JPS573052B2 - - Google Patents
Info
- Publication number
- JPS573052B2 JPS573052B2 JP2583774A JP2583774A JPS573052B2 JP S573052 B2 JPS573052 B2 JP S573052B2 JP 2583774 A JP2583774 A JP 2583774A JP 2583774 A JP2583774 A JP 2583774A JP S573052 B2 JPS573052 B2 JP S573052B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2583774A JPS573052B2 (en:Method) | 1974-03-06 | 1974-03-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2583774A JPS573052B2 (en:Method) | 1974-03-06 | 1974-03-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50120327A JPS50120327A (en:Method) | 1975-09-20 |
| JPS573052B2 true JPS573052B2 (en:Method) | 1982-01-20 |
Family
ID=12176958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2583774A Expired JPS573052B2 (en:Method) | 1974-03-06 | 1974-03-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS573052B2 (en:Method) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5282414A (en) * | 1975-12-29 | 1977-07-09 | Inst Borupurobodonikofu Akadem | Electromagnetic radiation and particle radiation sensitive material |
| JPS5282425A (en) * | 1975-12-29 | 1977-07-09 | Inst Borupurobodonikofu Akadem | Method of producing embossed article using electromagnetic and particle radiation sensitive material |
| JPS52111381A (en) * | 1976-03-15 | 1977-09-19 | Nippon Telegr & Teleph Corp <Ntt> | Photo-sensitive material for forming pattern having photo-sensitive ca lcogenide layer and the pattern forming method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS511412B2 (en:Method) * | 1971-08-02 | 1976-01-17 | ||
| JPS5435084B2 (en:Method) * | 1972-02-18 | 1979-10-31 |
-
1974
- 1974-03-06 JP JP2583774A patent/JPS573052B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50120327A (en:Method) | 1975-09-20 |