |
-
1977
- 1977-09-29 JP JP11771377A patent/JPS5450440A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5450440A (en) | 1979-04-20 |