JPS573717A - Precipitation of tantalum or niobium compound - Google Patents
Precipitation of tantalum or niobium compoundInfo
- Publication number
- JPS573717A JPS573717A JP7378580A JP7378580A JPS573717A JP S573717 A JPS573717 A JP S573717A JP 7378580 A JP7378580 A JP 7378580A JP 7378580 A JP7378580 A JP 7378580A JP S573717 A JPS573717 A JP S573717A
- Authority
- JP
- Japan
- Prior art keywords
- solution
- hydrofluoric acid
- compound
- precipitant
- peroxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
PURPOSE: To prepare the titled compound having low impurity content, by adding a precipitant to a Ta or Nb solution acidified with hydrofluoric acid.
CONSTITUTION: Ore containing Ta or Nb oxide is dissolved in hydrofluoric acid, and the solution is made to contact with an organic solvent to extract the Ta or Nb in the solution to the organic solvent. The organic solution of Ta or Nb is then made to contact with a dilute mineral acid to obtain an aqueous solution of Ta or Nb. Hydrofluoric acid is added to the aqueous solution until the concentration of free hydrofluoric acid reaches to ≥0.1M/l, and the hydrofluoric acid solution of Ta or Nb thus obtained is mixed with a peroxide (e.g. H2O2). The molar concentration ratio of the Ta or Nb to the peroxide is selected to ≥1. A precipitant (e.g. aqueous ammonia) is added to the mixture, and the pH of the solution is adjusted to ≥5 to precipitate the Ta or Nb compound. By this process, a Ta or Nb compound having low content of Sb, Si, etc. can be obtained.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7378580A JPS573717A (en) | 1980-06-03 | 1980-06-03 | Precipitation of tantalum or niobium compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7378580A JPS573717A (en) | 1980-06-03 | 1980-06-03 | Precipitation of tantalum or niobium compound |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS573717A true JPS573717A (en) | 1982-01-09 |
Family
ID=13528188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7378580A Pending JPS573717A (en) | 1980-06-03 | 1980-06-03 | Precipitation of tantalum or niobium compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS573717A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111977690A (en) * | 2020-09-07 | 2020-11-24 | 江西拓泓新材料有限公司 | Method for removing copper and other impurities in preparation of tantalum-niobium oxide |
| WO2023171020A1 (en) * | 2022-03-11 | 2023-09-14 | 三井金属鉱業株式会社 | Tantalic acid compound dispersion liquid and method for producing same |
| WO2024162472A1 (en) * | 2023-02-03 | 2024-08-08 | 三井金属鉱業株式会社 | Metal oxide-including liquid and manufacturing method therefor |
-
1980
- 1980-06-03 JP JP7378580A patent/JPS573717A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111977690A (en) * | 2020-09-07 | 2020-11-24 | 江西拓泓新材料有限公司 | Method for removing copper and other impurities in preparation of tantalum-niobium oxide |
| WO2023171020A1 (en) * | 2022-03-11 | 2023-09-14 | 三井金属鉱業株式会社 | Tantalic acid compound dispersion liquid and method for producing same |
| WO2024162472A1 (en) * | 2023-02-03 | 2024-08-08 | 三井金属鉱業株式会社 | Metal oxide-including liquid and manufacturing method therefor |
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