JPS5726406B2 - - Google Patents
Info
- Publication number
- JPS5726406B2 JPS5726406B2 JP15918676A JP15918676A JPS5726406B2 JP S5726406 B2 JPS5726406 B2 JP S5726406B2 JP 15918676 A JP15918676 A JP 15918676A JP 15918676 A JP15918676 A JP 15918676A JP S5726406 B2 JPS5726406 B2 JP S5726406B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15918676A JPS5383468A (en) | 1976-12-28 | 1976-12-28 | Mask aligning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15918676A JPS5383468A (en) | 1976-12-28 | 1976-12-28 | Mask aligning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5383468A JPS5383468A (en) | 1978-07-22 |
| JPS5726406B2 true JPS5726406B2 (OSRAM) | 1982-06-04 |
Family
ID=15688182
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15918676A Granted JPS5383468A (en) | 1976-12-28 | 1976-12-28 | Mask aligning method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5383468A (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6900463B1 (en) | 1980-06-30 | 2005-05-31 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
-
1976
- 1976-12-28 JP JP15918676A patent/JPS5383468A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5383468A (en) | 1978-07-22 |